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1. 发明授权

US07738187B2 Optical element, projection lens and associated projection exposure apparatus 有权
标题翻译：光学元件，投影透镜及相关投影曝光装置
公开(公告)号：US07738187B2
公开(公告)日：2010-06-15
申请号：US12134062
申请日：2008-06-05
申请人： Alexandra Pazidis , Stephan Six , Ruediger Duesing , Gennady Fedosenko
发明人： Alexandra Pazidis , Stephan Six , Ruediger Duesing , Gennady Fedosenko
IPC分类号： G02B13/14
CPC分类号： G02B21/33 , G03F7/70341 , G03F7/70958
摘要： An optical element (1) made of a material that is transparent to wavelengths in the UV region, which optical element (1) includes an oleophobic coating (6, 7) outside of its optically free diameter whose disperse component of the surface energy is preferably 25 mN/m or less, particularly preferably 20 mN/m or less, in particular 15 mN/m or less. In addition or as an alternative, the optical element (1) within its optically free diameter comprises an oleophilic coating (9b, 9c) that is transparent to wavelengths in the UV region, with the disperse component of the surface energy of this coating preferably being more than 25 mN/m, particularly preferably more than 30 mN/m, in particular more than 40 mN/m. The optical element may be provided in an arrangement in which it dips at least partially into an organic liquid.
摘要翻译：一种光学元件（1），其由对UV区域中的波长透明的材料制成，该光学元件（1）包括其光学自由直径外的疏油涂层（6,7），其表面能的分散分量优选为 25mN / m以下，特别优选为20mN / m以下，特别优选为15mN / m以下。另外或作为替代，光学元件（1）在其光学自由直径内包括对UV区域中的波长透明的亲油涂层（9b，9c），该涂层的表面能的分散组分优选为超过25mN / m，特别优选大于30mN / m，特别是大于40mN / m。光学元件可以以其至少部分地浸入有机液体的布置来设置。

2. 发明申请

US20080304035A1 OPTICAL ELEMENT, PROJECTION LENS AND ASSOCIATED PROJECTION EXPOSURE APPARATUS 有权
标题翻译：光学元件，投影镜头及相关投影曝光装置
公开(公告)号：US20080304035A1
公开(公告)日：2008-12-11
申请号：US12134062
申请日：2008-06-05
申请人： Alexandra Pazidis , Stephan Six , Ruediger Duesing , Gennady Fedosenko
发明人： Alexandra Pazidis , Stephan Six , Ruediger Duesing , Gennady Fedosenko
IPC分类号： G03B27/54 , G02B3/00
CPC分类号： G02B21/33 , G03F7/70341 , G03F7/70958
摘要： An optical element (1) made of a material that is transparent to wavelengths in the UV region, which optical element (1) includes an oleophobic coating (6, 7) outside of its optically free diameter whose disperse component of the surface energy is preferably 25 mN/m or less, particularly preferably 20 mN/m or less, in particular 15 mN/m or less. In addition or as an alternative, the optical element (1) within its optically free diameter comprises an oleophilic coating (9b, 9c) that is transparent to wavelengths in the UV region, with the disperse component of the surface energy of this coating preferably being more than 25 mN/m, particularly preferably more than 30 mN/m, in particular more than 40 mN/m. The optical element may be provided in an arrangement in which it dips at least partially into an organic liquid.
摘要翻译：一种光学元件（1），其由对UV区域中的波长透明的材料制成，该光学元件（1）包括其光学自由直径外的疏油涂层（6,7），其表面能的分散分量优选为 25mN / m以下，特别优选为20mN / m以下，特别优选为15mN / m以下。另外或作为替代，光学元件（1）在其光学自由直径内包括对UV区域中的波长透明的亲油涂层（9b，9c），该涂层的表面能的分散组分优选为超过25mN / m，特别优选大于30mN / m，特别是大于40mN / m。光学元件可以以其至少部分地浸入有机液体的布置来设置。

