专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明公开

US20240071804A1 METHOD, ASSEMBLY AND SYSTEM FOR GAS INJECTION AND CONTROL 审中-公开
公开(公告)号：US20240071804A1
公开(公告)日：2024-02-29
申请号：US18238573
申请日：2023-08-28
申请人： ASM IP Holding B.V.
发明人： Peipei Gao , Wentao Wang , Han Ye , Kai Zhou , Fan Gao , Xing Lin
IPC分类号： H01L21/687 , H01L21/02 , H01L21/67
CPC分类号： H01L21/68735 , H01L21/0262 , H01L21/67017 , H01L21/67248
摘要： Methods, systems, and assemblies suitable for gas-phase processes are disclosed. An exemplary assembly includes a susceptor ring and at least one injector tube. The injector tube can be disposed within the susceptor ring to provide a gas to a peripheral region of a substrate. Methods, systems, and assemblies can be used to obtain desired (e.g. composition and/or thickness) profiles of material on a substrate surface.

2. 发明公开

US20240112930A1 CHAMBER ARRANGEMENTS WITH LASER SOURCES, SEMICONDUCTOR PROCESSING SYSTEMS, AND MATERIAL LAYER DEPOSITION METHODS 审中-公开
公开(公告)号：US20240112930A1
公开(公告)日：2024-04-04
申请号：US18476117
申请日：2023-09-27
申请人： ASM IP Holding, B.V.
发明人： Fan Gao , Peipei Gao , Wentao Wang , Kai Zhou , Kishor Patil , Han Ye , Xing Lin , Alexandros Demos
IPC分类号： H01L21/67 , B23K26/03 , B23K26/06 , C23C16/458 , C23C16/46 , C23C16/48 , C23C16/52 , G05D23/19
CPC分类号： H01L21/67115 , B23K26/034 , B23K26/0626 , B23K26/0643 , C23C16/4584 , C23C16/46 , C23C16/483 , C23C16/52 , G05D23/1931 , H01L21/67109
摘要： A chamber arrangement includes a chamber body, a substrate support, and a laser source. The substrate support is arranged within the chamber body and supported for rotation about a rotation axis relative to the chamber body. The laser source is arranged outside of the chamber body and optically coupled to the substrate support along a lasing axis. The lasing axis intersects the substrate support at a location radially outward from an outer periphery of a substrate seated on the substrate support. A semiconductor processing system and a material layer deposition method are also described.

3. 发明公开

US20240071805A1 METHOD, ASSEMBLY AND SYSTEM FOR GAS INJECTION 审中-公开
公开(公告)号：US20240071805A1
公开(公告)日：2024-02-29
申请号：US18238577
申请日：2023-08-28
申请人： ASM IP Holding B.V.
发明人： Han Ye , Peipei Gao , Wentao Wang , Aniket Chitale , Xing Lin , Alexandros Demos , Yanfu Lu
IPC分类号： H01L21/687 , H01L21/67
CPC分类号： H01L21/68735 , H01L21/67069
摘要： Methods, systems, and assemblies suitable for gas-phase processes are disclosed. An exemplary assembly includes a susceptor ring and at least one injector tube. The injector tube can be disposed within the susceptor ring to provide a gas to a lower chamber area of a reactor. Methods, systems, and assemblies can be used to obtain desired etching and purging of the lower chamber area.

4. 发明申请

US20220301905A1 DUAL PYROMETER SYSTEMS FOR SUBSTRATE TEMPERATURE CONTROL DURING FILM DEPOSITION 有权
公开(公告)号：US20220301905A1
公开(公告)日：2022-09-22
申请号：US17697145
申请日：2022-03-17
申请人： ASM IP Holding B.V.
发明人： Han Ye , Kai Zhou , Peipei Gao , Wentao Wang , Kishor Patil , Fan Gao , Krishnaswamy Mahadevan , Xing Lin , Alexandros Demos
IPC分类号： H01L21/67 , H01L21/66 , C23C16/46 , C23C16/52
摘要： A method of operating a reactor system to provide multi-zone substrate temperature control. The method includes, with a first pyrometer, sensing a temperature of a first zone of a substrate supported in the reactor system, and, with a second pyrometer, sensing a temperature of a second zone of the substrate. The method further includes, with a controller, comparing the temperatures of the first and second zones to setpoint temperatures for the first and second zones and, in response, generating control signals to control heating of the substrate. The method also includes controlling, based on the control signals, operations of a heater assembly operating to heat the substrate.

