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1. 发明授权

US5493125A Charged beam apparatus 失效
标题翻译：带电束装置
公开(公告)号：US5493125A
公开(公告)日：1996-02-20
申请号：US206161
申请日：1994-03-07
申请人： Shigeo Okayama , Mutsuo Ogura , Masanori Komuro , Hiroshi Hiroshima
发明人： Shigeo Okayama , Mutsuo Ogura , Masanori Komuro , Hiroshi Hiroshima
IPC分类号： H01J37/18 , H01J37/20 , H01J37/28 , H01J37/305 , H01L21/027
CPC分类号： H01J37/20 , H01J37/18 , H01J2237/2005
摘要： A charged beam apparatus comprising a vacuum chamber having a moving mechanism inside and a sample chamber, the sample chamber being used placed in an ultra-high vacuum atmosphere or a gas atmosphere, wherein a flat surface is formed on that surface of the moving mechanism which faces the sample chamber, and a flange having a flat open surface is mounted between the vacuum chamber and the sample chamber such that the open surface is opposed to the flat surface with a tiny gap being formed between the open surface and the flat surface for permitting vacuum venting without imposing any restrictions on the moving mechanism, whereby the apparatus operates without restricting the action of the moving mechanism.
摘要翻译：一种带电束装置，包括在内部具有移动机构的真空室和样品室，所述样品室用于超高真空气氛或气体气氛中，其中在所述移动机构的所述表面上形成有平坦表面，面对样品室，并且具有平坦开放表面的凸缘安装在真空室和样品室之间，使得开口表面与平坦表面相对，在开口表面和平坦表面之间形成微小的间隙以允许真空排气而不对移动机构施加任何限制，由此该装置在不限制移动机构的作用的情况下操作。

2. 发明授权

US4902892A Method of measurement by scanning tunneling microscope 失效
标题翻译：扫描隧道显微镜测量方法
公开(公告)号：US4902892A
公开(公告)日：1990-02-20
申请号：US257468
申请日：1988-10-13
申请人： Shigeo Okayama , Hiroshi Tokumoto , Hiroshi Bando , Wataru Mizutani , Masayuki Shimura , Haruki Nakagawa , Masatsugu Shigeno , Kazutoshi Watanabe
发明人： Shigeo Okayama , Hiroshi Tokumoto , Hiroshi Bando , Wataru Mizutani , Masayuki Shimura , Haruki Nakagawa , Masatsugu Shigeno , Kazutoshi Watanabe
IPC分类号： G01B7/34 , G01N23/00 , G01N27/00 , G01N37/00 , G01Q10/02 , G01Q10/06 , G01Q60/10 , H01J37/22 , H01J37/26 , H01J37/28
CPC分类号： G01Q60/10 , B82Y35/00 , G01Q10/06 , Y10S977/851
摘要： A probe is shifted at a distance where the probe and a material to be obsed are sufficiently far away from each other relative to the roughness of the material's surface. This method prevents the probe from colliding with the material's surface during the shift of the probe thereby enabling high speed shift of the probe. Further, a micro-drive mechanism for controlling tunnel currents may be stopped during the shift in order to minimize the drift which may be caused by heat generated inside the micro-drive mechanism. Therefore, it is particularly advantageous to apply this STM measuring method for high-speed and stable measurement of a very large surface area and a very rough surface.
摘要翻译：探针在探针和待观察材料相对于材料表面的粗糙度彼此足够远的距离处移动。这种方法可以防止探头在探头移动期间与材料的表面碰撞，从而实现探头的高速移动。此外，在移动期间可以停止用于控制隧道电流的微驱动机构，以便最小化可能由微驱动机构内部产生的热引起的漂移。因此，将STM测量方法应用于非常大的表面积和非常粗糙的表面的高速和稳定的测量是特别有利的。

3. 发明授权

US4075488A Pattern forming apparatus using quadrupole lenses 失效
标题翻译：使用四边形镜片的图案形成装置
公开(公告)号：US4075488A
公开(公告)日：1978-02-21
申请号：US687690
申请日：1976-05-19
申请人： Shigeo Okayama , Hisazo Kawakatsu
发明人： Shigeo Okayama , Hisazo Kawakatsu
IPC分类号： H01J37/30 , H01J3/14
CPC分类号： H01J37/3007
摘要： Disclosed is a pattern forming apparatus using a quadrupole lens system to control the cross section of a beam of electrons or ions to be projected onto a plate-like object. A variety of rectangular beams can be formed by electrically controlling the quadrupole lens system, and thus a desired pattern can be produced in the form of combination of rectangle and line pattern elements when the plate-like object is exposed to the beam of electric charged particles. The pattern forming apparatus according to this invention is useful particularly in fabricating integrated circuits, semiconductor devices and other precision devices.

4. 发明授权

US5298757A Lens for charged particle beam 失效
标题翻译：带电粒子束的透镜
公开(公告)号：US5298757A
公开(公告)日：1994-03-29
申请号：US16264
申请日：1993-02-11
申请人： Shigeo Okayama
发明人： Shigeo Okayama
IPC分类号： H01J37/10 , H01J37/12 , H01J37/14 , H01J37/153
CPC分类号： H01J37/12 , H01J37/153
摘要： A lens for a charged particle beam comprises first, second, third and fourth quadrupoles, a first aperture electrode placed in front of the first quadrupole, a second aperture electrode placed between the first quadrupole and the second quadrupole, a third aperture electrode placed between the second quadrupole and the third quadrupole, a fourth aperture electrode placed between the third quadrupole and the fourth quadrupole, a fifth aperture electrode placed behind the fourth quadrupole, means for exciting the quadrupoles to cause them to converge the charged beam to a line near the third aperture electrode, and means for applying voltage to excite the first to fifth aperture electrodes and cause them to produce an octupole lens action for correcting aperture aberration.
摘要翻译：用于带电粒子束的透镜包括第一，第二，第三和第四四极，放置在第一四极的前面的第一孔径电极，放置在第一四极和第二四极之间的第二孔电极，第二四极和第三四极，第四孔径电极，位于第三四极和第四四极之间，第五孔径电极放置在第四四极杆的后面，用于激励四极杆使得它们将带电束会聚到靠近第三四极杆孔电极，以及用于施加电压以激发第一至第五孔径电极并使其产生用于校正孔径像差的八极透镜作用的装置。

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