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    • 1. 发明授权
    • Selective cooling of sheet to be embossed
    • 选择性冷却要压花的片材
    • US4158070A
    • 1979-06-12
    • US919168
    • 1978-06-26
    • Walter J. Lewicki, Jr.William M. McQuate
    • Walter J. Lewicki, Jr.William M. McQuate
    • B29C59/04B41M1/24B44C1/24D06N7/00B05D5/00
    • B44C1/24B29C59/04B41M1/24D06N7/001
    • A mechanical embossing process wherein a web of material composed of a composite structure having at least a carrier and a thick foam layer to be embossed is heated in an oven to a temperature of 250.degree. F. to 350.degree. F. and thereafter cooled by wetting the carrier, which is the back surface of the web, to approximately 100.degree. F. below the top surface of the web prior to embossing of the foam. In certain areas of the web, hot spots may occur resulting in a top surface-back surface temperature of less than approximately 100.degree. F. Just prior to embossing, these hot spots are eliminated by selectively and intermittently cooling the back surfaces of the hot spot areas to obtain a top surface-back surface temperature difference of approximately 100.degree. F. The process is used for achieving multilevel mechanical embossing of a fused or cured wear layer in register with a print-on and expanded foam.
    • 一种机械压花方法,其中由至少具有载体的复合结构材料和待压花的厚泡沫层组成的材料网在烘箱中加热至250°F至350°F的温度,然后通过润湿 作为网的后表面的载体在压花泡沫之前在幅材的顶表面下方约为100°F。 在网的某些区域中,可能会发生热点,导致上表面温度低于约100°F。恰好在压花之前,通过选择性地和间歇地冷却热点的背面来消除这些热点 获得约100°F的顶表面温度差的区域。该方法用于实现与印刷和膨胀泡沫对准的熔融或固化的耐磨层的多层机械压花。
    • 7. 发明授权
    • Apparatus for placing particles in a pattern onto a substrate
    • 用于将图案中的颗粒放置在基底上的装置
    • US06855205B2
    • 2005-02-15
    • US10354605
    • 2003-01-30
    • William M. McQuateElizabeth A. MalkowskiJohn J. OrlandoDavid A. Kraft
    • William M. McQuateElizabeth A. MalkowskiJohn J. OrlandoDavid A. Kraft
    • B05C1/10B05C19/04B05D1/32B05D5/06B41F15/08
    • B05D1/32B05C1/10B05C19/04B05D5/06B05D2401/32B41F15/0836Y10T428/24479
    • An apparatus for placing particles onto a substrate, methods for using the apparatus to deposit particles on a substrate and substrates prepared using the apparatus are disclosed. The apparatus includes a rotary screen, a blade disposed for directing and urging the particles through the screen, and a sheet mounted in a position to receive the particles from a feeder and deliver the particles to the rotary screen substantially across the blade. The apparatus can include a frame on which a rotary screen is rotatably mounted and a feed system disposed within and extending substantially along the length of the screen for distributing the particles. The apparatus can optionally include a vacuum means, an anti-static means and/or collection pans for handling stray particles. The screen can include a series of openings in the form of a pattern, and can be used to place particles in a pattern in register with a design or pattern on a substrate as the substrate passes under the openings in the screen.
    • 公开了一种用于将颗粒放置在基板上的装置,使用该装置将颗粒沉积在基板上的方法和使用该装置制备的基板。 该设备包括旋转筛网,设置用于引导和推动颗粒通过筛网的叶片,以及安装在从进料器接收颗粒的位置的片材,并将颗粒基本上跨过叶片输送到旋转筛网。 该装置可以包括框架,旋转屏幕可旋转地安装在该框架上,并且馈送系统设置在基本上沿着屏幕的长度延伸并且用于分配颗粒的延伸部分。 该设备可以可选地包括用于处理杂散颗粒的真空装置,防静电装置和/或收集盘。 屏幕可以包括一个图案形式的一系列开口,并且当衬底通过屏幕上的开口下方时,可以将颗粒放置在与衬底上的设计或图案对齐的图案中。