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    • 6. 发明授权
    • Liquid crystal display
    • 液晶显示器
    • US06798464B2
    • 2004-09-28
    • US10063781
    • 2002-05-13
    • Alexander BietschEmmanuel DelamarcheBruno MichelHeinz Schmid
    • Alexander BietschEmmanuel DelamarcheBruno MichelHeinz Schmid
    • G02F11335
    • G02F1/13439G02F1/133621G02F2001/133548
    • A liquid crystal display device includes a substantially transparent substrate layer between a grating layer and a pixel electrode that comprises a solid conductor and an electrically conductive mesh. The device also includes a liquid crystal layer between said pixel electrode and a substantially transparent counter electrode that is arranged at a transparent cover plate. It further includes an active circuit element layer with a field effect transistor for controlling the pixel electrode. A method for manufacturing the liquid crystal display device is further disclosed wherein the pixel electrode is formed by printing a patterned substance onto the substrate layer and selectively plating a conductor onto said substance. The device may also comprise a conductor mesh comprising rows of conductor lines crossing with columns of conductor lines, wherein at least part of the conductor lines are randomly spaced from each other.
    • 液晶显示装置包括在光栅层和像素电极之间的基本上透明的基底层,其包括实心导体和导电网。 该装置还包括在所述像素电极和布置在透明盖板上的基本上透明的对电极之间的液晶层。 其还包括具有用于控制像素电极的场效应晶体管的有源电路元件层。 进一步公开了一种用于制造液晶显示装置的方法,其中通过将图案化物质印刷到基底层上并选择性地将导体镀在所述物质上而形成像素电极。 该装置还可以包括导体网,其包括与导体线的列交叉的导体线行,其中导体线的至少一部分彼此间隔开。
    • 9. 发明授权
    • Selective etching of substrates with control of the etch profile
    • 通过控制蚀刻轮廓选择性蚀刻衬底
    • US07041232B2
    • 2006-05-09
    • US10081860
    • 2002-02-22
    • Alexander BietschEmmanuel DelamarcheBruno MichelHeinz SchmidMatthias Geisler
    • Alexander BietschEmmanuel DelamarcheBruno MichelHeinz SchmidMatthias Geisler
    • C09K13/00C09K13/06H01L21/306
    • H01L21/76838C23F1/02C23F1/34C23F1/40
    • A wet etching system for selectively patterning substrates having regions covered with self-assembled monolayers (SAM) thereby controlling the etch profile. The system contains a) a liquid etching solution; and b) at least one additive to the liquid etching solution having a higher affinity to the regions of the substrate covered with the SAMs than to the other regions of the substrate. Also provided is a method of selectively patterning substrates having regions covered with self-assembled monolayers (SAMs), thereby controlling the etch profile, the method consisting of the steps of a) providing a liquid etching solution; b) adding at least one additive to said etching solution having a higher affinity to the regions of the substrate covered with the SAMs than to the other regions of the substrate; and c) etching said substrate with said liquid etching solution containing at least one additive.
    • 一种湿蚀刻系统,用于选择性地图案化具有被自组装单层(SAM)覆盖的区域的衬底,从而控制蚀刻轮廓。 该系统包含a)液体蚀刻溶液; 和b)液体蚀刻溶液中至少一种添加剂对于被SAM覆盖的衬底的区域比对衬底的其它区域具有更高的亲和力。 还提供了一种选择性地图案化具有被自组装单层(SAM)覆盖的区域的衬底的方法,从而控制蚀刻轮廓,该方法包括以下步骤:a)提供液体蚀刻溶液; b)向所述衬底覆盖的所述衬底的所述区域具有比所述衬底的其它区域更高亲和力的所述蚀刻溶液中的至少一种添加剂; 和c)用含有至少一种添加剂的液体蚀刻溶液蚀刻所述基材。