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1. 发明授权

US09111968B2 Plasma processing chamber with a grounded electrode assembly 有权
标题翻译：具有接地电极组件的等离子体处理室
公开(公告)号：US09111968B2
公开(公告)日：2015-08-18
申请号：US12825268
申请日：2010-06-28
申请人： Arnold Kholodenko , Anwer Husain
发明人： Arnold Kholodenko , Anwer Husain
IPC分类号： C23C16/00 , H01L21/67 , H01J37/32
CPC分类号： H01J37/32532 , H01J37/32055 , H01J37/32082 , H01J37/32091 , H01J37/32174 , H01J37/32458 , H01J37/32559 , H01J37/32577 , H01J37/32651 , H01J37/32724 , H01L21/67069
摘要： An optimized plasma processing chamber configured to provide a current path is provided. The optimized plasma processing chamber includes at least an upper electrode, a powered lower electrode, a heating plate, a cooling plate, a plasma chamber lid, and clamp ring. Both the heating plate and the cooling plate are disposed above the upper electrode whereas the heating plate is configured to heat the upper electrode while the cooling plate is configured to cool the upper electrode. The clamp ring is configured to secure the upper electrode to a plasma chamber lid and to provide a current path from the upper electrode to the plasma chamber lid. A pocket may be formed between the clamp ring and the upper electrode to hold at least the heater plate, wherein the pocket is configured to allow longitudinal and lateral tolerances for thermal expansion of the heater plate from repetitive thermal cycling.
摘要翻译：提供了一种被配置为提供电流路径的优化等离子体处理室。优化的等离子体处理室至少包括上电极，动力下电极，加热板，冷却板，等离子体室盖和夹环。加热板和冷却板都设置在上电极的上方，而加热板构造成加热上电极，同时冷却板构造为冷却上电极。夹紧环被构造成将上部电极固定到等离子体室盖并且提供从上部电极到等离子体室盖的电流路径。可以在夹紧环和上部电极之间形成一个口袋，以至少保持加热板，其中该口袋构造成允许加热器板的热膨胀的重复热循环的纵向和横向公差。

2. 发明申请

US20100263592A1 PLASMA PROCESSING CHAMBER WITH A GROUNDED ELECTRODE ASSEMBLY 有权
标题翻译：具有接地电极组件的等离子体加工室
公开(公告)号：US20100263592A1
公开(公告)日：2010-10-21
申请号：US12825268
申请日：2010-06-28
申请人： Arnold Kholodenko , Anwer Husain
发明人： Arnold Kholodenko , Anwer Husain
IPC分类号： C23C16/00 , C23C16/505
CPC分类号： H01J37/32532 , H01J37/32055 , H01J37/32082 , H01J37/32091 , H01J37/32174 , H01J37/32458 , H01J37/32559 , H01J37/32577 , H01J37/32651 , H01J37/32724 , H01L21/67069
摘要： An optimized plasma processing chamber configured to provide a current path is provided. The optimized plasma processing chamber includes at least an upper electrode, a powered lower electrode, a heating plate, a cooling plate, a plasma chamber lid, and clamp ring. Both the heating plate and the cooling plate are disposed above the upper electrode whereas the heating plate is configured to heat the upper electrode while the cooling plate is configured to cool the upper electrode. The clamp ring is configured to secure the upper electrode to a plasma chamber lid and to provide a current path from the upper electrode to the plasma chamber lid. A pocket may be formed between the clamp ring and the upper electrode to hold at least the heater plate, wherein the pocket is configured to allow longitudinal and lateral tolerances for thermal expansion of the heater plate from repetitive thermal cycling.
摘要翻译：提供了一种被配置为提供电流路径的优化等离子体处理室。优化的等离子体处理室至少包括上电极，动力下电极，加热板，冷却板，等离子体室盖和夹环。加热板和冷却板都设置在上电极的上方，而加热板构造成加热上电极，同时冷却板构造为冷却上电极。夹紧环被构造成将上部电极固定到等离子体室盖并且提供从上部电极到等离子体室盖的电流路径。可以在夹紧环和上部电极之间形成一个口袋，以至少保持加热板，其中该口袋构造成允许加热器板的热膨胀的重复热循环的纵向和横向公差。

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