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1. 发明申请

US20030144499A1 Photocleavable protecting groups and methods for their use 失效
标题翻译：可透光保护组及其使用方法
公开(公告)号：US20030144499A1
公开(公告)日：2003-07-31
申请号：US10348917
申请日：2003-01-22
申请人： Affymetrix, Inc.
发明人： Glenn H. McGall , Ngo Q. Nam , Richard P. Rava
IPC分类号： C07H021/04 , C07H019/16 , C07H019/06 , C07H019/067 , C07H019/073 , C07H019/09
CPC分类号： C07H21/00 , B01J2219/00432 , C07B2200/11 , C07H19/10 , C07H19/20 , C07H19/207 , C07K1/061 , C40B40/04 , C40B50/14 , C40B60/14 , G01N33/54353 , Y02P20/55
摘要： Novel compounds are provided which are useful as linking groups in chemical synthesis, preferably in the solid phase synthesis of oligonucleotides and polypeptides. These compounds are generally photolabile and comprise protecting groups which can be removed by photolysis to unmask a reactive group. The protecting group has the general formula ArnullC(R1)(R2)nullOnullC(O)null wherein: Ar is an optionally substituted fused polycyclic aryl or heteroaromatic group or a vinylogous derivative thereof; R1 and R2 are independently H, optionally substituted alkyl, alkenyl or alkynyl, optionally substituted aryl or optionally substituted heteroaromatic, or a vinylogous derivative of the foregoing; and X is a leaving group, a chemical fragment linked to ArnullC(R1)(R2)nullOnullC(O)null via a heteroatom, or a solid support; provided that when Ar is 1-pyrenyl and R1 and R2 are H, X is not linked to ArnullC(R1)(R2)nullOnullC(O)null via a nitrogen atom. Preferred embodiments are those in which Ar is a fused polycyclic aromatic hydrocarbon and in which the substituents on Ar, R1 and R2 are electron donating groups. A particularly preferred protecting group is the nullPYMOCnull protecting group, pyrenylmethyloxycarbonyl, where Ar is pyrenyl and R1 and R2 are H. Also provided is a method of forming, from component molecules, a plurality of compounds on a support, each compound occupying a separate predefined region of the support, using the protected compounds described above.
摘要翻译：提供了新的化合物，其可用作化学合成中的连接基团，优选在寡核苷酸和多肽的固相合成中。这些化合物通常是光不稳定的并且包括可以通过光解去除以揭示反应性基团的保护基团。保护基具有通式Ar-C（R 1）（R 2）-O-C（O） - ，其中：Ar是任选取代的稠合多环芳基或杂芳族基团或其杂原子衍生物; R 1和R 2独立地为H，任选取代的烷基，烯基或炔基，任选取代的芳基或任选取代的杂芳族化合物，或前述的乙烯衍生物; X是离去基团，经由杂原子连接到Ar-C（R 1）（R 2）-O-C（O） - 或固体载体上的化学片段; 条件是当Ar为1-芘基且R 1和R 2为H时，X不能通过氮原子与Ar-C（R 1）（R 2）-O-C（O） - 连接。优选的实施方案是其中Ar是稠合多环芳烃并且其中Ar，R 1和R 2上的取代基是给电子基团的实施方案。特别优选的保护基是“PYMOC”保护基，芘基甲氧基羰基，其中Ar是芘基，R 1和R 2是H.还提供了一种从组分分子在载体上形成多种化合物的方法，每种化合物占据使用上述保护的化合物分离预定区域的载体。

2. 发明申请

US20040171167A1 Chip-in-a-well scanning 审中-公开
标题翻译：芯片在一个井的扫描
公开(公告)号：US20040171167A1
公开(公告)日：2004-09-02
申请号：US10733926
申请日：2003-12-11
申请人： Affymetrix, INC.
发明人： Melvin Yamamoto , Stephen P. A. Fodor , Richard P. Rava
IPC分类号： G01N021/03
CPC分类号： B01L3/5085 , B01L2300/0636 , B01L2300/0829 , C12Q1/6837 , C12Q2537/143
摘要： In one embodiment of the invention, methods and apparatus for packaging microarray suspended in a well of a well plate are provided. In another embodiment of the invention, microarrays can be successfully scanned with its target surface up or down.
摘要翻译：在本发明的一个实施例中，提供了用于包装悬浮在孔板的孔中的微阵列的方法和装置。在本发明的另一个实施方案中，可以成功地扫描微阵列，其目标表面向上或向下扫描。

