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1. 发明授权

US07772554B2 Charged particle system 有权
标题翻译：带电粒子系统
公开(公告)号：US07772554B2
公开(公告)日：2010-08-10
申请号：US12098127
申请日：2008-04-04
申请人： Akiyuki Sugiyama , Hidetoshi Morokuma , Yutaka Hojo , Yukio Yoshizawa
发明人： Akiyuki Sugiyama , Hidetoshi Morokuma , Yutaka Hojo , Yukio Yoshizawa
IPC分类号： G01N23/00
CPC分类号： H01J37/3056 , B82Y10/00 , B82Y40/00 , H01J37/265 , H01J37/28 , H01J37/3045 , H01J37/3174 , H01J2237/22 , H01J2237/2817 , H01J2237/31745
摘要： To provide a charged particle system capable of facilitating comparison between an actual pattern and an ideal pattern using not only two-dimensional CAD data but also three-dimensional CAD data. According to the present invention, using information about the angle of irradiation of a sample with a charged particle beam, a two-dimensional display of an ideal pattern (design data, such as CAD data, for example) is converted into a three-dimensional display, and the three-dimensional ideal pattern is displayed with an observation image. If the three-dimensional ideal pattern is superimposed on the observation image, comparison thereof can be easily carried out. Examples of the ideal pattern include a circuit pattern (CAD data) based on semiconductor design information, an exposure mask pattern based on an exposure mask used for exposure of a semiconductor wafer, and an exposure simulation pattern based on exposure simulation based on the exposure mask and an exposure condition can be used, and at least one of these patterns is displayed three-dimensionally.
摘要翻译：为了提供一种带电粒子系统，其能够利用不仅二维CAD数据而且还可以利用三维CAD数据来实现实际图案与理想图案之间的比较。根据本发明，使用带有带电粒子束的样本的照射角度的信息，将理想图案（例如，CAD数据等设计数据）的二维显示转换成三维显示，并且用观察图像显示三维理想图案。如果将三维理想图案叠加在观察图像上，则可以容易地进行比较。理想图案的实例包括基于半导体设计信息的电路图案（CAD数据），基于用于半导体晶片曝光的曝光掩模的曝光掩模图案和基于曝光掩模的曝光模拟的曝光模拟图案并且可以使用曝光条件，并且这些图案中的至少一个被三维地显示。

2. 发明申请

US20080245965A1 Charged Particle System 有权
标题翻译：带电粒子系统
公开(公告)号：US20080245965A1
公开(公告)日：2008-10-09
申请号：US12098127
申请日：2008-04-04
申请人： Akiyuki Sugiyama , Hidetoshi Morokuma , Yutaka Hojo , Yukio Yoshizawa
发明人： Akiyuki Sugiyama , Hidetoshi Morokuma , Yutaka Hojo , Yukio Yoshizawa
IPC分类号： G01N23/00
CPC分类号： H01J37/3056 , B82Y10/00 , B82Y40/00 , H01J37/265 , H01J37/28 , H01J37/3045 , H01J37/3174 , H01J2237/22 , H01J2237/2817 , H01J2237/31745
摘要： To provide a charged particle system capable of facilitating comparison between an actual pattern and an ideal pattern using not only two-dimensional CAD data but also three-dimensional CAD data. According to the present invention, using information about the angle of irradiation of a sample with a charged particle beam, a two-dimensional display of an ideal pattern (design data, such as CAD data, for example) is converted into a three-dimensional display, and the three-dimensional ideal pattern is displayed with an observation image. If the three-dimensional ideal pattern is superimposed on the observation image, comparison thereof can be easily carried out. Examples of the ideal pattern include a circuit pattern (CAD data) based on semiconductor design information, an exposure mask pattern based on an exposure mask used for exposure of a semiconductor wafer, and an exposure simulation pattern based on exposure simulation based on the exposure mask and an exposure condition can be used, and at least one of these patterns is displayed three-dimensionally.
摘要翻译：为了提供一种带电粒子系统，其能够利用不仅二维CAD数据而且还可以利用三维CAD数据来实现实际图案与理想图案之间的比较。根据本发明，使用带有带电粒子束的样本的照射角度的信息，将理想图案（例如，CAD数据等设计数据）的二维显示转换成三维显示，并且用观察图像显示三维理想图案。如果将三维理想图案叠加在观察图像上，则可以容易地进行比较。理想图案的实例包括基于半导体设计信息的电路图案（CAD数据），基于用于半导体晶片曝光的曝光掩模的曝光掩模图案和基于曝光掩模的曝光模拟的曝光模拟图案并且可以使用曝光条件，并且这些图案中的至少一个被三维地显示。

