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1. 发明授权

US08860941B2 Tool induced shift reduction determination for overlay metrology 有权
标题翻译：刀具诱导移位减少确定重叠度量
公开(公告)号：US08860941B2
公开(公告)日：2014-10-14
申请号：US13457832
申请日：2012-04-27
申请人： Yung-Yao Lee , Ying Ying Wang , Heng-Hsin Liu , Heng-Jen Lee
发明人： Yung-Yao Lee , Ying Ying Wang , Heng-Hsin Liu , Heng-Jen Lee
IPC分类号： G01B11/00
CPC分类号： G01B11/00 , G03F7/70633
摘要： One embodiment relates to a method for semiconductor workpiece processing. In this method, a baseline tool induced shift (TIS) is measured by performing a baseline number of TIS measurements on a first semiconductor workpiece. After the baseline TIS has been determined, the method determines a subsequent TIS based on a subsequent number of TIS measurements taken on a first subsequent semiconductor workpiece. The subsequent number of TIS measurements is less than the baseline number of TIS measurements.
摘要翻译：一个实施例涉及一种用于半导体工件加工的方法。在该方法中，通过在第一半导体工件上执行TIS测量的基线数量来测量基线工具诱发位移（TIS）。在确定基线TIS之后，该方法基于在第一后续半导体工件上进行的随后的TIS测量数确定随后的TIS。随后的TIS测量数量小于TIS测量的基线数量。

2. 发明授权

US08822019B2 Coated article and method for making same 有权
标题翻译：涂层制品及其制作方法
公开(公告)号：US08822019B2
公开(公告)日：2014-09-02
申请号：US13238176
申请日：2011-09-21
申请人： Wen-Rong Chen , Cheng-Shi Chen , Ying-Ying Wang , Zhi-Jie Hu , Cong Li
发明人： Wen-Rong Chen , Cheng-Shi Chen , Ying-Ying Wang , Zhi-Jie Hu , Cong Li
IPC分类号： B32B17/06
CPC分类号： C23C28/30 , C23C28/32 , C23C28/321 , C23C28/322 , C23C28/345
摘要： A coated article includes a substrate, a first layer deposited on the substrate, a second layer deposited on the first layer and a third layer deposited on the second layer. The first layer substantially consists of one material selected from the group consisting of Al layer, Al alloy layer, Zn layer or Zn alloy layer. The first layer is white. The second layer substantially includes metal M′, O and N, wherein M′ is Al or Zn. The third layer is an aluminum oxide layer or a silicon oxide layer. The third layer has an anti-fingerprint property.
摘要翻译：涂覆制品包括基底，沉积在基底上的第一层，沉积在第一层上的第二层和沉积在第二层上的第三层。第一层基本由选自由Al层，Al合金层，Zn层或Zn合金层组成的组中的一种材料组成。第一层是白色。第二层基本上包括金属M'，O和N，其中M'是Al或Zn。第三层是氧化铝层或氧化硅层。第三层具有防指纹属性。

3. 发明授权

US08741444B2 Process for surface treating iron-based alloy and article 有权
标题翻译：铁基合金表面处理工艺及制品
公开(公告)号：US08741444B2
公开(公告)日：2014-06-03
申请号：US13217950
申请日：2011-08-25
申请人： Hsin-Pei Chang , Wen-Rong Chen , Huann-Wu Chiang , Cheng-Shi Chen , Ying-Ying Wang
发明人： Hsin-Pei Chang , Wen-Rong Chen , Huann-Wu Chiang , Cheng-Shi Chen , Ying-Ying Wang
IPC分类号： B32B15/04 , C23C14/14 , C23C14/08 , C23C14/35
CPC分类号： C23C14/081 , C23C14/022 , C23C14/025 , C23C14/0647 , C23C14/10 , C23C28/322 , C23C28/34 , C23C28/345
摘要： A process for surface treating iron-based alloy includes providing a substrate made of iron-based alloy. A chromium layer is then formed on the substrate by vacuum sputtering. A silicon oxide layer, an alumina layer, and a boron nitride layer are formed in that order by vacuum evaporation.
摘要翻译：铁基合金的表面处理方法包括提供由铁基合金制成的基板。然后通过真空溅射在基板上形成铬层。通过真空蒸发依次形成氧化硅层，氧化铝层和氮化硼层。

