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1. 发明申请

US20080037015A1 Polarimetric scatterometry methods for critical dimension measurements of periodic structures 有权
标题翻译：周期性结构关键尺寸测量的极化散射法
公开(公告)号：US20080037015A1
公开(公告)日：2008-02-14
申请号：US11903238
申请日：2007-09-21
申请人： Adam Norton , Abdurrahman Sezginer , Fred Stanke
发明人： Adam Norton , Abdurrahman Sezginer , Fred Stanke
IPC分类号： G01J3/447
CPC分类号： G01B11/02 , G01J3/02 , G01J3/0294 , G01N21/211 , G01N21/25 , G01N21/474 , G01N21/9501 , G01N21/956 , G01N2021/213
摘要： An optical measurement system for evaluating a sample has a motor-driven rotating mechanism coupled to an azimuthally rotatable measurement head, allowing the optics to rotate with respect to the sample. A polarimetric scatterometer, having optics directing a polarized illumination beam at non-normal incidence onto a periodic structure on a sample, can measure optical properties of the periodic structure. An E-O modulator in the illumination path can modulate the polarization. The head optics collect light reflected from the periodic structure and feed that light to a spectrometer for measurement. A beamsplitter in the collection path can ensure both S and P polarization from the sample are separately measured. The measurement head can be mounted for rotation of the plane of incidence to different azimuthal directions relative to the periodic structures. The instrument can be integrated within a wafer process tool in which wafers may be provided at arbitrary orientation.
摘要翻译：用于评估样品的光学测量系统具有耦合到方位角可旋转测量头的电动机旋转机构，允许光学器件相对于样品旋转。具有将非正常入射的偏振照明光束引导到样品上的周期性结构上的光学偏振散射仪可以测量周期性结构的光学性质。照明路径中的E-O调制器可以调制偏振。头部光学器件收集从周期性结构反射的光并将光馈送到光谱仪进行测量。收集路径中的分束器可以确保来自样品的S和P极化分别测量。测量头可以安装成相对于周期性结构使入射平面旋转到不同的方位角方向。仪器可以集成在晶片工艺工具中，其中可以以任意取向提供晶片。

2. 发明申请

US20050174575A1 Polarimetric scatterometry methods for critical dimension measurements of periodic structures 有权
公开(公告)号：US20050174575A1
公开(公告)日：2005-08-11
申请号：US11105099
申请日：2005-04-13
申请人： Adam Norton , Abdurrahman Sezginer , Fred Stanke
发明人： Adam Norton , Abdurrahman Sezginer , Fred Stanke
IPC分类号： G01N21/21 , G01N21/25 , G01N21/47 , G01N21/956
CPC分类号： G01B11/02 , G01J3/02 , G01J3/0294 , G01N21/211 , G01N21/25 , G01N21/474 , G01N21/9501 , G01N21/956 , G01N2021/213
摘要： An optical measurement system for evaluating a sample has a motor-driven rotating mechanism coupled to an azimuthally rotatable measurement head, allowing the optics to rotate with respect to the sample. A polarimetric scatterometer, having optics directing a polarized illumination beam at non-normal incidence onto a periodic structure on a sample, can measure optical properties of the periodic structure. An E-O modulator in the illumination path can modulate the polarization. The head optics collect light reflected from the periodic structure and feed that light to a spectrometer for measurement. A beamsplitter in the collection path can ensure both S and P polarization from the sample are separately measured. The measurement head can be mounted for rotation of the plane of incidence to different azimuthal directions relative to the periodic structures. The instrument can be integrated within a wafer process tool in which wafers may be provided at arbitrary orientation.

