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1. 发明授权

US09139932B2 Quartz glass crucible and method for treating surface of quartz glass crucible 有权
标题翻译：石英玻璃坩埚及石英玻璃坩埚表面处理方法
公开(公告)号：US09139932B2
公开(公告)日：2015-09-22
申请号：US11899786
申请日：2007-09-07
申请人： Richard Lee Hansen , Theodore P. Kircher , Narsi Devanathan
发明人： Richard Lee Hansen , Theodore P. Kircher , Narsi Devanathan
IPC分类号： C30B15/10 , C03C17/30 , C30B29/06 , C30B35/00
CPC分类号： C30B15/10 , C03C17/30 , C03C2218/31 , C30B29/06 , C30B35/002 , Y10T117/1024 , Y10T428/31612
摘要： There is provided a quartz glass article having a surface treated with novel coating materials which provides a reduced chemistry, wherein the quartz glass surface having a reduced chemistry upon exposure to melted silicon or similarly corrosive environments, forms crystalline structures covering at least 30% of the coated surface of the quartz glass crucible. Said crystalline covered surface provides a more stable surface of contact with the silicon melt and the growth of single crystal silicon. In one embodiment of the invention, the coating material comprises at least a methyl group for providing at least one of a hydrogenated and a methylated surface on the coated surface, forming rosette structures, or other crystalline morphologies covering at last 80% of the coated surface. In another embodiment of the invention, the coating material is selected from at least one of an amine, an organosilane halogen and mixtures thereof.
摘要翻译：提供了一种石英玻璃制品，其具有用新的涂层材料处理的表面，其提供减少的化学性质，其中在暴露于熔融硅或类似的腐蚀性环境时具有化学成分降低的石英玻璃表面形成覆盖至少30％石英玻璃坩埚的涂层表面。所述晶体覆盖表面提供与硅熔体更接近的稳定表面和单晶硅的生长。在本发明的一个实施方案中，涂层材料至少包含用于提供涂覆表面上的氢化和甲基化表面中的至少一种的甲基，形成玫瑰花结构或覆盖涂层表面的最后80％的其它结晶形态。在本发明的另一个实施方案中，涂料选自胺，有机硅烷卤素及其混合物中的至少一种。

2. 发明授权

US07452518B2 Process for treating synthetic silica powder and synthetic silica powder treated thereof 有权
标题翻译：处理合成二氧化硅粉末和合成二氧化硅粉末的方法
公开(公告)号：US07452518B2
公开(公告)日：2008-11-18
申请号：US11266575
申请日：2005-11-02
申请人： Richard L. Hansen , Theodore P. Kircher , Douglas M. Korwin
发明人： Richard L. Hansen , Theodore P. Kircher , Douglas M. Korwin
IPC分类号： C01B33/158
CPC分类号： C01B33/18 , C03C1/022
摘要： A process for producing a synthetic quartz glass powder which is substantially free of carbon contaminant, for reduced bubble density and improved stability of articles made from the synthetic quartz glass during fusion molding by maintaining the synthetic silica powder in an oxidizing environment, e.g., an atmosphere comprising at least 3 vol. % ozone at a temperature of less than 1400° C., causing carbon containing compounds to be reduced to less than 10 ppm.
摘要翻译：一种制造基本上不含碳污染物的合成石英玻璃粉末的方法，用于通过将合成二氧化硅粉末保持在氧化环境例如大气中，在熔融成型期间通过合成石英玻璃制造的制品的气泡密度降低和稳定性提高包括至少3体积％在低于1400℃的温度下的臭氧％，使含碳化合物减少到小于10ppm。

3. 发明申请

US20080092804A1 Quartz glass crucible and method for treating surface of quartz glass crucible 有权
标题翻译：石英玻璃坩埚及石英玻璃坩埚表面处理方法
公开(公告)号：US20080092804A1
公开(公告)日：2008-04-24
申请号：US11899786
申请日：2007-09-07
申请人： Richard Lee Hansen , Theodore P. Kircher , Narsi Devanathan
发明人： Richard Lee Hansen , Theodore P. Kircher , Narsi Devanathan
IPC分类号： C30B15/10 , B32B17/06
CPC分类号： C30B15/10 , C03C17/30 , C03C2218/31 , C30B29/06 , C30B35/002 , Y10T117/1024 , Y10T428/31612
摘要： There is provided a quartz glass article having a surface treated with novel coating materials which provides a reduced chemistry, wherein the quartz glass surface having a reduced chemistry upon exposure to melted silicon or similarly corrosive environments, forms crystalline structures covering at least 30% of the coated surface of the quartz glass crucible. Said crystalline covered surface provides a more stable surface of contact with the silicon melt and the growth of single crystal silicon. In one embodiment of the invention, the coating material comprises at least a methyl group for providing at least one of a hydrogenated and a methylated surface on the coated surface, forming rosette structures, or other crystalline morphologies covering at last 80% of the coated surface. In another embodiment of the invention, the coating material is selected from at least one of an amine, an organosilane halogen and mixtures thereof.
摘要翻译：提供了一种石英玻璃制品，其具有用新的涂层材料处理的表面，其提供减少的化学性质，其中在暴露于熔融硅或类似的腐蚀性环境时具有化学成分降低的石英玻璃表面形成覆盖至少30％石英玻璃坩埚的涂层表面。所述晶体覆盖表面提供与硅熔体更接近的稳定表面和单晶硅的生长。在本发明的一个实施方案中，涂层材料至少包含用于提供涂覆表面上的氢化和甲基化表面中的至少一种的甲基，形成玫瑰花结构或覆盖涂层表面的最后80％的其它结晶形态。在本发明的另一个实施方案中，涂料选自胺，有机硅烷卤素及其混合物中的至少一种。

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