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1. 发明授权

US4363536A Instrument base for optical devices 失效
标题翻译：光学仪器基座
公开(公告)号：US4363536A
公开(公告)日：1982-12-14
申请号：US172229
申请日：1980-07-25
申请人： Andreas Thaer , Willi Hagner , Horst Frimmel , Horst Riegel
发明人： Andreas Thaer , Willi Hagner , Horst Frimmel , Horst Riegel
IPC分类号： A61B3/00 , A61B3/10 , A61B3/12 , G02B7/00 , G12B5/00 , G12B9/08
CPC分类号： G12B5/00 , A61B3/0075 , A61B3/10 , G02B7/004 , G12B9/08
摘要： Disclosed is an adjustable instrument base suitable for holding optical instruments, comprising a base plate movable along first and second horizontal coordinate directions; a housing member surrounding the base plate and being movable with respect to the base plate in the first coordinate direction; first and second mechanisms mounted on the housing member for effecting displacement of the base plate in the first and second coordinate directions, respectively; a generally U-shaped stirrup member mounted on the base plate for rotation; a support plate mounted on the stirrup member for rotation about a horizontal axis; a first and preferably second instrument carriers displaceably mounted on the support plate; and a mechanism mounted on said base plate for effecting vertical displacement of the first instrument carrier.
摘要翻译：公开了一种适用于保持光学仪器的可调节仪器基座，包括可沿着第一和第二水平坐标方向移动的基板; 壳体构件，围绕所述基板并且能够沿所述第一坐标方向相对于所述基板移动; 安装在壳体构件上的第一和第二机构分别用于实现基板在第一和第二坐标方向上的位移; 安装在基板上以旋转的大致U形的箍筋构件; 安装在所述马镫构件上用于围绕水平轴线旋转的支撑板; 可移动地安装在支撑板上的第一和优选的第二仪器架; 以及安装在所述基板上用于实现第一仪器载体的垂直位移的机构。

2. 发明授权

US4353618A Optical arrangement for the reflecting microscopic examination of an object 失效
标题翻译：用于物体的反射显微镜检查的光学布置
公开(公告)号：US4353618A
公开(公告)日：1982-10-12
申请号：US91819
申请日：1979-11-06
申请人： Willi Hagner , Andreas Thaer , Francis Bigar
发明人： Willi Hagner , Andreas Thaer , Francis Bigar
IPC分类号： A61B3/12 , A61B3/117 , A61B3/15 , G02B21/12
CPC分类号： A61B3/13
摘要： An optical system for the reflecting microscopic examination of objects. An illuminating beam path and an observation beam path are provided along with an optical lens such that the beam paths pass through the optical lens and make an angle with each other. The lens is made up of two portions interfacing in a plane which bisects the angle of the beam paths and is perpendicular to a plane containing the beam paths. The interface between the lens portions is at least partially opaque and serves to absorb or reflect light reflected from the lens/object interface and thereby prevents such light from obscuring light reflected from surfaces interior to the object. The optical system is particularly advantageous for the examination of biological tissue such as the endothelium layer of the cornea of the eye.
摘要翻译：一种用于物体反射显微镜检查的光学系统。与光学透镜一起设置照明光束路径和观察光束路径，使得光束路径通过光学透镜并且彼此成一角度。透镜由两部分组成，该部分在平面上平衡光束路径的角度并垂直于包含光束路径的平面的平面。透镜部分之间的界面至少部分不透明，并且用于吸收或反射从透镜/物体界面反射的光，从而防止这种光遮蔽从物体内部的表面反射的光。光学系统特别有利于检查生物组织，例如眼睛角膜的内皮层。

3. 发明授权

US4672012A Process for modifying structural profiles in resist layers 失效
标题翻译：改进抗蚀剂层结构轮廓的方法
公开(公告)号：US4672012A
公开(公告)日：1987-06-09
申请号：US733306
申请日：1985-05-13
申请人： Knut Heitmann , Martin Hoppe , Eckhard Schneider , Andreas Thaer
发明人： Knut Heitmann , Martin Hoppe , Eckhard Schneider , Andreas Thaer
IPC分类号： G03C7/00 , G02B5/18 , G03C5/00 , G03C5/08 , G03F7/11 , G03F7/20 , G03F7/26 , G03F7/30 , G03F7/36 , G03F7/38 , G03F7/00 , G03F7/02
CPC分类号： G03F7/36 , G03F7/11 , G03F7/20 , G03F7/38
摘要： A process for modifying structural profiles produced by polymerization or depolymerization in resist layers. As a function of the acoustic impedance of the substrate carrying the resist layer, the structures are irradiated with an ultrasonic beam. An ultrasonic beam for which the substrate represents a high impedance is used in order to enhance the contrast of the structures. An ultrasonic beam for which the substrate represents a low impedance is used to weaken the contrast. An acoustic microscope is especially suitable for carrying out the process.
摘要翻译：用于改变抗蚀剂层中聚合或解聚产生的结构分布的方法。作为承载抗蚀剂层的基板的声阻抗的函数，用超声波束照射结构。使用基板表示高阻抗的超声波束，以增强结构的对比度。使用基板代表低阻抗的超声波束来削弱对比度。声学显微镜特别适用于进行该过程。

4. 发明授权

US4612267A Process for producing structures in resist layers using ultrasonic irradiation 失效
标题翻译：使用超声波照射在抗蚀层中制造结构的方法
公开(公告)号：US4612267A
公开(公告)日：1986-09-16
申请号：US733188
申请日：1985-05-13
申请人： Knut Heitmann , Martin Hoppe , Eckhard Schneider , Andreas Thaer
发明人： Knut Heitmann , Martin Hoppe , Eckhard Schneider , Andreas Thaer
IPC分类号： G03C5/00 , G03C5/08 , G03F7/039 , G03F7/20 , G03F7/26 , G03F7/36 , G03F7/38 , G03F7/00 , G03F7/02
CPC分类号： G03F7/039 , G03F7/20 , G03F7/36 , G03F7/38
摘要： A process for the production of structures by the polymerization, or fragmentation of resist layers comprising the steps of effecting an incomplete exposure of the resist layer corresponding to the pattern of the structures, and of fully developing the structure in the resist layer by ultrasonic irradiation.An acoustic microscope is preferably used for the ultrasonic irradiation, whereby the formation of the structure in the resist layer may also be observed.
摘要翻译：通过抗蚀层的聚合或分裂生成结构的方法，包括以下步骤：对抗结构图案进行不完全曝光，并通过超声波照射完全显影抗蚀剂层中的结构。优选使用声学显微镜进行超声波照射，从而也可以观察抗蚀剂层中的结构的形成。

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