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1. 发明申请

US20120097331A1 GAS FLOW DISTRIBUTION RECEPTACLES, PLASMA GENERATOR SYSTEMS, AND METHODS FOR PERFORMING PLASMA STRIPPING PROCESSES 审中-公开
标题翻译：气体流量分配装置，等离子体发生器系统和执行等离子体剥离方法的方法
公开(公告)号：US20120097331A1
公开(公告)日：2012-04-26
申请号：US13342757
申请日：2012-01-03
申请人： Huatan Qiu , Woody Chung , Anirban Guha , David Cheung
发明人： Huatan Qiu , Woody Chung , Anirban Guha , David Cheung
IPC分类号： H01L21/3065
CPC分类号： H01J37/3244 , C23C16/45519 , H01J37/32449 , H01L21/31138
摘要： Systems, system components, and methods for plasma stripping are provided. In an embodiment, a gas flow distribution receptacle may have a rounded section that includes an inner surface defining a reception cavity, an outer surface forming an enclosed end, and a centerpoint on the outer surface having a longitudinal axis extending therethrough and through the reception cavity. First and second rings of openings provide flow communication with the plasma chamber. The second ring of openings are disposed between the first ring and the centerpoint, and each opening of the second ring of openings extends between the inner and outer surfaces at a second angle relative to the longitudinal axis that is less than the first angle and has a diameter that is substantially identical to a diameter of an adjacent opening and smaller than the diameters of an opening of the first ring of openings.
摘要翻译：提供了用于等离子体剥离的系统，系统组件和方法。在一个实施例中，气流分配容座可以具有圆形部分，该圆形部分包括限定接收腔的内表面，形成封闭端的外表面和外表面上的中心点，其具有延伸穿过其中的纵向轴线并且通过接收腔。第一和第二开口环提供与等离子体室的流动连通。所述第二开口环设置在所述第一环和所述中心点之间，并且所述第二开口环的每个开口在所述内表面和所述外表面之间以相对于所述纵向轴线的第二角度延伸，所述纵向轴线小于所述第一角度并具有直径基本上与相邻开口的直径相同，并且小于第一开口环的开口的直径。

2. 发明授权

US09209000B2 Gas flow distribution receptacles, plasma generator systems, and methods for performing plasma stripping processes 有权
标题翻译：气体流量分配容器，等离子体发生器系统和用于执行等离子体剥离工艺的方法
公开(公告)号：US09209000B2
公开(公告)日：2015-12-08
申请号：US13342757
申请日：2012-01-03
申请人： Huatan Qiu , Woody Chung , Anirban Guha , David Cheung
发明人： Huatan Qiu , Woody Chung , Anirban Guha , David Cheung
IPC分类号： H01J37/32 , C23C16/455 , H01L21/311
CPC分类号： H01J37/3244 , C23C16/45519 , H01J37/32449 , H01L21/31138
摘要： Systems, system components, and methods for plasma stripping are provided. In an embodiment, a gas flow distribution receptacle may have a rounded section that includes an inner surface defining a reception cavity, an outer surface forming an enclosed end, and a centerpoint on the outer surface having a longitudinal axis extending therethrough and through the reception cavity. First and second rings of openings provide flow communication with the plasma chamber. The second ring of openings are disposed between the first ring and the centerpoint, and each opening of the second ring of openings extends between the inner and outer surfaces at a second angle relative to the longitudinal axis that is less than the first angle and has a diameter that is substantially identical to a diameter of an adjacent opening and smaller than the diameters of an opening of the first ring of openings.
摘要翻译：提供了用于等离子体剥离的系统，系统组件和方法。在一个实施例中，气流分配容座可以具有圆形部分，该圆形部分包括限定接收腔的内表面，形成封闭端的外表面和外表面上的中心点，其具有延伸穿过其中的纵向轴线并且通过接收腔。第一和第二开口环提供与等离子体室的流动连通。所述第二开口环设置在所述第一环和所述中心点之间，并且所述第二开口环的每个开口在所述内表面和所述外表面之间以相对于所述纵向轴线的第二角度延伸，所述纵向轴线小于所述第一角度并具有直径基本上与相邻开口的直径相同，并且小于第一开口环的开口的直径。

