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    • 5. 发明授权
    • Method for manufacturing a recording medium
    • 记录介质的制造方法
    • US06896973B2
    • 2005-05-24
    • US09938273
    • 2001-08-23
    • Yoshinobu Sugata
    • Yoshinobu Sugata
    • G11B5/84G11B7/26G11B5/66
    • G11B5/8404
    • A recording medium manufacturing method has a surface treatment process which removes contamination from a surface of a thermoplastic resin support substrate and also improves its wettability. This surface treatment process is conducted prior to forming the layer structure, which includes at least a signal recording layer, onto the surface of the thermoplastic resin support substance. The support substance is placed in an active gas atmosphere, such as ozone, followed by an inert gas atmosphere, such as nitrogen. This surface treatment process generates little deterioration in the support substrate surface.
    • 记录介质的制造方法具有从热塑性树脂支撑基板的表面除去污染的表面处理工艺,并且还提高其润湿性。 在将热塑性树脂支撑物质的表面上形成至少包含信号记录层的层结构之前进行该表面处理工艺。 将载体物质置于诸如臭氧的活性气体气氛中,然后置于诸如氮气的惰性气体气氛中。 该表面处理工艺在支撑基材表面几乎没有劣化。
    • 7. 发明申请
    • FLAME-RESISTANT RESIN COMPOSITION
    • 阻燃树脂组合物
    • US20100113654A1
    • 2010-05-06
    • US12553293
    • 2009-09-03
    • Yoshinobu SUGATAToshiyuki KANNO
    • Yoshinobu SUGATAToshiyuki KANNO
    • C08K5/5313C08K5/3492
    • C09K21/12C08K5/5313
    • A flame-resistant resin composition is disclosed that uses a non-halogen flame retardant as the flame retardant, and allows resin processed articles to be obtained which have superior flame resistance and heat resistance. The flame-resistant resin composition comprises a non-halogen flame retardant (A) containing a metal phosphinate (a) represented by the following formula (I) wherein, R1 and R2 respectively represent an alkyl group having 1 to 6 carbon atoms or an aryl group having 12 carbon atoms or less, M represents calcium, aluminum or zinc, m=3 when M is aluminum, and m=2 when M is other than aluminum, and an organic phosphorous flame retardant (b), an isocyanurate compound (B) having one or more glycidyl groups in the molecular structure thereof, and a thermoplastic resin (C).
    • 公开了一种使用非卤素阻燃剂作为阻燃剂的耐火树脂组合物,并且可以获得具有优异的阻燃性和耐热性的树脂加工制品。 阻燃树脂组合物包含含有由下式(I)表示的金属次膦酸盐(a)的无卤阻燃剂(A),其中R1和R2分别表示碳原子数为1〜6的烷基或芳基 具有12个碳原子或更少的基团,M表示钙,铝或锌,当M是铝时m = 3,当M不是铝时m = 2,有机磷阻燃剂(b),异氰脲酸酯化合物(B )在其分子结构中具有一个或多个缩水甘油基,和热塑性树脂(C)。
    • 8. 发明授权
    • Photoconductor for electrophotography with a charge generating substance
comprising a polycyclic and azo compound
    • 用于具有包含多环和AZO化合物的电荷产生物质的电泳机的光电子器件
    • US5178981A
    • 1993-01-12
    • US661249
    • 1991-02-27
    • Yoshimasa HattoriYoshinobu SugataMasami KurodaNoboru Furusho
    • Yoshimasa HattoriYoshinobu SugataMasami KurodaNoboru Furusho
    • C09B35/34G03G5/06
    • G03G5/0681C09B35/34G03G5/0609G03G5/0618
    • A photoconductor for electrophotography includes an electroconductive substrate; and a photosensitive layer formed on the substrate. The photosensitive layer includes a charge generating substance consisting essentially of at least one polycyclic compound represent by general formula (I) and at least one azo compound represented by general formula (II). ##STR1## wherein X is selected from the group consisting of a hydrogen atom, a halogen atom and a cyano group and n is an integer of 0 to 4; ##STR2## wherein R is selected from the group consisting of a hydrogen atom, a halogen atom and a substituted or unsubstituted alkyl group and alkoxy group, Z1 is selected from the group consisting of a substituted or unsubstituted alkyl group, aryl group and aromatic heterocyclic group, Z.sub.2 is selected from the group consisting of a hydrogen atom, a cyano group, a carbomoyl group, a carboxyl group, an ester group and an acyl group, each of Z.sub.3 and Z.sub.4 is selected from the group consisting of a hydrogen atom, a halogen atom, a nitro group and a substituted or unsubstituted alkyl group and alkoxy group.
    • 电子照相用感光体包括导电性基材; 以及形成在基板上的感光层。 感光层包括基本上由至少一种由通式(I)表示的多环化合物和至少一种由通式(II)表示的偶氮化合物组成的电荷产生物质。 (I)其中X选自氢原子,卤素原子和氰基,n为0至4的整数; 其中R选自氢原子,卤素原子和取代或未取代的烷基和烷氧基,Z 1选自由以下基团组成的组: 取代或未取代的烷基,芳基和芳族杂环基,Z2选自氢原子,氰基,氨基甲酰基,羧基,酯基和酰基,Z3和Z4中的每一个 选自氢原子,卤素原子,硝基和取代或未取代的烷基和烷氧基。