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1. 发明授权

US10763091B2 Physical vapor deposition chamber particle reduction apparatus and methods 有权
公开(公告)号：US10763091B2
公开(公告)日：2020-09-01
申请号：US15681022
申请日：2017-08-18
申请人： Applied Materials, Inc.
发明人： Vibhu Jindal , Sanjay Bhat , Majeed A. Foad
IPC分类号： C23C14/34 , H01J37/34 , C23C14/35 , G03F1/22 , C23C14/56 , H01J37/32
摘要： Physical vapor deposition processing chambers and methods of processing a substrate such as an EUV mask blank in a physical vapor deposition chamber are disclosed. An electric field and a magnetic field are utilized to deflect particles from a substrate being processed in the chamber.

2. 发明申请

US20200058213A9 Extreme Ultraviolet Mask Blank Production System With Thin Absorber And Manufacturing System Therefor 审中-公开
公开(公告)号：US20200058213A9
公开(公告)日：2020-02-20
申请号：US16220351
申请日：2018-12-14
申请人： Applied Materials, Inc.
发明人： Vinayak Vishwanath Hassan , Majeed A. Foad , Cara Beasley , Ralf Hofmann
IPC分类号： G08B25/00 , G06F17/15 , G08B13/196 , G06F16/44 , G06F16/435 , G06Q50/00 , G06F16/2457 , G06F16/25 , G08B31/00 , G06F16/248
摘要： An extreme ultraviolet (EUV) mask blank production system includes: a substrate handling vacuum chamber for creating a vacuum; a substrate handling platform, in the vacuum, for transporting an ultra-low expansion substrate loaded in the substrate handling vacuum chamber; and multiple sub-chambers, accessed by the substrate handling platform, for forming an EUV mask blank includes: a multi-layer stack, formed above the ultra-low expansion substrate, for reflecting an extreme ultraviolet (EUV) light, and an absorber layer, formed above the multi-layer stack, for absorbing the EUV light at a wavelength of 13.5 nm includes the absorber layer has a thickness of less than 80 nm and less than 2% reflectivity.

3. 发明授权

US10551732B2 Extreme ultraviolet mask blank production system with thin absorber and manufacturing system therefor 有权
公开(公告)号：US10551732B2
公开(公告)日：2020-02-04
申请号：US16220351
申请日：2018-12-14
申请人： Applied Materials, Inc.
发明人： Vinayak Vishwanath Hassan , Majeed A. Foad , Cara Beasley , Ralf Hofmann
IPC分类号： G03F1/54 , G03F1/22 , G03F1/24
摘要： An extreme ultraviolet (EUV) mask blank production system includes: a substrate handling vacuum chamber for creating a vacuum; a substrate handling platform, in the vacuum, for transporting an ultra-low expansion substrate loaded in the substrate handling vacuum chamber; and multiple sub-chambers, accessed by the substrate handling platform, for forming an EUV mask blank includes: a multi-layer stack, formed above the ultra-low expansion substrate, for reflecting an extreme ultraviolet (EUV) light, and an absorber layer, formed above the multi-layer stack, for absorbing the EUV light at a wavelength of 13.5 nm includes the absorber layer has a thickness of less than 80 nm and less than 2% reflectivity.

4. 发明授权

US09905418B2 Growing graphene on substrates 有权
公开(公告)号：US09905418B2
公开(公告)日：2018-02-27
申请号：US15427367
申请日：2017-02-08
申请人： Applied Materials, Inc.
发明人： Cara Beasley , Ralf Hofmann , Majeed A. Foad
IPC分类号： B05D5/12 , H01L21/02 , H01L21/288 , C01B31/04
CPC分类号： H01L21/02376 , B05D3/061 , B05D3/065 , B05D3/141 , B05D5/12 , C01B32/182 , C01B32/184 , C01B32/186 , C01B32/20 , H01L21/02318 , H01L21/0234 , H01L21/02345 , H01L21/0237 , H01L21/02527 , H01L21/02628 , H01L21/02664 , H01L21/288
摘要： Embodiments described herein provide methods and apparatus for forming graphitic carbon such as graphene on a substrate. The method includes providing a precursor comprising a linear conjugated hydrocarbon, depositing a hydrocarbon layer from the precursor on the substrate, and forming graphene from the hydrocarbon layer by applying energy to the substrate. The precursor may include template molecules such as polynuclear aromatics, and may be deposited on the substrate by spinning on, by spraying, by flowing, by dipping, or by condensing. The energy may be applied as radiant energy, thermal energy, or plasma energy.

