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1. 发明授权

US08351021B2 Optical system, exposure system, and exposure method 失效
公开(公告)号：US08351021B2
公开(公告)日：2013-01-08
申请号：US12656639
申请日：2010-02-05
申请人： Yasuhiro Omura
发明人： Yasuhiro Omura
IPC分类号： G02B27/28 , G03B27/32 , G03B27/42 , G03B27/54 , G03B27/72
CPC分类号： G02B17/0892 , G02B13/143 , G02B17/08 , G02B27/28 , G03F7/70091 , G03F7/70191 , G03F7/70566 , G03F7/70966
摘要： An optical system is able to achieve a substantially azimuthal polarization state in a lens aperture while suppressing loss of light quantity, based on a simple configuration. The optical system of the present invention is provided with a birefringent element for achieving a substantially circumferential distribution or a substantially radial distribution as a fast axis distribution in a lens aperture, and an optical rotator located behind the birefringent element and adapted to rotate a polarization state in the lens aperture. The birefringent element has an optically transparent member which is made of a uniaxial crystal material and a crystallographic axis of which is arranged substantially in parallel with an optical axis of the optical system. A light beam of substantially spherical waves in a substantially circular polarization state is incident to the optically transparent member.

2. 发明授权

US07978310B2 Projection optical system, exposure system, and exposure method 有权
标题翻译：投影光学系统，曝光系统和曝光方法
公开(公告)号：US07978310B2
公开(公告)日：2011-07-12
申请号：US12719455
申请日：2010-03-08
申请人： Hironori Ikezawa , Yuji Kudo , Yasuhiro Omura
发明人： Hironori Ikezawa , Yuji Kudo , Yasuhiro Omura
IPC分类号： G03B27/54 , G03B27/32
CPC分类号： G03F7/70341
摘要： A liquid immersion type projection optical system that can stably prevent the outflow of immersion liquid into inside of an optical system and can maintain good imaging performance. In the projection optical system of the present invention, an optical path between a light transmitting member (Lp) disposed closest to a second surface (W) side and the second surface is filled with a liquid (Lm1) having a refractive index greater than 1.1, and a light shielding film (36) for shielding the passing of light is formed on the side surfaces (41, 42) of the light transmitting member. When D is a space between the second surface and the light shielding film, Θ is a maximum incident angle of an image forming beam which reaches the second surface, and Ym is a maximum image height on the second surface, the condition of 0.25
摘要翻译：一种液浸型投影光学系统，其可以稳定地防止浸没液体流入光学系统内部并且可以保持良好的成像性能。在本发明的投影光学系统中，在最靠近第二表面（W）侧设置的透光构件（Lp）和第二表面之间的光路填充有折射率大于1.1的液体（Lm1）并且在透光构件的侧面（41,42）上形成用于遮蔽光通过的遮光膜（36）。当D是第二表面和遮光膜之间的空间时，Θ是到达第二表面的图像形成光束的最大入射角，Ym是第二表面上的最大图像高度，条件为0.25

3. 发明授权

US07936441B2 Projection optical system, exposure apparatus, and exposure method 有权
标题翻译：投影光学系统，曝光装置和曝光方法
公开(公告)号：US07936441B2
公开(公告)日：2011-05-03
申请号：US11920331
申请日：2006-05-08
申请人： Yasuhiro Omura
发明人： Yasuhiro Omura
IPC分类号： B60R1/06 , G02B7/02 , G03B27/42 , G03B27/52 , G03B27/54
CPC分类号： G03F7/70825 , G02B1/02 , G02B1/06 , G02B17/0892 , G02B21/33 , G03F7/70341
摘要： An immersion projection optical system that prevents leakage of a liquid (immersion liquid) into the optical system and maintains satisfactory imaging capability. The projection optical system of the present invention is a projection optical system that projects a reduced image of a first plane onto a second plane through a liquid. The projection optical system includes an interface optical lens (Lb) having a side towards the first plane that contacts a gas and a side towards the second plane that contacts the liquid. The interface optical element includes a light entering surface (Lba), which has a convex shape facing towards the first plane, and a groove (Gr), which is formed to surround an effective region in a light emitting surface of the interface optical element.
摘要翻译：一种浸没投影光学系统，其防止液体（浸没液体）泄漏到光学系统中并保持令人满意的成像能力。本发明的投影光学系统是通过液体将第一平面的缩小图像投影到第二平面上的投影光学系统。投影光学系统包括界面光学透镜（Lb），其具有朝向接触气体的第一平面的侧面和朝向接触液体的第二平面的一侧。界面光学元件包括具有朝向第一平面的凸形的光入射表面（Lba）和形成为围绕界面光学元件的发光表面中的有效区域的凹槽（Gr）。