5. 发明申请

US20220181193A1 HIGH PERFORMANCE SUSCEPTOR APPARATUS 有权
公开(公告)号：US20220181193A1
公开(公告)日：2022-06-09
申请号：US17457605
申请日：2021-12-03
申请人： ASM IP HOLDING B.V.
发明人： Peipei Gao , Wentao Wang , Xing Lin , Han Ye , Ion Hong Chao , Siyao Luan , Alexandros Demos , Fan Gao
IPC分类号： H01L21/687
摘要： A substrate support and lift assembly configured to support and lift a substrate from a susceptor is disclosed. The substrate support and lift assembly can include a susceptor support and a lift pin. The susceptor support can be configured to support the susceptor thereon. The susceptor support includes a plurality of support arms each extending radially from a central portion of the susceptor support to a terminus. Each of the plurality of support arms includes an aperture extending therethrough. The lift pin can be configured to fit through the aperture of a corresponding support arm to lift a substrate on the susceptor.

6. 发明公开

US20240222187A1 SHAFT MEMBERS, PROCESS KITS AND SEMICONDUCTOR PROCESSING SYSTEMS HAVING SHAFT MEMBERS, AND METHODS OF MAKING SEMICONDUCTOR PROCESSING SYSTEMS 审中-公开
公开(公告)号：US20240222187A1
公开(公告)日：2024-07-04
申请号：US18397372
申请日：2023-12-27
申请人： ASM IP Holding B.V.
发明人： Aniket Chitale , Felix Rabinovich , Gary Urban Keppers , Han Ye , Bradley Wayne Evans , Wentao Wang , Gregory Rosendahl , Amin Azimi
IPC分类号： H01L21/687 , C23C16/44 , C23C16/458
CPC分类号： H01L21/68792 , C23C16/4412 , C23C16/4581 , H01L21/68785
摘要： A shaft member includes a cylindrical body formed from a ceramic material and having a drive segment, a frustoconical segment, and an end key segment. The drive segment extends about a rotation axis, the frustoconical segment is offset from the drive segment along the rotation axis, and the end key segment extends axially from the frustoconical segment and is axially separated from the drive segment by the frustoconical segment of the shaft member. The end key segment has a first circumferential facet and a second circumferential facet circumferentially opposite the first circumferential facet to fix the shaft member in rotation about the rotation axis relative to a support member seated when the end key segment is slidably received within an end key socket defined within the support member. Process kits, semiconductor processing systems, and methods of making semiconductor processing systems are also described.

7. 外观设计

USD1031676S1 Combined susceptor, support, and lift system 有权
公开(公告)号：USD1031676S1
公开(公告)日：2024-06-18
申请号：US29760951
申请日：2020-12-04
申请人： ASM IP HOLDING B.V.
设计人： Peipei Gao , Wentao Wang , Xing Lin , Han Ye , Ion Hong Chao , Siyao Luan , Alexandros Demos , Fan Gao
摘要： FIG. 1 is a front perspective view of a combined susceptor, support, and lift system;
FIG. 2 is a back perspective view thereof;
FIG. 3 is a side view thereof;
FIG. 4 is a cross-sectional view taken along line 4-4 as indicated in FIG. 3;
FIG. 5 is an enlarged view of FIG. 4 shown without broken line environmental subject matter for clarity of the claimed subject matter;
FIG. 6 is a top perspective view of the lift pin thereof;
FIG. 7 is a bottom perspective view of the lift pin thereof;
FIG. 8 is a front view of the lift pin thereof;
FIG. 9 is a back view of the lift pin thereof;
FIG. 10 is a left view of the lift pin thereof;
FIG. 11 is a right view of the lift pin thereof;
FIG. 12 is a top view of the lift pin thereof; and,
FIG. 13 is a bottom view of the lift pin thereof.
The dash-dash broken lines within the shaded area and the dash-dash broken lines in FIGS. 1-13 depicting various components of the susceptor, support, and lift system are for the purpose of illustrating environmental subject matter and portions of the article that form no part of the claimed design. The dot-dash broken line in FIG. 3 is for the purpose of defining the cross-sectional view shown in FIG. 4.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式