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1. 发明授权

US06964832B2 Semiconductor device and manufacturing method thereof 失效
标题翻译：半导体装置及其制造方法
公开(公告)号：US06964832B2
公开(公告)日：2005-11-15
申请号：US10374096
申请日：2003-02-27
申请人： Akemi Moniwa , Jiro Yamamoto , Fumio Murai , Hiroshi Fukuda
发明人： Akemi Moniwa , Jiro Yamamoto , Fumio Murai , Hiroshi Fukuda
IPC分类号： G03F1/20 , G03F1/68 , G03F7/20 , H01L21/027 , G03F9/00 , G03C5/00
CPC分类号： G03F1/20 , H01J2237/31794 , Y10S430/143
摘要： A method is provided for solving a problem that the fine processing property is degraded by an increase of a current applied to complementarily divided masks in an electron beam projection process. In the method, the complementarily divided masks used for electron projection are used whereby one mask is used for patterns requiring high dimensional accuracy and another is used for other patterns. Consequently, it is possible to lower the current applied to the patterns requiring high dimensional accuracy to realize high printing accuracy. In addition, the highly accurate patterns can be formed at a high throughput.
摘要翻译：提供了一种解决在电子束投影处理中通过施加到互补分割掩模的电流的增加而使精细加工性能劣化的问题的方法。在该方法中，使用用于电子投影的互补分割的掩模，其中一个掩模用于需要高尺寸精度的图案，另一个掩模用于其它图案。因此，可以降低施加到需要高尺寸精度的图案的电流，以实现高的打印精度。此外，可以以高产量形成高精度图案。

2. 发明授权

US06586341B2 Method of manufacturing semiconductor device 失效
公开(公告)号：US06586341B2
公开(公告)日：2003-07-01
申请号：US10083417
申请日：2002-02-27
申请人： Akemi Moniwa , Hiroshi Fukuda , Fumio Murai
发明人： Akemi Moniwa , Hiroshi Fukuda , Fumio Murai
IPC分类号： H01L21302
CPC分类号： G03F1/20 , Y10S438/945 , Y10S438/95
摘要： To provide a method of manufacturing a semiconductor device for manufacturing a minute pattern with high accuracy using a stencil mask. An input layout data is classified into rectangles according to pattern width or the like, a boundary is created that divides a periphery or an inside of each classified graphics, an input pattern is fractionized by the boundary, and a complementary mask with fractionized patterns on both sides of the boundary distributed into different layers is used to form a pattern.

3. 发明授权

US06787459B2 Method for fabricating a semiconductor device 有权
标题翻译：半导体器件的制造方法
公开(公告)号：US06787459B2
公开(公告)日：2004-09-07
申请号：US10294700
申请日：2002-11-15
申请人： Akemi Moniwa , Takuya Hagiwara , Keitaro Katabuchi , Hiroshi Fukuda , Mineko Adachi
发明人： Akemi Moniwa , Takuya Hagiwara , Keitaro Katabuchi , Hiroshi Fukuda , Mineko Adachi
IPC分类号： H01C2144
CPC分类号： G03F1/70 , G03F1/26 , Y10S438/942
摘要： There is provided a method of fabricating a semiconductor device whereby fine patterns are formed with high dimensional accuracy by means of multiple exposures, using a phase shift mask and a trim mask. Phases are periodically assigned to shifter patterns within a given range from patterns generated with the phase shift mask, respectively.
摘要翻译：提供一种制造半导体器件的方法，由此通过使用相移掩模和修剪掩模，通过多次曝光以高尺寸精度形成精细图案。相位分别定期地分配给给定范围内的移相器图案，从用相移掩模生成的图案。

