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    • 1. 发明申请
    • CARRIER WITH DEPOSITION SHIELD
    • 携带沉积物
    • US20090308317A1
    • 2009-12-17
    • US12468887
    • 2009-05-20
    • Hiroshi SoneShinya HoumanNaoyuki NozawaYoshiro Hasegawa
    • Hiroshi SoneShinya HoumanNaoyuki NozawaYoshiro Hasegawa
    • C23C14/56C23C14/50
    • C23C14/50C23C14/564C23C14/568
    • The peeling-off of a deposited film caused by a carrier is restrained, and the exchange period of the carrier is prolonged. In a carrier 1 including a slider 7 having a mechanism for conveying a substrate holder 3 that supports a substrate 2, a deposition shield 20a, 20b that can cover the substrate holder 3 and has an opening equivalent to or larger than the substrate 2 on which a film is formed is installed on both surfaces of the substrate holder 3. At this time, the substrate holder 3, supporting claws 4, and fixing parts 6 are arranged so as to be hidden by the deposition shield 20. In a film forming chamber, to form a predetermined film on the substrate 2, the carrier 1 covered by the deposition shield 20 is exposed to a plasma space in the film forming chamber, and the film is formed. The deposition of film onto the substrate holder 3, the supporting claws 4, and the fixing parts 6 that are covered by the deposition shield 20 can be restrained. Therefore, the peeling-off of film due to the deflection of claw or the peeling-off of film from the acute angle part of the fixing part 6 and the like is restrained, by which the exchange period of the carrier 1 can be prolonged.
    • 由载体引起的沉积膜的剥离被抑制,并且载体的交换周期延长。 在包括具有用于输送支撑基板2的基板保持件3的机构的滑块7的载体1中,可以覆盖基板保持件3并且具有等于或大于其上的基板2的开口的沉积屏蔽20a,20b, 在基板支架3的两面安装有膜。此时,基板保持件3,支撑爪4和固定部6被布置成被沉积屏蔽20隐藏。在成膜室 为了在基板2上形成规定的膜,将由沉积屏蔽罩20覆盖的载体1暴露于成膜室中的等离子体空间,形成膜。 可以抑制膜沉积到由沉积屏蔽20覆盖的基板保持件3,支撑爪4和固定部6上。 因此,可以抑制由于爪的偏转而导致的膜的剥离或者从固定部6的锐角部等剥离的膜等,能够延长载体1的交换周期。