3. 发明申请

US20050018190A1 Overlay alignment metrology using diffraction gratings 有权
$Overlay alignment metrology using diffraction gratings$
标题翻译：使用衍射光栅覆盖对准测量
公开(公告)号：US20050018190A1
公开(公告)日：2005-01-27
申请号：US10917219
申请日：2004-08-12
申请人： Abdurrahman Sezginer , Kenneth Johnson , Fred Stanke
发明人： Abdurrahman Sezginer , Kenneth Johnson , Fred Stanke
IPC分类号： G03F7/20 , H01L23/544 , G01B11/00
CPC分类号： G03F7/70633 , H01L22/34 , H01L2223/54453
摘要： Alignment accuracy between two or more patterned layers is measured using a metrology target comprising substantially overlapping diffraction gratings formed in a test area of the layers being tested. An optical instrument illuminates all or part of the target area and measures the optical response. The instrument can measure transmission, reflectance, and/or ellipsometric parameters as a function of wavelength, polar angle of incidence, azimuthal angle of incidence, and/or polarization of the illumination and detected light. Overlay error or offset between those layers containing the test gratings is determined by a processor programmed to calculate an optical response for a set of parameters that include overlay error, using a model that accounts for diffraction by the gratings and interaction of the gratings with each others' diffracted field. The model parameters might also take account of manufactured asymmetries. The calculation may involve interpolation of pre-computed entries from a database accessible to the processor. The calculated and measured responses are iteratively compared and the model parameters changed to minimize the difference.
摘要翻译：使用包括在被测试层的测试区域中形成的基本上重叠的衍射光栅的测量目标来测量两个或更多个图案化层之间的对准精度。光学仪器照亮目标区域的全部或部分，并测量光学响应。仪器可以测量作为波长，极角入射角，入射方位角和/或照明和检测光的偏振的函数的透射率，反射率和/或椭偏参数。包含测试光栅的那些层之间的叠加误差或偏移量被编程为使用考虑光栅衍射的模型和光栅与彼此的相互作用计算包括重叠误差的一组参数的光学响应的处理器来确定 '衍射场模型参数也可能考虑到制造的不对称性。该计算可以包括从处理器可访问的数据库插入预先计算的条目。迭代比较计算和测量的响应，改变模型参数以最小化差异。

4. 发明申请

US20070064229A1 Small-spot spectrometry instrument with reduced polarization and multiple-element depolarizer therefor 失效
公开(公告)号：US20070064229A1
公开(公告)日：2007-03-22
申请号：US11599906
申请日：2006-11-15
申请人： Adam Norton , Kenneth Johnson , Fred Stanke
发明人： Adam Norton , Kenneth Johnson , Fred Stanke
IPC分类号： G01J3/28 , G01N21/88
CPC分类号： G01J3/02 , G01J3/0224 , G01J3/0243 , G01J3/28 , G01N21/21 , G01N21/31 , G01N21/956 , G01N2021/213 , G02B5/3083 , G02B27/28 , G02B27/286 , G02B27/288 , G03F7/70625 , G03F7/70991
摘要： A small-spot imaging, spectrometry instrument for measuring properties of a sample has a polarization-scrambling element, such as a birefringent plate depolarizer, incorporated between the polarization-introducing components of the system, such as the beamsplitter, and the microscope objective of the system. The plate depolarizer varies polarization with wavelength, and may be a Lyot depolarizer with two plates, or a depolarizer with more than two plates (such as a three-plate depolarizer). Sinusoidal perturbation in the resulting measured spectrum can be removed by data processing techniques or, if the depolarizer is thick or highly birefringent, the perturbation may be narrower than the wavelength resolution of the instrument.

5. 发明授权

US08107073B2 Diffraction order sorting filter for optical metrology 有权
$Diffraction order sorting filter for optical metrology$
标题翻译：用于光学测量的衍射顺序分选滤波器
公开(公告)号：US08107073B2
公开(公告)日：2012-01-31
申请号：US12369905
申请日：2009-02-12
申请人： Adam Norton , Holger Tuitje , Fred Stanke
发明人： Adam Norton , Holger Tuitje , Fred Stanke
IPC分类号： G01J3/28 , G02B1/10
CPC分类号： G01J3/28 , G01B2210/56 , G01J3/02 , G01J3/0229 , G01J3/0297 , G01J3/18 , G02B5/28 , G02B2207/117
摘要： A zoned order sorting filter for a spectrometer in a semiconductor metrology system is disclosed with reduced light dispersion at the zone joints. The order sorting filter comprises optically-transparent layers deposited underneath, or on top of thin-film filter stacks of the order sorting filter zones, wherein the thicknesses of the optically-transparent layers are adjusted such that the total optical lengths traversed by light at a zone joint are substantially equal in zones adjacent the zone joint. A method for wavelength to detector array pixel location calibration of spectrometers is also disclosed, capable of accurately representing the highly localized nonlinearities of the calibration curve in the vicinity of zone joints of an order sorting filter.
摘要翻译：公开了一种用于半导体测量系统中的光谱仪的分区排序分选过滤器，其中在区域关节处的光散射减小。订单分选过滤器包括沉积在下面的光学透明层，或者在分级过滤器区域的薄膜过滤器堆叠的顶部，其中调整光学透明层的厚度，使得在光区域接头在邻近区域接头的区域中基本相等。还公开了一种用于波长到检测器阵列像素位置校准的光谱仪的方法，其能够精确地表示在订单分选滤波器的区域接头附近的校准曲线的高度局部化的非线性。