3. 发明申请

US20020147319A1 Printing oligonucleotide arrays 失效
标题翻译：打印寡核苷酸阵列
公开(公告)号：US20020147319A1
公开(公告)日：2002-10-10
申请号：US09841405
申请日：2001-04-24
申请人： Affymetrix, Inc.
发明人： R. Fabian Pease , Glenn McGall , Martin J. Goldberg , Richard P. Rava , Stephen P.A. Fodor , Virginia Goss , Lubert Stryer , James L. Winkler
IPC分类号： C07H021/04 , B05D003/00
CPC分类号： G03F7/00 , B01J19/0046 , B01J2219/00378 , B01J2219/00382 , B01J2219/00385 , B01J2219/00427 , B01J2219/00432 , B01J2219/00454 , B01J2219/00527 , B01J2219/00529 , B01J2219/00585 , B01J2219/0059 , B01J2219/00596 , B01J2219/00605 , B01J2219/00608 , B01J2219/00612 , B01J2219/00626 , B01J2219/00637 , B01J2219/00659 , B01J2219/00689 , B01J2219/00711 , B01J2219/00722 , B01J2219/00725 , B41M3/00 , B82Y30/00 , C07B2200/11 , C07H21/00 , C07K1/047 , C40B40/06 , C40B40/10 , C40B50/14 , C40B60/14
摘要： A method and apparatus for selectively applying a print material onto a substrate for the synthesis of an array of oligonucleotides at selected regions of a substrate. The print material includes a barrier material, a monomer sequence, a nucleoside, a deprotection agent, a carrier material, among other materials. The method and apparatus also relies upon standard DMT based chemistry, and a vapor phase deprotection agent such as solid TCA and the like.
摘要翻译：一种用于选择性地将印刷材料施加到基底上以在基底的选定区域合成寡核苷酸阵列的方法和装置。印刷材料包括阻挡材料，单体序列，核苷，去保护剂，载体材料等。该方法和装置还依赖于基于标准的基于DMT的化学，以及气相脱保护剂如固体TCA等。

4. 发明申请

US20040105932A1 Substrate preparation process 审中-公开
标题翻译：基材制备工艺
公开(公告)号：US20040105932A1
公开(公告)日：2004-06-03
申请号：US10722032
申请日：2003-11-25
申请人： Affymetrix, Inc.
发明人： Martin Goldberg , Martin Diggelman , Earl Hubbell , Glenn McGall , Nam Quoc Ngo , MacDonald Morris , Mel Yamamoto , Jennifer Tan , Richard P. Rava
IPC分类号： A61L002/00 , B05D003/00
CPC分类号： C07K1/047 , B01J19/0046 , B01J2219/00432 , B01J2219/00527 , B01J2219/00529 , B01J2219/00585 , B01J2219/0059 , B01J2219/00596 , B01J2219/00605 , B01J2219/00608 , B01J2219/00612 , B01J2219/00617 , B01J2219/00626 , B01J2219/00637 , B01J2219/00641 , B01J2219/00659 , B01J2219/00689 , B01J2219/00711 , B01J2219/00722 , B01J2219/00725 , B82Y30/00 , C07B2200/11 , C07H21/00 , C40B40/06 , C40B40/10 , C40B60/14
摘要： The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
摘要翻译：本发明提供了用于大规模制备聚合物序列阵列的新方法，其中每个阵列包括具有已知单体序列的多个不同的位置不同的聚合物序列。本发明的方法将高通量处理步骤与高分辨率光刻技术结合在聚合物阵列的制造中。

