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1. 发明申请

US20190226090A1 NOZZLE FOR A DISTRIBUTION ASSEMBLY OF A MATERIAL DEPOSITION SOURCE ARRANGEMENT, MATERIAL DEPOSITION SOURCE ARRANGEMENT, VACUUM DEPOSITION SYSTEM AND METHOD FOR DEPOSITING MATERIAL 审中-公开
公开(公告)号：US20190226090A1
公开(公告)日：2019-07-25
申请号：US15552022
申请日：2016-09-22
申请人： Andreas LOPP , Dieter HAAS , Applied Materials, Inc.
发明人： Andreas LOPP , Dieter HAAS
IPC分类号： C23C16/455
摘要： A nozzle for being connected to a distribution assembly for guiding evaporated material from a material source into a vacuum chamber is described. The nozzle includes: a nozzle inlet for receiving the evaporated material; a nozzle outlet for releasing the evaporated material to the vacuum chamber; and a nozzle passage extending from the nozzle inlet the nozzle outlet in a flow direction, wherein the nozzle passage comprises an outlet section having an aperture angle which continuously increases in the flow direction. Further, a material deposition arrangement having such a nozzle, a vacuum deposition system with the material source arrangement, and a method for depositing evaporated material are provided.

2. 发明申请

US20170092899A1 EVAPORATION SOURCE FOR ORGANIC MATERIAL 审中-公开
公开(公告)号：US20170092899A1
公开(公告)日：2017-03-30
申请号：US15126565
申请日：2014-03-21
申请人： Stefan BANGERT , Jose Manuel DIEGUEZ-CAMPO , Uwe SCHÜSSLER , Andreas LOPP , Applied Materials, Inc.
发明人： Stefan BANGERT , Jose Manuel DIEGUEZ-CAMPO , Uwe SCHÜSSLER , Andreas LOPP
IPC分类号： H01L51/56 , C23C14/26 , H01L51/00 , C23C14/24
CPC分类号： H01L51/56 , C23C14/042 , C23C14/243 , C23C14/26 , H01L51/001 , H01L51/0011 , H01L51/0012
摘要： An evaporation source for organic material is described. The evaporation source includes an evaporation crucible, wherein the evaporation crucible is configured to evaporate the organic material, a distribution pipe with one or more outlets provided along the length of the distribution pipe, wherein the distribution pipe is in fluid communication with the evaporation crucible, and wherein the distribution pipe has a cross-section perpendicular to the length of the distribution pipe, which is non-circular, and which includes: an outlet side at which the one or more outlets are provided, wherein the width of the outlet side of the cross-section is 30% or less of the maximum dimension of the cross-section.

3. 发明申请

US20180187302A1 MEASUREMENT ASSEMBLY FOR MEASURING A DEPOSITION RATE AND METHOD THEREFORE 审中-公开
公开(公告)号：US20180187302A1
公开(公告)日：2018-07-05
申请号：US15572585
申请日：2015-09-21
申请人： Jose Manuel DIEGUEZ-CAMPO , Andreas LOPP , Uwe SCHÜSSLER , Stefan BANGERT , Applied Materials, Inc.
发明人： Jose Manuel DIEGUEZ-CAMPO , Andreas LOPP , Uwe SCHÜSSLER , Stefan BANGERT
IPC分类号： C23C14/54 , G01N29/24 , G01N29/02 , C23C14/24
CPC分类号： C23C14/546 , C23C14/24 , G01N29/022 , G01N29/2443 , G01N2291/0256
摘要： A measurement assembly for measuring a deposition rate of an evaporated material is described. The measurement assembly includes an oscillation crystal for measuring the deposition rate, a measurement outlet for providing evaporated material to the oscillation crystal, and a magnetic closing mechanism configured for opening and closing the measurement outlet by magnetic force.

4. 发明申请

US20170081755A1 EVAPORATION SOURCE FOR ORGANIC MATERIAL 审中-公开
公开(公告)号：US20170081755A1
公开(公告)日：2017-03-23
申请号：US15126568
申请日：2014-03-21
申请人： Jose Manuel DIEGUEZ-CAMPO , Stefan BANGERT , Andreas LOPP , Uwe SCHÜSSLER , Applied Materials, Inc.
发明人： Jose Manuel DIEGUEZ-CAMPO , Stefan BANGERT , Andreas LOPP , Uwe SCHÜSSLER
IPC分类号： C23C14/24 , H01L51/00 , H01L51/56 , C23C14/04 , C23C14/56
CPC分类号： C23C14/243 , C23C14/042 , C23C14/56 , H01L51/001 , H01L51/0011 , H01L51/56
摘要： An evaporation source array for depositing two or more organic materials on a substrate is described. The evaporation source array includes two or more evaporation crucibles, wherein the two or more evaporation crucibles are configured to evaporate the two or more organic materials, two or more distribution pipes with outlets provided along the length of the two or more distribution pipes, wherein a first distribution pipe of the two or more distribution pipes is in fluid communication with a first evaporation crucible of the two or more evaporation crucibles, two or more heat shields, which surround the first distribution pipe, a cooling shield arrangement provided at at least one side of the two or more distribution pipes, wherein the at least one side is the side at which the outlets are provided, and a cooling element provided at or in the cooling shield arrangement for active cooling of the cooling shield arrangement.