6. 发明申请

US20060197948A1 Small-spot spectrometry instrument with reduced polarization and multiple-element depolarizer therefor 有权
公开(公告)号：US20060197948A1
公开(公告)日：2006-09-07
申请号：US11399133
申请日：2006-04-06
申请人： Adam Norton , Kenneth Johnson , Fred Stanke
发明人： Adam Norton , Kenneth Johnson , Fred Stanke
IPC分类号： G01J3/28
CPC分类号： G01J3/02 , G01J3/0224 , G01J3/0243 , G01J3/28 , G01N21/21 , G01N21/31 , G01N21/956 , G01N2021/213 , G02B5/3083 , G02B27/28 , G02B27/286 , G02B27/288 , G03F7/70625 , G03F7/70991
摘要： A small-spot imaging, spectrometry instrument for measuring properties of a sample has a polarization-scrambling element, such as a birefringent plate depolarizer, incorporated between the polarization-introducing components of the system, such as the beamsplitter, and the microscope objective of the system. The plate depolarizer varies polarization with wavelength, and may be a Lyot depolarizer with two plates, or a depolarizer with more than two plates (such as a three-plate depolarizer). Sinusoidal perturbation in the resulting measured spectrum can be removed by data processing techniques or, if the depolarizer is thick or highly birefringent, the perturbation may be narrower than the wavelength resolution of the instrument.

7. 发明授权

US07924422B2 Calibration method for optical metrology 有权
标题翻译：光学测量的校准方法
公开(公告)号：US07924422B2
公开(公告)日：2011-04-12
申请号：US12369947
申请日：2009-02-12
申请人： Fred Stanke , Adam Norton , Holger Tuitje
发明人： Fred Stanke , Adam Norton , Holger Tuitje
IPC分类号： G01J3/28
CPC分类号： G01J3/02 , G01B2210/56 , G01J3/0205 , G01J3/0224 , G01J3/0297 , G01J3/28 , G01J3/2803 , G01J2003/1828 , G01N21/274
摘要： A zoned order sorting filter for a spectrometer in a semiconductor metrology system is disclosed with reduced light dispersion at the zone joints. The order sorting filter comprises optically-transparent layers deposited underneath, or on top of thin-film filter stacks of the order sorting filter zones, wherein the thicknesses of the optically-transparent layers are adjusted such that the total optical lengths traversed by light at a zone joint are substantially equal in zones adjacent the zone joint. A method for wavelength to detector array pixel location calibration of spectrometers is also disclosed, capable of accurately representing the highly localized nonlinearities of the calibration curve in the vicinity of zone joints of an order sorting filter.
摘要翻译：公开了一种用于半导体测量系统中的光谱仪的分区排序分选过滤器，其中在区域关节处的光散射减小。订单分选过滤器包括沉积在下面的光学透明层，或者在分级过滤器区域的薄膜过滤器堆叠的顶部，其中调整光学透明层的厚度，使得在光区域接头在邻近区域接头的区域中基本相等。还公开了一种用于波长到检测器阵列像素位置校准的光谱仪的方法，其能够精确地表示在订单分选滤波器的区域接头附近的校准曲线的高度局部化的非线性。

