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    • 2. 发明授权
    • Thin film transistor array substrate and manufacturing method thereof
    • 薄膜晶体管阵列基板及其制造方法
    • US07948570B2
    • 2011-05-24
    • US12270206
    • 2008-11-13
    • Zhangtao WangHaijun QiuTae Yup Min
    • Zhangtao WangHaijun QiuTae Yup Min
    • G02F1/136
    • H01L27/124G02F1/1368G02F2001/136236H01L27/1288
    • A thin film transistor (TFT) array substrate for a liquid crystal display comprises a gate line and a data line formed in a display region, a gate connecting line and a data connecting line formed in a PAD region, and a TFT formed at an intersection between the gate line and the data line. The TFT comprises a gate electrode on a base substrate, a gate insulating layer on the gate electrode, a semiconductor layer on the gate insulating layer, a doped semiconductor layer on the semiconductor layer, and a source electrode and a drain electrode that are on the doped semiconductor layer, and a TFT channel is defined in the semiconductor layer between the source electrode and the drain electrode. The array substrate further comprises a passivation layer that is formed on the source electrode and the drain electrode and a pixel electrode, a portion of which is formed under the drain electrode and connected with the drain electrode.
    • 用于液晶显示器的薄膜晶体管(TFT)阵列基板包括形成在PAD区域中的显示区域,栅极连接线和数据连接线上形成的栅极线和数据线,以及形成在交叉点处的TFT 在栅极线和数据线之间。 TFT包括在基底基板上的栅极电极,栅电极上的栅极绝缘层,栅极绝缘层上的半导体层,半导体层上的掺杂半导体层,以及源电极和漏电极 掺杂半导体层,并且在源电极和漏电极之间的半导体层中限定TFT沟道。 阵列基板还包括形成在源电极和漏电极上的钝化层和像素电极,其一部分形成在漏电极下方并与漏电极连接。
    • 4. 发明授权
    • Fringe field switching liquid crystal display and method for manufacturing the same
    • 边缘场开关液晶显示器及其制造方法
    • US06449026B1
    • 2002-09-10
    • US09599372
    • 2000-06-22
    • Tae Yup MinSeung Jun YiSeung Hee LeeIn Cheol ParkYoun Hak Jeong
    • Tae Yup MinSeung Jun YiSeung Hee LeeIn Cheol ParkYoun Hak Jeong
    • G02F1136
    • G02F1/134363G02F2001/134372
    • Disclosed is a fringe field switching liquid crystal display (FFS-LCD) and a method for manufacturing the same. The FFS-LCD comprises: a lower substrate; a plurality of gate bus lines extending along a selected direction on the lower substrate; a plurality of data bus lines disposed on the lower substrate in a manner such that they are crossed with the plurality of gate bus lines, for defining a unit pixel; a gate insulating film for insulating the gate bus lines and the data bus lines from each other; a thin film transistor located at a place where the gate bus lines and the data bus lines are crossed with each other; a pixel electrode formed on the gate insulating film, brought into contact with the thin film transistor and disposed in a space of the unit pixel; a counter electrode overlapped on the pixel electrode, the counter electrode cooperating with the pixel electrode for forming a fringe field which actuates all liquid crystal molecules existing on the pixel electrode and the counter electrode; and a passivation layer intervened between the pixel electrode and the counter electrode, wherein the pixel electrode and the counter electrode are made from a transparent conductive material and the plurality of gate bus lines are made as a metal film including aluminum.
    • 公开了一种边缘场切换液晶显示器(FFS-LCD)及其制造方法。 FFS-LCD包括:下基板; 沿着所述下基板上的选定方向延伸的多个栅极总线; 多个数据总线,以与所述多个栅极总线交叉的方式设置在所述下基板上,用于限定单位像素; 栅极绝缘膜,用于使栅极总线和数据总线彼此绝缘; 位于栅极总线和数据总线彼此交叉的位置处的薄膜晶体管; 形成在所述栅极绝缘膜上的像素电极,与所述薄膜晶体管接触并设置在所述单位像素的空间中; 对置电极,重叠在像素电极上,对置电极与像素电极配合,形成用于激活存在于像素电极和对电极上的所有液晶分子的条纹场; 以及介于像素电极和对电极之间的钝化层,其中像素电极和对电极由透明导电材料制成,并且多个栅极总线线制成包括铝的金属膜。
    • 5. 发明授权
    • TFT-LCD pixel unit and method for manufacturing the same
    • TFT-LCD像素单元及其制造方法
    • US08294153B2
    • 2012-10-23
    • US13102164
    • 2011-05-06
    • Haijun QiuZhangtao WangTae Yup MinXu Chen
    • Haijun QiuZhangtao WangTae Yup MinXu Chen
    • H01L33/62
    • H01L27/124H01L27/1214H01L27/1288
    • A thin film transistor liquid crystal display (TFT-LCD) pixel unit and a method for manufacturing the same. The pixel unit comprises a gate line and a gate electrode formed on a substrate and a first gate insulating layer, an active layer, and a doped layer that are sequentially formed on the gate line and the gate electrode. An intercepting trench is formed on the gate line to cut off the doped layer and the active layer on the gate line. A second insulating layer covers the intercepting trench and the substrate where the gate line and the gate electrode are not formed. A pixel electrode is formed on the second insulating layer and a part of the pixel electrode overlaps one of a source and drain electrodes.
    • 薄膜晶体管液晶显示器(TFT-LCD)像素单元及其制造方法。 像素单元包括形成在基板上的栅极线和栅电极以及依次形成在栅极线和栅电极上的第一栅极绝缘层,有源层和掺杂层。 在栅极线上形成截止沟槽以切断栅极线上的掺杂层和有源层。 第二绝缘层覆盖不形成栅极线和栅电极的截止沟槽和衬底。 像素电极形成在第二绝缘层上,并且像素电极的一部分与源极和漏极之一重叠。
    • 6. 发明授权
    • TFT-LCD pixel unit and method for manufacturing the same
    • TFT-LCD像素单元及其制造方法
    • US08134158B2
    • 2012-03-13
    • US13007884
    • 2011-01-17
    • Haijun QiuZhangtao WangTae Yup Min
    • Haijun QiuZhangtao WangTae Yup Min
    • H01L33/62
    • H01L29/78696H01L27/124H01L27/1288
    • A thin film transistor liquid crystal display (TFT-LCD) pixel unit and a method for manufacturing the same. The pixel unit comprises a gate line and a gate electrode formed on a substrate and a first gate insulating layer, an active layer, and a doped layer sequentially that are formed on the gate line and the gate electrode. An intercepting trench is formed on the gate line to cut off the doped layer and the active layer on the gate line. A second insulating layer covers the intercepting trench and the substrate where the gate line and the gate electrode are not formed. A pixel electrode is formed on the second insulating layer and is integrated with the second source/drain electrode.
    • 薄膜晶体管液晶显示器(TFT-LCD)像素单元及其制造方法。 像素单元包括形成在基板上的栅极线和栅电极,以及顺序地形成在栅极线和栅电极上的第一栅极绝缘层,有源层和掺杂层。 在栅极线上形成截止沟槽以切断栅极线上的掺杂层和有源层。 第二绝缘层覆盖不形成栅极线和栅电极的截止沟槽和衬底。 像素电极形成在第二绝缘层上并与第二源极/漏极集成。