4. 发明授权

US5895741A Photomask, manufacture of photomask, formation of pattern, manufacture of semiconductor device, and mask pattern design system 失效
标题翻译：光掩模，光掩模的制造，图案的形成，半导体器件的制造和掩模图案设计系统
公开(公告)号：US5895741A
公开(公告)日：1999-04-20
申请号：US906162
申请日：1997-08-05
申请人： Norio Hasegawa , Tsuneo Terasawa , Hiroshi Fukuda , Katsuya Hayano , Akira Imai , Akemi Moniwa , Shinji Okazaki
发明人： Norio Hasegawa , Tsuneo Terasawa , Hiroshi Fukuda , Katsuya Hayano , Akira Imai , Akemi Moniwa , Shinji Okazaki
IPC分类号： G03F1/00 , G03F1/26 , G03F1/32 , G03F1/36 , G03F7/20 , G03F9/00
CPC分类号： G03F1/32 , G03F1/26 , G03F1/36 , G03F7/70283 , G03F7/70433
摘要： A photomask used for printing a mask pattern by projection optics, in which a main pattern formed of a transparent area is provided in a semitransparent area formed of a semitransparent film and a phase shifter, and the phase angles of light beams passing through respective areas are different from each other substantially by 180.degree.. The photomask is intended to prevent a reduction in a production yield due to a resolution failure of the photomask, and to prevent generation of an unnecessary projected image. In this photomask, a transparent auxiliary pattern having the same phase angle of light as that of the transparent area is disposed around a main pattern formed of the transparent area, and a distance D between the center or a desired center line of the main pattern and that of the auxiliary pattern satisfies the relationship of D=b.lambda./NAm , where NAm is a mask-side numerical aperture of a projection lens, .lambda. is a wavelength of exposure light, and is a coefficient in the range of 1.35
摘要翻译：用于通过投影光学器件印制掩模图案的光掩模，其中由透明区域形成的半透明区域设置在由半透明膜和移相器形成的半透明区域中，并且通过各个区域的光束的相位角为彼此相差180度。光掩模旨在防止由于光掩模的分辨率故障导致的产量降低，并且防止产生不必要的投影图像。在该光掩模中，具有与透明区域相同的相位相位角的透明辅助图案设置在由透明区域形成的主图案周围，并且主图案的中心或期望中心线之间的距离D和辅助图案的图案满足D =bλ/ NAm的关系，其中NAm是投影透镜的掩模侧数值孔径，λ是曝光光的波长，并且b是1.35的范围内的系数

5. 发明授权

US5700601A Photomask, manufacture of photomask, formation of pattern, manufacture of semiconductor device, and mask pattern design system 失效
标题翻译：光掩模，光掩模的制造，图案的形成，半导体器件的制造和掩模图案设计系统
公开(公告)号：US5700601A
公开(公告)日：1997-12-23
申请号：US495836
申请日：1995-06-28
申请人： Norio Hasegawa , Tsuneo Terasawa , Hiroshi Fukuda , Katsuya Hayano , Akira Imai , Akemi Moniwa , Shinji Okazaki
发明人： Norio Hasegawa , Tsuneo Terasawa , Hiroshi Fukuda , Katsuya Hayano , Akira Imai , Akemi Moniwa , Shinji Okazaki
IPC分类号： G03F1/00 , G03F1/26 , G03F1/32 , G03F1/36 , G03F7/20 , G03F9/00
CPC分类号： G03F1/32 , G03F1/26 , G03F1/36 , G03F7/70283 , G03F7/70433
摘要： A photomask used for printing a mask pattern by projection optics, in which a main pattern formed of a transparent area is provided in a semitransparent area formed of a semitransparent film and a phase shifter, and the phase angles of light beams passing through respective areas are different from each other substantially by 180.degree.. The photomask is intended to prevent a reduction in a production yield due to a resolution failure of the photomask, and to prevent generation of an unnecessary projected image. In this photomask, a transparent auxiliary pattern having the same phase angle of light as that of the transparent area is disposed around a main pattern formed of the transparent area, and a distance D between the center or a desired center line of the main pattern and that of the auxiliary pattern satisfies the relationship of D=b.lambda./NAm , where NAm is a mask-side numerical aperture of a projection lens, .lambda. is a wavelength of exposure light, and is a coefficient in the range of 1.35
摘要翻译：用于通过投影光学器件打印掩模图案的光掩模，其中由透明区域形成的半透明区域设置在由半透明膜和移相器形成的半透明区域中，并且通过各个区域的光束的相位角为彼此相差180度。光掩模旨在防止由于光掩模的分辨率故障导致的产量降低，并且防止产生不必要的投影图像。在该光掩模中，具有与透明区域相同的相位相位角的透明辅助图案设置在由透明区域形成的主图案周围，并且主图案的中心或期望中心线之间的距离D和辅助图案的图案满足D =bλ/ NAm的关系，其中NAm是投影透镜的掩模侧数值孔径，λ是曝光光的波长，并且b是1.35的范围内的系数

