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1. 发明授权

US5166033A Positive resist composition containing quinone diazide sulfonate ester of vinylphenol compounds or isopropenylphenol compounds 失效
标题翻译：含有乙烯基酚化合物或异丙苯酚化合物的二苯甲酮磺酸酯的正极性组合物
公开(公告)号：US5166033A
公开(公告)日：1992-11-24
申请号：US587917
申请日：1990-09-25
申请人： Masayuki Oie , Shoji Kawata , Takamasa Yamada
发明人： Masayuki Oie , Shoji Kawata , Takamasa Yamada
IPC分类号： G03F7/023 , G03F7/022 , H01L21/027 , H01L21/30
CPC分类号： G03F7/0226
摘要： Disclosed herein is a positive resist composition comprising an alkali-soluble phenolic resin and the quinonediazide sulfonate of at least one phenolic compound selected from vinylphenol compounds and isopropenylphenol compounds as a photosensitive agent. It is suitable for use in minute processing.

2. 发明授权

US5532107A Positive resist composition 失效
标题翻译：正抗蚀剂组成
公开(公告)号：US5532107A
公开(公告)日：1996-07-02
申请号：US227145
申请日：1994-04-13
申请人： Masayuki Oie , Shoji Kawata , Takamasa Yamada , Shinya Ikeda
发明人： Masayuki Oie , Shoji Kawata , Takamasa Yamada , Shinya Ikeda
IPC分类号： G03F7/022 , H01L21/027 , H01L21/30 , G03F7/023 , C07C245/00
CPC分类号： G03F7/022
摘要： Disclosed herein is a positive resist composition comprising an alkali-soluble phenolic resin and a photosensitive agent, characterized in that the positive resist composition contains, as the photosensitive agent, the quinonediazide sulfonate of at least one of phenolic compounds represented by the following general formulae (I) and (II): ##STR1## wherein R.sub.1 through R.sub.4 mean individually a hydrogen or halogen atom, a hydroxyl group, an alkyl or alkenyl group having 1-3 carbon atoms, or a hydroxyalkyl group having 1-3 carbon atoms and may be equal to or different from one another, and R.sub.5 denotes a hydrogen atom, an alkyl or alkenyl group having 1-3 carbon atoms, or an aryl group with the proviso that the number of hydroxyl groups is 3 or 4; and ##STR2## wherein R.sub.6 through R.sub.9 mean individually a hydrogen or halogen atom, an alkyl or alkenyl group having 1-3 carbon atoms, or a hydroxyalkyl group having 1-3 carbon atoms and may be equal to or different from one another, and R.sub.10 denotes a hydrogen atom, an alkyl or alkenyl group having 1-3 carbon atoms, or an aryl group with the proviso that the number of hydroxyl groups is 5 and at least one of R.sub.6 through R.sub.9 is an atom or group other than hydrogen atom. It is suitable for use in minute processing.
摘要翻译：本文公开了包含碱溶性酚醛树脂和感光剂的正性抗蚀剂组合物，其特征在于，所述正性抗蚀剂组合物含有由以下通式表示的酚类化合物中的至少一种的醌二叠氮化物磺酸盐作为感光剂： I）和（II）：其中R 1至R 4分别表示氢或卤素原子，羟基，具有1-3个碳原子的烷基或烯基或具有1-3个碳原子的羟烷基并且可以彼此相同或不同，R5表示氢原子，具有1-3个碳原子的烷基或烯基或芳基，条件是羟基数为3或4; 和其中R6至R9分别表示氢或卤素原子，具有1-3个碳原子的烷基或烯基或具有1-3个碳原子的羟烷基，并且可以等于或不同于一个另一个，R 10表示氢原子，具有1-3个碳原子的烷基或烯基或芳基，条件是羟基数为5，并且R6至R9中的至少一个为原子或其它基团比氢原子。适用于分钟处理。

