专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20110235895A1 PATTERN INSPECTION APPARATUS AND METHOD 有权
标题翻译：图案检查装置及方法
公开(公告)号：US20110235895A1
公开(公告)日：2011-09-29
申请号：US13152227
申请日：2011-06-02
申请人： Tadashi Kitamura , Toshiaki Hasebe , Masotoshi Tsuneoka
发明人： Tadashi Kitamura , Toshiaki Hasebe , Masotoshi Tsuneoka
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G06K9/00 , G06K2209/19 , G06T2207/30148
摘要： A pattern inspection apparatus is used for inspecting a fine pattern, such as a semiconductor integrated circuit (LSI), a liquid crystal panel, and a photomask (reticle) for the semiconductor or the liquid crystal panel, which are fabricated based on data for fabricating the fine pattern such as design data. The pattern inspection apparatus includes a reference pattern generation device configured to generate a reference pattern represented by one or more lines, comprising one of a line segment and a curve, from the data, an image generation device configured to generate the image of the pattern to-be-inspected, a detecting device configured to detect an edge of the image of the pattern to-be-inspected, and an inspection device configured to inspect the pattern to-be-inspected by comparing the edge of the image of the pattern to-be-inspected with the one or more lines of the reference pattern.
摘要翻译：图案检查装置用于检查用于半导体或液晶面板的半导体集成电路（LSI），液晶面板和光掩模（掩模版）等精细图案，其基于用于制造的数据精细图案如设计数据。图案检查装置包括：参考图案生成装置，被配置为从数据生成包括线段和曲线中的一个或多个线的代表的参考图案，被配置为生成图案的图像的图像生成装置被检查的检测装置，被配置为检测所述待检查图案的边缘的检测装置;以及检查装置，被配置为通过将所述图案的图像的边缘与所述图案的边缘进行比较来检查所述图案，用参考图案的一行或多行进行检查。

2. 发明申请

US20100303334A1 PATTERN INSPECTION APPARATUS AND METHOD 有权
标题翻译：图案检查装置及方法
公开(公告)号：US20100303334A1
公开(公告)日：2010-12-02
申请号：US12852314
申请日：2010-08-06
申请人： Tadashi KITAMURA , Kazufumi KUBOTA , Shinichi NAKAZAWA , Neeti VOHRA , Masahiro YAMAMOTO , Toshiaki HASEBE
发明人： Tadashi KITAMURA , Kazufumi KUBOTA , Shinichi NAKAZAWA , Neeti VOHRA , Masahiro YAMAMOTO , Toshiaki HASEBE
IPC分类号： G06K9/00 , G06K9/48 , G06K9/62
CPC分类号： G06K9/2054 , G06K9/00 , G06K9/036 , G06K9/48 , G06K2209/19 , G06T7/0004 , G06T7/001 , G06T2207/30148 , H01J37/265 , H01J37/28 , H01J2237/2817
摘要： A fine pattern, such as a semiconductor integrated circuit (LSI), a liquid crystal panel, and a photomask (reticle) for the semiconductor or the liquid crystal panel, which are fabricated based on data for fabricating the fine pattern such as design data is inspected by a pattern inspection apparatus. The pattern inspection apparatus for inspecting a pattern to-be-inspected uses an image of the pattern to-be-inspected and data for fabricating the pattern to-be-inspected. The pattern inspection apparatus includes a reference pattern generation device configured to generate a reference pattern represented by one or more lines from the data, an image generation device configured to generate the image of the pattern to-be-inspected, a detecting device configured to detect an edge of the image of the pattern to-be-inspected, and an inspection device configured to inspect the pattern to-be-inspected by comparing edges of the image of the pattern to-be-inspected with the one or more lines of the reference pattern.
摘要翻译：基于用于制造诸如设计数据的精细图案的数据制造的诸如用于半导体或液晶面板的半导体集成电路（LSI），液晶面板和光掩模（掩模版））的精细图案是由图案检查装置检查。用于检查待检查图案的图案检查装置使用要检查的图案的图像和用于制造待检查图案的数据。图案检查装置包括参考图案生成装置，被配置为从数据生成由一行或多行表示的参考图案，被配置为生成待检查图案的图像的图像生成装置，被配置为检测要检查的图案的边缘;以及检查装置，其被配置为通过将待检查的图案的图像的边缘与所述待检查的图案的边缘进行比较来检查待检查的图案，参考模式。