8. 发明申请

US20100202055A1 DIFFRACTION ORDER SORTING FILTER FOR OPTICAL METROLOGY 有权
标题翻译： DIFFRACTION ORDER SORTING SORTING FILTER FOR OPTIM METROLOGY
公开(公告)号：US20100202055A1
公开(公告)日：2010-08-12
申请号：US12369905
申请日：2009-02-12
申请人： Adam NORTON , Holger Tuitje , Fred Stanke
发明人： Adam NORTON , Holger Tuitje , Fred Stanke
IPC分类号： G02B27/44 , G02B27/42
CPC分类号： G01J3/28 , G01B2210/56 , G01J3/02 , G01J3/0229 , G01J3/0297 , G01J3/18 , G02B5/28 , G02B2207/117
摘要： A zoned order sorting filter for a spectrometer in a semiconductor metrology system is disclosed with reduced light dispersion at the zone joints. The order sorting filter comprises optically-transparent layers deposited underneath, or on top of thin-film filter stacks of the order sorting filter zones, wherein the thicknesses of the optically-transparent layers are adjusted such that the total optical lengths traversed by light at a zone joint are substantially equal in zones adjacent the zone joint. A method for wavelength to detector array pixel location calibration of spectrometers is also disclosed, capable of accurately representing the highly localized nonlinearities of the calibration curve in the vicinity of zone joints of an order sorting filter.
摘要翻译：公开了一种用于半导体测量系统中的光谱仪的分区排序分选过滤器，其中在区域关节处的光散射减小。订单分选过滤器包括沉积在下面的光学透明层，或者在分级过滤器区域的薄膜过滤器堆叠的顶部，其中调整光学透明层的厚度，使得在光区域接头在邻近区域接头的区域中基本相等。还公开了一种用于波长到检测器阵列像素位置校准的光谱仪的方法，其能够精确地表示在订单分选滤波器的区域接头附近的校准曲线的高度局部化的非线性。

9. 发明申请

US20050057755A1 Method of measuring meso-scale structures on wafers 有权
标题翻译：测量晶圆上的中尺度结构的方法
公开(公告)号：US20050057755A1
公开(公告)日：2005-03-17
申请号：US10919718
申请日：2004-08-17
申请人： Kenneth Johnson , Fred Stanke
发明人： Kenneth Johnson , Fred Stanke
IPC分类号： G01B11/06 , G01B11/30 , G01N21/21 , G01N21/95 , H01L21/66 , H01L21/67 , G01N21/47
CPC分类号： H01L21/67 , G01B11/0625 , G01B11/30 , G01N21/211 , G01N21/9501 , H01L22/12
摘要： A method of measuring at least one parameter associated with a portion of a sample having formed thereon one or more structures with at least two zones each having an associated zone reflectance property. The method includes the steps of illuminating the zones with broadband light, and measuring at least one reflectance property of light reflected from the at least two zones. The measurement includes a substantial portion of non-specularly scattered light, thereby increasing the quality of the measurement. The method further includes the step of fitting a parameterized model to the measured reflectance property. The parameterized model mixes the zone reflectance properties of the zones to account for partially coherent light interactions between the two zones.
摘要翻译：测量与其上形成有一个或多个结构的样品的一部分相关联的至少一个参数的方法，其中至少两个区域各自具有相关联的区域反射性质。该方法包括以下步骤：用宽带光照射区域，并且测量从至少两个区域反射的光的至少一个反射性。测量包括大部分非镜面散射光，从而提高了测量的质量。该方法还包括将参数化模型拟合到所测量的反射率特性的步骤。参数化模型将区域的区域反射特性混合以考虑两个区域之间的部分相干光相互作用。

10. 发明申请

US20050280832A1 Database interpolation method for optical measurement of diffractive microstructures 失效
$Database interpolation method for optical measurement of diffractive microstructures$
公开(公告)号：US20050280832A1
公开(公告)日：2005-12-22
申请号：US11212165
申请日：2005-08-26
申请人： Kenneth Johnson , Fred Stanke
发明人： Kenneth Johnson , Fred Stanke
IPC分类号： G01B11/00 , G01B11/14 , G01N21/47 , G01N21/95 , G01N21/956 , G02B5/18 , G06F17/10 , H01L21/66
CPC分类号： G02B5/18 , G01N21/4788 , G01N21/9501 , G01N21/956
摘要： A database interpolation method is used to rapidly calculate a predicted optical response characteristic of a diffractive microstructure as part of a real-time optical measurement process. The interpolated optical response is a continuous and (in a preferred embodiment) smooth function of measurement parameters, and it matches the theoretically-calculated optical response at the database-stored interpolation points.

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