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    • 1. 发明申请
    • Cooling system for alcohol beverage dispensing apparatus
    • 酒精饮料分配装置的冷却系统
    • US20060131325A1
    • 2006-06-22
    • US10536973
    • 2003-11-25
    • Albert WautersHans DonkerIan AndersonEdward DuffyAndrew Halket
    • Albert WautersHans DonkerIan AndersonEdward DuffyAndrew Halket
    • B67D5/08
    • B67D1/0462B67D1/0857B67D1/0861F25D31/006F25D2331/802F25D2700/16
    • A beer or like alcohol beverage dispensing apparatus has a keg for containing the beverage. A keg dispensing device is connected through a top portion of the keg and extends to a bottom portion of the keg to draw the beverage from the keg adjacent the bottom portion. The apparatus has a cooling plate in heat transfer contacting relation with the bottom of the keg and also has a Peltier thermoelectric device connected to the cooling plate so as to extract heat from the cooling plate and thereby extract heat from the keg. The cooling apparatus has a first temperature sensor, mounted in heat sensing relation with a bottom portion of the keg and a second temperature sensor mounted in heat sensing relation with an upper portion of the keg. A controller controls the cooling apparatus in response to the first and second temperature sensors so as to control the operation of the cooling apparatus to extract heat from the bottom portion of the keg to lower and maintain the temperature of the beverage contained in the keg to a desired beverage serving temperature. The keg may comprise either steel, stainless steel or copper so as to provide a stratified cooling effect or may comprise aluminum so as to initially cool the beverage in the container in a more homogeneous manner.
    • 啤酒或类似酒精饮料分配装置具有用于容纳饮料的小桶。 小桶分配装置通过小桶的顶部连接并延伸到小桶的底部,以从邻近底部的小桶抽取饮料。 该装置具有与小桶的底部传热接触的冷却板,并且还具有连接到冷却板的珀尔帖热电装置,以从冷却板中提取热量,从而从小桶中提取热量。 所述冷却装置具有第一温度传感器,其与所述小桶的底部热传感关系安装,所述第二温度传感器与所述小桶的上部热传感地安装。 控制器响应于第一温度传感器和第二温度传感器控制冷却装置,以便控制冷却装置的操作以从小桶的底部提取热量来降低,并且将包含在小桶中的饮料的温度保持为 所需饮料服务温度。 小桶可以包括钢,不锈钢或铜,以提供分层的冷却效果,或者可以包括铝,以便以更均匀的方式最初冷却容器中的饮料。
    • 2. 发明申请
    • Beer dispensing system with gas pressure reservoir
    • 啤酒分配系统与气压储罐
    • US20060138177A1
    • 2006-06-29
    • US10536974
    • 2003-11-25
    • Albert WautersIan AndersonEdward Duffy
    • Albert WautersIan AndersonEdward Duffy
    • B67D5/42
    • B67D1/0431B67D1/0462
    • A home beer dispensing apparatus has a keg having a self-contained bag filled with a beer and a pressure system. The pressure system creates a pressurized air space between the keg inner walls and the bag to assist in the dispensing of the beer. The pressure system has a keg one-way air valve mounted to a top wall of the keg to permit entry of pressurized air into the keg. The pressure system has a pressure reservoir mounted in the dispensing apparatus outside the keg and in fluid flow communication with the keg one-way valve. The reservoir stores a charge of pressurized air and supplies at least a portion of this charge to the keg through the keg air valve when the dispensing apparatus is operated to dispense the beer. The reservoir provides a reserved charge of pressurized gas that is on hand to reduce dampening pressure fluctuations during beer dispensing which can result in beer frothing, especially during the early stages of beer dispensing when the air head space in the keg is small. Further, the apparatus may also have a pressure sensing system adapted to measure time rate of pressure change in the keg. The apparatus has a signaling device responsive to the time rate of pressure change in the keg to produce a signal related to volume of beer remaining in the bag. Preferably, the signal is displayed visually on the dispensing apparatus.
    • 家用啤酒分配装置具有小桶,该桶具有装满啤酒和压力系统的独立袋。 压力系统在小桶内壁和袋之间形成加压空气空间,以帮助分配啤酒。 压力系统具有安装在小桶的顶壁上的小桶单向空气阀,以允许加压空气进入小桶。 压力系统具有安装在小桶外部的分配装置中并与小桶单向阀流体连通的压力容器。 储存器存储加压空气的装料,并且当分配装置操作以分配啤酒时,通过小桶空气阀向桶中供应至少一部分该装料。 储存器提供了预留的加压气体,其在手上以减少啤酒分配期间的阻尼压力波动,这可导致啤酒起泡,特别是在小桶中的空气头部空间较小时在啤酒分配的早期阶段。 此外,该装置还可以具有适于测量小桶中的压力变化的时间速率的压力感测系统。 该装置具有响应于小桶中的压力变化的时间速率的信号装置,以产生与袋中剩余的啤酒量相关的信号。 优选地,在分配装置上可视地显示信号。
    • 3. 发明授权
    • Method and apparatus to control surface texture modification of silicon wafers for photovoltaic cell devices
    • 用于控制光伏电池器件的硅晶片的表面纹理修改的方法和装置
    • US09548224B2
    • 2017-01-17
    • US13696730
    • 2011-05-11
    • Edward DuffyLaurent Clochard
    • Edward DuffyLaurent Clochard
    • H01L31/0236H01L21/67H01L31/18H01L21/30
    • H01L21/67069H01L31/0236H01L31/02363H01L31/1804Y02E10/547Y02P70/521
    • A method and apparatus to modify the surface structure of a silicon substrate or deposited silicon layer in a controllable manner using gas only in an atmospheric environment, suitable for making photovoltaic (PV) wafer based devices. The method and apparatus comprising the steps of disposing the substrate or deposited layer on a moveable carrier; pre-heating the substrate or deposited layer; and moving the substrate or deposited layer for etching through an atmospheric reactor; under an etchant delivering module inside the reactor and applying at least one etchant in gas form at a controlled flow rate and angle to the substrate or deposited layer in the reactor, wherein the at least one etchant gas is selected from the group comprising fluoride-containing gases and chlorine-based compounds. The technical problem that has been solved is the provision of a high throughput dry etching method at atmospheric pressure. This apparatus does not require plasma to aid the etching process using fluoride-containing gases and chlorine-based compounds and is performed at open atmospheric pressure. The use of elemental fluorine, which has a significantly lower bonding energy than any of the other etchants used to date, allows for the use of much lower power energy source to crack the elemental fluorine in to its etching radicals. The apparatus enables the delivery of a predetermined texture finish by controlling the flow rate of the gasses which are bombarded on the surface of the substrate.
