专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20090223812A1 PROCESSES AND DEVICE FOR THE DEPOSITION OF FILMS ON SUBSTRATES 有权
标题翻译：用于沉积衬底上膜的方法和装置
公开(公告)号：US20090223812A1
公开(公告)日：2009-09-10
申请号：US12399887
申请日：2009-03-06
申请人： Andrey E. YAKSHIN , Wolfgang Fukarek
发明人： Andrey E. YAKSHIN , Wolfgang Fukarek
IPC分类号： C23C14/34 , C23C14/35 , C23C14/58
CPC分类号： C23C14/024 , C23C14/0635 , C23C14/14 , C23C14/30 , C23C14/351 , C23C14/568 , C23C14/5833
摘要： It is in the object of the present invention to improve current deposition processes and devices for the fabrication of multilayer systems to better control the energy contribution at different stages of the deposition. This is achieved by depositing films by sputtering in a scheme providing for thermalized particles. One can get thermalized particles by choosing the working gas pressure and the distance between target and substrate to result in a mean free path of particles smaller than the distance between target and substrate or to result in a product of pressure and distance being larger than 2.0 cmPa.
摘要翻译：本发明的目的是改进用于制造多层系统的电流沉积方法和装置，以更好地控制在沉积的不同阶段的能量贡献。这通过在提供热化颗粒的方案中通过溅射沉积膜来实现。可以通过选择工作气体压力和目标和基板之间的距离来获得热化颗粒，以产生小于目标和基板之间的距离的颗粒的平均自由程，或导致压力和距离的乘积大于2.0cmPa 。

2. 发明授权

US08025777B2 Processes and device for the deposition of films on substrates 有权
标题翻译：用于在基材上沉积膜的方法和装置
公开(公告)号：US08025777B2
公开(公告)日：2011-09-27
申请号：US12399887
申请日：2009-03-06
申请人： Andrey E. Yakshin , Wolfgang Fukarek
发明人： Andrey E. Yakshin , Wolfgang Fukarek
IPC分类号： C23C14/34
CPC分类号： C23C14/024 , C23C14/0635 , C23C14/14 , C23C14/30 , C23C14/351 , C23C14/568 , C23C14/5833
摘要： It is in the object of the present invention to improve current deposition processes and devices for the fabrication of multilayer systems to better control the energy contribution at different stages of the deposition. This is achieved by depositing films by sputtering in a scheme providing for thermalized particles. One can get thermalized particles by choosing the working gas pressure and the distance between target and substrate to result in a mean free path of particles smaller than the distance between target and substrate or to result in a product of pressure and distance being larger than 2.0 cmPa.
摘要翻译：本发明的目的是改进用于制造多层系统的电流沉积方法和装置，以更好地控制在沉积的不同阶段的能量贡献。这通过在提供热化颗粒的方案中通过溅射沉积膜来实现。可以通过选择工作气体压力和目标和基板之间的距离来获得热化颗粒，以产生小于目标和基板之间的距离的颗粒的平均自由程，或导致压力和距离的乘积大于2.0cmPa 。

3. 发明授权

US08475635B2 Processes and device for the deposition of films on substrates 有权
标题翻译：用于在基材上沉积膜的方法和装置
公开(公告)号：US08475635B2
公开(公告)日：2013-07-02
申请号：US13216979
申请日：2011-08-24
申请人： Andrey E. Yakshin , Wolfgang Fukarek
发明人： Andrey E. Yakshin , Wolfgang Fukarek
IPC分类号： C23C14/34
CPC分类号： C23C14/024 , C23C14/0635 , C23C14/14 , C23C14/30 , C23C14/351 , C23C14/568 , C23C14/5833
摘要： Deposition processes and devices for the fabrication of multilayer systems to better control the energy contribution at different stages of the deposition. This is achieved by depositing films by sputtering in a scheme providing for thermalized particles. Thermalized particles are obtained by choosing the working gas pressure and the distance between target and substrate to result in a mean free path of particles smaller than the distance between target and substrate or to result in a product of pressure and distance being larger than 2.0 cmPa.
摘要翻译：用于制造多层系统的沉积工艺和装置，以更好地控制沉积不同阶段的能量贡献。这通过在提供热化颗粒的方案中通过溅射沉积膜来实现。通过选择工作气体压力和目标和基板之间的距离来获得热化颗粒，以产生小于目标和基材之间的距离的颗粒的平均自由程度或导致压力和距离的乘积大于2.0cmPa。

