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    • 8. 发明授权
    • Method of making an oxide superconducting thin film
    • 制造氧化物超导薄膜的方法
    • US5679625A
    • 1997-10-21
    • US563905
    • 1995-11-22
    • Wataru ItoTadataka MorishitaNorio HommaYukihisa Yoshida
    • Wataru ItoTadataka MorishitaNorio HommaYukihisa Yoshida
    • C01G1/00C01G3/00C23C14/08C23C14/35C23C14/46C30B29/22H01L39/24C23C14/34
    • C23C14/35C23C14/087C23C14/46H01L39/2435Y10S505/731
    • A method of making a superconducting thin film of a Y--Ba--Cu--O series material by using a diode parallel plate type sputtering apparatus including a vacuum chamber, a substrate disposed within the vacuum chamber and having a substantially flat surface on which the superconducting thin film is to be formed, and a plate-shaped target functioning as a cathode and disposed within the vacuum chamber to parallelly face to the flat surface of the substrate, the target being made of the same material as the superconducting thin film, a plasma gas being introduced into the vacuum chamber, and a voltage being applied between the cathode and the substrate, wherein the method comprises the steps of applying a high frequency voltage having a frequency higher than 40 MHz between the cathode and the substrate to generate plasma of the introduced gas, superimposing a DC voltage (V) on the high frequency voltage in a polarity that the cathode becomes negative, and setting the DC voltage at a value where the DC voltage is substantially unchanged with variation of a cathode current flowing through the target when adjusting the DC voltage and controlling a value of the DC current while maintaining the DC voltage substantially at the set value.
    • 通过使用包括真空室的二极管平行板型溅射装置制造Y-Ba-Cu-O系材料的超导薄膜的方法,设置在真空室内的基板,并具有基本平坦的表面,超导 要形成薄膜,并且一个板状靶用作阴极并且设置在真空室内以平行地面对基板的平坦表面,靶由与超导薄膜相同的材料制成,等离子体 气体被引入真空室中,并且施加在阴极和衬底之间的电压,其中该方法包括在阴极和衬底之间施加频率高于40MHz的高频电压以产生等离子体的步骤 引入气体,以与阴极变为负极性的高频电压叠加直流电压(V),将直流电压设定为 当调节直流电压并控制直流电流的值同时保持直流电压基本上处于设定值时,直流电压随着流经目标的阴极电流的变化而基本上不变。