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    • 1. 发明授权
    • High-frequency power supply system
    • 高频电源系统
    • US07796368B2
    • 2010-09-14
    • US10580815
    • 2004-11-26
    • Hiroyuki KotaniHirotaki TakeiYoshifumi IbukiHiroaki Oichi
    • Hiroyuki KotaniHirotaki TakeiYoshifumi IbukiHiroaki Oichi
    • H02H3/00
    • H01J37/32174H01J37/32935H03H7/40H05H1/46
    • A high-frequency power supply system includes an anomaly detector 3 which detects an anomaly occurring in a circuit on the side of a load L as from an outputting end A of a high-frequency power source 1. The anomaly detector 3 includes a first detector 21 which detects a voltage value Vf of a high-frequency forward wave, a second detector 22 which detects a voltage value Vr of a high-frequency reflected wave, a reflection coefficient calculator 23 and a differentiator 24 which calculate a reflection coefficient differential value dΓ/dt from the forward wave voltage value Vf and the reflected wave voltage value Vr, and an anomaly determiner 25 which determines of an occurrence of an anomaly based on the reflection coefficient differential value dΓ/dt. When the anomaly detector 3 outputs an anomaly detection signal to the high-frequency power source 1, high-frequency power source 1 stops its power output operation.
    • 高频电源系统包括异常检测器3,其从高频电源1的输出端A检测在负载L侧的电路中发生的异常。异常检测器3包括第一检测器 21检测高频正向波的电压值Vf,检测高频反射波的电压值Vr的第二检测器22,计算反射系数微分值d&Ggr的反射系数计算器23和微分器24 ; / dt和反射波电压值Vr,以及基于反射系数微分值d&Ggr; / dt确定异常的发生的异常判定器25。 当异常检测器3向高频电源1输出异常检测信号时,高频电源1停止其电力输出动作。
    • 5. 发明授权
    • High-frequency measuring device and high-frequency measuring device calibration method
    • 高频测量装置和高频测量装置的校准方法
    • US08686711B2
    • 2014-04-01
    • US13048104
    • 2011-03-15
    • Ryohei TanakaYoshifumi Ibuki
    • Ryohei TanakaYoshifumi Ibuki
    • G01R23/02
    • H01J37/32183H01J37/32935
    • A method for calibrating a high frequency measuring device so as to accurately measure plasma processing parameters within a chamber. A calibration parameter is calculated from a first set of three reference loads measured by a high frequency measurement device. A second calibration parameter is calculated from S parameters measured between a connection point where the high-frequency measuring device is connected and the inside of the chamber of a plasma processing device. A second set of three reference loads, which include the impedance previously calculated and encompass a range narrower than that encompassed by the first set of three reference loads, is measured with the reference loads in the chamber. Another calibration parameter is calculated from the measured impedances of the second set of three reference loads measured by the high- frequency measuring device, and the true values of those impedances, and a detected voltage signal and a detected current signal are calibrated using the above calibration parameters.
    • 一种用于校准高频测量装置以精确测量腔室内的等离子体处理参数的方法。 根据由高频测量装置测量的第一组三个参考载荷来计算校准参数。 从连接高频测量装置的连接点与等离子体处理装置的室内测量的S参数计算出第二校准参数。 使用腔室中的参考负载测量第二组三个参考负载,其包括先前计算的阻抗并且包含比由第一组三个参考负载包围的范围窄的范围。 从由高频测量装置测量的第二组三个参考载荷的测量阻抗计算出另一个校准参数,并且使用上述校准校准那些阻抗的真实值,检测到的电压信号和检测到的电流信号 参数。
    • 6. 发明申请
    • HIGH-FREQUENCY MEASURING DEVICE AND HIGH-FREQUENCY MEASURING DEVICE CALIBRATION METHOD
    • 高频测量装置和高频测量装置校准方法
    • US20110234201A1
    • 2011-09-29
    • US13048104
    • 2011-03-15
    • Ryohei TANAKAYoshifumi IBUKI
    • Ryohei TANAKAYoshifumi IBUKI
    • G01R23/02
    • H01J37/32183H01J37/32935
    • A method is provided for calibrating a high-frequency, measuring device so as to accurately measure high-frequency parameters within a chamber. A calibration parameter is calculated from impedance of a first set of three reference loads measured by a high-frequency measuring device and the true values of those impedances. A calibration parameter is calculated from an S parameter measured between a connection point where the high-frequency measuring device is connected and the inside of the chamber of a plasma processing device. An impedance within the chamber is calculated from a voltage signal and a current signal calibrated using the above calibration parameters. A second set of three reference loads, which include the impedance calculated in Step 5 and encompass a range narrower than that encompassed by the first set of three reference loads, is determined. Another calibration parameter is calculated from impedances of the second set of three reference loads measured by the high-frequency measuring device and the true values of those impedances, and a detected voltage signal and a detected current signal are calibrated using the above calibration parameters.