5. 发明授权

US09739913B2 Extreme ultraviolet capping layer and method of manufacturing and lithography thereof 有权
公开(公告)号：US09739913B2
公开(公告)日：2017-08-22
申请号：US14696322
申请日：2015-04-24
申请人： Applied Materials, Inc.
发明人： Cara Beasley , Ralf Hofmann , Majeed A. Foad , Rudy Beckstrom, III
IPC分类号： G02B5/08 , G02B1/14 , G03F7/20
CPC分类号： G02B5/0891 , C23C14/083 , C23C14/14 , C23C14/568 , C23C14/5853 , C23C14/5873 , C23C28/32 , C23C28/3455 , G02B1/14 , G02B5/0816 , G02B5/085 , G03F1/24 , G03F1/48 , G03F7/20 , G03F7/70316 , G03F7/70916 , G03F7/70958 , G21K1/062
摘要： A method of manufacture of an extreme ultraviolet reflective element includes: providing a substrate; forming a multilayer stack on the substrate, the multilayer stack includes a plurality of reflective layer pairs having a first reflective layer and a second reflective layer for forming a Bragg reflector; and forming a capping layer on and over the multilayer stack, the capping layer formed from titanium oxide, ruthenium oxide, niobium oxide, ruthenium tungsten, ruthenium molybdenum, or ruthenium niobium, and the capping layer for protecting the multilayer stack by reducing oxidation and mechanical erosion.

6. 发明授权

US09343347B2 Portable electrostatic chuck carrier for thin substrates 有权
标题翻译：用于薄基板的便携式静电卡盘托架
公开(公告)号：US09343347B2
公开(公告)日：2016-05-17
申请号：US14018959
申请日：2013-09-05
申请人： APPLIED MATERIALS, INC.
发明人： Dieter Haas , Majeed A. Foad , Ralf Hofmann
IPC分类号： H01L21/683
CPC分类号： H01L21/6833 , H01L21/6831
摘要： Embodiments of a portable electrostatic chuck for use in a substrate process chamber to support an ultra-thin substrate when disposed thereon are provided herein. In some embodiments, a portable electrostatic chuck may include a carrier comprising a dielectric material; an electrically conductive layer disposed on a top surface of the carrier; a dielectric layer disposed over the electrically conductive layer, such that the electrically conductive layer is disposed between the carrier and the dielectric layer; and at least one conductor coupled to the electrically conductive layer, wherein the portable electrostatic chuck is configured to electrostatically retain the ultra-thin substrate to the portable electrostatic chuck, wherein the portable electrostatic chuck is further configured to be handled and moved by substrate processing equipment outside of the substrate process chamber, and wherein the portable electrostatic chuck is sized to support large ultra-thin substrates.
摘要翻译：本文提供了一种用于基板处理室中用于支撑超薄基板的便携式静电卡盘的实施例。在一些实施例中，便携式静电卡盘可以包括包括电介质材料的载体; 设置在所述载体的顶表面上的导电层; 设置在所述导电层上的电介质层，使得所述导电层设置在所述载体和所述电介质层之间; 以及耦合到所述导电层的至少一个导体，其中所述便携式静电卡盘被配置为将所述超薄基板静电保持到所述便携式静电卡盘，其中所述便携式静电卡盘进一步构造成由基板处理设备在基板处理室外部，并且其中便携式静电卡盘的尺寸被设计成支撑大的超薄基板。

7. 发明申请

US20160011344A1 EXTREME ULTRAVIOLET CAPPING LAYER AND METHOD OF MANUFACTURING AND LITHOGRAPHY THEREOF 有权
标题翻译：极端超紫外线吸收层及其制造方法及其研究方法
公开(公告)号：US20160011344A1
公开(公告)日：2016-01-14
申请号：US14696322
申请日：2015-04-24
申请人： Applied Materials, Inc.
发明人： Cara Beasley , Ralf Hofmann , Majeed A. Foad , Rudy Beckstrom, III
IPC分类号： G02B5/08 , G02B1/14
CPC分类号： G02B5/0891 , C23C14/083 , C23C14/14 , C23C14/568 , C23C14/5853 , C23C14/5873 , C23C28/32 , C23C28/3455 , G02B1/14 , G02B5/0816 , G02B5/085 , G03F1/24 , G03F1/48 , G03F7/20 , G03F7/70316 , G03F7/70916 , G03F7/70958 , G21K1/062
摘要： A method of manufacture of an extreme ultraviolet reflective element includes: providing a substrate; forming a multilayer stack on the substrate, the multilayer stack includes a plurality of reflective layer pairs having a first reflective layer and a second reflective layer for forming a Bragg reflector; and forming a capping layer on and over the multilayer stack, the capping layer formed from titanium oxide, ruthenium oxide, niobium oxide, ruthenium tungsten, ruthenium molybdenum, or ruthenium niobium, and the capping layer for protecting the multilayer stack by reducing oxidation and mechanical erosion.
摘要翻译：一种制造极紫外反射元件的方法包括：提供基底; 在所述衬底上形成多层叠层，所述多层叠层包括多个具有第一反射层和用于形成布拉格反射器的第二反射层的反射层对; 在多层堆叠上形成覆盖层，由氧化钛，氧化钌，氧化铌，钌钨，钌钼或钌铌形成的覆盖层，以及通过还原氧化和机械保护多层叠层的覆盖层侵蚀。