3. 发明授权

US09189843B2 Pattern inspection apparatus and method 有权
标题翻译：图案检验装置及方法
公开(公告)号：US09189843B2
公开(公告)日：2015-11-17
申请号：US13604456
申请日：2012-09-05
申请人： Tadashi Kitamura , Toshiaki Hasebe , Masotoshi Tsuneoka
发明人： Tadashi Kitamura , Toshiaki Hasebe , Masotoshi Tsuneoka
IPC分类号： G06K9/00 , G06T7/00
CPC分类号： G06T7/001 , G06K9/00 , G06K2209/19 , G06T2207/30148
摘要： A pattern inspection apparatus is used for inspecting a fine pattern, such as a semiconductor integrated circuit (LSI), a liquid crystal panel, and a photomask (reticle) for the semiconductor or the liquid crystal panel, which are fabricated based on data for fabricating the fine pattern such as design data. The pattern inspection apparatus includes a reference pattern generation device configured to generate a reference pattern represented by one or more lines, comprising one of a line segment and a curve, from the data, an image generation device configured to generate the image of the pattern to-be-inspected, a detecting device configured to detect an edge of the image of the pattern to-be-inspected, and an inspection device configured to inspect the pattern to-be-inspected by comparing the edge of the image of the pattern to-be-inspected with the one or more lines of the reference pattern.
摘要翻译：图案检查装置用于检查用于半导体或液晶面板的半导体集成电路（LSI），液晶面板和光掩模（掩模版）等精细图案，其基于用于制造的数据制造精细图案如设计数据。图案检查装置包括：参考图案生成装置，被配置为从数据生成包括线段和曲线中的一个或多个线的代表的参考图案，被配置为生成图案的图像的图像生成装置被检查的检测装置，被配置为检测所述待检查图案的边缘的检测装置;以及检查装置，被配置为通过将所述图案的图像的边缘与所述图案的边缘进行比较来检查所述图案，用参考图案的一行或多行进行检查。

4. 发明申请

US20120328181A1 PATTERN INSPECTION APPARATUS AND METHOD 有权
标题翻译：图案检查装置及方法
公开(公告)号：US20120328181A1
公开(公告)日：2012-12-27
申请号：US13604456
申请日：2012-09-05
申请人： Tadashi Kitamura , Toshiaki Hasebe , Masatoshi Tsuneoka
发明人： Tadashi Kitamura , Toshiaki Hasebe , Masatoshi Tsuneoka
IPC分类号： G06K9/62
CPC分类号： G06T7/001 , G06K9/00 , G06K2209/19 , G06T2207/30148
摘要： A pattern inspection apparatus is used for inspecting a fine pattern, such as a semiconductor integrated circuit (LSI), a liquid crystal panel, and a photomask (reticle) for the semiconductor or the liquid crystal panel, which are fabricated based on data for fabricating the fine pattern such as design data. The pattern inspection apparatus includes a reference pattern generation device configured to generate a reference pattern represented by one or more lines, comprising one of a line segment and a curve, from the data, an image generation device configured to generate the image of the pattern to-be-inspected, a detecting device configured to detect an edge of the image of the pattern to-be-inspected, and an inspection device configured to inspect the pattern to-be-inspected by comparing the edge of the image of the pattern to-be-inspected with the one or more lines of the reference pattern.
摘要翻译：图案检查装置用于检查用于半导体或液晶面板的半导体集成电路（LSI），液晶面板和光掩模（掩模版）等精细图案，其基于用于制造的数据制造精细图案如设计数据。图案检查装置包括：参考图案生成装置，被配置为从数据生成包括线段和曲线中的一个或多个线的代表的参考图案，被配置为生成图案的图像的图像生成装置被检查的检测装置，被配置为检测所述待检查图案的边缘的检测装置;以及检查装置，被配置为通过将所述图案的图像的边缘与所述图案的边缘进行比较来检查所述图案，用参考图案的一行或多行进行检查。