    • 一种以可控的方式使用仅在大气环境中使用气体的硅衬底或沉积硅层的表面结构的方法和装置,其适用于制造基于光伏(PV)晶圆的器件。 该方法和装置包括以下步骤:将衬底或沉积层设置在可移动的载体上; 预热衬底或沉积层; 并移动用于刻蚀的衬底或沉积层通过大气反应器; 在所述反应器内部的蚀刻剂输送模块下方,并以与所述反应器中的所述基底或沉积层受控的流速和角度施加气体形式的至少一种蚀刻剂,其中所述至少一种蚀刻剂气体选自含氟化物 气体和氯基化合物。 已经解决的技术问题是在大气压下提供高通量干蚀刻方法。 该装置不需要等离子体来辅助使用含氟气体和氯系化合物的蚀刻工艺,并且在开放的大气压下进行。 与迄今为止使用的任何其它蚀刻剂相比,具有明显降低的键合能量的元素氟使得能够使用更低功率的能量来将元素氟裂解成其蚀刻自由基。 该装置能够通过控制被轰击在基板的表面上的气体的流速来传送预定的纹理完成。
    • 5. 发明申请
    • Method and Apparatus to Control Surface Texture Modification of Silicon Wafers for Photovoltaic Cell Devices
    • 控制用于光伏电池器件的硅晶片的表面纹理修改的方法和装置
    • US20130069204A1
    • 2013-03-21
    • US13696730
    • 2011-05-11
    • Edward DuffyLaurent Clochard
    • Edward DuffyLaurent Clochard
    • H01L21/306C23F1/08H01L29/06
    • H01L21/67069H01L31/0236H01L31/02363H01L31/1804Y02E10/547Y02P70/521
    • A method and apparatus to modify the surface structure of a silicon substrate or deposited silicon layer in a controllable manner using gas only in an atmospheric environment, suitable for making photovoltaic (PV) wafer based devices. The method and apparatus comprising the steps of disposing the substrate or deposited layer on a moveable carrier; pre-heating the substrate or deposited layer; and moving the substrate or deposited layer for etching through an atmospheric reactor; under an etchant delivering module inside the reactor and applying at least one etchant in gas form at a controlled flow rate and angle to the substrate or deposited layer in the reactor, wherein the at least one etchant gas is selected from the group comprising fluoride-containing gases and chlorine-based compounds. The technical problem that has been solved is the provision of a high throughput dry etching method at atmospheric pressure. This apparatus does not require plasma to aid the etching process using fluoride-containing gases and chlorine-based compounds and is performed at open atmospheric pressure. The use of elemental fluorine, which has a significantly lower bonding energy than any of the other etchants used to date, allows for the use of much lower power energy source to crack the elemental fluorine in to its etching radicals. The apparatus enables the delivery of a predetermined texture finish by controlling the flow rate of the gasses which are bombarded on the surface of the substrate.
    • 一种以可控的方式使用仅在大气环境中使用气体的硅衬底或沉积硅层的表面结构的方法和装置,其适用于制造基于光伏(PV)晶圆的器件。 该方法和装置包括以下步骤:将衬底或沉积层设置在可移动的载体上; 预热衬底或沉积层; 并移动用于刻蚀的衬底或沉积层通过大气反应器; 在所述反应器内部的蚀刻剂输送模块下方,并以与所述反应器中的所述基底或沉积层受控的流速和角度施加气体形式的至少一种蚀刻剂,其中所述至少一种蚀刻剂气体选自含氟化物 气体和氯基化合物。 已经解决的技术问题是在大气压下提供高通量干蚀刻方法。 该装置不需要等离子体来辅助使用含氟气体和氯系化合物的蚀刻工艺,并且在开放的大气压下进行。 与迄今为止使用的任何其它蚀刻剂相比,具有明显降低的键合能量的元素氟使得能够使用更低功率的能量来将元素氟裂解成其蚀刻自由基。 该装置能够通过控制被轰击在基板的表面上的气体的流速来传送预定的纹理完成。