3. 发明授权

US08199191B2 Electron microscope for inspecting dimension and shape of a pattern formed on a wafer 有权
标题翻译：用于检查在晶片上形成的图案的尺寸和形状的电子显微镜
公开(公告)号：US08199191B2
公开(公告)日：2012-06-12
申请号：US11699062
申请日：2007-01-29
申请人： Hidetoshi Sato , Takumichi Sutani , Yutaka Hojo
发明人： Hidetoshi Sato , Takumichi Sutani , Yutaka Hojo
IPC分类号： H04N7/18 , G02B21/00 , G06K9/00
CPC分类号： H01J37/28 , H01J2237/221 , H01J2237/2485 , H01J2237/2816 , H01J2237/2817
摘要： There is provided an electron microscope which is capable of making a significant contribution to accomplishment of efficiency in investigating causes for pattern abnormalities found out. The electron microscope including an I/O for capturing image data on a microscopic image acquired by another electron microscope, a computation processing unit for generating a display signal based on the image data on the microscopic image acquired by another electron microscope and captured via the I/O and image data on a microscopic image acquired by the electron microscope itself, in order that the microscopic image acquired by another electron microscope and the microscopic image acquired by the electron microscope itself are displayed at the same scale and under the same display condition, and a display unit for displaying both of the microscopic images based on the display signal from the computation processing unit.
摘要翻译：提供了一种电子显微镜，其能够对发现的图案异常的调查原因的效率的实现方面作出重大贡献。电子显微镜包括用于在由另一电子显微镜获取的显微镜图像上捕获图像数据的I / O，计算处理单元，用于根据由另一电子显微镜获取的显微图像上的图像数据产生显示信号，并通过I / O和通过电子显微镜本身获取的显微镜图像上的图像数据，以便通过另一电子显微镜获得的显微图像和由电子显微镜本身获取的显微图像以相同的尺度显示在相同的显示条件下，以及显示单元，用于基于来自计算处理单元的显示信号显示两个微观图像。

4. 发明授权

US08942464B2 Pattern measuring apparatus, and pattern measuring method and program 有权
标题翻译：图案测量装置，图案测量方法和程序
公开(公告)号：US08942464B2
公开(公告)日：2015-01-27
申请号：US13700018
申请日：2011-03-28
申请人： Takuma Shibahara , Tsuyoshi Minakawa , Michio Oikawa , Yutaka Hojo , Hitoshi Sugahara , Hiroyuki Shindo
发明人： Takuma Shibahara , Tsuyoshi Minakawa , Michio Oikawa , Yutaka Hojo , Hitoshi Sugahara , Hiroyuki Shindo
IPC分类号： G06T7/00 , G01B21/20 , H01J37/22 , H01J37/28 , H01L21/66
CPC分类号： G06T7/0004 , G01B21/20 , G06T7/0006 , G06T2207/10061 , G06T2207/30148 , H01J37/222 , H01J37/28 , H01J2237/24578 , H01J2237/24592 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： The present invention provides a pattern measuring apparatus (600) that: acquires the image contour of a circuit pattern formed by transferring design data; classifies the acquired image contour into shape structures; calculates normal vectors for each shape structure; maps the shape structures to the image contour; uses at least one normal direction for each shape structure to stabilize the normal directions to the image contour; and uses the normal vectors for each shape structure to determine the position of a SEM contour.
摘要翻译：本发明提供一种图形测量装置（600），其获取通过传送设计数据形成的电路图案的图像轮廓; 将获取的图像轮廓分类为形状结构; 计算每个形状结构的法向矢量; 将形状结构映射到图像轮廓; 对于每个形状结构使用至少一个法线方向来稳定图像轮廓的法线方向; 并使用每个形状结构的法向量来确定SEM轮廓的位置。

