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    • 6. 发明申请
    • MEMS Switching Array Having a Substrate Arranged to Conduct Switching Current
    • 具有布置以导通开关电流的基板的MEMS开关阵列
    • US20110308924A1
    • 2011-12-22
    • US12817578
    • 2010-06-17
    • Kuna Venkat Satya Rama KishoreMarco Aimi
    • Kuna Venkat Satya Rama KishoreMarco Aimi
    • H01H57/00
    • H01H1/0036H01H59/0009H01H2001/0063H01H2001/0084
    • A micro-electromechanical systems (MEMS) switch or array is provided. A first substrate (e.g., carrier substrate) includes an electrically conductive substrate region. An electrical isolation layer may be disposed over a first surface of the carrier substrate. Movable actuators may be provided. At least one substrate contact is electrically coupled to at least one of the plurality of movable actuators so that a flow of electrical current is established during an electrically-closed condition of the MEMS switch array. A cover substrate may also be provided and includes an electrically conductive substrate region. The electrically conductive region of the carrier substrate is electrically coupled to the electrically conductive region of the cover substrate to define an electrically conductive path for the flow of electrical current during the electrically-closed condition of the switching array.
    • 提供微机电系统(MEMS)开关或阵列。 第一衬底(例如,载体衬底)包括导电衬底区域。 电隔离层可以设置在载体衬底的第一表面上。 可以提供可移动致动器。 至少一个衬底接触件电耦合到多个可移动致动器中的至少一个,使得在MEMS开关阵列的电闭合状态期间建立电流流动。 还可以提供覆盖基板,并且包括导电基板区域。 载体衬底的导电区域电耦合到覆盖衬底的导电区域,以在开关阵列的电闭合状态期间限定用于电流流动的导电路径。
    • 9. 发明申请
    • Three-dimensional metal microfabrication process and devices produced thereby
    • 三维金属微细加工工艺及其制造的装置
    • US20070039170A1
    • 2007-02-22
    • US11445067
    • 2006-06-01
    • Masaru RaoMarco AimiNoel MacDonald
    • Masaru RaoMarco AimiNoel MacDonald
    • B44C1/22H01B13/00C23F1/00H01R43/00
    • C23F4/00B81B2201/042B81B2203/033B81C1/00126B81C2201/0132Y10T29/49117
    • The present invention relates, in general, to a method for three-dimensional (3D) microfabrication of complex, high aspect ratio structures with arbitrary surface height profiles in metallic materials, and to devices fabricated in accordance with this process. The method builds upon anisotropic deep etching methods for metallic materials previously developed by the inventors by enabling simplified realization of complex, non-prismatic structural geometries composed of multiple height levels and sloping and/or non-planar surface profiles. The utility of this approach is demonstrated in the fabrication of a sloping electrode structure intended for application in bulk micromachined titanium micromirror devices, however such a method could find use in the fabrication of any number of other microactuator, microsensor, microtransducer, or microstructure devices as well.
    • 本发明一般涉及用于金属材料中具有任意表面高度分布的复合高纵横比结构的三维(3D)微细加工方法,以及根据该方法制造的器件。 该方法基于由本发明人先前开发的金属材料的各向异性深蚀刻方法,其通过使得能够简化实现由多个高度级别和倾斜和/或非平面表面轮廓组成的复杂的非棱柱结构几何形状。 在制造用于体积微加工的钛微镜器件中的倾斜电极结构的过程中证明了这种方法的实用性,然而这种方法可用于制造任何数量的其它微型致动器,微传感器,微传感器或微结构器件,如 好。
    • 10. 发明授权
    • MEMS switching array having a substrate arranged to conduct switching current
    • MEMS开关阵列具有布置成传导开关电流的基板
    • US08576029B2
    • 2013-11-05
    • US12817578
    • 2010-06-17
    • Kuna Venkat Satya Rama KishoreMarco Aimi
    • Kuna Venkat Satya Rama KishoreMarco Aimi
    • H01H51/22H01H57/00
    • H01H1/0036H01H59/0009H01H2001/0063H01H2001/0084
    • A micro-electromechanical systems (MEMS) switch or array is provided. A first substrate (e.g., carrier substrate) includes an electrically conductive substrate region. An electrical isolation layer may be disposed over a first surface of the carrier substrate. Movable actuators may be provided. At least one substrate contact is electrically coupled to at least one of the plurality of movable actuators so that a flow of electrical current is established during an electrically-closed condition of the MEMS switch array. A cover substrate may also be provided and includes an electrically conductive substrate region. The electrically conductive region of the carrier substrate is electrically coupled to the electrically conductive region of the cover substrate to define an electrically conductive path for the flow of electrical current during the electrically-closed condition of the switching array.
    • 提供微机电系统(MEMS)开关或阵列。 第一衬底(例如,载体衬底)包括导电衬底区域。 电隔离层可以设置在载体衬底的第一表面上。 可以提供可移动致动器。 至少一个衬底接触件电耦合到多个可移动致动器中的至少一个,使得在MEMS开关阵列的电闭合状态期间建立电流流动。 还可以提供覆盖基板,并且包括导电基板区域。 载体衬底的导电区域电耦合到覆盖衬底的导电区域,以在开关阵列的电闭合状态期间限定用于电流流动的导电路径。