5. 发明申请

US20120012458A1 MAGNET ARRANGEMENT FOR A TARGET BACKING TUBE, TARGET BACKING TUBE INCLUDING THE SAME, CYLINDRICAL TARGET ASSEMBLY AND SPUTTERING SYSTEM 有权
标题翻译：用于目标支管的磁铁布置，包括其的目标支管，圆柱形目标组件和溅射系统
公开(公告)号：US20120012458A1
公开(公告)日：2012-01-19
申请号：US12840021
申请日：2010-07-20
申请人： Andreas LOPP , Juergen GRILLMAYER , Wolfgang KROCK
发明人： Andreas LOPP , Juergen GRILLMAYER , Wolfgang KROCK
IPC分类号： C23C14/35
CPC分类号： H01J37/3405 , H01J37/342 , H01J37/345 , H01J37/3452 , H01J37/3461
摘要： The disclosure relates to a magnet arrangement for a sputtering system, wherein the magnet arrangement is adapted for a rotatable target of a sputtering system and includes: a first magnet element extending along a first axis; a second magnet element being disposed around the first magnet element symmetrically to a first plane; wherein the second magnet element includes at least one magnet section intersecting the first plane; and wherein a magnetic axis of the at least one magnet section is inclined with respect to a second plane being orthogonal to the first axis. Further, the disclosure relates to a target backing tube for a rotatable target of a sputtering system, a cylindrical rotatable target for a sputtering system, and a sputtering
摘要翻译：本发明涉及一种用于溅射系统的磁体装置，其中磁体装置适用于溅射系统的可旋转靶，并且包括：沿着第一轴线延伸的第一磁体元件; 第二磁体元件围绕第一磁体元件对称地设置在第一平面上; 其中所述第二磁体元件包括与所述第一平面交叉的至少一个磁体部分; 并且其中所述至少一个磁体部分的磁轴相对于与所述第一轴正交的第二平面倾斜。此外，本公开涉及一种用于溅射系统的可旋转靶的目标衬管，用于溅射系统的圆柱形可旋转靶，以及溅射

6. 发明申请

US20130199891A1 DYNAMIC LOAD LOCK WITH CELLULAR STRUCTURE FOR DISCRETE SUBSTRATES 有权
标题翻译：动态负载锁定用于分离基板的细胞结构
公开(公告)号：US20130199891A1
公开(公告)日：2013-08-08
申请号：US13748271
申请日：2013-01-23
申请人： Wolfgang BUSCHBECK , Juergen HENRICH , Andreas LOPP , Susanne SCHLAEFER
发明人： Wolfgang BUSCHBECK , Juergen HENRICH , Andreas LOPP , Susanne SCHLAEFER
IPC分类号： H01L21/677
CPC分类号： H01L21/67739 , H01L21/67201
摘要： A dynamic load lock chamber that includes a plurality of actuators positioned along its length to achieve a desired pressure gradient from an atmospheric pressure side to a processing pressure side of the chamber is provided. The chamber includes a transport belt continuously running through the chamber to transport substrates from the atmospheric pressure side to the processing pressure side of the chamber, if situated on an inlet side of a production line, and from the processing pressure side to the atmospheric pressure side of the chamber, if positioned on an outlet side of the production line. Separation mechanisms may be attached to the belt to separate discrete regions within the chamber into a plurality of discrete volumes. Substrates may be disposed between the separation mechanisms, such that separation between adjacent pressure regions within the chamber is maintained as the substrates are transported through the chamber.
摘要翻译：提供一种动态负载锁定室，其包括沿其长度定位的多个致动器，以实现从室的大气压侧到处理压力侧的期望的压力梯度。所述腔室包括连续运行通过所述腔室的输送带，以将衬底从所述大气压侧输送到所述腔室的处理压力侧，如果位于生产线的入口侧，以及从处理压力侧到大气压侧如果位于生产线的出口侧。分离机构可以附接到带上以将腔室内的离散区域分离成多个离散体积。衬底可以设置在分离机构之间，使得当衬底被输送通过腔室时，保持室内的相邻压力区域之间的间隔。

