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1. 发明申请

US20080220610A1 Silicon oxide polishing method utilizing colloidal silica 审中-公开
标题翻译：使用胶体二氧化硅的氧化硅抛光方法
公开(公告)号：US20080220610A1
公开(公告)日：2008-09-11
申请号：US11478004
申请日：2006-06-29
申请人： Benjamin Bayer , Zhan Chen , Jeffrey P. Chamberlain , Robert Vacassy
发明人： Benjamin Bayer , Zhan Chen , Jeffrey P. Chamberlain , Robert Vacassy
IPC分类号： H01L21/306
CPC分类号： H01L21/31053 , C09G1/02 , H01L21/3212
摘要： The inventive method comprises chemically-mechanically polishing a substrate with a polishing composition comprising a liquid carrier and sol-gel colloidal silica abrasive particles.
摘要翻译：本发明的方法包括用包含液体载体和溶胶 - 凝胶胶态二氧化硅磨料颗粒的抛光组合物对衬底进行化学机械抛光。

2. 发明申请

US20080020680A1 Rate-enhanced CMP compositions for dielectric films 审中-公开
标题翻译：介电膜的速率增强CMP组成
公开(公告)号：US20080020680A1
公开(公告)日：2008-01-24
申请号：US11491612
申请日：2006-07-24
申请人： Robert Vacassy , Benjamin Bayer , Zhan Chen , Jeffrey P. Chamberlain
发明人： Robert Vacassy , Benjamin Bayer , Zhan Chen , Jeffrey P. Chamberlain
IPC分类号： B24B1/00 , B24D3/02 , B24B7/30 , C09K3/14
CPC分类号： C09G1/02 , B24B37/044 , C09K3/1463 , H01L21/31053 , H01L21/3212
摘要： The invention provides a chemical-mechanical polishing composition consisting essentially of silica, an oxidizing agent, a quaternary ammonium compound, and water. The invention further provides a method of chemically-mechanically polishing a substrate with the aforementioned polishing composition. The polishing composition provides for enhanced polishing rates when used to polish dielectric films.
摘要翻译：本发明提供了一种主要由二氧化硅，氧化剂，季铵化合物和水组成的化学 - 机械抛光组合物。本发明还提供了用上述抛光组合物对衬底进行化学机械抛光的方法。抛光组合物在用于抛光电介质膜时提供了增强的抛光速率。

3. 发明申请

US20070298612A1 Compositions and methods for polishing silicon nitride materials 有权
标题翻译：用于研磨氮化硅材料的组合物和方法
公开(公告)号：US20070298612A1
公开(公告)日：2007-12-27
申请号：US11448205
申请日：2006-06-07
申请人： Jeffrey Dysard , Sriram Anjur , Timothy Johns , Zhan Chen
发明人： Jeffrey Dysard , Sriram Anjur , Timothy Johns , Zhan Chen
IPC分类号： C03C15/00 , H01L21/302
CPC分类号： C09K3/1463 , C09G1/02 , H01L21/31053
摘要： The present invention provides a method for polishing silicon nitride-containing substrates. The method comprises abrading a surface of a silicon nitride substrate with a polishing composition, which comprises colloidal silica, at least one acidic component, and an aqueous carrier. The at least one acidic component has a pKa in the range of about 1 to 4.5. The composition has a pH in the range of about 0.5 pH units less than the pKa of the at least one acidic component to about 1.5 pH units greater than the pKa.
摘要翻译：本发明提供一种研磨含氮化硅的基板的方法。该方法包括用抛光组合物研磨氮化硅衬底的表面，抛光组合物包括胶体二氧化硅，至少一种酸性组分和水性载体。所述至少一种酸性组分的pKa在约1至4.5的范围内。所述组合物的pH值比所述至少一种酸性组分的pKa小约0.5pH单位至大于pKa约1.5pH单位。