5. 发明授权

US07983471B2 Pattern inspection apparatus and method 有权
标题翻译：图案检验装置及方法
公开(公告)号：US07983471B2
公开(公告)日：2011-07-19
申请号：US11987766
申请日：2007-12-04
申请人： Tadashi Kitamura , Toshiaki Hasebe , Masatoshi Tsuneoka
发明人： Tadashi Kitamura , Toshiaki Hasebe , Masatoshi Tsuneoka
IPC分类号： G06K9/00 , G06K9/48 , G06K9/62
CPC分类号： G06T7/001 , G06K9/00 , G06K2209/19 , G06T2207/30148
摘要： A pattern inspection apparatus is used for inspecting a fine pattern, such as a semiconductor integrated circuit (LSI), a liquid crystal panel, and a photomask (reticle) for the semiconductor or the liquid crystal panel, which are fabricated based on data for fabricating the fine pattern such as design data. The pattern inspection apparatus includes a reference pattern generation device configured to generate a reference pattern represented by one or more lines, comprising one of a line segment and a curve, from the data, an image generation device configured to generate the image of the pattern to-be-inspected, a detecting device configured to detect an edge of the image of the pattern to-be-inspected, and an inspection device configured to inspect the pattern to-be-inspected by comparing the edge of the image of the pattern to-be-inspected with the one or more lines of the reference pattern.
摘要翻译：图案检查装置用于检查用于半导体或液晶面板的半导体集成电路（LSI），液晶面板和光掩模（掩模版）等精细图案，其基于用于制造的数据制造精细图案如设计数据。图案检查装置包括：参考图案生成装置，被配置为从数据生成包括线段和曲线中的一个或多个线的代表的参考图案，被配置为生成图案的图像的图像生成装置被检查的检测装置，被配置为检测所述待检查图案的边缘的检测装置;以及检查装置，被配置为通过将所述图案的图像的边缘与所述图案的边缘进行比较来检查所述图案，用参考图案的一行或多行进行检查。

6. 发明授权

US07796801B2 Pattern inspection apparatus and method 有权
标题翻译：图案检验装置及方法
公开(公告)号：US07796801B2
公开(公告)日：2010-09-14
申请号：US11434797
申请日：2006-05-17
申请人： Tadashi Kitamura , Kazufumi Kubota , Shinichi Nakazawa , Neeti Vohra , Masahiro Yamamoto , Toshiaki Hasebe
发明人： Tadashi Kitamura , Kazufumi Kubota , Shinichi Nakazawa , Neeti Vohra , Masahiro Yamamoto , Toshiaki Hasebe
IPC分类号： G06K9/00 , G06K9/48 , G06K9/62
CPC分类号： G06K9/2054 , G06K9/00 , G06K9/036 , G06K9/48 , G06K2209/19 , G06T7/0004 , G06T7/001 , G06T2207/30148 , H01J37/265 , H01J37/28 , H01J2237/2817
摘要： A fine pattern, such as a semiconductor integrated circuit (LSI), a liquid crystal panel, and a photomask (reticle) for the semiconductor or the liquid crystal panel, which are fabricated based on data for fabricating the fine pattern such as design data is inspected by a pattern inspection apparatus. The pattern inspection apparatus for inspecting a pattern to-be-inspected uses an image of the pattern to-be-inspected and data for fabricating the pattern to-be-inspected. The pattern inspection apparatus includes a reference pattern generation device configured to generate a reference pattern represented by one or more lines from the data, an image generation device configured to generate the image of the pattern to-be-inspected, a detecting device configured to detect an edge of the image of the pattern to-be-inspected, and an inspection device configured to inspect the pattern to-be-inspected by comparing the edge of the image of the pattern to-be-inspected with the one or more lines of the reference pattern.
摘要翻译：基于用于制造诸如设计数据的精细图案的数据制造的诸如用于半导体或液晶面板的半导体集成电路（LSI），液晶面板和光掩模（掩模版））的精细图案是由图案检查装置检查。用于检查待检查图案的图案检查装置使用要检查的图案的图像和用于制造待检查图案的数据。图案检查装置包括参考图案生成装置，被配置为从数据生成由一行或多行表示的参考图案，被配置为生成待检查图案的图像的图像生成装置，被配置为检测要检查的图案的边缘，以及检查装置，其被配置为通过将待检查的图案的图像的边缘与所述待检查的图案的边缘进行比较来检查待检查的图案，参考模式。