5. 发明申请

US20130223723A1 PATTERN MEASURING APPARATUS, AND PATTERN MEASURING METHOD AND PROGRAM 有权
标题翻译：模式测量装置和模式测量方法与程序
公开(公告)号：US20130223723A1
公开(公告)日：2013-08-29
申请号：US13700018
申请日：2011-03-28
申请人： Takuma Shibahara , Tsuyoshi Minakawa , Michio Oikawa , Yutaka Hojo , Hitoshi Sugahara , Hiroyuki Shindo
发明人： Takuma Shibahara , Tsuyoshi Minakawa , Michio Oikawa , Yutaka Hojo , Hitoshi Sugahara , Hiroyuki Shindo
IPC分类号： G06T7/00
CPC分类号： G06T7/0004 , G01B21/20 , G06T7/0006 , G06T2207/10061 , G06T2207/30148 , H01J37/222 , H01J37/28 , H01J2237/24578 , H01J2237/24592 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： The present invention provides a pattern measuring apparatus (600) that: acquires the image contour of a circuit pattern formed by transferring design data; classifies the acquired image contour into shape structures; calculates normal vectors for each shape structure; maps the shape structures to the image contour; uses at least one normal direction for each shape structure to stabilize the normal directions to the image contour; and uses the normal vectors for each shape structure to determine the position of a SEM contour.
摘要翻译：本发明提供一种图形测量装置（600），其获取通过传送设计数据形成的电路图案的图像轮廓; 将获取的图像轮廓分类为形状结构; 计算每个形状结构的法向矢量; 将形状结构映射到图像轮廓; 对于每个形状结构使用至少一个法线方向来稳定图像轮廓的法线方向; 并使用每个形状结构的法向量来确定SEM轮廓的位置。

6. 发明申请

US20140224986A1 PATTERN MEASUREMENT DEVICE AND PATTERN MEASUREMENT METHOD 有权
标题翻译：图案测量装置和图案测量方法
公开(公告)号：US20140224986A1
公开(公告)日：2014-08-14
申请号：US14233003
申请日：2012-03-23
申请人： Takuma Shibahara , Michio Oikawa , Yutaka Hojo , Hitoshi Sugahara , Hiroyuki Shindo
发明人： Takuma Shibahara , Michio Oikawa , Yutaka Hojo , Hitoshi Sugahara , Hiroyuki Shindo
IPC分类号： H01J37/26
CPC分类号： H01J37/261 , G01B15/04 , G01N23/2251 , G03F1/36 , G03F7/70441 , G03F7/70625 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A pattern measurement device includes: a storage section storing mask edge data of a circuit pattern and image data obtained by imaging the circuit pattern; an SEM contour extracting section receiving the image data, SEM contour of the circuit pattern, and cause an exposure simulator to generate estimated SEM contour data of an estimated SEM contour on the basis of the mask edge data and SEM contour data of the extracted SEM contour; a shape classifying section receiving the mask edge data, the SEM contour data, and the estimated contour data to classify the SEM contour data and the estimated SEM contour data into a one-dimensionally shaped contour and a two-dimensionally shaped contour; and an SEM contour sampling section receiving the SEM contour data and the estimated SEM contour data to sample the SEM contour data on the basis of types of the one-dimensionally and two-dimensionally shaped contours.
摘要翻译：图案测量装置包括：存储部分，其存储电路图案的掩模边缘数据和通过对电路图案进行成像获得的图像数据; 接收图像数据的SEM轮廓提取部分，电路图案的SEM轮廓，并且使得曝光模拟器基于提取的SEM轮廓的掩模边缘数据和SEM轮廓数据来生成估计的SEM轮廓的估计的SEM轮廓数据 ; 接收掩模边缘数据的形状分类部分，SEM轮廓数据和估计的轮廓数据，以将SEM轮廓数据和估计的SEM轮廓数据分类成一维轮廓和二维轮廓; 以及SEM轮廓采样部，其接收SEM轮廓数据和估计的SEM轮廓数据，以基于一维和二维轮廓的类型对SEM轮廓数据进行采样。