4. 发明申请

US20070219104A1 Oxidation-stabilized CMP compositions and methods 失效
标题翻译：氧化稳定的CMP组合物和方法
公开(公告)号：US20070219104A1
公开(公告)日：2007-09-20
申请号：US11384538
申请日：2006-03-20
申请人： Steven Grumbine , Renjie Zhou , Zhan Chen , Phillip Carter
发明人： Steven Grumbine , Renjie Zhou , Zhan Chen , Phillip Carter
IPC分类号： B08B7/00
CPC分类号： H01L21/3212 , C09G1/02 , C09K3/1463 , C23F3/04 , C23F3/06
摘要： The present invention provides a chemical-mechanical polishing (CMP) composition comprising an amino compound, a radical-forming oxidizing agent, a radical trapping agent capable of inhibiting radical-induced oxidation of the amino compound, and an aqueous carrier therefore. The radical trapping agent is a hydroxyl-substituted polyunsaturated cyclic compound, a nitrogenous compound, or a combination thereof. Optionally, the composition comprises a metal oxide abrasive (e.g., silica, alumina, titania, ceria, zirconia, or a combination of two or more of the foregoing abrasives). The invention further provides a method of chemically-mechanically polishing a substrate with the CMP compositions, as well as a method of enhancing the shelf-life of CMP compositions containing an amine and a radical-forming oxidizing agent, in which a radical trapping agent is added to the CMP composition.
摘要翻译：本发明提供一种包含氨基化合物，自由基形成氧化剂，能够抑制氨基化合物自由基诱导氧化的自由基捕获剂的化学机械抛光（CMP）组合物，以及含水载体。自由基捕获剂是羟基取代的多不饱和环状化合物，含氮化合物或其组合。任选地，组合物包含金属氧化物研磨剂（例如二氧化硅，氧化铝，二氧化钛，二氧化铈，氧化锆，或两种或更多种前述研磨剂的组合）。本发明还提供了用CMP组合物对基材进行化学机械抛光的方法，以及提高含有胺和自由基形成氧化剂的CMP组合物的保存期限的方法，其中自由基捕获剂是添加到CMP组合物中。

5. 发明申请

US20070209287A1 Composition and method to polish silicon nitride 审中-公开
标题翻译：抛光氮化硅的组成和方法
公开(公告)号：US20070209287A1
公开(公告)日：2007-09-13
申请号：US11374238
申请日：2006-03-13
申请人： Zhan Chen , Robert Vacassy , Phillip Carter , Jeffrey Dysard
发明人： Zhan Chen , Robert Vacassy , Phillip Carter , Jeffrey Dysard
IPC分类号： B24D3/02 , B24B7/30 , B24B29/00 , C09K3/14 , B24B1/00
CPC分类号： C09G1/02 , H01L21/31053
摘要： The inventive chemical-mechanical polishing composition comprises an abrasive, a nitride accelerator, and water, and has a pH of about 1 to about 6. The inventive method of polishing a substrate involves the use of the aforesaid polishing composition and is particularly useful in polishing a substrate containing silicon nitride.
摘要翻译：本发明的化学机械抛光组合物包含研磨剂，氮化物促进剂和水，并且具有约1至约6的pH。本发明的抛光基材的方法涉及使用上述抛光组合物，并且特别适用于抛光含有氮化硅的衬底。

6. 发明申请

US20060221452A1 Anti-glare reflective and transmissive devices 审中-公开
标题翻译：防眩光反射和透射装置
公开(公告)号：US20060221452A1
公开(公告)日：2006-10-05
申请号：US11373579
申请日：2006-03-10
申请人： Zhan Chen
发明人： Zhan Chen
IPC分类号： G02B5/08
CPC分类号： B60R1/088 , G02F1/13725
摘要： Devices that include a dichroic material sandwiched between first and second electrodes layers and exhibiting a high optical absorption when the first and second electrode layers are biased at a first electrical bias state and a low optical absorption when the first and second electrode layers are biased at a second, different electrical bias state. Such devices may be used to construct optically reflective devices such as anti-glare mirrors and optically transmissive devices such as eye glasses. The dichroic material may be selected to be operable to switch between the high optical absorption and the low optical absorption in less than 0.1 second.
摘要翻译：包括夹在第一和第二电极层之间的二向色材料的装置，并且当第一和第二电极层被偏置在第一电偏置状态时呈现高的光吸收，而当第一和第二电极层被偏置在第二，不同的电偏置状态。这种装置可用于构造光学反射装置，例如防眩光镜和诸如眼镜的光学透射装置。二色性材料可以被选择为可操作以在小于0.1秒内在高光吸收和低光吸收之间切换。