3. 发明授权

US5112719A Positive resist composition containing alkali-soluble phenolic resin, quinonediazide sulfonic acid ester photosensitive agent and polyhydroxy sensitizer 失效
标题翻译：含有碱性可溶性酚醛树脂的阳离子组合物，邻苯二甲酸二异氰酸酯感光剂和聚羟基敏感剂
公开(公告)号：US5112719A
公开(公告)日：1992-05-12
申请号：US603355
申请日：1990-10-26
申请人： Takamasa Yamada , Shoji Kawata , Masayuki Oie
发明人： Takamasa Yamada , Shoji Kawata , Masayuki Oie
IPC分类号： G03F7/023 , G03F7/022 , H01L21/027
CPC分类号： G03F7/0226
摘要： Disclosed herein is a positive resist composition comprising an alkali-soluble phenolic resin, a photosensitive agent formed of a quinonediazide sulfonic acid ester and at least one compound represented by the following general formula (I): ##STR1## wherein R.sup.1 through R.sup.6 mean individually a hydrogen or halogen atom, a hydroxyl group or an alkyl or alkenyl group having 1-4 carbon atoms and may be equal to or different from one another,R.sup.7 and R.sup.8 denote individually a hydrogen or halogen atom, or an alkyl group having 1-4 carbon atoms and may be equal to or different from each other, andR.sup.9 through R.sup.11 stand individually for a hydrogen atom or an alkyl group having 1-4 carbon atoms and may be equal to or different from one another. It is suitable for use in minute processing.

4. 发明授权

US5306596A Positive resist composition comprising a polyphenolic o-quinone diazide sulfonate 失效
标题翻译：正型抗蚀剂组合物，其包含多酚邻醌二叠氮化物磺酸盐
公开(公告)号：US5306596A
公开(公告)日：1994-04-26
申请号：US603597
申请日：1990-10-26
申请人： Masayuki Oie , Shoji Kawata , Takamasa Yamada , Shinya Ikeda
发明人： Masayuki Oie , Shoji Kawata , Takamasa Yamada , Shinya Ikeda
IPC分类号： G03F7/022 , H01L21/027 , H01L21/30 , G03F7/023 , C07C245/00
CPC分类号： G03F7/022
摘要： Disclosed herein is a positive resist composition comprising an alkali-soluble phenolic resin and a photosensitive agent, characterized in that the positive resist composition contains, as the photosensitive agent, the quinonediazide sulfonate of at least one of phenolic compounds represented by the following general formulae (I) and (II): ##STR1## wherein R.sub.1 through R.sub.4 mean individually a hydrogen or halogen atom, a hyaroxyl group, an alkyl or alkenyl group having 1-3 carbon atoms, or a hydroxyalkyl group having 1-3 carbon atoms and may be equal to or different from one another, and R.sub.5 denotes a hydrogen atom, an alkyl or alkenyl group having 1-3 carbon atoms, or an aryl group with the proviso that the number of hydroxyl groups is 3 or 4; and ##STR2## wherein R.sub.6 through R.sub.9 mean individually a hydrogen or halogen atom, an alkyl or alkenyl group having 1-3 carbon atoms, or a hydroxyalkyl group having 1-3 carbon atoms and may be equal to or different from one another, and R.sub.10 denotes a hydrogen atom, an alkyl or alkenyl group having 1-3 carbon atoms, or an aryl group with the proviso that the number of hydroxyl groups is 5 and at least one of R.sub.6 through R.sub.9 is an atom or group other than hydrogen atom. It is suitable for use in minute processing.
摘要翻译：本文公开了含有碱溶性酚醛树脂和感光剂的正性抗蚀剂组合物，其特征在于，所述正性抗蚀剂组合物含有由以下通式表示的酚类化合物中的至少一种的醌二叠氮化物磺酸盐作为感光剂 I）和（II）：（*化学结构*）（I）其中R 1至R 4分别表示氢或卤素原子，杂环基，具有1-3个碳原子的烷基或烯基或具有1个 -3个碳原子并且可以彼此相同或不同，R5表示氢原子，具有1-3个碳原子的烷基或烯基或芳基，条件是羟基数为3或 4; 和（*化学结构*）（II）其中R6至R9分别表示氢或卤素原子，具有1-3个碳原子的烷基或烯基或具有1-3个碳原子的羟烷基，并且可以等于或 R 10表示氢原子，具有1-3个碳原子的烷基或烯基或芳基，条件是羟基数为5，并且R6至R9中的至少一个为原子或氢原子以外的基团。适用于分钟处理。

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