4. 发明申请

US20100215848A1 VACUUM TREATMENT OF STRIP-SHAPED SUBSTRATES 有权
标题翻译：条形衬底的真空处理
公开(公告)号：US20100215848A1
公开(公告)日：2010-08-26
申请号：US12528558
申请日：2008-02-26
申请人： Wolfgang Fukarek , Bontscho Bontschew
发明人： Wolfgang Fukarek , Bontscho Bontschew
IPC分类号： C23C16/44 , C23C16/00 , C23C14/34 , C23C14/35
CPC分类号： C23C14/562
摘要： In the case of the treatment installation for the vacuum treatment, in particular vacuum coating, of a front side of substrates in strip form in a first process chamber with a first process roller and at least one process source and a second process chamber with a second process roller and at least one process source, it is provided that there is a transfer chamber which is arranged between the first and second process chambers, is coupled with both process chambers and can be separated in terms of pressure from at least one of the process chambers and an unwinding device with a removable unwinding reel and a winding-up device with a removable winding-up reel for the substrate to be treated as well as an outside air lock for loading and unloading the unwinding reel and/or winding-up reel. During this, the substrate to be treated is facing with its rear side toward the first and second process rollers and can be guided through the transfer chamber from the unwinding device to the first process roller, from the first process roller to the second process roller and from the second process roller to the winding-up device. The invention also relates to a method for operating the treatment installation.
摘要翻译：在具有第一处理辊和至少一个处理源的第一处理室中的用于真空处理，特别是真空涂覆处理装置的处理设备的情况下，处理辊和至少一个工艺源，设置有设置在第一和第二处理室之间的传送室，与两个处理室耦合，并且可以在压力方面与过程中的至少一个分离腔室和具有可移除的放卷卷轴的放卷装置和具有用于待处理衬底的可移除卷绕卷轴的卷绕装置以及用于装载和卸载展开卷轴和/或卷绕卷轴的外部空气锁。在此期间，要处理的基板面向其后侧朝向第一和第二处理辊，并且可以从开卷装置引导到第一处理辊，从第一处理辊到第二处理辊，从第二处理辊到卷绕装置。本发明还涉及一种用于操作处理装置的方法。

5. 发明授权

US09297065B2 Vacuum treatment of strip-shaped substrates 有权
标题翻译：带状基材的真空处理
公开(公告)号：US09297065B2
公开(公告)日：2016-03-29
申请号：US12528558
申请日：2008-02-26
申请人： Wolfgang Fukarek , Bontscho Bontschew
发明人： Wolfgang Fukarek , Bontscho Bontschew
IPC分类号： C23C14/56 , C23C16/54
CPC分类号： C23C14/562
摘要： A treatment installation for vacuum treatment of a front side of strip substrates includes first and second process chambers, each process chamber including a process roller and at least one process source. A transfer chamber arranged between the process chambers is coupled with both process chambers and can be separated in terms of pressure from at least one of the process chambers. The transfer chamber further includes an unwinding device with a removable unwinding reel and a winding-up device with a removable winding-up reel for the substrate and an outside air lock for loading and unloading the unwinding reel and/or winding-up reel. The rear side of the substrate faces the two process rollers and can be guided through the transfer chamber from the unwinding device to the first process roller, from the first process roller to the second process roller and from the second process roller to the winding-up device.
摘要翻译：用于真空处理带状基材的前侧的处理装置包括第一和第二处理室，每个处理室包括处理辊和至少一个处理源。布置在处理室之间的传送室与两个处理室联接，并且可以在压力下与至少一个处理室分离。传送室还包括具有可移除的放卷卷轴的开卷装置和具有用于基板的可移除卷绕卷轴的卷绕装置和用于装载和卸载展开卷轴和/或卷绕卷轴的外部空气锁。基板的后侧面向两个处理辊，并且可以从开卷装置引导到传送室到第一处理辊，从第一处理辊到第二处理辊以及从第二处理辊到卷绕设备。

6. 发明申请

US20080247046A1 Glare free mirror pane as well as a rear view mirror with such a mirror pane 审中-公开
标题翻译：无眩光的镜面窗格以及带有这种镜面板的后视镜
公开(公告)号：US20080247046A1
公开(公告)日：2008-10-09
申请号：US11974984
申请日：2007-10-17
申请人： Jurgen Singer , Werner Lang , Wolfgang Fukarek
发明人： Jurgen Singer , Werner Lang , Wolfgang Fukarek
IPC分类号： B60R1/08 , G02B1/10 , C23C14/08 , C23C14/14
CPC分类号： B60R1/08 , C03C17/36 , C03C17/3618 , C03C17/3626 , C03C17/3649 , C03C17/3663 , C03C17/42 , C03C2217/73 , C03C2218/36 , C23C14/0652 , C23C14/083 , C23C14/185 , C23C14/568 , C23C14/584
摘要： Proposed is a glare free pan for a rear view service in motor vehicles, possessing a curved transparent substrate, the front surface of which forms the exposed surface of the said mirror. Upon the rear surface of said substrate is applied, in appropriate thicknesses, by sputtering at least four successive and contiguous layers of respectively niobium pentoxide, silicon dioxide, chromium and a protect covering of lacquer. The chromium layer provides the effective reflecting quality of the said mirror. The composition and thicknesses of the layers allows the mirror to reflectively function in visible light wavelengths suitable for both night and day service. Proposed also is a method for the manufacture of the above as well as its assembly into a rear view mirror ready for vehicle installation.
摘要翻译：提出了一种用于机动车辆后视服务的无眩光盘，具有弯曲的透明基板，其前表面形成所述镜子的暴露表面。通过溅射分别为五氧化二铌，二氧化硅，铬和防护漆的至少四个连续和连续的层，在适当的厚度施加所述基板的后表面。铬层提供所述反射镜的有效反射质量。层的组成和厚度允许反射镜在适用于夜间和日间服务的可见光波长中反射地起作用。还提出了制造上述方法以及将其组装成准备用于车辆安装的后视镜的方法。

