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    • 2. 发明授权
    • Components for a film-forming device and method for cleaning the same
    • 用于成膜装置的部件及其清洁方法
    • US08216654B2
    • 2012-07-10
    • US10538856
    • 2004-02-18
    • Akisuke HirataShinji IsodaYutaka KadowakiKatsuhiko Mushiake
    • Akisuke HirataShinji IsodaYutaka KadowakiKatsuhiko Mushiake
    • B23B3/02
    • C23C14/564C23C14/0005C23C16/4401C23C16/4404C23C16/4407C23C30/00C23F13/00C25F5/00Y10T428/12139Y10T428/12569Y10T428/21Y10T428/252Y10T428/256
    • There are provided a film forming equipment component having a structure in which an deposited film d formed on the component can be separated from the component for a time period shorter than the prior art to reduce damage due to a cleaning fluid S, and a method of cleaning such a component. A metal film layer 2 electrochemically less noble than the matrix metal material 1 of the aforementioned component is formed on the surface of the matrix metal material 1 through thermal spraying, vapor depositing, sputtering, laminating or other process. Alternatively, a second metal film layer 3 electrochemically more noble than the aforementioned matrix metal material 1 is formed on the surface of the metal film layer 2 through said thermal spraying or other process. Thus, a local cell is formed between the metal film layer 2 and the matrix metal material 1 or the second metal film layer 3. Therefore, the deposited film d can be separated from the matrix metal material 1 for an extremely shortened time period, without damaging the matrix metal material 1 itself from the cleaning fluid S.
    • 提供了一种成膜设备部件,其具有这样一种结构,其中在组件上形成的沉积膜d可以比现有技术短的时间段与部件分离,以减少由清洗液S引起的损坏的方法 清洗这样一个组件。 通过热喷涂,气相沉积,溅射,层压或其它工艺在基体金属材料1的表面上形成电化学上比上述组分的基体金属材料1更不贵的金属膜层2。 或者,通过所述热喷涂或其它工艺在金属膜层2的表面上形成比上述基体金属材料1电化学更高的第二金属膜层3。 因此,在金属膜层2和基体金属材料1或第二金属膜层3之间形成局部电池。因此,沉积膜d可以在极短的时间内与基体金属材料1分离,而没有 从清洗液S破坏基质金属材料1本身。
    • 4. 发明授权
    • Components for film forming device
    • 成膜装置用部件
    • US07436068B2
    • 2008-10-14
    • US10538087
    • 2004-01-22
    • Akisuke HirataShinji IsodaYutaka KadowakiKatsuhiko Mushiake
    • Akisuke HirataShinji IsodaYutaka KadowakiKatsuhiko Mushiake
    • H01L23/48H01L29/40
    • H01L21/6704C23C16/4407
    • Herein disclosed are a component of a film-forming device, in which a thin films is formed on a substrate using a film-forming material, whose surface structure makes any breakage, peeling off and/or falling off of a film adhered to the component quite difficult, while the structure permits easy removal of such an adhered film within a short period of time when cleaning the component as sell as a method for cleaning the component. A large number of through holes each extending from the back face to the top face of the component are formed for the penetration of a cleaning solution into the boundary between the component and a film of the film-forming material adhered to the surface of the component and formed during the formation of the foregoing thin film. This easily allows the peeling off and removal of the film adhered to the component within a short period of time as compared when the adhered film is dissolved only from the surface thereof.