7. 发明申请

US20130296576A1 HIGH STABLE NON-IONIC N-VINYL BUTYROLACTAM IODINE AND PREPARATION METHOD THEREOF 审中-公开
标题翻译：高稳定性非离子型N-乙烯基丁酰胺碘化物及其制备方法
公开(公告)号：US20130296576A1
公开(公告)日：2013-11-07
申请号：US13978329
申请日：2011-08-18
申请人： Yu Wang , Zhan Chen
发明人： Yu Wang , Zhan Chen
IPC分类号： C07D207/267
CPC分类号： C07D207/267 , C08F8/22 , C08F126/10
摘要： The present invention relates to a preparation method of a high-stable non-ionic N-vinyl butyrolactam iodine, wherein non-ionic N-vinyl butyrolactam, iodine and at least one grinding aid are stirred at 150-800 r/min at a temperature of 50° C.-90° C. for 1 to 12 hours to prepare the high-stable non-ionic N-vinyl butyrolactam iodine, wherein the K value of the non-ionic N-vinyl butyrolactam is 32±1, the PD value of the main peak of the non-ionic N-vinyl butyrolactam is ≦1.6, the moisture content of the non-ionic N-vinyl butyrolactam is ≦2.5%, preferably, the grinding aid is selected one or several from sodium chloride, sodium citrate, sodium carbonate and sodium phosphate, the amount of the grinding aid added is 0.02 to 2% of the total amount of the non-ionic N-vinyl butyrolactam and the iodine, the non-ionic N-vinyl butyrolactam is PVP-K32, the high-stable non-ionic N-vinyl butyrolactam iodine prepared by the above mentioned method is also provided, the stability of the high-stable non-ionic N-vinyl butyrolactam iodine of the present invention is high, thereby facilitating long-term storage and use, thus the high-stable non-ionic N-vinyl butyrolactam iodine is suitable for large-scale popularization.
摘要翻译：本发明涉及一种高稳定性非离子型N-乙烯基丁内酰胺碘的制备方法，其中非离子N-乙烯基丁内酰胺碘和至少一种研磨助剂以150-800r / min的温度在50℃-90℃下反应1至12小时以制备高稳定性非离子型N-乙烯基丁内酰胺碘，其中非离子型N-乙烯基丁内酰胺的K值为32±1，PD 非离子型N-乙烯基丁内酰胺的主峰的值为1.6，非离子型N-乙烯基丁内酰胺的水分含量为2.5％，优选的是，研磨助剂由氯化钠，钠柠檬酸钠，碳酸钠和磷酸钠，加入的助磨剂的量为非离子型N-乙烯基丁内酰胺和碘的总量的0.02〜2％，非离子型N-乙烯基丁内酰胺为PVP-K32，还提供了通过上述方法制备的高稳定性非离子型N-乙烯基丁内酰胺碘，稳定性高本发明的离子型N-乙烯基丁内酰胺碘高，从而促进长期保存和使用，因此高稳定性的非离子型N-乙烯基丁内酰胺碘适用于大规模普及。

8. 发明授权

US08497209B2 Oxidation-stabilized CMP compositions and methods 有权
标题翻译：氧化稳定的CMP组合物和方法
公开(公告)号：US08497209B2
公开(公告)日：2013-07-30
申请号：US12764268
申请日：2010-04-21
申请人： Steven K. Grumbine , Renjie Zhou , Zhan Chen , Phillip W. Carter
发明人： Steven K. Grumbine , Renjie Zhou , Zhan Chen , Phillip W. Carter
IPC分类号： H01L21/302 , H01L21/321
CPC分类号： H01L21/3212 , C09G1/02 , C09K3/1463 , C23F3/04 , C23F3/06
摘要： The present invention provides a chemical-mechanical polishing (CMP) composition comprising an amino compound, a radical-forming oxidizing agent, a radical trapping agent capable of inhibiting radical-induced oxidation of the amino compound, and an aqueous carrier therefore. The radical trapping agent is a hydroxyl-substituted polyunsaturated cyclic compound, a nitrogenous compound, or a combination thereof. Optionally, the composition comprises a metal oxide abrasive (e.g., silica, alumina, titania, ceria, zirconia, or a combination of two or more of the foregoing abrasives).
摘要翻译：本发明提供一种包含氨基化合物，自由基形成氧化剂，能够抑制氨基化合物自由基诱导氧化的自由基捕获剂的化学机械抛光（CMP）组合物，以及含水载体。自由基捕获剂是羟基取代的多不饱和环状化合物，含氮化合物或其组合。任选地，组合物包含金属氧化物研磨剂（例如二氧化硅，氧化铝，二氧化钛，二氧化铈，氧化锆，或两种或更多种前述研磨剂的组合）。

