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1. 发明授权

US08810770B2 Exposure apparatus and article manufacturing method 有权
标题翻译：曝光装置和制品制造方法
公开(公告)号：US08810770B2
公开(公告)日：2014-08-19
申请号：US13157618
申请日：2011-06-10
申请人： Yuji Maehara , Nobushige Korenaga
发明人： Yuji Maehara , Nobushige Korenaga
IPC分类号： G03B27/52 , G03B27/58 , G03B27/60
CPC分类号： G03F7/70875 , B82Y10/00 , B82Y40/00 , H01J37/20 , H01J37/3174 , H01J2237/2001 , H01J2237/2482
摘要： An apparatus for exposing a substrate to an energy in a vacuum includes a substrate stage having a mirror surface; a mirror configured to deflect a light into a Z axis direction; a measuring device configured to measure the stage position in the Z axis direction with the light in which the mirror surface is irradiated; a driving device configured to move the measuring device so that the mirror surface is irradiated with the light; an optical system configured to project the energy onto the substrate; and a cooling device including a radiation plate (arranged between the optical system and the stage in the Z axis direction and having a first opening which the energy passes and a second opening which the light passes), including a cooler configured to cool the first radiation plate, and configured to perform radiation cooling of the substrate.
摘要翻译：用于将衬底暴露于真空中的能量的装置包括具有镜面的衬底台; 配置为将光偏转到Z轴方向的反射镜; 测量装置，被配置为用照射所述镜面的光来测量所述Z轴方向上的所述平台位置; 驱动装置，其构造成使所述测量装置移动，使得所述镜面被所述光照射; 配置成将能量投射到基板上的光学系统; 以及冷却装置，其包括辐射板（布置在所述光学系统和所述台架之间的Z轴方向上并且具有所述能量通过的第一开口和所述光通过的第二开口），所述冷却装置包括冷却器，所述冷却器被配置为冷却所述第一辐射并且被配置为执行基板的辐射冷却。

2. 发明申请

US20110310366A1 EXPOSURE APPARATUS AND ARTICLE MANUFACTURING METHOD 有权
标题翻译：曝光装置和制品制造方法
公开(公告)号：US20110310366A1
公开(公告)日：2011-12-22
申请号：US13157618
申请日：2011-06-10
申请人： Yuji Maehara , Nobushige Korenaga
发明人： Yuji Maehara , Nobushige Korenaga
IPC分类号： G03B27/52 , G03B27/32
CPC分类号： G03F7/70875 , B82Y10/00 , B82Y40/00 , H01J37/20 , H01J37/3174 , H01J2237/2001 , H01J2237/2482
摘要： An apparatus for exposing a substrate to an energy in a vacuum includes a substrate stage having a mirror surface; a mirror configured to deflect a light into a Z axis direction; a measuring device configured to measure the stage position in the Z axis direction with the light in which the mirror surface is irradiated; a driving device configured to move the measuring device so that the mirror surface is irradiated with the light; an optical system configured to project the energy onto the substrate; and a cooling device including a radiation plate (arranged between the optical system and the stage in the Z axis direction and having a first opening which the energy passes and a second opening which the light passes), including a cooler configured to cool the first radiation plate, and configured to perform radiation cooling of the substrate.
摘要翻译：用于将衬底暴露于真空中的能量的装置包括具有镜面的衬底台; 配置为将光偏转到Z轴方向的反射镜; 测量装置，被配置为用照射所述镜面的光来测量所述Z轴方向上的所述平台位置; 驱动装置，其构造成使所述测量装置移动，使得所述镜面被所述光照射; 配置成将能量投射到基板上的光学系统; 以及冷却装置，其包括辐射板（布置在所述光学系统和所述台架之间的Z轴方向上并且具有所述能量通过的第一开口和所述光通过的第二开口），所述冷却装置包括冷却器，所述冷却器被配置为冷却所述第一辐射并且被配置为执行基板的辐射冷却。

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