7. 发明申请

US20060245636A1 Pattern inspection apparatus and method 有权
标题翻译：图案检验装置及方法
公开(公告)号：US20060245636A1
公开(公告)日：2006-11-02
申请号：US11434797
申请日：2006-05-17
申请人： Tadashi Kitamura , Kazufumi Kubota , Shinichi Nakazawa , Neeti Vohra , Masahiro Yamamoto , Toshiaki Hasebe
发明人： Tadashi Kitamura , Kazufumi Kubota , Shinichi Nakazawa , Neeti Vohra , Masahiro Yamamoto , Toshiaki Hasebe
IPC分类号： G06K9/00
CPC分类号： G06K9/2054 , G06K9/00 , G06K9/036 , G06K9/48 , G06K2209/19 , G06T7/0004 , G06T7/001 , G06T2207/30148 , H01J37/265 , H01J37/28 , H01J2237/2817
摘要： A fine pattern, such as a semiconductor integrated circuit (LSI), a liquid crystal panel, and a photomask (reticle) for the semiconductor or the liquid crystal panel, which are fabricated based on data for fabricating the fine pattern such as design data is inspected by a pattern inspection apparatus. The pattern inspection apparatus for inspecting a pattern to-be-inspected uses an image of the pattern to-be-inspected and data for fabricating the pattern to-be-inspected. The pattern inspection apparatus includes a reference pattern generation device configured to generate a reference pattern represented by one or more lines from the data, an image generation device configured to generate the image of the pattern to-be-inspected, a detecting device configured to detect an edge of the image of the pattern to-be-inspected, and an inspection device configured to inspect the pattern to-be-inspected by comparing the edge of the image of the pattern to-be-inspected with the one or more lines of the reference pattern.
摘要翻译：基于用于制造诸如设计数据的精细图案的数据制造的诸如用于半导体或液晶面板的半导体集成电路（LSI），液晶面板和光掩模（掩模版））的精细图案是由图案检查装置检查。用于检查待检查图案的图案检查装置使用要检查的图案的图像和用于制造待检查图案的数据。图案检查装置包括参考图案生成装置，被配置为从数据生成由一行或多行表示的参考图案，被配置为生成待检查图案的图像的图像生成装置，被配置为检测要检查的图案的边缘，以及检查装置，其被配置为通过将待检查的图案的图像的边缘与所述待检查的图案的边缘进行比较来检查待检查的图案，参考模式。

8. 发明授权

US08285031B2 Pattern inspection apparatus and method 有权
标题翻译：图案检验装置及方法
公开(公告)号：US08285031B2
公开(公告)日：2012-10-09
申请号：US13152227
申请日：2011-06-02
申请人： Tadashi Kitamura , Toshiaki Hasebe , Masotoshi Tsuneoka
发明人： Tadashi Kitamura , Toshiaki Hasebe , Masotoshi Tsuneoka
IPC分类号： G06K9/00 , G06K9/48 , G06K9/62
CPC分类号： G06T7/001 , G06K9/00 , G06K2209/19 , G06T2207/30148
摘要： A pattern inspection apparatus is used for inspecting a fine pattern, such as a semiconductor integrated circuit (LSI), a liquid crystal panel, and a photomask (reticle) for the semiconductor or the liquid crystal panel, which are fabricated based on data for fabricating the fine pattern such as design data. The pattern inspection apparatus includes a reference pattern generation device configured to generate a reference pattern represented by one or more lines, comprising one of a line segment and a curve, from the data, an image generation device configured to generate the image of the pattern to-be-inspected, a detecting device configured to detect an edge of the image of the pattern to-be-inspected, and an inspection device configured to inspect the pattern to-be-inspected by comparing the edge of the image of the pattern to-be-inspected with the one or more lines of the reference pattern.
摘要翻译：图案检查装置用于检查用于半导体或液晶面板的半导体集成电路（LSI），液晶面板和光掩模（掩模版）等精细图案，其基于用于制造的数据制造精细图案如设计数据。图案检查装置包括：参考图案生成装置，被配置为从数据生成包括线段和曲线中的一个或多个线的代表的参考图案，被配置为生成图案的图像的图像生成装置被检查的检测装置，被配置为检测所述待检查图案的边缘的检测装置;以及检查装置，被配置为通过将所述图案的图像的边缘与所述图案的边缘进行比较来检查所述图案，用参考图案的一行或多行进行检查。

