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1. 发明授权

US06722938B1 Shadow mask, plate member therefor and method of manufacturing shadow mask 失效
标题翻译：阴影面具，板材及其制造方法
公开(公告)号：US06722938B1
公开(公告)日：2004-04-20
申请号：US09655191
申请日：2000-09-05
申请人： Takayasu Komatsu , Hiromitsu Ochiai , Akira Makita , Hirofumi Hideshima , Takuya Ogio , Toshimu Watanabe
发明人： Takayasu Komatsu , Hiromitsu Ochiai , Akira Makita , Hirofumi Hideshima , Takuya Ogio , Toshimu Watanabe
IPC分类号： H01J912
CPC分类号： H01J9/142 , H01J2229/0755 , H01J2229/0766 , Y10T225/12
摘要： A shadow mask is formed from a plate member comprising an outer frame portion, a body portion of a shadow mask having an outer peripheral line formed through an etching process and a plurality of connection portions through which the body portion of the shadow mask is supported by the outer frame portion. The shadow mask is formed from the plate member by removing the outer frame portion from the body portion of the shadow mask. In this process, a break portion is formed to the shadow mask by removing the outer frame portion so as to be recessed inward from the outer peripheral line of the shadow mask.
摘要翻译：荫罩由包括外框部分，阴影掩模的主体部分，通过蚀刻工艺形成的外周线和多个连接部分构成的荫罩形成，荫罩的主体部分通过该多个连接部分被外框部分。通过从荫罩的主体部分移除外框架部分，由板构件形成荫罩。在该过程中，通过从外框部分移除以从荫罩的外周线向内凹入的方式，对荫罩形成断开部分。

2. 发明授权

US06620554B1 Etching substrate material, etching process, and article obtained by etching 有权
标题翻译：蚀刻基板材料，蚀刻工艺和通过蚀刻获得的制品
公开(公告)号：US06620554B1
公开(公告)日：2003-09-16
申请号：US09189977
申请日：1998-11-12
申请人： Takayasu Komatsu , Daisuke Hashimoto , Akira Makita , Koji Fujiyama
发明人： Takayasu Komatsu , Daisuke Hashimoto , Akira Makita , Koji Fujiyama
IPC分类号： G03F900
CPC分类号： G03F7/09 , C23F1/02 , G03F7/0007 , G03F7/115 , H01J9/142 , Y10T428/12229 , Y10T428/12361 , Y10T428/12993
摘要： A process of forming a high-definition pattern by etching is provided. A photosensitive resin layer is formed on a metal substrate material having a center line-average surface roughness Ra of up to 0.10 &mgr;m and a maximum surface roughness Rmax of up to 1.0 &mgr;m to form a resist pattern. Then, the photosensitive resin layer provided on the metal substrate material is exposed to light to form a resist pattern. Finally, etching is carried out to form a pattern on the metal substrate material.
摘要翻译：提供了通过蚀刻形成高清晰度图案的工艺。感光性树脂层形成在中心线平均表面粗糙度Ra为0.10μm以上的金属基材上，最大表面粗糙度Rmax为1.0μm以形成抗蚀剂图案。然后，将设置在金属基板材料上的感光性树脂层曝光，形成抗蚀剂图案。最后，进行蚀刻以在金属基底材料上形成图案。

3. 发明授权

US06922010B2 Shadow mask for a cathode ray tube 失效
标题翻译：阴影射线管阴影掩模
公开(公告)号：US06922010B2
公开(公告)日：2005-07-26
申请号：US09964189
申请日：2001-09-26
申请人： Takayasu Komatsu , Hirofumi Hideshima , Akira Makita , Yutaka Matsumoto , Takuya Ogio
发明人： Takayasu Komatsu , Hirofumi Hideshima , Akira Makita , Yutaka Matsumoto , Takuya Ogio
IPC分类号： H01J29/07 , H01J29/80
CPC分类号： H01J29/07 , H01J2229/0755
摘要： The present invention provides a shadow mask having an improved resistance to an impact such as vibration or dropping so as to keep a constant quality of a color cathode-ray tube. The object is achieved by a shadow mask in which throughholes are formed, each of the throughholes 2a and 2b having a rear side hole portion 4a or 4b through which an electron beam enters and a front side hole portion 3a or 3b through which the electron beam is emitted so as to form a beam spot having a prescribed shape on a surface to be irradiated; wherein, each of the throughholes 2a and 2b has a ridge portion 8, 8b or 8e formed by intersection of a taper surface 10, 10b or 10e of the rear side hole portion 4a or 4b and a taper surface 6, 6b or 6e of the front side hole portion 3a or 3b; the taper size T represented by a value a half the difference between the hole width S at end 7, 7b or 7e of the front side hole portion 3a or 3b and the hole width Q at the ridge portion 8, 8b or 8e is within a range of from 30 to 40% of the thickness t of the shadow mask; and the ridge portion is formed at a sectional height of up to 35 μm from the end 9 of the rear side hole portion 4a or 4b.
摘要翻译：本发明提供了一种具有改善的抵抗诸如振动或掉落的冲击的荫罩，从而保持彩色阴极射线管的质量不变。该目的通过形成有通孔的荫罩实现，每个通孔2a和2b具有电子束进入的后侧孔部分4a或4b，以及前侧孔部分3a或3 b，通过该电子束发射电子束以在待照射的表面上形成具有规定形状的束斑; 其中，每个通孔2a和2b具有通过后侧孔部分4a或4b的锥形表面10,10b或10e与锥形部分相交形成的脊部分8,8b或8e，前侧孔部分3a或3b的表面6,6b或6e; 锥形尺寸T由前侧孔部分3a或3b的端部7,7b或7e处的孔宽S与脊部8,8b之间的孔宽度Q之间的差的一半的值表示或8e在荫罩的厚度t的30〜40％的范围内; 并且脊部形成为距后侧孔部分4a或4b的端部9的截面高度高达35μm。