    • 提供了一种用于校准高频测量装置以便精确地测量腔室内的高频参数的方法。 从由高频测量装置测量的第一组三个参考载荷的阻抗和这些阻抗的真实值的阻抗来计算校准参数。 根据在连接高频测量装置的连接点与等离子体处理装置的室内之间测量的S参数来计算校准参数。 从电压信号和使用上述校准参数校准的电流信号计算室内的阻抗。 第二组三个参考载荷,其包括在步骤5中计算的阻抗并且包含比由第一组三个参考载荷所包围的阻抗窄的范围。 通过由高频测量装置测量的第二组三个参考载荷的阻抗和这些阻抗的真实值的阻抗计算另一个校准参数,并且使用上述校准参数校准检测到的电压信号和检测到的电流信号。
    • 8. 发明授权
    • High-frequency power supply system
    • 高频电源系统
    • US08134816B2
    • 2012-03-13
    • US12834579
    • 2010-07-12
    • Hiroyuki KotaniHirotaki TakeiYoshifumi IbukiHiroaki Oichi
    • Hiroyuki KotaniHirotaki TakeiYoshifumi IbukiHiroaki Oichi
    • H02H3/00
    • H01J37/32174H01J37/32935H03H7/40H05H1/46
    • A high-frequency power supply system includes an anomaly detector 3 which detects an anomaly occurring in a circuit on the side of a load L as from an outputting end A of a high-frequency power source 1. The anomaly detector 3 includes a first detector 21 which detects a voltage value Vf of a high-frequency forward wave, a second detector 22 which detects a voltage value Vr of a high-frequency reflected wave, a reflection coefficient calculator 23 and a differentiator 24 which calculate a reflection coefficient differential value dΓ/dt from the forward wave voltage value Vf and the reflected wave voltage value Vr, and an anomaly determiner 25 which determines of an occurrence of an anomaly based on the reflection coefficient differential value dΓ/dt. When the anomaly detector 3 outputs an anomaly detection signal to the high-frequency power source 1, high-frequency power source 1 stops its power output operation.
    • 高频电源系统包括异常检测器3,其从高频电源1的输出端A检测在负载L侧的电路中发生的异常。异常检测器3包括第一检测器 21检测高频正向波的电压值Vf,检测高频反射波的电压值Vr的第二检测器22,计算反射系数微分值d&Ggr的反射系数计算器23和微分器24 ; / dt和反射波电压值Vr,以及基于反射系数微分值d&Ggr; / dt确定异常的发生的异常判定器25。 当异常检测器3向高频电源1输出异常检测信号时,高频电源1停止其电力输出动作。
    • 10. 发明申请
    • HIGH-FREQUENCY POWER SUPPLY SYSTEM
    • 高频电源系统
    • US20100277843A1
    • 2010-11-04
    • US12834579
    • 2010-07-12
    • Hiroyuki KOTANIHirotaka TakeiYoshifumi IbukiHiroaki Oichi
    • Hiroyuki KOTANIHirotaka TakeiYoshifumi IbukiHiroaki Oichi
    • H02H3/00G01R21/06
    • H01J37/32174H01J37/32935H03H7/40H05H1/46
    • A high-frequency power supply system includes an anomaly detector 3 which detects an anomaly occurring in a circuit on the side of a load L as from an outputting end A of a high-frequency power source 1. The anomaly detector 3 includes a first detector 21 which detects a voltage value Vf of a high-frequency forward wave, a second detector 22 which detects a voltage value Vr of a high-frequency reflected wave, a reflection coefficient calculator 23 and a differentiator 24 which calculate a reflection coefficient differential value dΓ/dt from the forward wave voltage value Vf and the reflected wave voltage value Vr, and an anomaly determiner 25 which determines of an occurrence of an anomaly based on the reflection coefficient differential value dΓ/dt. When the anomaly detector 3 outputs an anomaly detection signal to the high-frequency power source 1, high-frequency power source 1 stops its power output operation.
    • 高频电源系统包括异常检测器3,其从高频电源1的输出端A检测在负载L侧的电路中发生的异常。异常检测器3包括第一检测器 21检测高频正向波的电压值Vf,检测高频反射波的电压值Vr的第二检测器22,计算反射系数微分值d&Ggr的反射系数计算器23和微分器24 ; / dt和反射波电压值Vr,以及基于反射系数微分值d&Ggr; / dt确定异常的发生的异常判定器25。 当异常检测器3向高频电源1输出异常检测信号时,高频电源1停止其电力输出动作。