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1. 发明授权

US08227149B2 Masks and methods of forming the same 有权
标题翻译：面具及其形成方法
公开(公告)号：US08227149B2
公开(公告)日：2012-07-24
申请号：US12656881
申请日：2010-02-18
申请人： YongJin Chun , Soohan Choi , Sangwook Kim , Seongwoon Choi , Sukjoo Lee , Sungwoo Lee , Youngchang Kim , SungSoo Suh , Jin-sun Choi
发明人： YongJin Chun , Soohan Choi , Sangwook Kim , Seongwoon Choi , Sukjoo Lee , Sungwoo Lee , Youngchang Kim , SungSoo Suh , Jin-sun Choi
IPC分类号： G03F1/70
CPC分类号： G03F1/36
摘要： Methods of forming masks. According to the methods, a target pattern is set. Generation of a side lobe caused by the target pattern is verified. A preliminary target pattern and a preliminary side lobe pattern are set, in the target pattern and a region where the side lobe is generated, respectively. An interference pattern map using the preliminary target pattern and the preliminary side lobe pattern is created. At least one of regions having a phase identical or opposite to that of a position of the preliminary target pattern in the interference pattern map is set to an interference auxiliary pattern. A mask using the interference auxiliary pattern and the target pattern is formed.
摘要翻译：形成掩模的方法根据该方法，设定目标图案。验证由目标图案引起的旁瓣的产生。分别在目标图案和产生旁瓣的区域中分别设置初步目标图案和初步旁瓣图案。创建使用初步目标图案和初步旁瓣图案的干涉图案图。具有与干涉图案图中的预备目标图案的位置相同或相反的相位的区域中的至少一个被设置为干涉辅助图案。形成使用干涉辅助图案和目标图案的掩模。

2. 发明申请

US20100216063A1 Masks and methods of forming the same 有权
标题翻译：面具及其形成方法
公开(公告)号：US20100216063A1
公开(公告)日：2010-08-26
申请号：US12656881
申请日：2010-02-18
申请人： YongJin Chun , Soohan Choi , Sangwook Kim , Seongwoon Choi , Sukjoo Lee , Sungwoo Lee , Youngchang Kim , SungSoo Suh , Jin-sun Choi
发明人： YongJin Chun , Soohan Choi , Sangwook Kim , Seongwoon Choi , Sukjoo Lee , Sungwoo Lee , Youngchang Kim , SungSoo Suh , Jin-sun Choi
IPC分类号： G03F1/00
CPC分类号： G03F1/36
摘要： Methods of forming masks. According to the methods, a target pattern is set. Generation of a side lobe caused by the target pattern is verified. A preliminary target pattern and a preliminary side lobe pattern are set, in the target pattern and a region where the side lobe is generated, respectively. An interference pattern map using the preliminary target pattern and the preliminary side lobe pattern is created. At least one of regions having a phase identical or opposite to that of a position of the preliminary target pattern in the interference pattern map is set to an interference auxiliary pattern. A mask using the interference auxiliary pattern and the target pattern is formed.
摘要翻译：形成掩模的方法根据该方法，设定目标图案。验证由目标图案引起的旁瓣的产生。分别在目标图案和产生旁瓣的区域中分别设置初步目标图案和初步旁瓣图案。创建使用初步目标图案和初步旁瓣图案的干涉图案图。具有与干涉图案图中的预备目标图案的位置相同或相反的相位的区域中的至少一个被设置为干涉辅助图案。形成使用干涉辅助图案和目标图案的掩模。

3. 发明授权

US08595657B2 Methods of forming a photo mask 有权
标题翻译：形成光罩的方法
公开(公告)号：US08595657B2
公开(公告)日：2013-11-26
申请号：US13366553
申请日：2012-02-06
申请人： Hosun Cha , Eunmi Lee , Sungwoo Lee
发明人： Hosun Cha , Eunmi Lee , Sungwoo Lee
IPC分类号： G06F17/50 , G06F19/00 , G03F1/00 , G21K5/00
CPC分类号： G06F17/5081 , G03F1/00 , G03F1/36 , G06F19/00 , G21K5/00
摘要： Methods of fabricating a photo mask are provided. The method includes collecting sample data, setting a preliminary mask layout, performing an optical proximity correction using the sample data and a preliminary mask layout to obtain an optimized preliminary mask layout, verifying the optimized preliminary mask layout to obtain a final mask layout, and fabricating the photo mask using the final mask layout. Verification of the optimized preliminary mask layout includes operating a verification simulator using the sample data and the optimized preliminary mask layout as input data to obtain verification image data. The verification image data includes a plurality of contours of a pattern at different vertical positions.
摘要翻译：提供了制作光罩的方法。该方法包括收集样本数据，设置初步掩模布局，使用样本数据执行光学邻近校正和初步掩模布局以获得优化的初步掩模布局，验证优化的初步掩模布局以获得最终掩模布局，以及制造使用最终的掩模布局的照片掩码。验证优化的初步掩模布局包括使用样本数据和优化的初步掩模布局操作验证模拟器作为输入数据以获得验证图像数据。验证图像数据包括在不同垂直位置处的图案的多个轮廓。

