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    • 7. 发明申请
    • Microprobe Tips and Methods for Making
    • 微型技巧和制作方法
    • US20080108221A1
    • 2008-05-08
    • US11931308
    • 2007-10-31
    • Kieun KimAdam CohenWilla LarsenRichard ChenAnanda KumarEzekiel KruglickVacit AratGang ZhangMichael LockardChristopher Bang
    • Kieun KimAdam CohenWilla LarsenRichard ChenAnanda KumarEzekiel KruglickVacit AratGang ZhangMichael LockardChristopher Bang
    • H01L21/44
    • C25D1/00C25D1/003C25D7/123
    • Embodiments of the present invention are directed to the formation of microprobe tips elements having a variety of configurations. In some embodiments tips are formed from the same building material as the probes themselves, while in other embodiments the tips may be formed from a different material and/or may include a coating material. In some embodiments, the tips are formed before the main portions of the probes and the tips are formed in proximity to or in contact with a temporary substrate. Probe tip patterning may occur in a variety of different ways, including, for example, via molding in patterned holes that have been isotropically or anisotropically etched silicon, via molding in voids formed in exposed photoresist, via molding in voids in a sacrificial material that have formed as a result of the sacrificial material mushrooming over carefully sized and located regions of dielectric material, via isotropic etching of the tip material around carefully sized and placed etching shields, via hot pressing, and the like.
    • 本发明的实施例涉及形成具有各种构造的微探针尖元件。 在一些实施例中,尖端由与探针本身相同的建筑材料形成,而在其它实施例中,尖端可以由不同的材料形成和/或可以包括涂层材料。 在一些实施例中,尖端在探针的主要部分之前形成,并且尖端形成在临时衬底附近或与临时衬底接触。 探针尖端图案化可以以各种不同的方式发生,包括例如通过在各向异性或各向异性地蚀刻硅的图案化孔中模制,通过在曝光的光致抗蚀剂中形成的空隙中模制,通过在牺牲材料中的空隙中模制, 由于牺牲材料通过电介质材料的细小尺寸和定位的区域,经由热压等等仔细地尺寸和放置的蚀刻屏蔽部分上的尖端材料的各向同性蚀刻而形成。
    • 8. 发明申请
    • Microprobe tips and methods for making
    • 微型笔尖和制作方法
    • US20060286829A1
    • 2006-12-21
    • US11028962
    • 2005-01-03
    • Kieun KimAdam CohenWilla LarsenRichard ChenAnanda KumarEzekiel KruglickVacit AratGang ZhangMichael Lockard
    • Kieun KimAdam CohenWilla LarsenRichard ChenAnanda KumarEzekiel KruglickVacit AratGang ZhangMichael Lockard
    • H01R12/00
    • G01R3/00G01R1/06744Y10T29/49147Y10T29/49204Y10T29/49222
    • Embodiments of the present invention are directed to the formation of microprobe tips elements having a variety of configurations. In some embodiments tips are formed from the same building material as the probes themselves, while in other embodiments the tips may be formed from a different material and/or may include a coating material. In some embodiments, the tips are formed before the main portions of the probes and the tips are formed in proximity to or in contact with a temporary substrate. Probe tip patterning may occur in a variety of different ways, including, for example, via molding in patterned holes that have been isotropically or anisotropically etched silicon, via molding in voids formed in over exposed photoresist, via molding in voids in a sacrificial material that have formed as a result of the sacrificial material mushrooming over carefully sized and located regions of dielectric material, via isotropic etching of a the tip material around carefully sized placed etching shields, via hot pressing, and the like.
    • 本发明的实施例涉及形成具有各种构造的微探针尖元件。 在一些实施例中,尖端由与探针本身相同的建筑材料形成,而在其它实施例中,尖端可以由不同的材料形成和/或可以包括涂层材料。 在一些实施例中,尖端在探针的主要部分之前形成,并且尖端形成在临时衬底附近或与临时衬底接触。 探针尖端图案化可以以各种不同的方式发生,包括例如通过在各向异性或各向异性地蚀刻硅的图案化孔中模制,通过在暴露在光致抗蚀剂中的空隙中模制,通过在牺牲材料中的空隙中模制, 由于牺牲材料在电介质材料的精细尺寸和定位的区域上的形成,通过各种各向同性的蚀刻尖端材料,围绕小心尺寸放置的蚀刻屏蔽件,通过热压等形成。