专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US5070488A Optical integrated circuit and optical apparatus 失效
标题翻译：光学集成电路和光学设备
公开(公告)号：US5070488A
公开(公告)日：1991-12-03
申请号：US372639
申请日：1989-06-28
申请人： Atsuko Fukushima , Yasuo Hira , Hidemi Sato , Kazumi Kawamoto , Kenchi Ito , Masataka Shiba , Akira Arimoto
发明人： Atsuko Fukushima , Yasuo Hira , Hidemi Sato , Kazumi Kawamoto , Kenchi Ito , Masataka Shiba , Akira Arimoto
IPC分类号： G02B6/124 , G02B6/34 , G02B6/42 , G02F1/335 , G11B7/12 , G11B7/125 , G11B7/135
CPC分类号： G02B6/4246 , G02B6/124 , G02B6/34 , G02B6/42 , G02F1/335 , G11B7/1245 , G11B7/125 , G11B7/1384
摘要： An optical integrated circuit and an optical apparatus used in optical communication or an opto-electronics apparatus such as an optical disk recording apparatus, in which various kinds of aberration caused by wavelength variation of a light source when a semiconductor laser is used as the light source. An aberration correcting grating having such grating pitches as to nearly satisfy the Bragg condition preferably with respect to a certain wavelength of the semiconductor laser beam is used. As a result, lowering of incidence (entrance) and radiation (exit) coupling efficiencies of the grating coupler and aberration such as chromatic aberration can be prevented. Even if a multi-mode semiconductor laser is used as a light source, the characteristics of the optical integrated circuit and optical apparatus do not vary largely.
摘要翻译：在光通信中使用的光集成电路和光学装置或光电记录装置等光电装置，其中当使用半导体激光器作为光源时，由光源的波长变化引起的各种像差。使用具有这样的光栅间距几乎满足布拉格条件的像差校正光栅，优选地相对于半导体激光束的特定波长。结果，可以防止光栅耦合器的入射（入射）和辐射（出射）耦合效率的降低以及像差等像差。即使使用多模式半导体激光器作为光源，光集成电路和光学装置的特性也不会很大变化。

2. 发明授权

US5191624A Optical information storing apparatus and method for production of optical deflector 失效
标题翻译：光学信息存储装置及其制造方法
公开(公告)号：US5191624A
公开(公告)日：1993-03-02
申请号：US762935
申请日：1991-09-19
申请人： Kenchi Ito , Kazumi Kawamoto , Naoya Kanda , Yasuo Hira , Hidemi Sato , Atsuko Fukushima , Masataka Shiba , Akira Inagaki , Minoru Yoshida
发明人： Kenchi Ito , Kazumi Kawamoto , Naoya Kanda , Yasuo Hira , Hidemi Sato , Atsuko Fukushima , Masataka Shiba , Akira Inagaki , Minoru Yoshida
IPC分类号： G02B6/12 , G02F1/335 , G11B7/12
CPC分类号： G02B6/12004 , G02F1/335 , G11B7/1245
摘要： An optical waveguide is comprised of an optical substrate and an optical thin-film optical waveguide layer and formed such that ##EQU1## where .theta. is an output angle, n.sub.o1 is an ordinary refractive index of the optical substrate for an ordinary beam, n.sub.e1 is an extraordinary refractive index of the optical substrate for an extraordinary beam, n.sub.o2 is an ordinary refractive index of the optical thin-film optical waveguide layer for the ordinary beam and n.sub.e2 is an extraordinary refractive index of the optical thin-film optical waveguide layer for the extraordinary beam, and an electrode for generating a surface acoustic wave for diffracting light is formed on the optical waveguide to construct a collinear optical deflector. A method for production of the optical thin-film optical waveguide layer is exemplified wherein a target made of tantalic lilthium niobate or tantalic lithium niobate magnesium and an optical substrate made of lithium tantalate are prepared and an optical thin-film optical waveguide layer having a composition of tantalic lithium niobate or tantalic lithium niobate magnesium is formed on the optical substrate through an ion beam sputtering process into which oxygen can be introduced. Proton substitutes for part of an element constituting the optical thin-film optical waveguide layer.
摘要翻译：光波导包括光学基板和光学薄膜光波导层，并且被形成为使得θ是输出角度的θIMA1是普通光束的光学基板的普通折射率，ne1是用于非常光束的光学基板的非常折射率，no2是普通光束的光学薄膜光波导层的普通折射率，ne2是非常优异的光学薄膜光波导层的非常折射率并且在光波导上形成用于产生用于衍射光的表面声波的电极，以构成共线的光学偏转器。制备光学薄膜光波导层的方法被制备，其中制备由钽酸铌酸锂或钽酸铌镁制成的靶和由钽酸锂制成的光学衬底，并且制备具有组成的光学薄膜光波导层通过可以引入氧气的离子束溅射工艺在光学基板上形成铌酸锂或钽酸铌酸镁。质子代替构成光学薄膜光波导层的元件的一部分。