7. 发明授权

US08959461B2 Pattern measurement device and pattern measurement method 有权
标题翻译：图案测量装置和图案测量方法
公开(公告)号：US08959461B2
公开(公告)日：2015-02-17
申请号：US14233003
申请日：2012-03-23
申请人： Takuma Shibahara , Michio Oikawa , Yutaka Hojo , Hitoshi Sugahara , Hiroyuki Shindo
发明人： Takuma Shibahara , Michio Oikawa , Yutaka Hojo , Hitoshi Sugahara , Hiroyuki Shindo
IPC分类号： G06F17/50 , H01J37/26 , G01B15/04 , G03F1/36 , H01L21/66 , G01N23/225
CPC分类号： H01J37/261 , G01B15/04 , G01N23/2251 , G03F1/36 , G03F7/70441 , G03F7/70625 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A pattern measurement device includes: a storage section storing mask edge data of a circuit pattern and image data obtained by imaging the circuit pattern; an SEM contour extracting section receiving the image data, SEM contour of the circuit pattern, and cause an exposure simulator to generate estimated SEM contour data of an estimated SEM contour on the basis of the mask edge data and SEM contour data of the extracted SEM contour; a shape classifying section receiving the mask edge data, the SEM contour data, and the estimated contour data to classify the SEM contour data and the estimated SEM contour data into a one-dimensionally shaped contour and a two-dimensionally shaped contour; and an SEM contour sampling section receiving the SEM contour data and the estimated SEM contour data to sample the SEM contour data on the basis of types of the one-dimensionally and two-dimensionally shaped contours.
摘要翻译：图案测量装置包括：存储部分，其存储电路图案的掩模边缘数据和通过对电路图案进行成像获得的图像数据; 接收图像数据的SEM轮廓提取部分，电路图案的SEM轮廓，并且使得曝光模拟器基于提取的SEM轮廓的掩模边缘数据和SEM轮廓数据来生成估计的SEM轮廓的估计的SEM轮廓数据 ; 接收掩模边缘数据的形状分类部分，SEM轮廓数据和估计的轮廓数据，以将SEM轮廓数据和估计的SEM轮廓数据分类成一维轮廓和二维轮廓; 以及SEM轮廓采样部，其接收SEM轮廓数据和估计的SEM轮廓数据，以基于一维和二维轮廓的类型对SEM轮廓数据进行采样。

8. 发明申请

US20080024601A1 Electron microscope 有权
标题翻译：电子显微镜
公开(公告)号：US20080024601A1
公开(公告)日：2008-01-31
申请号：US11699062
申请日：2007-01-29
申请人： Hidetoshi Sato , Takumichi Sutani , Yutaka Hojo
发明人： Hidetoshi Sato , Takumichi Sutani , Yutaka Hojo
IPC分类号： H04N9/47
CPC分类号： H01J37/28 , H01J2237/221 , H01J2237/2485 , H01J2237/2816 , H01J2237/2817
摘要： There is provided an electron microscope which is capable of making a significant contribution to accomplishment of efficiency in investigating causes for pattern abnormalities found out. The electron microscope including an I/O for capturing image data on a microscopic image acquired by another electron microscope, a computation processing unit for generating a display signal based on the image data on the microscopic image acquired by another electron microscope and captured via the I/O and image data on a microscopic image acquired by the electron microscope itself, in order that the microscopic image acquired by another electron microscope and the microscopic image acquired by the electron microscope itself are displayed at the same scale and under the same display condition, and a display unit for displaying both of the microscopic images based on the display signal from the computation processing unit.
摘要翻译：提供了一种电子显微镜，其能够对发现的图案异常的调查原因的效率的实现方面作出重大贡献。电子显微镜包括用于在由另一电子显微镜获取的显微镜图像上捕获图像数据的I / O，计算处理单元，用于根据由另一电子显微镜获取的显微图像上的图像数据产生显示信号，并通过I / O和通过电子显微镜本身获取的显微镜图像上的图像数据，以便通过另一电子显微镜获得的显微图像和由电子显微镜本身获取的显微图像以相同的尺度显示在相同的显示条件下，以及显示单元，用于基于来自计算处理单元的显示信号显示两个微观图像。

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