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    • 8. 发明授权
    • Fabrication of ferroelectric capacitor and memory cell
    • 铁电电容器和存储单元的制造
    • US5536672A
    • 1996-07-16
    • US950795
    • 1992-09-24
    • William D. MillerJoseph T. EvansWayne I. KinneyWilliam H. Shepherd
    • William D. MillerJoseph T. EvansWayne I. KinneyWilliam H. Shepherd
    • H01L27/115H01L21/70
    • H01L27/11502
    • A ferroelectric capacitor structure is designed for fabrication together with MOS devices on a semiconductor substrate. The ferroelectric capacitor includes a diffusion barrier above the surface of the substrate for preventing the materials of the ferroelectric capacitor from contaminating the substrate or MOS devices. The ferroelectric capacitor comprises a bottom electrode, a thin film ferroelectric layer and a top electrode. An interlayer dielectric is formed to cover portions of the ferroelectric thin film and provide an opening therethrough for the top electrode. A ferroelectric memory cell comprises a field effect transistor together with a ferroelectric capacitor fabricated on a semiconductor substrate. In one configuration, the ferroelectric capacitor is offset from the field effect transistor, while in another configuration, the ferroelectric capacitor is substantially above the field effect transistor to provide greater density.
    • 铁电电容器结构被设计用于与半导体衬底上的MOS器件一起制造。 铁电电容器包括在衬底表面上方的扩散阻挡层,用于防止铁电电容器的材料污染衬底或MOS器件。 铁电电容器包括底电极,薄膜铁电层和顶电极。 形成层间电介质以覆盖铁电薄膜的部分,并提供用于顶部电极的开口。 铁电存储单元包括场效应晶体管和制造在半导体衬底上的铁电电容器。 在一种配置中,铁电电容器偏离场效应晶体管,而在另一种配置中,铁电电容器基本上高于场效应晶体管,以提供更大的密度。