    • 本文公开了一种成膜装置的组件,其中在使用成膜材料的基板上形成薄膜,其表面结构使得附着到部件上的膜的断裂,剥离和/或脱落 相当困难,而结构允许在清洁作为销售的部件作为清洁部件的方法的短时间内容易地去除这种粘附膜。 形成从组件的背面延伸到顶面的大量通孔,用于将清洁溶液渗透到粘附到部件表面的成膜材料和成膜材料的膜之间的边界中 并且在形成上述薄膜期间形成。 与粘附膜仅从其表面溶解的情况相比,容易在短时间内剥离和除去附着在部件上的膜。
    • 5. 发明申请
    • Film-forming apparatus component and method for cleaning same
    • 成膜装置部件及其清洗方法
    • US20060246735A1
    • 2006-11-02
    • US10538856
    • 2004-02-18
    • Akisuke HirataShinji IsodaYutaka KadowakiKatsuhiko Mushiake
    • Akisuke HirataShinji IsodaYutaka KadowakiKatsuhiko Mushiake
    • H01L21/302H01L21/461
    • C23C14/564C23C14/0005C23C16/4401C23C16/4404C23C16/4407C23C30/00C23F13/00C25F5/00Y10T428/12139Y10T428/12569Y10T428/21Y10T428/252Y10T428/256
    • There are provided a film forming equipment component having a structure in which an deposited film d formed on the component can be separated from the component for a time period shorter than the prior art to reduce damage due to a cleaning fluid S, and a method of cleaning such a component. A metal film layer 2 electrochemically less noble than the matrix metal material 1 of the aforementioned component is formed on the surface of the matrix metal material 1 through thermal spraying, vapor depositing, sputtering, laminating or other process. Alternatively, a second metal film layer 3 electrochemically more noble than the aforementioned matrix metal material 1 is formed on the surface of the metal film layer 2 through said thermal spraying or other process. Thus, a local cell is formed between the metal film layer 2 and the matrix metal material 1 or the second metal film layer 3. Therefore, the deposited film d can be separated from the matrix metal material 1 for an extremely shortened time period, without damaging the matrix metal material 1 itself from the cleaning fluid S.
    • 提供了一种成膜设备部件,其具有这样一种结构,其中在组件上形成的沉积膜d可以比现有技术短的时间段与部件分离,以减少由清洗液S引起的损坏的方法 清洗这样一个组件。 通过热喷涂,气相沉积,溅射,层压或其它工艺在基体金属材料1的表面上形成电化学上比上述组分的基体金属材料1更不贵的金属膜层2。 或者,通过所述热喷涂或其它工艺在金属膜层2的表面上形成比上述基体金属材料1电化学更高的第二金属膜层3。 因此,在金属膜层2和基体金属材料1或第二金属膜层3之间形成局部电池。 因此,沉积膜d可以在非常短的时间内与基体金属材料1分离,而不会使基体金属材料1本身从清洗流体S损伤。
    • 6. 发明申请
    • Components for film forming device and method of washing the component
    • 用于成膜装置的部件和洗涤部件的方法
    • US20060144418A1
    • 2006-07-06
    • US10538087
    • 2004-01-22
    • Akisuke HirataShinji IsodaYutaka KadowakiKatsuhiko Mushiake
    • Akisuke HirataShinji IsodaYutaka KadowakiKatsuhiko Mushiake
    • B08B6/00
    • H01L21/6704C23C16/4407
    • Herein disclosed are a component of a film-forming device, in which a thin films is formed on a substrate using a film-forming material, whose surface structure makes any breakage, peeling off and/or falling off of a film adhered to the component quite difficult, while the structure permits easy removal of such an adhered film within a short period of time when cleaning the component as sell as a method for cleaning the component. A large number of through holes each extending from the back face to the top face of the component are formed for the penetration of a cleaning solution into the boundary between the component and a film of the film-forming material adhered to the surface of the component and formed during the formation of the foregoing thin film. This easily allows the peeling off and removal of the film adhered to the component within a short period of time as compared when the adhered film is dissolved only from the surface thereof.
    • 本文公开了一种成膜装置的组件,其中在使用成膜材料的基板上形成薄膜,其表面结构使得附着到部件上的膜的断裂,剥离和/或脱落 相当困难,而结构允许在清洁作为销售的部件作为清洁部件的方法的短时间内容易地去除这种粘附膜。 形成从组件的背面延伸到顶面的大量通孔,用于将清洁溶液渗透到粘附到部件表面的成膜材料和成膜材料的膜之间的边界中 并且在形成上述薄膜期间形成。 与粘附膜仅从其表面溶解的情况相比,容易在短时间内剥离和除去附着在部件上的膜。