3. 发明授权

US09733395B2 Microlithographic projection exposure apparatus 有权
公开(公告)号：US09733395B2
公开(公告)日：2017-08-15
申请号：US13112357
申请日：2011-05-20
申请人： Vladimir Kamenov , Daniel Kraehmer , Toralf Gruner , Karl-Stefan Weissenrieder , Heiko Feldmann , Achim Zirkel , Alexandra Pazidis , Bruno Thome , Stephan Six
发明人： Vladimir Kamenov , Daniel Kraehmer , Toralf Gruner , Karl-Stefan Weissenrieder , Heiko Feldmann , Achim Zirkel , Alexandra Pazidis , Bruno Thome , Stephan Six
IPC分类号： G03B27/68 , G02B1/11 , G03F7/20
CPC分类号： G02B1/11 , G03F7/70191 , G03F7/70308 , G03F7/70958
摘要： The disclosure relates to a microlithographic projection exposure apparatus, such as are used for the production of large-scale integrated electrical circuits and other microstructured components. The disclosure relates in particular to coatings of optical elements in order to increase or reduce the reflectivity.

4. 发明授权

US08279402B2 Optical arrangement for immersion lithography with a hydrophobic coating, as well as projection exposure apparatus comprising the same 有权
标题翻译：用于具有疏水性涂层的浸没式光刻的光学布置，以及包括其的投影曝光设备
公开(公告)号：US08279402B2
公开(公告)日：2012-10-02
申请号：US12403132
申请日：2009-03-12
申请人： Stephan Six , Michael Lill , Ruediger Duesing , Bernhard Gellrich , Michael Widmann , Andreas Schubert , Tilmann Von Papen , Thomas Ihl
发明人： Stephan Six , Michael Lill , Ruediger Duesing , Bernhard Gellrich , Michael Widmann , Andreas Schubert , Tilmann Von Papen , Thomas Ihl
IPC分类号： G03F7/207
CPC分类号： G03F7/70958 , G03F7/70341 , G03F7/706
摘要： An optical arrangement for immersion lithography, having at least one component (1) to which a hydrophobic coating (6, 7) is applied, the hydrophobic coating (6, 7) being exposed to UV radiation during operation of a projection lens, and the at least one component (1) being wetted at least in part by an immersion fluid during operation of the projection lens. The hydrophobic coating (6, 7) includes at least one UV-resistant layer (6) that absorbs and/or reflects UV radiation at a wavelength of less than 260 nm.
摘要翻译：一种用于浸没光刻的光学装置，其具有至少一个施加有疏水涂层（6,7）的组分（1），所述疏水涂层（6,7）在投影透镜的操作期间暴露于UV辐射，并且至少一个部件（1）在投影透镜的操作期间至少部分地被浸没流体润湿。疏水涂层（6,7）包括吸收和/或反射波长小于260nm的UV辐射的至少一个抗紫外线层（6）。

5. 发明申请

US20110222043A1 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：微波投影曝光装置
公开(公告)号：US20110222043A1
公开(公告)日：2011-09-15
申请号：US13112357
申请日：2011-05-20
申请人： Vladimir Kamenov , Daniel Kraehmer , Toralf Gruner , Karl-Stefan Weissenrieder , Heiko Feldmann , Achim Zirkel , Alexandra Pazidis , Bruno Thome , Stephan Six
发明人： Vladimir Kamenov , Daniel Kraehmer , Toralf Gruner , Karl-Stefan Weissenrieder , Heiko Feldmann , Achim Zirkel , Alexandra Pazidis , Bruno Thome , Stephan Six
IPC分类号： G03B27/72
CPC分类号： G02B1/11 , G03F7/70191 , G03F7/70308 , G03F7/70958
摘要： The disclosure relates to a microlithographic projection exposure apparatus, such as are used for the production of large-scale integrated electrical circuits and other microstructured components. The disclosure relates in particular to coatings of optical elements in order to increase or reduce the reflectivity.
摘要翻译：本公开涉及一种微光刻投影曝光装置，例如用于生产大型集成电路和其它微结构元件的微光投影曝光装置。本公开特别涉及光学元件的涂层以增加或降低反射率。