9. 发明授权

US08045785B2 Pattern inspection apparatus and method 有权
标题翻译：图案检验装置及方法
公开(公告)号：US08045785B2
公开(公告)日：2011-10-25
申请号：US12852314
申请日：2010-08-06
申请人： Tadashi Kitamura , Kazufumi Kubota , Shinichi Nakazawa , Neeti Vohra , Masahiro Yamamoto , Toshiaki Hasebe
发明人： Tadashi Kitamura , Kazufumi Kubota , Shinichi Nakazawa , Neeti Vohra , Masahiro Yamamoto , Toshiaki Hasebe
IPC分类号： G06K9/00 , G06K9/48 , G06K9/62
CPC分类号： G06K9/2054 , G06K9/00 , G06K9/036 , G06K9/48 , G06K2209/19 , G06T7/0004 , G06T7/001 , G06T2207/30148 , H01J37/265 , H01J37/28 , H01J2237/2817
摘要： A fine pattern, such as a semiconductor integrated circuit (LSI), a liquid crystal panel, and a photomask (reticle) for the semiconductor or the liquid crystal panel, which are fabricated based on data for fabricating the fine pattern such as design data is inspected by a pattern inspection apparatus. The pattern inspection apparatus for inspecting a pattern to-be-inspected uses an image of the pattern to-be-inspected and data for fabricating the pattern to-be-inspected. The pattern inspection apparatus includes a reference pattern generation device configured to generate a reference pattern represented by one or more lines from the data, an image generation device configured to generate the image of the pattern to-be-inspected, a detecting device configured to detect an edge of the image of the pattern to-be-inspected, and an inspection device configured to inspect the pattern to-be-inspected by comparing edges of the image of the pattern to-be-inspected with the one or more lines of the reference pattern.
摘要翻译：基于用于制造诸如设计数据的精细图案的数据制造的诸如用于半导体或液晶面板的半导体集成电路（LSI），液晶面板和光掩模（掩模版））的精细图案是由图案检查装置检查。用于检查待检查图案的图案检查装置使用要检查的图案的图像和用于制造待检查图案的数据。图案检查装置包括参考图案生成装置，被配置为从数据生成由一行或多行表示的参考图案，被配置为生成待检查图案的图像的图像生成装置，被配置为检测要检查的图案的边缘;以及检查装置，其被配置为通过将待检查的图案的图像的边缘与所述待检查的图案的边缘进行比较来检查待检查的图案，参考模式。

10. 发明申请

US20080130982A1 Pattern inspection apparatus and method 有权
标题翻译：图案检验装置及方法
公开(公告)号：US20080130982A1
公开(公告)日：2008-06-05
申请号：US11987766
申请日：2007-12-04
申请人： Tadashi Kitamura , Toshiaki Hasebe , Masatoshi Tsuneoka
发明人： Tadashi Kitamura , Toshiaki Hasebe , Masatoshi Tsuneoka
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G06K9/00 , G06K2209/19 , G06T2207/30148
摘要： A pattern inspection apparatus is used for inspecting a fine pattern, such as a semiconductor integrated circuit (LSI), a liquid crystal panel, and a photomask (reticle) for the semiconductor or the liquid crystal panel, which are fabricated based on data for fabricating the fine pattern such as design data. The pattern inspection apparatus includes a reference pattern generation device configured to generate a reference pattern represented by one or more lines, comprising one of a line segment and a curve, from the data, an image generation device configured to generate the image of the pattern to-be-inspected, a detecting device configured to detect an edge of the image of the pattern to-be-inspected, and an inspection device configured to inspect the pattern to-be-inspected by comparing the edge of the image of the pattern to-be-inspected with the one or more lines of the reference pattern.
摘要翻译：图案检查装置用于检查用于半导体或液晶面板的半导体集成电路（LSI），液晶面板和光掩模（掩模版）等精细图案，其基于用于制造的数据制造精细图案如设计数据。图案检查装置包括：参考图案生成装置，被配置为从数据生成包括线段和曲线中的一个或多个线的代表的参考图案，被配置为生成图案的图像的图像生成装置被检查的检测装置，被配置为检测所述待检查图案的边缘的检测装置;以及检查装置，被配置为通过将所述图案的图像的边缘与所述图案的边缘进行比较来检查所述图案，用参考图案的一行或多行进行检查。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式