4. 发明申请

US20100142051A1 Optical system, exposure system, and exposure method 失效
公开(公告)号：US20100142051A1
公开(公告)日：2010-06-10
申请号：US12656639
申请日：2010-02-05
申请人： Yasuhiro Omura
发明人： Yasuhiro Omura
IPC分类号： G02B5/30
CPC分类号： G02B17/0892 , G02B13/143 , G02B17/08 , G02B27/28 , G03F7/70091 , G03F7/70191 , G03F7/70566 , G03F7/70966
摘要： An optical system is able to achieve a substantially azimuthal polarization state in a lens aperture while suppressing loss of light quantity, based on a simple configuration. The optical system of the present invention is provided with a birefringent element for achieving a substantially circumferential distribution or a substantially radial distribution as a fast axis distribution in a lens aperture, and an optical rotator located behind the birefringent element and adapted to rotate a polarization state in the lens aperture. The birefringent element has an optically transparent member which is made of a uniaxial crystal material and a crystallographic axis of which is arranged substantially in parallel with an optical axis of the optical system. A light beam of substantially spherical waves in a substantially circular polarization state is incident to the optically transparent member.

5. 发明申请

US20100141921A1 Optical system, exposure system, and exposure method 失效
标题翻译：光学系统，曝光系统和曝光方法
公开(公告)号：US20100141921A1
公开(公告)日：2010-06-10
申请号：US12656637
申请日：2010-02-05
申请人： Yasuhiro Omura
发明人： Yasuhiro Omura
IPC分类号： G03B27/72 , G02B5/30
CPC分类号： G02B17/0892 , G02B13/143 , G02B17/08 , G02B27/28 , G03F7/70091 , G03F7/70191 , G03F7/70566 , G03F7/70966
摘要： An optical system is able to achieve a substantially azimuthal polarization state in a lens aperture while suppressing loss of light quantity, based on a simple configuration. The optical system of the present invention is provided with a birefringent element for achieving a substantially circumferential distribution or a substantially radial distribution as a fast axis distribution in a lens aperture, and an optical rotator located behind the birefringent element and adapted to rotate a polarization state in the lens aperture. The birefringent element has an optically transparent member which is made of a uniaxial crystal material and a crystallographic axis of which is arranged substantially in parallel with an optical axis of the optical system. A light beam of substantially spherical waves in a substantially circular polarization state is incident to the optically transparent member.
摘要翻译：基于简单的配置，光学系统能够在抑制光量损失的同时实现透镜孔中的基本方位极化状态。本发明的光学系统设置有用于实现基本圆周分布或基本上径向分布作为透镜孔径中的快轴分布的双折射元件，以及位于双折射元件后面并适于旋转偏振态的旋转器在镜头光圈。双折射元件具有由单轴晶体材料制成的光学透明构件，其晶轴基本上与光学系统的光轴平行。呈基本圆形极化状态的大致球形的光束入射到光学透明构件。

6. 发明授权

US07551362B2 Projection optical system and method for photolithography and exposure apparatus and method using same 有权
标题翻译：投影光学系统及光刻法及曝光装置及其使用方法
公开(公告)号：US07551362B2
公开(公告)日：2009-06-23
申请号：US11907679
申请日：2007-10-16
申请人： Yasuhiro Omura , Hironori Ikezawa
发明人： Yasuhiro Omura , Hironori Ikezawa
IPC分类号： G02B3/00 , G02B17/00
CPC分类号： G02B17/0892 , G02B13/22 , G02B17/08 , G02B21/33 , G03F7/70225 , G03F7/70341
摘要： An immersion optical system includes a liquid immerged optical element having an optical surface which is contactable with a liquid, a convex surface, and an optical axis. A side surface of the liquid immerged optical element is inclined with respect to the optical axis.
摘要翻译：浸入式光学系统包括具有可与液体，凸面和光轴接触的光学表面的液体浸入式光学元件。液体浸没的光学元件的侧表面相对于光轴倾斜。

7. 发明申请

US20080304036A1 CATADIOPTRIC IMAGING SYSTEM, EXPOSURE DEVICE, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译： CATADIOPTRIC成像系统，曝光装置和装置制造方法
公开(公告)号：US20080304036A1
公开(公告)日：2008-12-11
申请号：US12187154
申请日：2008-08-06
申请人： Yasuhiro OMURA
发明人： Yasuhiro OMURA
IPC分类号： G03B27/54 , G02B17/00
CPC分类号： G02B17/0892 , G03F7/70225 , G03F7/70275
摘要： A catadioptric imaging optical system with a high numerical aperture and including an effective imaging region shaped optimally for use in a batch type exposure apparatus and having an imaging magnification with a small absolute value. The catadioptric imaging optical system includes a dioptric first imaging system, which forms a first intermediate image based on light from the first plane, a second imaging system, which forms a second intermediate image based on light from the first intermediate image, a third dioptric imaging system, which forms a reduced image on the second plane based on light from the second intermediate image, and a deflecting mirror arranged in an optical path extending from the first imaging system to the second imaging system and an optical path extending from the second imaging system to the third imaging system. The first imaging system and the second imaging system provide a composite imaging magnification having an absolute value β12 of less than 0.55, and the third imaging system has an imaging magnification with an absolute value β3 of less than 0.35.
摘要翻译：具有高数值孔径的反折射成像光学系统，并且包括最佳地用于间歇式曝光装置并且具有绝对值小的成像倍率的有效成像区域。反射折射成像光学系统包括：第一成像系统，其基于来自第一平面的光形成第一中间图像，第二成像系统，其基于来自第一中间图像的光形成第二中间图像;第三屈光度成像系统，其基于来自第二中间图像的光在第二平面上形成缩小图像;以及偏转镜，布置在从第一成像系统延伸到第二成像系统的光路中，以及从第二成像系统延伸的光路到第三成像系统。第一成像系统和第二成像系统提供具有小于0.55的绝对值β12的复合成像放大倍数，并且第三成像系统具有绝对值β3小于0.35的成像倍率。

