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    • 1. 发明授权
    • Method for processing silver halide photosensitive material including
the replenishing of washing water containing a chelating agent and a
controlled amount of calcium and magnesium compounds
    • 用于处理卤化银感光材料的方法,包括补充含有螯合剂的洗涤水和受控量的钙和镁化合物
    • US5034308A
    • 1991-07-23
    • US086790
    • 1987-08-19
    • Akira AbeYoshihiro FujitaToshio KoshimizuKazuhiro Aikawa
    • Akira AbeYoshihiro FujitaToshio KoshimizuKazuhiro Aikawa
    • G03C11/00G03C7/30G03C7/44
    • G03C7/44G03C7/3046
    • A method for processing silver halide photosensitive materials comprising developing an exposed silver halide photosensitive material, fixing the developed photosensitive material and then washing it with a washing water, the washing water used in the water washing process being replenished in an amount of 2 to 50 times the volume of liquid carried over by the photosensitive material from a bath preceding the water washing bath per unit area thereof, the amount of calcium and magnesium compounds present in the water washing bath being reduced to not more than 5 mg/l, respectively, on the basis of elemental calcium and magnesium and the washing water containing at least one chelating agent having a stability constant of a chelate, which is formed between the chelating agent and calcium or magnesium, of at least 6 is herein disclosed. The method makes it possible to suppress the increase in turbidity due to the proliferation of bacteria and molds in washing bath even when the processing is continuously conducted while substantially saving the amount of washing water and further provides an excellent processed photosensitive materials.
    • 一种用于处理卤化银感光材料的方法,包括曝光的卤化银感光材料的显影,固定显影的感光材料,然后用洗涤水清洗,水洗过程中使用的洗涤水的量为2至50倍 由感光材料从洗涤浴之前的浴中每单位面积的液体所携带的液体的体积,洗涤水中存在的钙和镁化合物的量分别减少到不超过5mg / l, 本文公开了元素钙和镁的基础以及含有至少一种螯合剂的至少一种螯合剂的洗涤水,螯合剂在螯合剂和钙或镁之间形成至少为6。 该方法即使在连续进行处理的同时可以抑制由于洗涤槽中的细菌和霉菌的增殖引起的浊度的增加,同时基本上节省了洗涤水的量并进一步提供了优良的加工感光材料。
    • 5. 发明授权
    • Benzimidazole compounds
    • 苯并咪唑化合物
    • US06787561B1
    • 2004-09-07
    • US10019668
    • 2002-06-05
    • Kozo AokiKazuhiro AikawaMasayuki KawakamiYongzhe Yan
    • Kozo AokiKazuhiro AikawaMasayuki KawakamiYongzhe Yan
    • A61K314439
    • C07D401/12C07D235/28C07D403/12C07D413/12C07D417/12
    • A benzimidazole compound or a salt thereof which has an inhibitory action of forming of macrophages and is useful as an active ingredient of an orally available medicament for preventive and/or therapeutic treatment of arteriosclerosis, which is represented by the formula (I): wherein, R1 represents one or more functional groups on the benzene ring selected from the group consisting of hydrogen atom, a halogen atom, a lower alkyl group and a lower alkoxy group; R2 represents hydrogen atom, an alkyl group or an acyl group; L represents a C4-C8 alkylene group or an ethyleneoxy linking group represented as (CH2CH2O)nCH2CH2 wherein n represents 1 or 2; X represents O or NH; Y represents S or a single bond; and Q represents a 5- or 6-membered heterocyclic group which may have a functional group on the ring.
    • 具有抑制巨噬细胞形成作用的苯并咪唑化合物或其盐,可用作由式(I)表示的用于预防和/或治疗动脉硬化的口服药物的活性成分:其中, R 1表示选自氢原子,卤素原子,低级烷基和低级烷氧基的苯环上的一个或多个官能团; R 2表示氢原子,烷基或酰基; L表示作为(CH 2 CH 2 O)n CH 2 CH 2表示的C 4 -C 8亚烷基或亚乙氧基连接基,其中n表示1或2; X表示O或NH; Y表示S或单键; Q表示在环上可具有官能团的5或6元杂环基。
    • 10. 发明授权
    • Silver halide photographic material
    • US4923790A
    • 1990-05-08
    • US247565
    • 1988-09-22
    • Hirohiko KatoKeiji MihayashiKazuhiro Aikawa
    • Hirohiko KatoKeiji MihayashiKazuhiro Aikawa
    • G03C1/37G03C7/26
    • G03C1/37
    • A silver halide photographic material composed of a support having thereon at least one light-sensitive silver halide emulsion layer, wherein the material contains the combination of (i) at least one compound represented by formula (I) and (ii) and at least one compound represented by formulae (II) and/or (III): ##STR1## wherein R.sub.1 represents hydrogen, an alkyl group, an aryl group or an aralkyl group; X represents a halogen atom, a nitro group, a hydroxyl group, a cyano group, a lower alkyl group, a lower alkoxy group, --COR.sub.2, ##STR2## or --SO.sub.3 M; R.sub.2 represents hydrogen, --OM, a lower alkyl group, an aryl group, an aralkyl group, a lower alkoxy group, an aryloxy group, an aralkyloxy group or ##STR3## R.sub.3 and R.sub.4 each represents hydrogen, a lower alkyl group, an aryl group, an aralkyl group, --COR.sub.7 or --SO.sub.2 R.sub.7 ; R.sub.5 and R.sub.6 each represents hydrogen, a lower alkyl group, an aryl group or an aralkyl group; R.sub.7 represents a lower alkyl group, an aryl group or an aralkyl group, M represents hydrogen, an alkali metal atom or atoms necessary for forming a monovalent cation, m represents 0 or an integer of 1 to 4, n represents 0 or an integer of 1 to 4, and Z represents an atomic group necessary for forming a thiazolyl ring; ##STR4## where in R.sub.8 represents a lower alkylene group, X is the same as X in formula (I), p represents 0 or 1, and q represents 0 or an integer of 1 to 5; ##STR5## wherein R.sub.9 represents hydrogen, an alkyl group, an alkenyl group, an aralkyl group, an aryl group, a heterocyclic group, ##STR6## R.sub.10 and R.sub.11 each represents hydrogen, an alkyl group, an aryl group, a cyano group, a heterocyclic group, an alkylthio group, an arylthio group, an alkylsulfonyloxy group or an alkylsulfonyl group; R.sub.10 and R.sub.11 may be linked to form an aromatic ring; and R.sub.12 and R.sub.13 each represents hydrogen, an alkyl group, an aryl group or an aralkyl group. The material has superior antifungal and antibacterial properties.