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1. 发明申请

US20120012458A1 MAGNET ARRANGEMENT FOR A TARGET BACKING TUBE, TARGET BACKING TUBE INCLUDING THE SAME, CYLINDRICAL TARGET ASSEMBLY AND SPUTTERING SYSTEM 有权
标题翻译：用于目标支管的磁铁布置，包括其的目标支管，圆柱形目标组件和溅射系统
公开(公告)号：US20120012458A1
公开(公告)日：2012-01-19
申请号：US12840021
申请日：2010-07-20
申请人： Andreas LOPP , Juergen GRILLMAYER , Wolfgang KROCK
发明人： Andreas LOPP , Juergen GRILLMAYER , Wolfgang KROCK
IPC分类号： C23C14/35
CPC分类号： H01J37/3405 , H01J37/342 , H01J37/345 , H01J37/3452 , H01J37/3461
摘要： The disclosure relates to a magnet arrangement for a sputtering system, wherein the magnet arrangement is adapted for a rotatable target of a sputtering system and includes: a first magnet element extending along a first axis; a second magnet element being disposed around the first magnet element symmetrically to a first plane; wherein the second magnet element includes at least one magnet section intersecting the first plane; and wherein a magnetic axis of the at least one magnet section is inclined with respect to a second plane being orthogonal to the first axis. Further, the disclosure relates to a target backing tube for a rotatable target of a sputtering system, a cylindrical rotatable target for a sputtering system, and a sputtering
摘要翻译：本发明涉及一种用于溅射系统的磁体装置，其中磁体装置适用于溅射系统的可旋转靶，并且包括：沿着第一轴线延伸的第一磁体元件; 第二磁体元件围绕第一磁体元件对称地设置在第一平面上; 其中所述第二磁体元件包括与所述第一平面交叉的至少一个磁体部分; 并且其中所述至少一个磁体部分的磁轴相对于与所述第一轴正交的第二平面倾斜。此外，本公开涉及一种用于溅射系统的可旋转靶的目标衬管，用于溅射系统的圆柱形可旋转靶，以及溅射

2. 发明申请

US20110079511A1 MAGNET ARRANGEMENT FOR A TARGET BACKING TUBE AND TARGET BACKING TUBE COMPRISING THE SAME 审中-公开
标题翻译：用于目标支管的磁铁装置和包含其的目标支管
公开(公告)号：US20110079511A1
公开(公告)日：2011-04-07
申请号：US12641080
申请日：2009-12-17
申请人： Anke HELLMICH , Wolfgang KROCK
发明人： Anke HELLMICH , Wolfgang KROCK
IPC分类号： C23C14/34
CPC分类号： H01J37/3405 , H01J37/342 , H01J37/3452
摘要： The disclosure concerns a magnet arrangement for a target backing tube for a rotatable target of a sputtering system, the magnet arrangement having a longitudinal axis and a circumferential direction around the longitudinal axis, and being adapted for an arrangement in a cylindrical backing tube, wherein the magnet arrangement comprises in a circumferential sequence: a first magnet element extending in parallel to the longitudinal axis, a second magnet element extending in parallel to the longitudinal axis, and a third magnet element extending in parallel to the longitudinal axis, wherein each magnet element has a center axis extending in a radial direction, wherein the angular distance between the first and the third magnet elements, with respect to their center axis, is less than about 85 degrees. The disclosure also concerns a cylindrical target assembly and at least one target cylinder disposed around the target backing tube.
摘要翻译：本公开涉及用于用于溅射系统的可旋转靶的目标背衬管的磁体布置，磁体布置具有围绕纵向轴线的纵向轴线和周向方向，并且适于在圆柱形背衬管中布置，其中，磁体排列包括圆周顺序：平行于纵向轴线延伸的第一磁体元件，平行于纵向轴线延伸的第二磁体元件和平行于纵向轴线延伸的第三磁体元件，其中每个磁体元件具有沿径向方向延伸的中心轴线，其中第一和第三磁体元件之间相对于其中心轴线的角距离小于约85度。本公开还涉及圆柱形目标组件和围绕目标背衬管设置的至少一个目标圆柱体。

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