5. 发明申请

US20040265838A1 Method of manufacturing 审中-公开
标题翻译：制造方法
公开(公告)号：US20040265838A1
公开(公告)日：2004-12-30
申请号：US10643630
申请日：2003-08-18
申请人： Affymetrix, INC.
发明人： Martin J. Goldberg , Richard P. Rava
IPC分类号： C12Q001/68 , C12P019/34 , C12M001/34
CPC分类号： B82Y30/00 , B01J19/0046 , B01J2219/00378 , B01J2219/00387 , B01J2219/00432 , B01J2219/00527 , B01J2219/00529 , B01J2219/00536 , B01J2219/00585 , B01J2219/0059 , B01J2219/00596 , B01J2219/00608 , B01J2219/0061 , B01J2219/00612 , B01J2219/00617 , B01J2219/00626 , B01J2219/00644 , B01J2219/00659 , B01J2219/00662 , B01J2219/00675 , B01J2219/00677 , B01J2219/00686 , B01J2219/00689 , B01J2219/00693 , B01J2219/00695 , B01J2219/00711 , B01J2219/00722 , B01J2219/00725 , C07K1/045 , C07K1/047 , C40B40/06 , C40B50/14 , C40B60/14 , G07C3/14
摘要： A method of manufacturing items in parallel. Selected samples of items to be manufactured are subjected to additional steps in a manufacturing process. If such sample items meet the requisite quality control standard, remaining items are subjected to further manufacturing steps. If the sample items which have been further processed do not meet the requisite quality control standard, the lot from which the samples do not undergo the additional manufacturing step. Invention provides an improved method of manufacturing in that it prevents unnecessary manufacturing steps.
摘要翻译：并行制造物品的方法。要制造的物品的选定样品在制造过程中经受另外的步骤。如果这些样品符合必要的质量控制标准，剩余物品将进行进一步的制造步骤。如果进一步处理的样品不符合必要的质量控制标准，样品不经过附加制造步骤的批次。本发明提供了一种改进的制造方法，因为它可防止不必要的制造步骤。

6. 发明申请

US20030175409A1 Printing molecular library arrays 审中-公开
标题翻译：印刷分子库阵列
公开(公告)号：US20030175409A1
公开(公告)日：2003-09-18
申请号：US10387969
申请日：2003-03-13
申请人： Affymetrix, Inc.
发明人： R. Fabian Pease , Glenn McGall , Martin. J. Goldberg , Richard P. Rava , Stephen P.A. Fodor , Virginia Goss , Lubert Stryer , James L. Winkler
IPC分类号： B05D003/00 , C07H021/04
CPC分类号： C07H21/00 , B01J19/0046 , B01J2219/00378 , B01J2219/00382 , B01J2219/00385 , B01J2219/00427 , B01J2219/00454 , B01J2219/00527 , B01J2219/00529 , B01J2219/00585 , B01J2219/0059 , B01J2219/00596 , B01J2219/00605 , B01J2219/00608 , B01J2219/0061 , B01J2219/00612 , B01J2219/00621 , B01J2219/00626 , B01J2219/00637 , B01J2219/00639 , B01J2219/00659 , B01J2219/00722 , B41M3/00 , C40B40/06 , C40B50/14 , C40B60/14 , G03F7/00
摘要： A method and apparatus for selectively applying a print material onto a substrate for the synthesis of an array of oligonucleotides at selected regions of a substrate. The print material includes a barrier material, a monomer sequence, a nucleoside, a deprotection agent, a carrier material, among other materials. The method and apparatus also relies upon standard DMT based chemistry, and a vapor phase deprotection agent such as solid TCA and the like.
摘要翻译：一种用于选择性地将印刷材料施加到基底上以在基底的选定区域合成寡核苷酸阵列的方法和装置。印刷材料包括阻挡材料，单体序列，核苷，去保护剂，载体材料等。该方法和装置还依赖于基于标准的基于DMT的化学，以及气相脱保护剂如固体TCA等。

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