6. 发明授权

US06845497B2 Method for fabrication of patterns and semiconductor devices 失效
标题翻译：图案和半导体器件的制造方法
公开(公告)号：US06845497B2
公开(公告)日：2005-01-18
申请号：US10288421
申请日：2002-11-06
申请人： Fumio Murai , Hiroshi Fukuda
发明人： Fumio Murai , Hiroshi Fukuda
IPC分类号： G03F1/20 , G03F1/68 , G03F7/20 , G06F17/50 , H01J37/302 , H01L21/027
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03F1/78 , H01J37/3026 , H01J2237/31764 , H01J2237/31769
摘要： Patterns for exposure are divided into subdivided regions taking into consideration a scope of an effect of backscattering, the Coulomb effect, and process factors, respectively, on errors in dimensions, and a pattern area occupancy ratio (pattern area density) within the respective subdivided regions is retained, thereby executing exposure with patterns after finding dimensions of pattern modification as the function of the respective pattern area densities. As a result, it becomes possible to fabricate a mask provided with correction for the errors in the dimensions, caused by plural factors such as backscattering, the Coulomb effect, and process factors, and to obtain highly accurate patterns for exposure. Further, use of pattern area density maps enables data processing time necessary for correction to be considerably reduced.
摘要翻译：考虑到分散区域的反向散射效应，库仑效应和工艺因素的范围分别为尺寸误差和各个细分区域内的图案面积占有率（图案面积密度）的范围，将其划分为细分区域被保持，从而在找到图案修改的尺寸之后，以各图案区域密度的函数来执行图案的曝光。结果，可以制造由诸如后向散射，库仑效应和工艺因素等多种因素引起的尺寸误差校正的掩模，并获得高精度的曝光图案。此外，使用图案区域密度映射使得校正所需的数据处理时间显着减少。

7. 发明授权

US08992239B2 Lever fitting-type connector 有权
标题翻译：杠杆接头型连接器
公开(公告)号：US08992239B2
公开(公告)日：2015-03-31
申请号：US13634729
申请日：2011-09-06
申请人： Yoshinobu Furuya , Hirotaka Hasegawa , Hiroshi Fukuda
发明人： Yoshinobu Furuya , Hirotaka Hasegawa , Hiroshi Fukuda
IPC分类号： H01R13/62 , F23G5/08 , C03B5/00 , C03B5/06 , F23G7/00 , F23J1/08
CPC分类号： F23G5/085 , C03B5/005 , C03B5/06 , F23G7/00 , F23G2202/20 , F23G2204/201 , F23G2209/18 , F23J1/08 , H01R13/62905 , H01R13/62938 , H01R13/62966 , H01R13/701 , H01R2201/26
摘要： A lever fitting-type connecter of the present invention has housing having a main body and a pair of projections; a lever having holes into which the projections are inserted, the lever rotated in a state that the projections are inserted into the holes from a non-fitting position before being fitted to another connector to a fitting position fitted to the other connector by rotating around the projection; an engagement receiving portion arranged in the projection so as to sandwich the lever between the main body and the engagement receiving portion; a first overlapping position arranged in the lever and overlapped with the engagement receiving portion at the non-fitting position; a second overlapping position arranged in the lever and overlapped with the engagement receiving portion at the fitting position; and an engaging portion arranged between the first and second overlapping positions and engaged to the engagement receiving portion.
摘要翻译：本发明的杠杆装配型连接器具有主体和一对突起的壳体; 具有孔的杠杆具有插入其中的孔，所述杆在安装到另一连接器之前从突出件从非装配位置插入孔中的状态旋转到通过围绕所述另一连接器旋转的配合位置投影; 布置在所述突起中以将所述杠杆夹在所述主体和所述接合接收部之间的接合接收部; 第一重叠位置布置在杠杆中并且在非装配位置处与接合接收部分重叠; 布置在所述杆中并在所述装配位置处与所述接合部分重叠的第二重叠位置; 以及布置在第一和第二重叠位置之间并且接合到接合接收部分的接合部分。

8. 发明授权

US08611082B2 Storage device 有权
标题翻译：储存设备
公开(公告)号：US08611082B2
公开(公告)日：2013-12-17
申请号：US13325116
申请日：2011-12-14
申请人： Toshihiro Arisaka , Daisuke Matsuka , Hiroshi Fukuda , Morihiro Waizumi , Kouichirou Kinoshita , Naoki Wada
发明人： Toshihiro Arisaka , Daisuke Matsuka , Hiroshi Fukuda , Morihiro Waizumi , Kouichirou Kinoshita , Naoki Wada
IPC分类号： G06F1/16
CPC分类号： G06F1/187
摘要： A storage device having a plurality of recording devices in which a decrease in vibrations from the recording devices can be achieved with a small number of parts. A storage device having a plurality of recording devices mounted therein includes a handle for inserting and withdrawing the recording device into and out of the storage device. Two holding members each include a mounting portion where the recording device is mounted and a frame extending from the mounting portion to the handle. Two protrusions are formed to extend inwardly of a region surrounded by the recording device, the handle, and the two frames. A restriction plate is disposed so as to overlap the respective surfaces of the two protrusions; and a viscoelastic body is disposed at the overlapping portion for joining the two protrusions and the restriction plate to one another.
摘要翻译：一种具有多个记录装置的存储装置，其中可以以少量的部件实现来自记录装置的振动的减少。具有安装在其中的多个记录装置的存储装置包括用于将记录装置插入和退出存储装置的手柄。两个保持构件各自包括安装记录装置的安装部分和从安装部分延伸到手柄的框架。两个突起形成为在由记录装置，手柄和两个框架围绕的区域的内部延伸。限制板设置成与两个突起的各个表面重叠; 并且在重叠部分处设置有粘弹性体，用于将两个突起和限制板彼此接合。