4. 发明申请

US20120202351A1 METHODS OF FORMING A PHOTO MASK 有权
标题翻译：形成照片遮罩的方法
公开(公告)号：US20120202351A1
公开(公告)日：2012-08-09
申请号：US13366553
申请日：2012-02-06
申请人： Hosun Cha , Eunmi Lee , Sungwoo Lee
发明人： Hosun Cha , Eunmi Lee , Sungwoo Lee
IPC分类号： H01L21/027 , G06F17/50
CPC分类号： G06F17/5081 , G03F1/00 , G03F1/36 , G06F19/00 , G21K5/00
摘要： Methods of fabricating a photo mask are provided. The method includes collecting sample data, setting a preliminary mask layout, performing an optical proximity correction using the sample data and a preliminary mask layout to obtain an optimized preliminary mask layout, verifying the optimized preliminary mask layout to obtain a final mask layout, and fabricating the photo mask using the final mask layout. Verification of the optimized preliminary mask layout includes operating a verification simulator using the sample data and the optimized preliminary mask layout as input data to obtain verification image data. The verification image data includes a plurality of contours of a pattern at different vertical positions.
摘要翻译：提供了制作光罩的方法。该方法包括收集样本数据，设置初步掩模布局，使用样本数据执行光学邻近校正和初步掩模布局以获得优化的初步掩模布局，验证优化的初步掩模布局以获得最终掩模布局，以及制造使用最终的掩模布局的照片掩码。验证优化的初步掩模布局包括使用样本数据和优化的初步掩模布局操作验证模拟器作为输入数据以获得验证图像数据。验证图像数据包括在不同垂直位置处的图案的多个轮廓。

5. 发明申请

US20090054612A1 Low dielectric constant plasma polymerized thin film and manufacturing method thereof 有权
标题翻译：低介电常数等离子体聚合薄膜及其制造方法
公开(公告)号：US20090054612A1
公开(公告)日：2009-02-26
申请号：US12228668
申请日：2008-08-14
申请人： Donggeun Jung , Sungwoo Lee , Jihyung Woo
发明人： Donggeun Jung , Sungwoo Lee , Jihyung Woo
IPC分类号： B05D3/06 , C08G77/04
CPC分类号： B05D1/62 , B05D3/0254
摘要： Disclosed is a low dielectric constant plasma polymerized thin film using linear organic/inorganic precursors and a method of manufacturing the low dielectric constant plasma polymerized thin film through plasma enhanced chemical vapor deposition and annealing using an RTA apparatus. The low dielectric constant plasma polymerized thin film is effective for the preparation of multilayered metal thin films having a thin film structure with very high thermal stability, a low dielectric constant, and superior mechanical properties.
摘要翻译：公开了使用线性有机/无机前体的低介电常数等离子体聚合薄膜和通过使用RTA装置的等离子体增强化学气相沉积和退火来制造低介电常数等离子体聚合薄膜的方法。低介电常数等离子体聚合薄膜对于制备具有非常高的热稳定性，低介电常数和优异的机械性能的薄膜结构的多层金属薄膜是有效的。

6. 发明授权

US10270339B2 DC-DC converter, charger integrated circuit and electronic device having the same and battery charging method thereof 有权
公开(公告)号：US10270339B2
公开(公告)日：2019-04-23
申请号：US14964071
申请日：2015-12-09
申请人： Kwang Chan Lee , Sanghee Kang , Jungwook Heo , Sungwoo Lee , Daewoong Cho
发明人： Kwang Chan Lee , Sanghee Kang , Jungwook Heo , Sungwoo Lee , Daewoong Cho
IPC分类号： H02M3/158 , H02J7/00 , H02J50/12
摘要： A charger integrated circuit is provided which includes a DC-DC converter configured to receive an input voltage and generate an output voltage through a switching operation for charging a battery, and a charging controller configured to control the switching operation such that the output voltage is supplied to the battery through charging paths chargeable according to a level of the input voltage.

