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    • 8. 发明授权
    • Nitride semiconductor laser element and method for manufacturing the same
    • 氮化物半导体激光元件及其制造方法
    • US07691653B2
    • 2010-04-06
    • US11500334
    • 2006-08-08
    • Takeshi KamikawaYoshinobu Kawaguchi
    • Takeshi KamikawaYoshinobu Kawaguchi
    • H01L21/00
    • H01S5/34333B82Y20/00H01S5/0202H01S5/028H01S5/0282H01S5/0287H01S5/2231
    • A substrate with a nitride semiconductor layer is cleaved to form resonator end faces, on which a coating film is formed so as to make a nitride semiconductor laser bar. This is divided into nitride semiconductor laser elements. Prior to forming the coating film on the resonator end face, the resonator end face is exposed to a plasma atmosphere generated from the gas containing nitrogen gas. When a ratio of nitrogen to gallium in the surface of the resonator end face before the exposure is represented by “a”, an average value of ratios of nitrogen to gallium inside from the surface of the resonator end face before the exposure is represented by “b”, a ratio of nitrogen to gallium in the surface of the resonator end face after the exposure to the first plasma atmosphere is represented by “d”, and an average value of ratios of nitrogen to gallium inside from the surface of the resonator end face after the exposure is represented by “e”, the value “g” that is expressed by g=(b·d)/(a·e) is set to a value that satisfies g≧0.8.
    • 具有氮化物半导体层的衬底被切割以形成谐振器端面,在其上形成涂膜以便形成氮化物半导体激光棒。 这被分为氮化物半导体激光元件。 在共振器端面上形成涂膜之前,共振器端面暴露于由含有氮气的气体产生的等离子体气氛中。 当曝光前共振器端面表面的氮与镓的比例由“a”表示时,曝光前共振器端面的表面内的氮与镓的平均值由“ b“,在暴露于第一等离子体气氛之后,共振器端面的表面中的氮与镓的比率由”d“表示,并且从谐振器端的表面的内部的氮与镓的平均值 曝光后的面由“e”表示,由g =(b·d)/(a·e)表示的值“g”被设定为满足g≥0.8的值。