9. 发明申请

US20130017697A1 LEVER FITTING-TYPE CONNECTOR 有权
标题翻译：杠杆配件式连接器
公开(公告)号：US20130017697A1
公开(公告)日：2013-01-17
申请号：US13634729
申请日：2011-09-06
申请人： Yoshinobu Furuya , Hirotaka Hasegawa , Hiroshi Fukuda
发明人： Yoshinobu Furuya , Hirotaka Hasegawa , Hiroshi Fukuda
IPC分类号： H01R13/62
CPC分类号： F23G5/085 , C03B5/005 , C03B5/06 , F23G7/00 , F23G2202/20 , F23G2204/201 , F23G2209/18 , F23J1/08 , H01R13/62905 , H01R13/62938 , H01R13/62966 , H01R13/701 , H01R2201/26
摘要： A lever fitting-type connecter of the present invention has housing having a main body and a pair of projections; a lever having holes into which the projections are inserted, the lever rotated in a state that the projections are inserted into the holes from a non-fitting position before being fitted to another connector to a fitting position fitted to the other connector by rotating around the projection; an engagement receiving portion arranged in the projection so as to sandwich the lever between the main body and the engagement receiving portion; a first overlapping position arranged in the lever and overlapped with the engagement receiving portion at the non-fitting position; a second overlapping position arranged in the lever and overlapped with the engagement receiving portion at the fitting position; and an engaging portion arranged between the first and second overlapping positions and engaged to the engagement receiving portion.
摘要翻译：本发明的杠杆装配型连接器具有主体和一对突起的壳体; 具有孔的杠杆具有插入其中的孔，所述杆在安装到另一连接器之前从突出件从非装配位置插入孔中的状态旋转到通过围绕所述另一连接器旋转的配合位置投影; 布置在所述突起中以将所述杠杆夹在所述主体和所述接合接收部之间的接合接收部; 第一重叠位置布置在杠杆中并且在非装配位置处与接合接收部分重叠; 布置在所述杆中并在所述装配位置处与所述接合部分重叠的第二重叠位置; 以及布置在第一和第二重叠位置之间并且接合到接合接收部分的接合部分。

10. 发明授权

US08264543B2 Radiation image capturing system for controlling a plurality of image capturing apparatuses 有权
标题翻译：用于控制多个图像捕获装置的辐射图像捕获系统
公开(公告)号：US08264543B2
公开(公告)日：2012-09-11
申请号：US12385151
申请日：2009-03-31
申请人： Daiki Harada , Naoki Mochizuki , Yasunori Ohta , Hiroshi Fukuda , Kazuharu Ueta , Eiichi Kito , Naoyuki Nishino
发明人： Daiki Harada , Naoki Mochizuki , Yasunori Ohta , Hiroshi Fukuda , Kazuharu Ueta , Eiichi Kito , Naoyuki Nishino
IPC分类号： H04N5/30
CPC分类号： A61B6/00 , A61B6/4216 , A61B6/4488 , A61B6/563 , G01T1/2014 , G06F19/321 , H04N1/00204 , H04N1/00347 , H04N1/00973 , H04N2201/0039 , H04N2201/0075 , H04N2201/0079 , H04N2201/0412
摘要： A radiation image capturing system includes at least one image capturing apparatus including a radiation detector, at least one image capturing apparatus including a stimulable phosphor panel for generating radiation image information, which is readable by an image reading apparatus, and at least one control device for controlling at least the image capturing apparatus and the image reading apparatus based on image capturing instruction information supplied from an external source. The control device includes a change setting unit for changing settings of the image capturing instruction information depending on whether the image capturing apparatus and the image reading apparatus are usable or not, and a controller for controlling the image capturing apparatus and the image reading apparatus based on the changed settings of the image capturing instruction information.
摘要翻译：一种放射线图像捕获系统包括至少一个包括放射线检测器的图像捕获装置，至少一个图像捕获装置，包括用于产生可由图像读取装置读取的辐射图像信息的可刺激荧光屏，以及至少一个控制装置，基于从外部源提供的图像捕获指令信息，至少控制图像捕获装置和图像读取装置。控制装置包括：改变设定单元，用于根据图像拍摄装置和图像读取装置是否可用来改变图像拍摄指示信息的设置;以及控制器，用于基于图像捕获装置和图像读取装置进行控制改变了图像捕获指令信息的设置。

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