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1. 发明授权

US5422723A Diffraction gratings for submicron linewidth measurement 失效
$Diffraction gratings for submicron linewidth measurement$
标题翻译：用于亚微米线宽测量的衍射光栅
公开(公告)号：US5422723A
公开(公告)日：1995-06-06
申请号：US948194
申请日：1992-09-21
申请人： Ajit P. Paranjpe , Phillip Chapados, Jr. , Jimmy W. Hosch
发明人： Ajit P. Paranjpe , Phillip Chapados, Jr. , Jimmy W. Hosch
IPC分类号： G01B11/02 , G02B5/18 , H01L21/302 , H01L21/306 , H01L21/3065 , G01B9/02
CPC分类号： G01B11/02
摘要： A test structure and a method of using it for measuring submicron linewidths. Diffraction gratings are made with lines having an unknown linewidth. The grating has a pitch comprises of multiple lines and multiple spaces. This permits a wider "effective pitch" resulting in an increased number of observable diffraction orders. Each order provides an intensity measurement, which can be substituted into a diffraction intensity equation in which intensity is a function of linewidth and other unknown variables. At least as many intensity measurements are obtained as are unknown variables so that a system of equations can be solved for the linewidth. In practice, if the grating lines are made in the same manner as other lines of a product, the width of the latter can be inferred.
摘要翻译：测试结构及其用于测量亚微米线宽的方法。衍射光栅由具有未知线宽的线制成。光栅具有包括多条线和多个空间的间距。这允许更宽的“有效间距”导致可观察的衍射级数的增加。每个顺序都提供强度测量，可以用衍射强度方程来代替强度是线宽和其他未知变量的函数。至少获得与未知变量一样多的强度测量，以便可以求解线宽系数。实际上，如果光栅线以与产品的其它线相同的方式制造，则可以推断后者的宽度。

2. 发明授权

US5361137A Process control for submicron linewidth measurement 失效
标题翻译：亚微米线宽测量的过程控制
公开(公告)号：US5361137A
公开(公告)日：1994-11-01
申请号：US938078
申请日：1992-08-31
申请人： Thomas J. Aton , Phillip Chapados, Jr. , Jimmy W. Hosch , Ajit P. Paranjpe
发明人： Thomas J. Aton , Phillip Chapados, Jr. , Jimmy W. Hosch , Ajit P. Paranjpe
IPC分类号： G01B11/02 , G01B9/02
CPC分类号： G01B11/02
摘要： A method and apparatus for measuring submicron linewidths, using diffraction gratings. A set of "fixed-linewidth variable-pitchwidth" test gratings has a number of gratings, each grating having the same linewidth but having different pitchwidths. These gratings are illuminated to form diffraction patterns. A set of peak intensities of the first or second order diffraction image from each grating is recorded. Either of these intensity values forms a curve around an extrema, which represents the intensity from a grating whose pitchwidth is equal to one-half the linewidth.
摘要翻译：使用衍射光栅测量亚微米线宽的方法和装置。一组“固定线宽可变 - 宽度”测试光栅具有多个光栅，每个光栅具有相同的线宽但具有不同的节距。这些光栅被照亮以形成衍射图案。记录来自每个光栅的一阶或二阶衍射图像的一组峰值强度。这些强度值中的任一个形成围绕极值的曲线，其表示其间距宽度等于线宽的一半的光栅的强度。

3. 发明授权

US5653838A Glass heating and sealing system 失效
标题翻译：玻璃加热密封系统
公开(公告)号：US5653838A
公开(公告)日：1997-08-05
申请号：US535423
申请日：1995-09-28
申请人： Ming-Jang Hwang , Chi-Cheong Shen , Cecil J. Davis , Robert T. Matthews , Phillip Chapados, Jr.
发明人： Ming-Jang Hwang , Chi-Cheong Shen , Cecil J. Davis , Robert T. Matthews , Phillip Chapados, Jr.
IPC分类号： C03B23/24 , C03B29/02 , H01J9/26 , B32B31/24
CPC分类号： C03B23/245 , C03B29/02 , H01J9/261 , Y02P40/57
摘要： A glass heating and sealing system (10, 30, 60) and method for manufacturing a flat panel display including anode and cathode glass panels with a vacuum compartment between them includes a plurality of vacuum chambers (12, 14, 16, 18, 20, 32, 34, 36, 38, 61, 76) for processing glass panels (39, 63, 74). Transfer of glass panels (39, 63, 74) between chambers (12, 14, 16, 18, 20, 32, 34, 36, 38, 61, 76) is accomplished by a transfer mechanism (24, 42, 68, 72) located within a central vacuum chamber (22, 40, 70) commonly connected to the other chambers. System (10, 30, 60) may include a rapid thermal processing (RTP) chamber (14, 34, 38, 76) for quick and even heating of the panels (39, 63, 74). System (10) includes an e-beam bombardment chamber (16) for preconditioning the anode glass panels, and a heating chamber (18) for fusing anode glass panels to cathode glass panels. Different levels of vacuum may be established in different chambers.
摘要翻译：一种玻璃加热和密封系统（10,30,60）以及用于制造平板显示器的方法，包括在它们之间具有真空室的阳极和阴极玻璃面板包括多个真空室（12,14,16,18,20， 32,34,36,38,61,76），用于加工玻璃面板（39,63,74）。在室（12,14,16,18,20,32,34,36,38,61,76）之间转移玻璃面板（39,63,74）由转印机构（24,42,68,72 ）位于通常连接到其它室的中央真空室（22,40,70）内。系统（10,30,60）可以包括用于快速并均匀加热面板（39,63,74）的快速热处理（RTP）室（14,34,38,76）。系统（10）包括用于预处理阳极玻璃面板的电子束轰击室（16）和用于将阳极玻璃面板熔合到阴极玻璃面板的加热室（18）。可以在不同的室中建立不同程度的真空。

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