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    • 4. 发明授权
    • Disk plating system
    • 磁盘电镀系统
    • US4822467A
    • 1989-04-18
    • US113872
    • 1987-10-27
    • David YoungRichard LamoureWilliam BrattVincent RuscelloJohn E. Wilson
    • David YoungRichard LamoureWilliam BrattVincent RuscelloJohn E. Wilson
    • C25D17/00
    • C25D17/005C25D17/06
    • The invention is an electroplating apparatus which partially submerges disks in the electrolytic solution, and provides electrical contact to the portions of the disk protruding above the solution. The disks are rotated during plating such that successive portions of the disk emerge from the solution, contact the electrical contact and then re-enter the solution. The disks are inserted into individual disk holders consisting of non-conductive shielding rings attached to a common bracket. The shielding rings are hinged such that the rings may be opened to insert the disks. When the disks are enclosed in the rings, they are supported by small non-conductive support wheels rotatably mounted in the rings. The rings remain stationary as the disks are rotated. To promote even plating, selectively-coated anode sheets are interleaved with the disk holding rings such that each holder has an anode sheet on either side.
    • 本发明是一种电镀设备,其部分地浸没在电解溶液中的盘,并且提供与在溶液上突出的盘的部分的电接触。 盘在电镀过程中旋转,使得盘的连续部分从溶液中出现,接触电接触,然后重新进入溶液。 盘被插入由连接到公共支架的非导电屏蔽环组成的单个盘保持器中。 屏蔽环被铰接,使得环可以打开以插入盘。 当盘被封闭在环中时,它们由可旋转地安装在环中的小的非导电支撑轮支撑。 当盘旋转时,环保持静止。 为了促进均匀电镀,选择性涂覆的阳极片与盘保持环交错,使得每个保持器在任一侧具有阳极片。
    • 6. 发明授权
    • Diamond-like carbon for ion milling magnetic material
    • 用于离子研磨磁性材料的类金刚石碳
    • US5658470A
    • 1997-08-19
    • US571395
    • 1995-12-13
    • Allan E. SchultzL. Vincent RuscelloWilliam H. Nunne
    • Allan E. SchultzL. Vincent RuscelloWilliam H. Nunne
    • C23F4/00G11B5/31B44C1/22C23F1/00
    • C23F4/00G11B5/3163G11B5/3116
    • A diamond-like carbon mask is formed on the surface of the magnetic material for ion-milling the magnetic material into a magnetic pole of a transducer. The mask is formed by depositing a layer of diamond-like carbon over the magnetic material. Successive layers of photoresist, SiO.sub.2 and photoresist are applied over the magnetic material. The second layer of photoresist is patterned in the shape of the pole being formed. The exposed insulating layer is etched with an etchant that does not attack the diamond-like carbon, the exposed portions of the photoresist are exposed and removed, and the exposed portion of the diamond-like carbon is etched with an oxygen etchant. The remaining photoresist is washed away to remove the remaining insulating material. In one form of the invention, a layer of SiO.sub.2 may additionally be formed over the diamond-like carbon to protect the diamond-like carbon from being affected by any undercut of the photoresist by the oxygen etchant. The SiO.sub.2 layer is etched prior to etching the diamond-like carbon. The mask is used to ion mill the magnetic material to the desired pole.
    • 在磁性材料的表面上形成类金刚石碳掩模,用于将磁性材料离子研磨成换能器的磁极。 掩模通过在磁性材料上沉积一层类金刚石碳而形成。 光致抗蚀剂,SiO 2和光致抗蚀剂的连续层被施加在磁性材料上。 第二层光致抗蚀剂被图案化成形成的极的形状。 暴露的绝缘层用不侵蚀类金刚石碳的蚀刻剂蚀刻,光刻胶的暴露部分被暴露和去除,并且用氧蚀刻剂蚀刻类金刚石碳的暴露部分。 洗去剩余的光致抗蚀剂以除去剩余的绝缘材料。 在本发明的一种形式中,还可以在类金刚石碳之上形成SiO 2层,以保护类金刚石碳免受氧蚀刻剂的光刻胶的任何底切的影响。 在蚀刻类金刚石碳之前蚀刻SiO 2层。 该掩模用于将磁性材料离子研磨到所需的极点。