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    • 1. 发明申请
    • ABSORPTION DEVICE FOR ROTATABLE HEATING
    • 用于可旋转加热的吸收装置
    • US20130228563A1
    • 2013-09-05
    • US13884440
    • 2010-12-10
    • Shaoyong WangMingbo Wang
    • Shaoyong WangMingbo Wang
    • H01L21/67
    • H01L21/67103H01L21/68742
    • An absorption device for rotatable heating is provided with an absorption heating plate (102), a support needle driving device (103), a rotary sliding ring (104) and a turning shaft (107). The absorption heating plate (102) is amounted at the top of the turning shaft (107), and a wafer (101) is arranged at the top of the absorption heating plate (102). The rotary sliding ring (104) is connected to the turning shaft (107) in which a vacuum channel and a connection wire channel are arranged. Support needles (111) are connected to the output end of the support needle driving device (103), run through the absorption heating plate (102) and are arranged at the bottom of the wafer (101) uniformly. The absorption device incorporates the wafer absorption function, the wafer rotating function with controllable speed and the heating function for heating the wafer to reach different temperature according to the different requirement, which solves the problem of absorption and heating rotation at the same time.
    • 用于可旋转加热的吸收装置设置有吸收加热板(102),支撑针驱动装置(103),旋转滑环(104)和转动轴(107)。 吸收加热板(102)位于转轴(107)的顶部,并且在吸收加热板(102)的顶部设置有晶片(101)。 旋转滑环(104)连接到设置有真空通道和连接线路的转动轴(107)。 支撑针(111)连接到支撑针驱动装置(103)的输出端,穿过吸收加热板(102)并均匀地布置在晶片(101)的底部。 吸收装置结合了晶片吸收功能,具有可控速度的晶片旋转功能和根据不同要求加热晶片达到不同温度的加热功能,同时解决了吸收和加热旋转的问题。