3. 发明申请

US20090236313A1 GAS FLOW DISTRIBUTION RECEPTACLES, PLASMA GENERATOR SYSTEMS, AND METHODS FOR PERFORMING PLASMA STRIPPING PROCESSES 有权
标题翻译：气体流量分配装置，等离子体发生器系统和执行等离子体剥离方法的方法
公开(公告)号：US20090236313A1
公开(公告)日：2009-09-24
申请号：US12052401
申请日：2008-03-20
申请人： Huatan QIU , Woody CHUNG , Anirban GUHA , David CHEUNG
发明人： Huatan QIU , Woody CHUNG , Anirban GUHA , David CHEUNG
IPC分类号： H01L21/306 , C23F1/02
CPC分类号： H01J37/3244 , C23C16/45519 , H01J37/32449 , H01L21/31138
摘要： Systems, system components, and methods for plasma stripping are provided. In an embodiment, a gas flow distribution receptacle may have a rounded section that includes an inner surface defining a reception cavity, an outer surface forming an enclosed end, and a centerpoint on the outer surface having a longitudinal axis extending therethrough and through the reception cavity. First and second rings of openings provide flow communication with the plasma chamber. The second ring of openings are disposed between the first ring and the centerpoint, and each opening of the second ring of openings extends between the inner and outer surfaces at a second angle relative to the longitudinal axis that is less than the first angle and has a diameter that is substantially identical to a diameter of an adjacent opening and smaller than the diameters of an opening of the first ring of openings.
摘要翻译：提供了用于等离子体剥离的系统，系统组件和方法。在一个实施例中，气流分配容座可以具有圆形部分，该圆形部分包括限定接收腔的内表面，形成封闭端的外表面和外表面上的中心点，其具有延伸穿过其中的纵向轴线并且通过接收腔。第一和第二开口环提供与等离子体室的流动连通。所述第二开口环设置在所述第一环和所述中心点之间，并且所述第二开口环的每个开口在所述内表面和所述外表面之间以相对于所述纵向轴线的第二角度延伸，所述纵向轴线小于所述第一角度并具有直径基本上与相邻开口的直径相同，并且小于第一开口环的开口的直径。

4. 发明授权

US08110068B2 Gas flow distribution receptacles, plasma generator systems, and methods for performing plasma stripping processes 有权
标题翻译：气体流量分配容器，等离子体发生器系统和用于执行等离子体剥离工艺的方法
公开(公告)号：US08110068B2
公开(公告)日：2012-02-07
申请号：US12052401
申请日：2008-03-20
申请人： Huatan Qiu , Woody Chung , Anirban Guha , David Cheung
发明人： Huatan Qiu , Woody Chung , Anirban Guha , David Cheung
IPC分类号： H01L21/3065 , C23C16/00 , C23C16/455
CPC分类号： H01J37/3244 , C23C16/45519 , H01J37/32449 , H01L21/31138
摘要： Systems, system components, and methods for plasma stripping are provided. In an embodiment, a gas flow distribution receptacle may have a rounded section that includes an inner surface defining a reception cavity, an outer surface forming an enclosed end, and a centerpoint on the outer surface having a longitudinal axis extending therethrough and through the reception cavity. First and second rings of openings provide flow communication with the plasma chamber. The second ring of openings are disposed between the first ring and the centerpoint, and each opening of the second ring of openings extends between the inner and outer surfaces at a second angle relative to the longitudinal axis that is less than the first angle and has a diameter that is substantially identical to a diameter of an adjacent opening and smaller than the diameters of an opening of the first ring of openings.
摘要翻译：提供了用于等离子体剥离的系统，系统组件和方法。在一个实施例中，气流分配容座可以具有圆形部分，该圆形部分包括限定接收腔的内表面，形成封闭端的外表面和外表面上的中心点，其具有延伸穿过其中的纵向轴线并且通过接收腔。第一和第二开口环提供与等离子体室的流动连通。所述第二开口环设置在所述第一环和所述中心点之间，并且所述第二开口环的每个开口在所述内表面和所述外表面之间以相对于所述纵向轴线的第二角度延伸，所述纵向轴线小于所述第一角度并具有直径基本上与相邻开口的直径相同，并且小于第一开口环的开口的直径。

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