4. 发明授权

US5965209A Liquid application method and application apparatus 失效
标题翻译：液体施用方法及应用装置
公开(公告)号：US5965209A
公开(公告)日：1999-10-12
申请号：US893095
申请日：1997-07-15
申请人： Takayasu Komatsu , Shunji Miyakawa , Kazuo Watanabe
发明人： Takayasu Komatsu , Shunji Miyakawa , Kazuo Watanabe
IPC分类号： B05C3/18 , B05C5/02 , B05C9/02 , B05D1/26 , G03F7/16
CPC分类号： G03F7/16 , B05C5/0266 , B05C9/02 , B05D1/26 , Y10S118/12
摘要： In an apparatus and method for forming an applied layer of a photosensitive resin on a large glass substrate for an LCD color filter, a substrate (S) is suctioned and held by a movable holder (8) with a main surface thereof to be processed oriented downward. The movable holder (8) is at an angle of inclination (.theta.) to the horizontal and is capable of moving along a guide rail (7). An application head (H) having an upward-pointing linear slit (13) through which an application liquid is supplied is provided below a region through which the substrate (S) moves supported by the holder (8). When the substrate (S) having a constant clearance (I.sub.2) with the application head (H) is moved diagonally upward, an application liquid bead (B) is formed between the slit (13) and the downward-pointing main surface of the substrate (S), by surface tension. The application liquid bead (B) is moved gradually diagonally downward along the main surface of the substrate to form an application layer (Ra). A meniscus (L.sub.2) of the application liquid bead (B) facing the higher side of the substrate (S) has a height dimension (h.sub.2) that is greater than that of a meniscus (L.sub.1) thereof facing the lower side of the substrate, and the height dimension of the meniscus on the higher side of the substrate (S) is made to be sufficiently larger than the thickness of the application liquid layer. This suppresses the generation of shear forces caused by differences in tension force within the application liquid bead (B) created by unevenness in the substrate surface, and thus a uniform applied layer can be formed stably and at a high usage efficiency of application liquid, without being affected by unevenness in the main surface of the substrate.
摘要翻译：在用于LCD彩色滤光片的大型玻璃基板上形成感光性树脂涂布层的装置和方法中，基板（S）被可移动的保持器（8）吸引并保持，其主表面被处理取向向下。可移动保持器（8）与水平面成倾角（θ）并且能够沿着导轨（7）移动。具有向上指向的线性狭缝（13）的施加头（H）被设置在基板（S）由支架（8）支撑的位置的下方。当具有应用头（H）的具有恒定间隙（I 2）的衬底（S）对角地向上移动时，在狭缝（13）和衬底的向下指向的主表面之间形成施加液珠（B）（S），表面张力。施加液珠（B）沿着基板的主表面逐渐向斜下方移动以形成施加层（Ra）。面向衬底（S）的较高侧的施加液体珠（B）的弯液面（L2）的高度尺寸（h2）大于面向衬底的下侧的弯月面（L1）的高度尺寸（h2）使基板（S）的上侧的弯液面的高度尺寸充分大于涂布液层的厚度。这抑制了由于基板表面的不均匀所引起的施加液珠（B）内的张力的差异所引起的剪切力的产生，因此可以稳定地且以高的涂布液的使用效率形成均匀的涂布层，而没有受到基板主表面不均匀的影响。

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