6. 发明申请

US20080297754A1 Microlithographic projection exposure apparatus 审中-公开
标题翻译：微光刻投影曝光装置
公开(公告)号：US20080297754A1
公开(公告)日：2008-12-04
申请号：US12031595
申请日：2008-02-14
申请人： Vladimir Kamenov , Daniel Kraehmer , Toralf Gruner , Karl-Stefan Weissenrieder , Heiko Feldmann , Achim Zirkel , Alexandra Pazidis , Bruno Thome , Stephan Six
发明人： Vladimir Kamenov , Daniel Kraehmer , Toralf Gruner , Karl-Stefan Weissenrieder , Heiko Feldmann , Achim Zirkel , Alexandra Pazidis , Bruno Thome , Stephan Six
IPC分类号： G03B27/54 , G02B5/00
CPC分类号： G02B1/11 , G03F7/70191 , G03F7/70308 , G03F7/70958
摘要： The disclosure relates to a microlithographic projection exposure apparatus, such as are used for the production of large-scale integrated electrical circuits and other microstructured components. The disclosure relates in particular to coatings of optical elements in order to increase or reduce the reflectivity.
摘要翻译：本公开涉及一种微光刻投影曝光装置，例如用于生产大型集成电路和其它微结构元件的微光投影曝光装置。本公开特别涉及光学元件的涂层以增加或降低反射率。

7. 发明授权

US08934079B2 Optical imaging with reduced immersion liquid evaporation effects 有权
标题翻译：光学成像与浸没液体蒸发效果降低
公开(公告)号：US08934079B2
公开(公告)日：2015-01-13
申请号：US13285729
申请日：2011-10-31
申请人： Stephan Six
发明人： Stephan Six
IPC分类号： G03F7/20
CPC分类号： G02B1/18 , G02B27/0006 , G03F7/7015 , G03F7/70341 , G03F7/70858 , G03F7/70883
摘要： An optical arrangement for use in an optical imaging process includes an optical element, an immersion zone and a liquid repelling device. During the optical imaging process, the immersion zone is located adjacent to the optical element and is filled with an immersion liquid. The optical element has a first surface region and a second surface region. During the optical imaging process, the first surface region is wetted by the immersion liquid. At least temporarily during the optical imaging process, the liquid repelling device generates an electrical field in the region of the second surface. The electrical field being is adapted to cause a repellent force on parts of the immersion liquid which are responsive to the electrical field and inadvertently contact the second surface region. The repellent force has a direction to drive away the parts of the immersion liquid from the second surface region.
摘要翻译：用于光学成像处理的光学装置包括光学元件，浸没区域和液体排斥装置。在光学成像过程中，浸没区域位于光学元件附近，并且填充有浸没液体。光学元件具有第一表面区域和第二表面区域。在光学成像过程中，第一表面区域被浸渍液体润湿。至少在光学成像过程中暂时，液体排斥装置在第二表面的区域中产生电场。电场适于在对电场响应的浸没液体的部分上产生排斥力，并且不经意地接触第二表面区域。排斥力具有从第二表面区域驱除浸没液体的部分的方向。

8. 发明申请

US20100084795A1 METHOD FOR OPERATING A CONVERTER 有权
标题翻译：操作转换器的方法
公开(公告)号：US20100084795A1
公开(公告)日：2010-04-08
申请号：US12443733
申请日：2007-10-02
申请人： Christian Imiela , Stephan Schulze , Stephan Six , Christoph Sundermann , Joerg Hertel , Rolf Best
发明人： Christian Imiela , Stephan Schulze , Stephan Six , Christoph Sundermann , Joerg Hertel , Rolf Best
IPC分类号： C21C5/50
CPC分类号： C21C5/50
摘要： In a method for operating a converter (1), in which the converter (1) is mounted in a carrying ring (3) by means of carrying journals (2), a gear mechanism (4) is mounted in a floating manner on the carrying journals (2), the converter (1) is configured, as a result, such that it can tilt about its horizontal axis and the gear mechanism (4) is connected rigidly to a pedestal (6) by a torque support (5), the torque support (5) connects the gear mechanism (4) to the pedestal (6) during the tilting operation of the converter (1), and the torque support (5) is released from the pedestal (6) or from the gear mechanism (4) or from both during operation of the converter (1).
摘要翻译：在用于操作转换器（1）的方法中，其中转换器（1）通过承载轴颈（2）安装在承载环（3）中，齿轮机构（4）以漂浮的方式安装在（2），转换器（1）的结构使得其能够围绕其水平轴线倾斜，并且齿轮机构（4）通过扭矩支撑件（5）刚性地连接到基座（6）在转换器（1）的倾转操作期间，扭矩支撑件（5）将齿轮机构（4）连接到基座（6），并且扭矩支撑件（5）从基座（6）或齿轮机构（4）或两者在转换器（1）的操作期间。