3. 发明授权

US5195070A Optical information processing apparatus and optical pickup therefor 失效
标题翻译：光信息处理装置及其光拾取装置
公开(公告)号：US5195070A
公开(公告)日：1993-03-16
申请号：US551794
申请日：1990-07-12
申请人： Masataka Shiba , Kazumi Kawamoto , Yasuo Hira , Akira Inagaki , Hidemi Sato , Kenchi Ito , Atsuko Fukushima , Ryuichi Funatsu
发明人： Masataka Shiba , Kazumi Kawamoto , Yasuo Hira , Akira Inagaki , Hidemi Sato , Kenchi Ito , Atsuko Fukushima , Ryuichi Funatsu
IPC分类号： G11B7/09 , G11B7/12 , G11B7/125 , G11B7/13 , G11B7/14
CPC分类号： G11B7/131 , G11B7/0903 , G11B7/1245 , G11B7/127 , G11B7/14
摘要： Using an optical pickup, recording/reproducing of information is performed by irradiating light beams to an optical recording medium to form light spots. The optical pickup includes means for generating plural light beams, an optical waveguide for guiding the plural light beams in a row into a flat space, and a light deflecting element for deflecting the light beams, which run in the optical waveguide, within a plane formed by a vector perpendicular to a plane of the optical waveguide and a directional vector of the light beams. The light deflecting element deflects the plural light spots, which are to be arranged in a row, in a direction perpendicular to the light spot row to perform micro seek.
摘要翻译：使用光学拾取器，通过将光束照射到光学记录介质以形成光斑来进行信息的记录/再现。光拾取器包括用于产生多个光束的装置，用于将多个光束一行地引导到平坦空间中的光波导和用于使在光波导中延伸的光束偏转在形成的平面内的光偏转元件通过垂直于光波导的平面的矢量和光束的方向矢量。光偏转元件在垂直于光点行的方向上偏转排列成一列的多个光点，以执行微寻迹。

4. 发明授权

US5274727A Second harmonic generator and method of fabrication thereof 失效
标题翻译：二次谐波发生器及其制造方法
公开(公告)号：US5274727A
公开(公告)日：1993-12-28
申请号：US879361
申请日：1992-05-07
申请人： Kenchi Ito , Kazumi Kawamoto , Hiroshi Momiji , Yasuo Hira , Hidemi Sato , Atsuko Fukushima
发明人： Kenchi Ito , Kazumi Kawamoto , Hiroshi Momiji , Yasuo Hira , Hidemi Sato , Atsuko Fukushima
IPC分类号： G02F1/377 , G02F1/37
CPC分类号： G02F1/3775
摘要： A second harmonic generator having a wide acceptance of bandwidth of temperature and/or a high conversion efficiency and a method of fabrication thereof are disclosed. An equidistant arrangement of pole-inverted grating having a rectangular sectional profile and the direction of spontaneous polarization opposite to that of a substrate within an optical waveguide has been known to produce a high conversion efficiency of the second harmonic generator A second harmonic generator having such a structure, which has so far been impossible to fabricate, is formed utilizing the liquid-phase epitaxial method and the ion-implanting method. Further, the substrate and the optical waveguide are formed of the same type of material. The temperature coefficient of the refractive index in the direction perpendicular to the substrate surface is rendered substantially equal to that of the optical waveguide, thereby improving the acceptance of bandwidth of temperature and making possible practical applications of the second harmonic generator.
摘要翻译：公开了具有对温度带宽的广泛接受和/或高转换效率的二次谐波发生器及其制造方法。已知具有矩形截面轮廓和与光波导内的衬底相反的自发极化方向的等反转光栅的等距布置产生二次谐波发生器A的高转换效率二次谐波发生器具有这样的使用液相外延法和离子注入法形成迄今为止不可能制造的结构。此外，基板和光波导由相同类型的材料形成。使与基板表面垂直的方向的折射率的温度系数基本上等于光波导的温度系数，从而提高了温度带宽的接受性，并且可以实现二次谐波发生器的实际应用。