8. 发明申请

US20080259440A1 PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD 有权
标题翻译：投影光学系统，曝光装置和装置制造方法
公开(公告)号：US20080259440A1
公开(公告)日：2008-10-23
申请号：US12050903
申请日：2008-03-18
申请人： Yasuhiro Omura
发明人： Yasuhiro Omura
IPC分类号： G02B27/00
CPC分类号： G03F7/70341 , G03F7/70275 , G03F7/70283
摘要： A projection optical system for forming an image of a first surface on a second surface has a first imaging optical system and a second imaging optical system, and a folding member for guiding light from the first imaging optical system to the second imaging optical system. Every optical element having a power in the second imaging optical system is a refractive element.
摘要翻译：用于在第二表面上形成第一表面的图像的投影光学系统具有第一成像光学系统和第二成像光学系统，以及用于将来自第一成像光学系统的光引导到第二成像光学系统的折叠部件。在第二成像光学系统中具有功率的每个光学元件是折射元件。

9. 发明申请

US20080094696A1 Projection optical system and method for photolithography and exposure apparatus and method using same 有权
标题翻译：投影光学系统及光刻法及曝光装置及其使用方法
公开(公告)号：US20080094696A1
公开(公告)日：2008-04-24
申请号：US11907679
申请日：2007-10-16
申请人： Yasuhiro Omura , Hironori Ikezawa
发明人： Yasuhiro Omura , Hironori Ikezawa
IPC分类号： G02B17/08 , G02B3/00
CPC分类号： G02B17/0892 , G02B13/22 , G02B17/08 , G02B21/33 , G03F7/70225 , G03F7/70341
摘要： An immersion optical system includes a liquid immerged optical element having an optical surface which is contactable with a liquid, a convex surface, and an optical axis. A side surface of the liquid immerged optical element is inclined with respect to the optical axis.
摘要翻译：浸入式光学系统包括具有可与液体，凸面和光轴接触的光学表面的液体浸入式光学元件。液体浸没的光学元件的侧表面相对于光轴倾斜。

10. 发明授权

US07348575B2 Projection optical system, exposure apparatus, and exposure method 有权
标题翻译：投影光学系统，曝光装置和曝光方法
公开(公告)号：US07348575B2
公开(公告)日：2008-03-25
申请号：US11266288
申请日：2005-11-04
申请人： Yasuhiro Omura
发明人： Yasuhiro Omura
IPC分类号： G02B17/00 , G02B3/00
CPC分类号： G03F7/7015 , G02B9/34 , G02B17/0844 , G03F7/70225 , G03F7/70341 , H01L21/027
摘要： A catadioptric projection optical system for forming a reduced image of a first surface (R) on a second surface (W) is a relatively compact projection optical system having excellent imaging performance as well corrected for various aberrations, such as chromatic aberration and curvature of field, and being capable of securing a large effective image-side numerical aperture while suitably suppressing reflection loss on optical surfaces. The projection optical system comprises at least two reflecting mirrors (CM1, CM2), and a boundary lens (Lb) whose surface on the first surface side has a positive refracting power, and an optical path between the boundary lens and the second surface is filled with a medium (Lm) having a refractive index larger than 1.1. Every transmitting member and every reflecting member with a refracting power forming the projection optical system are arranged along a single optical axis (AX) and the projection optical system has an effective imaging area of a predetermined shape not including the optical axis.
摘要翻译：用于在第二表面（W）上形成第一表面（R）的缩小图像的反射折射投影光学系统是具有优异成像性能的相对紧凑的投影光学系统，并且还针对各种像差进行校正，例如色差和曲率并且能够确保大的有效的图像侧数值孔径，同时适当地抑制光学表面上的反射损失。投影光学系统包括至少两个反射镜（CM 1，CM 2）以及其表面在第一表面侧具有正折射力的边界透镜（Lb）和边界透镜与第二表面之间的光路填充有折射率大于1.1的介质（Lm）。形成投影光学系统的每个透射构件和具有折射力的每个反射构件沿着单个光轴（AX）布置，并且投影光学系统具有不包括光轴的预定形状的有效成像区域。

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