9. 发明授权

US08564925B2 Wafer chuck for EUV lithography 有权
标题翻译：用于EUV光刻的晶圆卡盘
公开(公告)号：US08564925B2
公开(公告)日：2013-10-22
申请号：US13163100
申请日：2011-06-17
申请人： Stephan Six
发明人： Stephan Six
IPC分类号： H02N13/00
CPC分类号： G03F7/70783 , G03F7/70708
摘要： A wafer chuck (1b) having a substrate (2) and having, applied to the substrate (2), an electrically conductive coating (8) for fixing a wafer (6) by electrostatic attraction and preferably having a reflective coating (10) applied to the substrate (2). The coating (8; 10) has at least a first layer (3; 11) under compressive stress and at least a second layer (7; 12) under tensile stress for compensating for the compressive stress of the first layer (3; 11) in order to keep deformation of the wafer chuck (1b) by the coating (8, 10) as low as possible.
摘要翻译：一种具有衬底（2）并且具有施加到衬底（2）上的用于通过静电吸引固定晶片（6）的导电涂层（8）并且优选地具有应用反射涂层（10）的晶片卡盘（1b）（2）。涂层（8; 10）在拉伸应力下至少具有压缩应力下的第一层（3; 11）和至少第二层（7; 12），用于补偿第一层（3; 11）的压缩应力，以便通过涂层（8,10）保持晶片卡盘（1b）的变形尽可能低。

10. 发明申请

US20120062865A1 OPTICAL IMAGING WITH REDUCED IMMERSION LIQUID EVAPORATION EFFECTS 有权
标题翻译：光学成像与降低液体蒸发效应
公开(公告)号：US20120062865A1
公开(公告)日：2012-03-15
申请号：US13285729
申请日：2011-10-31
申请人： Stephan Six
发明人： Stephan Six
IPC分类号： G03B27/54 , G02B27/00
CPC分类号： G02B1/18 , G02B27/0006 , G03F7/7015 , G03F7/70341 , G03F7/70858 , G03F7/70883
摘要： An optical arrangement for use in an optical imaging process includes an optical element, an immersion zone and a liquid repelling device. During the optical imaging process, the immersion zone is located adjacent to the optical element and is filled with an immersion liquid. The optical element has a first surface region and a second surface region. During the optical imaging process, the first surface region is wetted by the immersion liquid. At least temporarily during the optical imaging process, the liquid repelling device generates an electrical field in the region of the second surface. The electrical field being is adapted to cause a repellent force on parts of the immersion liquid which are responsive to the electrical field and inadvertently contact the second surface region. The repellent force has a direction to drive away the parts of the immersion liquid from the second surface region.
摘要翻译：用于光学成像处理的光学装置包括光学元件，浸没区域和液体排斥装置。在光学成像过程中，浸没区域位于光学元件附近，并且填充有浸没液体。光学元件具有第一表面区域和第二表面区域。在光学成像过程中，第一表面区域被浸渍液体润湿。至少在光学成像过程中暂时，液体排斥装置在第二表面的区域中产生电场。电场适于在对电场响应的浸没液体的部分上产生排斥力，并且不经意地接触第二表面区域。排斥力具有从第二表面区域驱除浸没液体的部分的方向。

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