会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 5. 发明申请
    • Method for electrochemically fabricating three-dimensional structures including pseudo-rasterization of data
    • 用于电化学地制造包括数据伪光栅化的三维结构的方法
    • US20050181315A1
    • 2005-08-18
    • US11028943
    • 2005-01-03
    • Adam CohenJeffrey Thompson
    • Adam CohenJeffrey Thompson
    • C25D5/02C25D5/10G03C5/38H01L21/8236
    • C25D5/02B33Y10/00B33Y50/00B33Y50/02C25D1/003C25D5/022C25D5/10
    • Some embodiments of the invention are directed to techniques for electrochemically fabricating multi-layer three-dimensional structures where selective patterning of at least one or more layers occurs via a mask which is formed using data representing cross-sections of the three-dimensional structure which has been modified to place it in a polygonal form which defines only regions of positive area. The regions of positive area are regions where structural material is to be located or regions where structural material is not to be located depending on whether the mask will be used, for example, in selectively depositing a structural material or a sacrificial material. The modified data may take the form of adjacent or slightly overlapped relative narrow rectangular structures where the width of the structures is related to a desired formation resolution. The spacing between centers of adjacent rectangles may be uniform or may be a variable. The data modification may also include the formation of duplicate copies of an original structure, scaled copies, mirrored copies, rotated copies, complementary copies, and the like.
    • 本发明的一些实施例涉及用于电化学制造多层三维结构的技术,其中至少一个或多个层的选择性图案化通过掩模发生,该掩模使用表示具有三维结构的横截面的数据形成,该三维结构具有 被修改为将其定义为仅限定正面积区域的多边形形式。 根据是否使用掩模,例如选择性地沉积结构材料或牺牲材料,正面积的区域是结构材料要被定位的区域或者结构材料不被定位的区域。 修改的数据可以采取相邻或稍微重叠的相对窄的矩形结构的形式,其中结构的宽度与期望的地层分辨率相关。 相邻矩形的中心之间的间距可以是均匀的或可以是变量。 数据修改还可以包括形成原始结构,缩放副本,镜像副本,旋转副本,补充副本等的重复副本。