4. 发明申请

US20120315501A1 COATED ARTICLE AND METHOD FOR MAKING SAME 审中-公开
标题翻译：涂层制品及其制造方法
公开(公告)号：US20120315501A1
公开(公告)日：2012-12-13
申请号：US13238157
申请日：2011-09-21
申请人： HUANN-WU CHIANG , CHENG-SHI CHEN , YING-YING WANG
发明人： HUANN-WU CHIANG , CHENG-SHI CHEN , YING-YING WANG
IPC分类号： B32B15/04 , B32B5/00 , C23C14/35 , B32B15/08 , C23C16/22 , C23C16/06 , B32B18/00 , B32B3/00
CPC分类号： C23C14/0015 , C23C14/022 , C23C14/0676 , C23C14/165 , C23C14/205 , C23C28/321 , C23C28/322 , C23C28/3225 , C23C28/34 , Y10T428/12729 , Y10T428/12736 , Y10T428/12757 , Y10T428/12764 , Y10T428/12799 , Y10T428/24355 , Y10T428/265
摘要： A coated article is provided. A coated article includes a substrate having a color layer and a ceramic layer formed thereon, and in that order. The color layer substantially comprises a material elected from the group consisting of aluminum, aluminum alloy, zinc, and zinc alloy. The ceramic layer substantially consists of substance M, elemental O, and elemental N, wherein M is elemental Al or elemental Zn.
摘要翻译：提供涂层制品。涂布制品包括具有着色层和形成在其上的陶瓷层的基板，并且依次。着色层基本上包括由铝，铝合金，锌和锌合金组成的组中选出的材料。陶瓷层基本上由物质M，元素O和元素N组成，其中M是元素Al或元素Zn。

5. 发明申请

US20120121718A1 COMPOSITIONS AND METHODS RELATING TO REDUCED MUCOADHESION 审中-公开
标题翻译：与减少MUCOADHESION有关的组合物和方法
公开(公告)号：US20120121718A1
公开(公告)日：2012-05-17
申请号：US13289196
申请日：2011-11-04
申请人： Samuel K. Lai , Ming Yang , Ying-Ying Wang , Olcay Mert , Laura Ensign , Justin Hanes
发明人： Samuel K. Lai , Ming Yang , Ying-Ying Wang , Olcay Mert , Laura Ensign , Justin Hanes
IPC分类号： A61K9/16 , B32B27/28 , A61K9/28 , G01N15/00 , B05D3/00
CPC分类号： A61K9/1641 , A61K9/0034 , A61K9/5146 , A61K31/355 , A61K45/06 , A61K47/60 , A61K47/6935 , A61K49/0002 , Y10T428/2998
摘要： The present invention generally relates to reducing the mucoadhesive properties of a particle. In some embodiments, the particle is coated with and/or associated with a (poly(ethylene glycol))-(poly(propylene oxide))-(poly(ethylene glycol)) triblock copolymer. Methods for preparing inventive particles using a poly(ethylene glycol)-vitamin E conjugate as a surfactant are also provided. In some embodiments, methods are provided comprising administering to a subject a composition of particles of the present invention. Such particles with reduced mucoadhesive properties are useful in delivering agents to mucosal tissues such as oral, ophthalmic, gastrointestinal, nasal, respiratory, and genital mucosal tissues.
摘要翻译：本发明一般涉及降低颗粒的粘膜粘附性质。在一些实施方案中，颗粒用（聚（乙二醇）） - （聚（环氧丙烷）） - （聚（乙二醇））三嵌段共聚物涂覆和/或与其相关联。还提供了使用聚（乙二醇） - 维生素E缀合物作为表面活性剂制备本发明颗粒的方法。在一些实施方案中，提供了包括向受试者施用本发明颗粒组合物的方法。具有降低的粘膜粘附性质的这种颗粒可用于将药物递送到粘膜组织如口服，眼科，胃肠道，鼻腔，呼吸道和生殖器粘膜组织。

6. 发明申请

US20120018340A1 DEVICE HOUSING AND METHOD FOR MAKING THE SAME 有权
标题翻译：装置壳体及其制造方法
公开(公告)号：US20120018340A1
公开(公告)日：2012-01-26
申请号：US13087512
申请日：2011-04-15
申请人： HSIN-PEI CHANG , WEN-RONG CHEN , HUANN-WU CHIANG , CHENG-SHI CHEN , YING-YING WANG
发明人： HSIN-PEI CHANG , WEN-RONG CHEN , HUANN-WU CHIANG , CHENG-SHI CHEN , YING-YING WANG
IPC分类号： B65D85/00 , C23C14/34
CPC分类号： C23C14/086 , C23C14/0036 , C23C14/024 , C23C28/04
摘要： A device housing is provided. The device housing includes a substrate, a silicon dioxide film formed on the substrate, and a zinc oxide film formed on the silicon dioxide film. The silicon dioxide film has micrometer sized structures. The zinc oxide film has nanometer sized structures. A method for making the device housing is also described there.
摘要翻译：提供了一种设备外壳。该器件壳体包括衬底，形成在衬底上的二氧化硅膜和形成在二氧化硅膜上的氧化锌膜。二氧化硅膜具有微米尺寸的结构。氧化锌膜具有纳米尺寸的结构。还描述了用于制造装置外壳的方法。