9. 发明申请

US20100235530A1 CONTROL METHOD OF TRANSMITTING STREAMING AUDIO/VIDEO DATA AND ARCHITECTURE THEREOF 审中-公开
标题翻译：传输音频/视频数据及其架构的控制方法
公开(公告)号：US20100235530A1
公开(公告)日：2010-09-16
申请号：US12703292
申请日：2010-02-10
申请人： Ching-Yao HUANG , Zhi-Zhan CHEN , Chun-Hsiao LI
发明人： Ching-Yao HUANG , Zhi-Zhan CHEN , Chun-Hsiao LI
IPC分类号： G06F15/16
CPC分类号： H04N7/24
摘要： A control method and architecture for controlling transmission of streaming audio/video data are disclosed. The method uses a report transmission rate on a transmitter to reduce the playback latency on a receiver. The report transmission rate is determined according to an actual transmission rate and the residual data amount of the previous period of a transmitter buffer. The actual transmission rate is the minimum of an available transmission rate and a required transmission rate, which depends on the residual data amount and the report transmission rate. Therefore, the report transmission rate is adjusted according to the accumulation of residual data of transmitter buffer, which improves the playback latency.
摘要翻译：公开了一种用于控制流式音频/视频数据传输的控制方法和架构。该方法使用发射机上的报告传输速率来减少接收机上的播放延迟。报告传输速率根据发射机缓冲器的实际传输速率和前一周期的剩余数据量来确定。实际传输速率是可用传输速率和所需传输速率的最小值，这取决于剩余数据量和报告传输速率。因此，根据发送缓冲区的残差数据的累积调整报告传输速率，提高播放延迟。

10. 发明申请

US20100200802A1 OXIDATION-STABILIZED CMP COMPOSITIONS AND METHODS 有权
标题翻译：氧化稳定的CMP组合物和方法
公开(公告)号：US20100200802A1
公开(公告)日：2010-08-12
申请号：US12764268
申请日：2010-04-21
申请人： Steven K. GRUMBINE , Renjie Zhou , Zhan Chen , Phillip W. Carter
发明人： Steven K. GRUMBINE , Renjie Zhou , Zhan Chen , Phillip W. Carter
IPC分类号： C09K13/00
CPC分类号： H01L21/3212 , C09G1/02 , C09K3/1463 , C23F3/04 , C23F3/06
摘要： The present invention provides a chemical-mechanical polishing (CMP) composition comprising an amino compound, a radical-forming oxidizing agent, a radical trapping agent capable of inhibiting radical-induced oxidation of the amino compound, and an aqueous carrier therefore. The radical trapping agent is a hydroxyl-substituted polyunsaturated cyclic compound, a nitrogenous compound, or a combination thereof. Optionally, the composition comprises a metal oxide abrasive (e.g., silica, alumina, titania, ceria, zirconia, or a combination of two or more of the foregoing abrasives).
摘要翻译：本发明提供一种包含氨基化合物，自由基形成氧化剂，能够抑制氨基化合物自由基诱导氧化的自由基捕获剂的化学机械抛光（CMP）组合物，以及含水载体。自由基捕获剂是羟基取代的多不饱和环状化合物，含氮化合物或其组合。任选地，组合物包含金属氧化物研磨剂（例如二氧化硅，氧化铝，二氧化钛，二氧化铈，氧化锆，或两种或更多种前述研磨剂的组合）。

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