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1. 发明授权

US06765449B2 Pulse width modulation circuit 失效
标题翻译：脉宽调制电路
公开(公告)号：US06765449B2
公开(公告)日：2004-07-20
申请号：US10368695
申请日：2003-02-19
申请人： Kazutaka Murayama , Sadatoshi Hisamoto , Norio Umezu , Yoshitaka Handa , Shuichi Hiza
发明人： Kazutaka Murayama , Sadatoshi Hisamoto , Norio Umezu , Yoshitaka Handa , Shuichi Hiza
IPC分类号： H03K708
CPC分类号： H03K7/08 , H03K5/12
摘要： A pulse width modulation circuit of the present invention includes: pulse generation means being provided with a first power supply and charged with a first current and a second current between which a constant current is distributed to turn ON/OFF a switching element, thereby generating a pulse from a first output section; pulse modulation means for controlling the charging while controlling a distribution ratio between the first current and the second current based on an input signal, thereby changing a pulse width of the output pulse; and first short circuit means for shorting the first output section with the first power supply when the pulse being output from the first output section transitions to a voltage of the first power supply.
摘要翻译：本发明的脉冲宽度调制电路包括：脉冲发生装置，设有第一电源并充电第一电流和第二电流，在该第一电流和第二电流之间分配有恒定电流以使开关元件导通/断开，从而产生来自第一输出部的脉冲; 脉冲调制装置，用于控制充电，同时基于输入信号控制第一电流和第二电流之间的分配比，从而改变输出脉冲的脉冲宽度; 以及第一短路装置，用于当从第一输出部分输出的脉冲转变到第一电源的电压时，用第一电源使第一输出部分短路。

2. 发明申请

US20120097239A1 METHOD FOR ROUGHENING SUBSTRATE SURFACE, METHOD FOR MANUFACTURING PHOTOVOLTAIC DEVICE, AND PHOTOVOLTAIC DEVICE 审中-公开
标题翻译：用于粗化基板表面的方法，制造光伏器件的方法和光电装置
公开(公告)号：US20120097239A1
公开(公告)日：2012-04-26
申请号：US13378187
申请日：2010-03-30
申请人： Takehiko Sato , Kunihiko Nishimura , Daisuke Niinobe , Shuichi Hiza , Shigeru Matsuno
发明人： Takehiko Sato , Kunihiko Nishimura , Daisuke Niinobe , Shuichi Hiza , Shigeru Matsuno
IPC分类号： H01L31/0236 , H01L31/0232 , H01L31/18 , B29D11/00
CPC分类号： C03C15/00 , C03C2218/355 , H01L31/02366 , Y02E10/50
摘要： To include a first step of forming a protection film on a surface of a translucent substrate, a second step of exposing the surface of the translucent substrate by forming a plurality of openings arranged regularly at a certain pitch in the protection film, a third step of forming parabolic irregularities including substantially hemispherical depressions arranged substantially uniformly on the surface of the translucent substrate by performing isotropic etching by using the protection film having the openings formed as a mask and under conditions in which the protection film has resistance to the surface of the translucent substrate on which the protection film is formed, and a fourth step of removing the protection film, wherein at the fourth step, the isotropic etching is continued after formation of the parabolic irregularities to separate the protection film from the translucent substrate and round apexes of protruded portions in the parabolic irregularities.
摘要翻译：为了包括在半透明基板的表面上形成保护膜的第一步骤，通过在保护膜中形成以一定间距规则排列的多个开口来曝光透光性基板的表面的第二步骤，第三步骤通过使用具有形成为掩模的开口的保护膜并且在保护膜对透光性基板的表面具有阻力的条件下进行各向同性蚀刻，形成包括基本上均匀地布置在透光性基板的表面上的基本上半球状的凹部的抛物面不规则在其上形成保护膜的第四步骤和去除保护膜的第四步骤，其中在第四步骤中，在形成抛物线不规则物之后继续进行各向同性蚀刻，以将保护膜与透光性基板分离，并且突出部分的圆顶部在抛物线不规则。

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