7. 发明授权

US08703368B2 Lithography process 有权
标题翻译：平版印刷工艺
公开(公告)号：US08703368B2
公开(公告)日：2014-04-22
申请号：US13550036
申请日：2012-07-16
申请人： Yung-Yao Lee , Ying Ying Wang , Heng-Hsin Liu , Chin-Hsiang Lin
发明人： Yung-Yao Lee , Ying Ying Wang , Heng-Hsin Liu , Chin-Hsiang Lin
IPC分类号： G03F9/00
CPC分类号： G03F7/70633
摘要： A process for use in lithography, such as photolithography for patterning a semiconductor wafer, is disclosed. The process includes receiving an incoming semiconductor wafer having various features and layers formed thereon. A unit-induced overlay (uniiOVL) correction is received and a deformation measurement is performed on the incoming semiconductor wafer in an overlay module. A deformation-induced overlay (defiOVL) correction is generated from the deformation measurement results by employing a predetermined algorithm on the deformation measurement results. The defiOVL and uniiOVL corrections are fed-forward to an exposure module and an exposure process is performed on the incoming semiconductor wafer.
摘要翻译：公开了一种用于光刻的方法，例如用于图案化半导体晶片的光刻技术。该方法包括接收具有形成在其上的各种特征和层的输入半导体晶片。接收单元引起的覆盖（uniOVL）校正，并且在覆盖模块中对输入的半导体晶片进行变形测量。通过对变形测量结果采用预定的算法，从变形测量结果生成变形诱导的覆盖（defiOVL）校正。 defiVV和unioVL校正被反馈到曝光模块，并且对输入的半导体晶片进行曝光处理。

8. 发明授权

US08637862B2 Device housing and method for making the same 有权
标题翻译：设备外壳及其制作方法
公开(公告)号：US08637862B2
公开(公告)日：2014-01-28
申请号：US13087512
申请日：2011-04-15
申请人： Hsin-Pei Chang , Wen-Rong Chen , Huann-Wu Chiang , Cheng-Shi Chen , Ying-Ying Wang
发明人： Hsin-Pei Chang , Wen-Rong Chen , Huann-Wu Chiang , Cheng-Shi Chen , Ying-Ying Wang
IPC分类号： H01L29/10
CPC分类号： C23C14/086 , C23C14/0036 , C23C14/024 , C23C28/04
摘要： A device housing is provided. The device housing includes a substrate, a silicon dioxide film formed on the substrate, and a zinc oxide film formed on the silicon dioxide film. The silicon dioxide film has micrometer sized structures. The zinc oxide film has nanometer sized structures. A method for making the device housing is also described there.
摘要翻译：提供了一种设备外壳。该器件壳体包括衬底，形成在衬底上的二氧化硅膜和形成在二氧化硅膜上的氧化锌膜。二氧化硅膜具有微米尺寸的结构。氧化锌膜具有纳米尺寸的结构。还描述了用于制造装置外壳的方法。

9. 发明授权

US08637148B2 Coated article and method of making the same 有权
标题翻译：涂层制品和制作方法
公开(公告)号：US08637148B2
公开(公告)日：2014-01-28
申请号：US13172234
申请日：2011-06-29
申请人： Hsin-Pei Chang , Wen-Rong Chen , Huann-Wu Chiang , Cheng-Shi Chen , Ying-Ying Wang
发明人： Hsin-Pei Chang , Wen-Rong Chen , Huann-Wu Chiang , Cheng-Shi Chen , Ying-Ying Wang
IPC分类号： B32B9/00
CPC分类号： C23C14/0036 , C23C14/022 , C23C14/0676 , C23C14/165
摘要： A coated article includes a bonding layer, an iridium layer, a chromium oxynitride layer and a chromium nitride layer formed on a substrate in that order. The substrate is made of die steel.
摘要翻译：涂布制品包括依次形成在基材上的粘合层，铱层，氮氧化铬层和氮化铬层。基板由模具钢制成。

10. 发明申请

US20130029097A1 COATED ARTICLE AND METHOD FOR MAKING SAME 有权
标题翻译：涂层制品及其制造方法
公开(公告)号：US20130029097A1
公开(公告)日：2013-01-31
申请号：US13238176
申请日：2011-09-21
申请人： WEN-RONG CHEN , CHENG-SHI CHEN , YING-YING WANG , ZHI-JIE HU , CONG LI
发明人： WEN-RONG CHEN , CHENG-SHI CHEN , YING-YING WANG , ZHI-JIE HU , CONG LI
IPC分类号： B32B15/04 , C23C14/06 , C23C14/34
CPC分类号： C23C28/30 , C23C28/32 , C23C28/321 , C23C28/322 , C23C28/345
摘要： A coated article includes a substrate, a first layer deposited on the substrate, a second layer deposited on the first layer and a third layer deposited on the second layer. The first layer substantially consists of one material selected from the group consisting of Al layer, Al alloy layer, Zn layer or Zn alloy layer. The first layer is white. The second layer substantially includes metal M′, O and N, wherein M′ is Al or Zn. The third layer is an aluminum oxide layer or a silicon oxide layer. The third layer has an anti-fingerprint property.
摘要翻译：涂覆制品包括基底，沉积在基底上的第一层，沉积在第一层上的第二层和沉积在第二层上的第三层。第一层基本由选自由Al层，Al合金层，Zn层或Zn合金层组成的组中的一种材料组成。第一层是白色。第二层基本上包括金属M'，O和N，其中M'是Al或Zn。第三层是氧化铝层或氧化硅层。第三层具有防指纹属性。

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