7. 发明申请

US20050150758A1 Processes and device for the deposition of films on substrates 审中-公开
标题翻译：用于在基材上沉积膜的方法和装置
公开(公告)号：US20050150758A1
公开(公告)日：2005-07-14
申请号：US10754151
申请日：2004-01-09
申请人： Andrey Yakshin , Wolfgang Fukarek
发明人： Andrey Yakshin , Wolfgang Fukarek
IPC分类号： C23C14/02 , C23C14/06 , C23C14/14 , C23C14/30 , C23C14/32 , C23C14/35 , C23C14/56 , C23C14/58
CPC分类号： C23C14/024 , C23C14/0635 , C23C14/14 , C23C14/30 , C23C14/351 , C23C14/568 , C23C14/5833
摘要： It is in the object of the present invention to improve current deposition processes and devices for the fabrication of multilayer systems to better control the energy contribution at different stages of the deposition. This is achieved by depositing films by sputtering in a scheme providing for thermalized particles. One can get thermalized particles by choosing the working gas pressure and the distance between target and substrate to result in a mean free path of particles smaller than the distance between target and substrate or to result in a product of pressure and distance being larger than 2.0 cmPa.
摘要翻译：本发明的目的是改进用于制造多层系统的电流沉积方法和装置，以更好地控制在沉积的不同阶段的能量贡献。这通过在提供热化颗粒的方案中通过溅射沉积膜来实现。可以通过选择工作气体压力和目标和基板之间的距离来获得热化颗粒，以产生小于目标和基板之间的距离的颗粒的平均自由程，或导致压力和距离的乘积大于2.0cmPa 。

8. 发明申请

US20080053373A1 Coating Installation Suitable For Clean Room Conditions 审中-公开
标题翻译：涂层安装适用于洁净室条件
公开(公告)号：US20080053373A1
公开(公告)日：2008-03-06
申请号：US11572252
申请日：2005-07-14
申请人： Dietrich Mund , Wolfgang Fukarek , Jurgen Leib
发明人： Dietrich Mund , Wolfgang Fukarek , Jurgen Leib
IPC分类号： B05C11/00
CPC分类号： H01J37/32477 , C23C14/564
摘要： At least one shielding device, which protects the vacuum chamber walls and/or the components arranged in the chamber from undesired deposits of the layer starting material is arranged in the vacuum chamber of a coating installation according to the invention in which vitreous, glass-ceramic and/or ceramic layers are applied to substrates by deposition from the gas phase. It is important that in the event of temperature changes in the vacuum chamber, the expansion or contraction of the shielding device corresponds to the expansion or contraction of the vitreous, glass-ceramic or ceramic layer or deposits.
摘要翻译：至少一个屏蔽装置，其保护真空室壁和/或布置在室中的部件不受层起始材料的不期望的沉积物的影响，布置在根据本发明的涂层装置的真空室中，其中玻璃质玻璃陶瓷和/或陶瓷层通过气相沉积施加到基板上。重要的是，在真空室中发生温度变化的情况下，屏蔽装置的膨胀或收缩对应于玻璃，玻璃陶瓷或陶瓷层或沉积物的膨胀或收缩。

9. 发明申请

US20070251458A1 Cleanroom-Capable Coating System 审中-公开
标题翻译：无尘室涂层系统
公开(公告)号：US20070251458A1
公开(公告)日：2007-11-01
申请号：US11572254
申请日：2005-07-14
申请人： Dietrich Mund , Wolfgang Fukarek , Jurgen Leib
发明人： Dietrich Mund , Wolfgang Fukarek , Jurgen Leib
IPC分类号： C23C14/56
CPC分类号： C23C14/566 , C23C16/4404
摘要： The invention relates to a cleanroom-capable coating system for PVD or CVD processes having at least one vacuum coating chamber, in which vitreous, glass-ceramic and/or ceramic layers deposited. A first opening of the vacuum coating chamber is connected via a separately evacuable vacuum airlock chamber (load lock) to a cleanroom, the vacuum airlock chamber comprising transport means for delivering substrates into the vacuum coating chamber and for taking substrates out of the vacuum coating chamber, and a second opening of the vacuum coating chamber connects the vacuum coating chamber to a grayroom area separated from the cleanroom.
摘要翻译：本发明涉及一种用于PVD或CVD工艺的洁净室涂层系统，该系统具有至少一个真空涂覆室，其中沉积玻璃，玻璃 - 陶瓷和/或陶瓷层。真空涂层室的第一开口通过单独抽空的真空气闸室（负载锁定）连接到洁净室，真空气闸室包括用于将衬底输送到真空涂覆室中并用于将衬底从真空涂布室中取出的输送装置并且真空涂覆室的第二开口将真空涂覆室连接到与洁净室分离的灰色区域。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式