5. 发明授权

US5125740A Method and apparatus for measuring optical constants of a thin film as well as method and apparatus for fabricating a thin film utilizing same 失效
标题翻译：用于测量薄膜的光学常数的方法和装置以及利用其制造薄膜的方法和装置
公开(公告)号：US5125740A
公开(公告)日：1992-06-30
申请号：US480649
申请日：1990-02-15
申请人： Hidemi Sato , Yasuo Hira , Atsuko Fukushima , Hiroshi Asao , Kazumi Kawamoto , Kenchi Ito , Ryuichi Funatsu
发明人： Hidemi Sato , Yasuo Hira , Atsuko Fukushima , Hiroshi Asao , Kazumi Kawamoto , Kenchi Ito , Ryuichi Funatsu
IPC分类号： G01N21/41 , G01N21/43 , G01N21/84 , G02B6/13 , G02B6/132 , H01S5/00
CPC分类号： G01N21/43 , G01N21/8422 , G01N2021/4126 , G01N21/412 , G01N21/552
摘要： A sample is located so as to be close to a prism and a light beam coming from a light source is projected to the prism while varying the incident angle to the prism as a parameter. The incident light beam to the prism is propagated therein and light emerging from the bottom surface of the prism, which is in contact with the sample, is projected to the sample. At the same time the intensity of light reflected by the bottom surface of the prism is measured. Optical constants such as the refractive index, the film thickness, the distribution of the refractive index, etc. are obtained by calculation, starting from measured values thus obtained.
摘要翻译：将样品定位成靠近棱镜，并且来自光源的光束作为参数改变与棱镜的入射角度而投射到棱镜。到棱镜的入射光束在其中传播，并且从与样品接触的棱镜的底表面出射的光被投射到样品。同时测量由棱镜底面反射的光的强度。光学常数如折射率，膜厚度，折射率分布等通过计算得到，从所获得的测量值开始。

6. 发明授权

US4906063A Wave guide type optical device and method of fabricating the same 失效
标题翻译：波导型光学器件及其制造方法
公开(公告)号：US4906063A
公开(公告)日：1990-03-06
申请号：US150204
申请日：1988-01-29
申请人： Hidemi Sato , Yasuo Hira , Shigeru Sasaki , Atsuko Fukusima , Kazumi Kawamoto
发明人： Hidemi Sato , Yasuo Hira , Shigeru Sasaki , Atsuko Fukusima , Kazumi Kawamoto
IPC分类号： G02B6/12 , G02B6/122
CPC分类号： G02B6/122
摘要： This invention relates to a wave guide type optical device as an integrated optical device having formed thereon lens and grating having particularly high efficiency and a fabrication method thereof. The present invention is characterized in that a wave guide type optical device having high efficiency and high stability can be fabricated efficiently by forming a buffer layer made of a dielectric substance on a optical wave guide formed near the surface of a substrate having an acousto-optic effect, then forming a light wave control loading layer and finely working the loading layer and the buffer layer to a predetermined shape of a desired optical device.
摘要翻译：本发明涉及一种作为集成光学元件的波导型光学器件，其特征在于，其具有特别高的效率的透镜和光栅及其制造方法。本发明的特征在于，可以通过在具有声光的基板的表面附近的光波导上形成由电介质材料制成的缓冲层来高效率地制造具有高效率和高稳定性的波导型光学器件然后形成光波控制加载层，并将加载层和缓冲层精细加工成所需光学装置的预定形状。

7. 发明授权

US5414239A Optical apparatus for laser machining 失效
标题翻译：激光加工用光学装置
公开(公告)号：US5414239A
公开(公告)日：1995-05-09
申请号：US24643
申请日：1993-03-01
申请人： Takao Terabayashi , Hidemi Sato , Hideaki Tanaka , Yoshitada Oshida
发明人： Takao Terabayashi , Hidemi Sato , Hideaki Tanaka , Yoshitada Oshida
IPC分类号： B23K26/00 , B23K26/06 , B23K26/38 , G03B27/32 , G03F7/20 , H01S3/00 , H05K3/00
CPC分类号： G03F7/70358 , B23K26/066
摘要： A laser-machining optical apparatus designed to efficiently work an object through a large area thereof by projecting an image of a mask to the object through a laser beam having a small sectional area and a high energy density. The apparatus has a laser head for oscillating laser light for working the specimen, a mask provided in the optical path of the laser light beam between the specimen and the laser head and having a working pattern formed on its surface, an objective provided in the optical path of the laser-light beam between the mask and the specimen, a mechanism on which the mask and the specimen are placed so that an optical imaging relationship is maintained therebetween with the objective interposed therebetween, and a two-dimensional scanning device provided in the optical path of the laser light beam between the laser head and the mask to two-dimensionally scan the surface of the mask with the laser light beam from the laser head.
摘要翻译：一种激光加工光学装置，其被设计为通过将具有小截面积和高能量密度的激光束将掩模的图像投射到物体上，通过其大面积有效地对物体进行加工。该装置具有用于振荡激光的激光头用于加工样品，设置在激光束的光路中的试样和激光头之间并具有在其表面上形成的工作图案的掩模，设置在光学器件中的物镜掩模和试样之间的激光束的路径，其中放置掩模和试样的机构，以便在它们之间保持光学成像关系，并且设置在其中的二维扫描装置在激光头和掩模之间的激光束的光路用激光头的激光二维扫描掩模的表面。