7. 发明申请

US20120107504A1 EVAPORATION SYSTEM AND METHOD 审中-公开
标题翻译：蒸发系统和方法
公开(公告)号：US20120107504A1
公开(公告)日：2012-05-03
申请号：US12916011
申请日：2010-10-29
申请人： Philipp MAURER , Sven SCHRAMM , Andreas LOPP , Andreas KLÖPPEL
发明人： Philipp MAURER , Sven SCHRAMM , Andreas LOPP , Andreas KLÖPPEL
IPC分类号： C23C16/448 , C23C16/458
CPC分类号： C23C14/225 , C23C14/542 , C23C14/56
摘要： A deposition system is provided which is adapted for depositing a thin film onto a substrate. The deposition system includes a substrate carrier adapted for carrying the substrate and at least one tilted evaporator crucible. The at least one tilted evaporator crucible is adapted for directing evaporated deposition material towards the substrate in a main emission direction. The main direction emission of the tilted evaporator crucible is different from a direction normal to the substrate.
摘要翻译：提供了一种沉积系统，其适于将薄膜沉积到基底上。沉积系统包括适于承载基底和至少一个倾斜的蒸发器坩埚的基底载体。所述至少一个倾斜的蒸发器坩埚适于在主发射方向上将蒸发的沉积材料引向衬底。倾斜的蒸发器坩埚的主要方向发射与垂直于基板的方向不同。

8. 发明申请

US20160189939A1 MINI ROTATABLE SPUTTER DEVICES FOR SPUTTER DEPOSITION 审中-公开
标题翻译：用于喷射器沉积的微型可旋转溅射装置
公开(公告)号：US20160189939A1
公开(公告)日：2016-06-30
申请号：US14384287
申请日：2012-03-12
申请人： Thomas DEPPISCH , Frank SCHNAPPENBERGER , Andreas LOPP , Annemarie FLOCK , Götz GÖRISCH
发明人： Thomas DEPPISCH , Frank SCHNAPPENBERGER , Andreas LOPP , Annemarie FLOCK , Götz GÖRISCH
IPC分类号： H01J37/34 , C23C14/35
CPC分类号： H01J37/3414 , C23C14/35 , H01J37/3277 , H01J37/3405 , H01J37/3417 , H01J37/342
摘要： A deposition apparatus and a method for depositing deposition material on a web is described. The deposition apparatus includes a first sputter device support defining a first axis for a first rotatable sputter device, a second sputter device support defining a second axis for a second rotatable sputter device, and a coating window. The first sputter device support and the second sputter device support are adapted for supporting the first rotatable sputter device and the second rotatable sputter device to provide at least a component of the deposition material to be deposited on the web over a coating drum. Further, the distance between the first axis and the second axis is smaller than 200 mm.
摘要翻译：描述了沉积设备和在网上沉积沉积材料的方法。沉积设备包括限定用于第一可旋转溅射器件的第一轴线的第一溅射器件支撑件，限定用于第二可旋转溅射器件的第二轴线的第二溅射器件支撑件和涂覆窗口。第一溅射装置支撑件和第二溅射装置支撑件适于支撑第一可旋转溅射装置和第二可旋转溅射装置，以提供要沉积在卷筒纸上的沉积材料的至少一部分在涂布滚筒上。此外，第一轴和第二轴之间的距离小于200mm。

9. 发明公开

US20240360546A1 TEMPERATURE-CONTROLLED SHIELD, MATERIAL DEPOSITION APPARATUS AND METHOD FOR DEPOSITING A MATERIAL ONTO A SUBSTRATE 审中-公开
公开(公告)号：US20240360546A1
公开(公告)日：2024-10-31
申请号：US18768799
申请日：2024-07-10
申请人： Applied Materials, Inc.
发明人： Andreas LOPP , Stefan BANGERT
IPC分类号： C23C14/54 , C23C14/24 , H01J37/32
CPC分类号： C23C14/542 , C23C14/24 , H01J37/32651
摘要： A temperature-controlled shield for an evaporation source is described. The temperature-controlled shield is configured to provide a pre-heating zone or a post-cooling zone.

10. 发明申请

US20190301002A1 MASK ARRANGEMENT FOR MASKING A SUBSTRATE IN A PROCESSING CHAMBER, APPARATUS FOR DEPOSITING A LAYER ON A SUBSTRATE, AND METHOD FOR ALIGNING A MASK ARRANGEMENT FOR MASKING A SUBSTRATE IN A PROCESSING CHAMBER 审中-公开
公开(公告)号：US20190301002A1
公开(公告)日：2019-10-03
申请号：US16422794
申请日：2019-06-26
申请人： Applied Materials, Inc.
发明人： Stefan BANGERT , Tommaso VERCESI , Daniele GISLON , Oliver HEIMEL , Andreas LOPP , Dieter HAAS
IPC分类号： C23C14/04 , C23C16/04 , C23C16/458
摘要： A mask arrangement for masking a substrate in a processing chamber is provided. The mask arrangement includes a mask frame having one or more frame elements and is configured to support a mask device, wherein the mask device is connectable to the mask frame; and at least one actuator connectable to at least one frame element of the one or more frame elements, wherein the at least one actuator is configured to apply a force to the at least one frame element.

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