7. 发明申请

US20160254689A1 DC-DC CONVERTER, CHARGER INTEGRATED CIRCUIT AND ELECTRONIC DEVICE HAVING THE SAME AND BATTERY CHARGING METHOD THEREOF 审中-公开
标题翻译：直流 - 直流转换器，充电器集成电路和具有该充电电路的电子设备及其充电方法
公开(公告)号：US20160254689A1
公开(公告)日：2016-09-01
申请号：US14964071
申请日：2015-12-09
申请人： Kwang Chan LEE , Sanghee KANG , Jungwook HEO , Sungwoo LEE , Daewoong CHO
发明人： Kwang Chan LEE , Sanghee KANG , Jungwook HEO , Sungwoo LEE , Daewoong CHO
IPC分类号： H02J7/00 , H02M3/158
CPC分类号： H02M3/158 , H02J7/0052 , H02J50/12 , H02J2007/0059 , Y02B40/90
摘要： A charger integrated circuit is provided which includes a DC-DC converter configured to receive an input voltage and generate an output voltage through a switching operation for charging a battery, and a charging controller configured to control the switching operation such that the output voltage is supplied to the battery through charging paths chargeable according to a level of the input voltage.
摘要翻译：提供一种充电器集成电路，其包括：DC-DC转换器，被配置为通过用于对电池充电的开关操作来接收输入电压并产生输出电压;以及充电控制器，被配置为控制开关操作，使得输出电压被提供通过根据输入电压的电平充电的充电路径到电池。

8. 发明授权

US07897521B2 Low dielectric constant plasma polymerized thin film and manufacturing method thereof 有权
标题翻译：低介电常数等离子体聚合薄膜及其制造方法
公开(公告)号：US07897521B2
公开(公告)日：2011-03-01
申请号：US12228668
申请日：2008-08-14
申请人： Donggeun Jung , Sungwoo Lee , Jihyung Woo
发明人： Donggeun Jung , Sungwoo Lee , Jihyung Woo
IPC分类号： H01L21/20 , H01L21/203 , H01L21/205
CPC分类号： B05D1/62 , B05D3/0254
摘要： Disclosed is a low dielectric constant plasma polymerized thin film using linear organic/inorganic precursors and a method of manufacturing the low dielectric constant plasma polymerized thin film through plasma enhanced chemical vapor deposition and annealing using an RTA apparatus. The low dielectric constant plasma polymerized thin film is effective for the preparation of multilayered metal thin films having a thin film structure with very high thermal stability, a low dielectric constant, and superior mechanical properties.
摘要翻译：公开了使用线性有机/无机前体的低介电常数等离子体聚合薄膜和通过使用RTA装置的等离子体增强化学气相沉积和退火来制造低介电常数等离子体聚合薄膜的方法。低介电常数等离子体聚合薄膜对于制备具有非常高的热稳定性，低介电常数和优异的机械性能的薄膜结构的多层金属薄膜是有效的。

9. 发明申请

US20080260148A1 Encryption Processor 失效
标题翻译：加密处理器
公开(公告)号：US20080260148A1
公开(公告)日：2008-10-23
申请号：US10575482
申请日：2005-12-01
申请人： Seungyoup Lee , Minsik Lee , Sungwoo Lee
发明人： Seungyoup Lee , Minsik Lee , Sungwoo Lee
IPC分类号： H04N7/167
CPC分类号： G06F21/72
摘要： One chip encryption processor is disclosed, in which a password process unit for processing a data encryption and an interface for managing a password needed for an encryption are integrated into one chip. The encryption processor includes an encryption interface for connecting an externally connected apparatus and an internal data process apparatus, a password process unit for encrypting the inputted data, a memory unit for temporarily storing the data. The above elements are integrated into one chip, so that a desired data security, non-error operation and stable user verification are obtained.
摘要翻译：公开了一种芯片加密处理器，其中用于处理数据加密的密码处理单元和用于管理加密所需密码的接口集成到一个芯片中。加密处理器包括用于连接外部连接的装置和内部数据处理装置的加密接口，用于加密输入数据的密码处理单元，用于临时存储数据的存储单元。将上述元件集成到一个芯片中，从而获得期望的数据安全性，非错误操作和稳定的用户验证。

10. 发明授权

US5291093A Inline type electron gun for color cathode ray tubes 失效
标题翻译：用于彩色阴极射线管的直列型电子枪
公开(公告)号：US5291093A
公开(公告)日：1994-03-01
申请号：US834473
申请日：1992-02-12
申请人： Sungwoo Lee
发明人： Sungwoo Lee
IPC分类号： H01J29/50 , H01J29/56
CPC分类号： H01J29/503
摘要： An inline type electron gun has a lopsided electric field applied to it to improve the spot formation of an electron beam in forming an expanded focus lens. The electron gun has first electrode to eighth electrode and has a lopsided electric field formed only at the two side apertures of a trio of apertures formed at one of the opposing sides of the sixth and seventh electrodes before a lopsided main focus lens formed between the seventh and eighth electrodes.
摘要翻译：直列型电子枪具有施加于其上的不均匀电场，以改善形成扩展聚焦透镜中电子束的光斑形成。电子枪具有第一电极至第八电极，并且在形成在第七和第七电极的相对侧之间的三个孔的两个侧孔处形成一个偏转电场，之后形成在第七电极之间的偏转主焦点透镜和第八电极。

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