8. 发明授权

US06648728B2 Polishing system 失效
公开(公告)号：US06648728B2
公开(公告)日：2003-11-18
申请号：US09949605
申请日：2001-09-12
申请人： Hiroyuki Kojima , Tetsuo Ohkawa , Hidemi Sato
发明人： Hiroyuki Kojima , Tetsuo Ohkawa , Hidemi Sato
IPC分类号： B24B4900
CPC分类号： B24B53/017 , B24B37/013 , B24B37/042 , B24B49/10 , B24B49/16
摘要： The present invention aims at make automatic real-time measurement of the removal rate in during polishing. For achieving the aim, a polishing system is provided with a sensor 1 for measuring a friction generated between a polishing pad and a workpiece during the polishing. The information processor of the polishing system evaluates the polishing efficiency of the polishing pad 5 on the basis of a fluctuation in the removal rate which is successively obtained from a friction successively detected by the sensor and a predetermined function. The result of the evaluation is used for the determination of the execution timing of a dressing process for the polishing pad, the calculation of the removal from the workpiece, and the like.

9. 发明授权

US06794206B2 Method of polishing a film 失效
标题翻译：抛光膜的方法
公开(公告)号：US06794206B2
公开(公告)日：2004-09-21
申请号：US10232707
申请日：2002-09-03
申请人： Takenori Hirose , Mineo Nomoto , Hiroyuki Kojima , Hidemi Sato
发明人： Takenori Hirose , Mineo Nomoto , Hiroyuki Kojima , Hidemi Sato
IPC分类号： H01L2166
CPC分类号： B24B37/013 , B24B49/04 , B24B49/12
摘要： A method of polishing a film formed on a wafer includes steps of polishing a film formed on a surface of a wafer which is chucked by a wafer chuck and set on a polishing disk so that the film faces the polishing disk, irradiating a plurality of portions of the film under polishing process with lights having different wavelengths from one another through a plurality of holes formed in the polishing disk, detecting lights reflected from the plurality of portions of the film caused by the irradiation, evaluating a thickness distribution of the film from information of an intensity ratio of the detected reflected lights, and controlling a pushing pressure of the wafer chuck according to the evaluated thickness distribution under polishing process.
摘要翻译：抛光形成在晶片上的膜的方法包括以下步骤：在由晶片卡盘夹持的晶片表面上形成的膜进行抛光，并将其设置在研磨盘上，使得该膜面向抛光盘，照射多个部分通过形成在研磨盘中的多个孔彼此不同波长的光进行研磨处理，检测从照射引起的膜的多个部分反射的光，从信息中评价胶片的厚度分布检测反射光的强度比，根据研磨过程中的评价厚度分布来控制晶片卡盘的推压。

10. 发明授权

US06531399B2 Polishing method 失效
公开(公告)号：US06531399B2
公开(公告)日：2003-03-11
申请号：US09949642
申请日：2001-09-12
申请人： Hiroyuki Kojima , Tetsuo Ohkawa , Hidemi Sato
发明人： Hiroyuki Kojima , Tetsuo Ohkawa , Hidemi Sato
IPC分类号： H01L21461
CPC分类号： B24B53/017 , B24B37/013 , B24B37/042 , B24B49/10 , B24B49/16
摘要： The present invention aims at make automatic real-time measurement of the removal rate in during polishing. For achieving the aim, a polishing system is provided with a sensor 1 for measuring a friction generated between a polishing pad and a workpiece during the polishing. The information processor of the polishing system evaluates the polishing efficiency of the polishing pad 5 on the basis of a fluctuation in the removal rate which is successively obtained from a friction successively detected by the sensor and a predetermined function. The result of the evaluation is used for the determination of the execution timing of a dressing process for the polishing pad, the calculation of the removal from the workpiece, and the like.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式