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    • 3. 发明授权
    • Film forming apparatus
    • 成膜装置
    • US5149415A
    • 1992-09-22
    • US580641
    • 1990-09-10
    • Toshio SugitaOsamu Koseki
    • Toshio SugitaOsamu Koseki
    • C23C14/34C23C14/04C23C14/35H01J37/34
    • H01J37/342C23C14/04C23C14/35H01J37/3402
    • Herein disclosed is a film forming apparatus, in which a magnet for generng the lines of magnetic force generally at a right angle with respect to opposed cathodes is disposed at one of the cathodes to shorten the distance from a passage hole through a conduit to an object by the thickness of the magnet, thereby to pass metal particles efficiently. At the same time, a holed plate is supported elastically and in close contact with the object to form a film contouring the shape of the hole of the holed plate correctly. Moreover, the holed plate is made thinner than its diameter to permit sufficient passage of the metal particles through the hole of the holed plate thereby to form a film efficiently. In the film forming apparatus of the present invention, moreover, the magnet of the vacuum chamber at the side of the conduit of the prior art can be dispensed with to make unnecessary the drilling of the magnet and to reduce the number of parts.
    • 这里公开了一种成膜装置,其中用于产生相对于相对阴极大致成直角的磁力线的磁体设置在一个阴极上,以缩短从通过导管通过的物体到物体的距离 通过磁铁的厚度,有效地使金属粒子通过。 同时,孔板被弹性地支撑并与物体紧密接触,以形成使孔板的孔的形状正确地形成的膜。 此外,孔板比其直径更薄,以允许金属颗粒充分通过孔板的孔,从而有效地形成膜。 此外,在本发明的成膜装置中,可以省去现有技术的管道一侧的真空室的磁体,从而不需要对磁体进行钻孔并减少零件的数量。
    • 4. 发明授权
    • Method of correcting defect of patterned article
    • 校正图案制品缺陷的方法
    • US4931307A
    • 1990-06-05
    • US416879
    • 1989-10-04
    • Toshio SugitaHiroyuki FunamotoKazuyoshi FurutaOsamu Koseki
    • Toshio SugitaHiroyuki FunamotoKazuyoshi FurutaOsamu Koseki
    • C23C14/04C23C14/35G03F1/72G03F1/74H01L21/027H01L21/30
    • G03F1/74C23C14/042C23C14/046C23C14/352
    • A method of correcting a missing defect of a patterned film formed on an icle is carried out by steps of providing an operative vacuum chamber having a pin hole, positioning an area of the missing defect outside the vacuum chamber in registration with the pin hole, operating the vacuum chamber to cause therein cold cathode discharging to generate particles, and directing a stream of the particles through the pin hole onto the area of the missing defect to deposit thereon a corrective film of the particles. A method of correcting a remaining defect of a patterned film formed on an article is carried out by steps of providing an operative vacuum chamber having a pin hole, positioning an area of the remaining defect outside the vacuum chamber in registration with the pin hole, operating the vacuum chamber to cause therein cold cathode discharging to generate particles and gas ions, and directing a stream of the particles and gas ions through the pin hole onto the area of the remaining defect to thereby remove therefrom a left patterned film to correct the remaining defect.
    • 通过提供具有针孔的操作真空室的步骤来进行校正在物品上形成的图案化膜的缺失缺陷的方法,将缺陷缺陷的区域定位在真空室外与针孔对准,操作 真空室在其中引起冷阴极排放以产生颗粒,并且将颗粒流通过针孔引导到缺失缺陷的区域上以在其上沉积颗粒的校正膜。 通过提供具有针孔的操作真空室的步骤来进行校正形成在制品上的图案化膜的剩余缺陷的方法,将剩余缺陷的区域定位在真空室外与销孔对准,操作 真空室在其中引起冷阴极排放以产生颗粒和气体离子,并将颗粒和气体离子流引导通过针孔延伸到剩余缺陷的区域上,从而从其去除左图案化膜以校正剩余缺陷 。