8. 发明授权

US09915621B2 Extreme ultraviolet (EUV) substrate inspection system with simplified optics and method of manufacturing thereof 有权
公开(公告)号：US09915621B2
公开(公告)日：2018-03-13
申请号：US15031690
申请日：2014-12-18
申请人： Applied Materials, Inc.
发明人： Majeed A. Foad , Christopher Dennis Bencher , Christopher G. Talbot , John Christopher Moran
IPC分类号： G01N21/95 , G01N21/956
CPC分类号： G01N21/95 , G01N21/956 , G01N2021/95676 , G01N2201/061
摘要： An extreme ultraviolet (EUV) substrate inspection system and method of manufacturing thereof, includes: an EUV source directing EUV illumination through an aperture; a light detector detecting mask illumination with reduced off axis rays reflected off from a substrate; and a computing device processing image data detected by the light detector.

9. 发明授权

US09595436B2 Growing graphene on substrates 有权
标题翻译：在基底上生长石墨烯
公开(公告)号：US09595436B2
公开(公告)日：2017-03-14
申请号：US14425578
申请日：2013-10-24
申请人： Applied Materials, Inc.
发明人： Cara Beasley , Ralf Hofmann , Majeed A. Foad
IPC分类号： B05D5/12 , H01L21/02 , B05D3/06 , B05D3/14
CPC分类号： H01L21/02376 , B05D3/061 , B05D3/065 , B05D3/141 , B05D5/12 , C01B32/182 , C01B32/184 , C01B32/186 , C01B32/20 , H01L21/02318 , H01L21/0234 , H01L21/02345 , H01L21/0237 , H01L21/02527 , H01L21/02628 , H01L21/02664 , H01L21/288
摘要： Embodiments described herein provide methods and apparatus for forming graphitic carbon such as graphene on a substrate. The method includes providing a precursor comprising a linear conjugated hydrocarbon, depositing a hydrocarbon layer from the precursor on the substrate, and forming graphene from the hydrocarbon layer by applying energy to the substrate. The precursor may include template molecules such as polynuclear aromatics, and may be deposited on the substrate by spinning on, by spraying, by flowing, by dipping, or by condensing. The energy may be applied as radiant energy, thermal energy, or plasma energy.
摘要翻译：本文所述的实施方案提供了在基底上形成石墨碳如石墨烯的方法和装置。该方法包括提供包含线性共轭烃的前体，在基底上沉积来自前体的烃层，以及通过向基底施加能量从烃层形成石墨烯。前体可以包括模板分子，例如多核芳族化合物，并且可以通过旋转，喷雾，通过浸渍，或通过冷凝沉积在基材上。能量可以作为辐射能，热能或等离子体能量施加。

10. 发明申请

US20160181134A1 MONITORING SYSTEM FOR DEPOSITION AND METHOD OF OPERATION THEREOF 有权
标题翻译：沉积监测系统及其操作方法
公开(公告)号：US20160181134A1
公开(公告)日：2016-06-23
申请号：US14839656
申请日：2015-08-28
申请人： Applied Materials, Inc.
发明人： Edward W. Budiarto , Majeed A. Foad , Ralf Hofmann , Thomas Nowak , Todd Egan , Mehdi Vaez-Iravani
IPC分类号： H01L21/67 , H01L21/02 , H01L21/285 , H01L21/66 , H01L21/033
CPC分类号： H01L21/67253 , G03F1/22 , G03F1/24 , H01L21/02631 , H01L21/0332 , H01L21/0337 , H01L21/2855 , H01L22/12 , H01L22/26
摘要： A monitoring and deposition control system and method of operation thereof including: a deposition chamber for depositing a material layer on a substrate; a sensor array for monitoring deposition of the material layer for changes in a layer thickness of the material layer during deposition; and a processing unit for adjusting deposition parameters based on the changes in the layer thickness during deposition.
摘要翻译：一种监测和沉积控制系统及其操作方法，包括：沉积室，用于在基板上沉积材料层; 传感器阵列，用于监测材料层的沉积，用于在沉积期间材料层的层厚度的变化; 以及用于基于沉积期间的层厚度的变化来调整沉积参数的处理单元。

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