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1. 发明授权

US09966375B2 Semiconductor device 有权
公开(公告)号：US09966375B2
公开(公告)日：2018-05-08
申请号：US15049648
申请日：2016-02-22
申请人： Yong-Joon Choi , Tae-Yong Kwon , Mirco Cantoro , Chang-Jae Yang , Dong-Hoon Khang , Woo-Ram Kim , Cheol Kim , Seung-Jin Mun , Seung-Mo Ha , Do-Hyoung Kim , Seong-Ju Kim , So-Ra You , Woong-ki Hong
发明人： Yong-Joon Choi , Tae-Yong Kwon , Mirco Cantoro , Chang-Jae Yang , Dong-Hoon Khang , Woo-Ram Kim , Cheol Kim , Seung-Jin Mun , Seung-Mo Ha , Do-Hyoung Kim , Seong-Ju Kim , So-Ra You , Woong-ki Hong
IPC分类号： H01L27/092 , H01L29/78 , H01L21/8234 , H01L29/66 , H01L29/10 , H01L21/8238 , H01L27/02 , H01L27/11 , H01L29/165
CPC分类号： H01L27/0924 , H01L21/823431 , H01L21/823807 , H01L21/823821 , H01L27/0207 , H01L27/1104 , H01L29/1054 , H01L29/165 , H01L29/66795 , H01L29/785
摘要： A semiconductor device includes a compound semiconductor layer, where the compound semiconductor layer includes separate fin patterns in separate regions. The separate fin patterns may include different materials. The separate fin patterns may include different dimensions, including one or more of width and height of one or more portions of the fin patterns. The separate fin patterns may include an upper pattern and a lower pattern. The upper pattern and the lower pattern may include different materials. The upper pattern and the lower pattern may include different dimensions. Separate regions may include separate ones of an NMOS or a PMOS. The semiconductor device may include gate electrodes on the compound semiconductor layer. Separate gate electrodes may intersect the separate fin patterns.

2. 发明授权

US08221564B2 Method for manufacturing high strength steel strips with superior formability and excellent coatability 有权
标题翻译：制造具有优异成型性和优异涂布性能的高强度钢带的方法
公开(公告)号：US08221564B2
公开(公告)日：2012-07-17
申请号：US12096968
申请日：2006-12-22
申请人： Seong-Ju Kim , Il-Ryoung Sohn , Hyun-Gyu Hwang , Seung-Bok Lee
发明人： Seong-Ju Kim , Il-Ryoung Sohn , Hyun-Gyu Hwang , Seung-Bok Lee
IPC分类号： C21D8/00 , C22C38/00
CPC分类号： C21D8/0236 , C21D9/46 , C22C38/02 , C22C38/04 , C22C38/06 , C22C38/12 , C22C38/60
摘要： A method for manufacturing a steel sheet used for structural members, elements, etc. of automobiles including a front side member, pillar, and the like, and more particularly, a method for manufacturing a steel sheet having a high strength and formability as well as hot-dip galvanizing properties is disclosed. In the method, after an aluminum killed steel slab, which comprises, by weight %: C: 0.05% to 0.25%; Si: 0.1% to 1.5%; S: 0.02% or less; N: 0.01% or less; Al: 0.02% to 2.0%; Mn: 1.0% to 2.5%; P: 0.001% to 0.1%; Sb: 0.005% to 0.10%; the balance of Fe and other unavoidable impurities, is subjected to a homogenization treatment at a temperature range of 1050° C. to 1300° C., the aluminum killed steel slab is subjected to a hot rolling under a finishing hot rolling temperature of 850° C. to 950° C. and a coiling temperature of 400° C. to 700° C., followed by a cold rolling under a cold rolling reduction ration of 30% to 80%, and annealing the cold rolled steel sheet.
摘要翻译：一种制造用于包括前侧构件，支柱等的汽车的结构构件，构件等的钢板的制造方法，更具体地说，涉及具有高强度，成形性的钢板的制造方法以及公开了热浸镀锌性能。在该方法中，在铝镇静钢板之后，其包含以重量％计：C：0.05％至0.25％; Si：0.1〜1.5％ S：0.02％以下; N：0.01％以下 Al：0.02〜2.0％ Mn：1.0〜2.5％ P：0.001〜0.1％ Sb：0.005〜0.10％将余量的Fe等不可避免的杂质在1050℃〜1300℃的温度范围内进行均质化处理，在850℃的最终热轧温度下进行热轧，在950℃，卷取温度400℃〜700℃，冷轧压下率为30〜80％的冷轧，冷轧钢板进行退火。

3. 发明申请

US20100109263A1 ELECTROSTATIC CHUCK HAVING REDUCED ARCING 有权
标题翻译：具有减少弧度的静电钻头
公开(公告)号：US20100109263A1
公开(公告)日：2010-05-06
申请号：US12270187
申请日：2008-11-13
申请人： Seok Yul Jun , Bum Jin Park , Sun Il Kim , Hyong Seok Oh , Sung Chul Cho , Young Sam Na , Yeon Sang Cho , Ha Sung Song , Seong Ju Kim , Hee Sang Chae , Talex Sajoto
发明人： Seok Yul Jun , Bum Jin Park , Sun Il Kim , Hyong Seok Oh , Sung Chul Cho , Young Sam Na , Yeon Sang Cho , Ha Sung Song , Seong Ju Kim , Hee Sang Chae , Talex Sajoto
IPC分类号： B23B31/28 , B23P17/00
CPC分类号： H01L21/6831 , H01L21/67103 , H02N13/00 , Y10T29/49986 , Y10T279/23
摘要： Electrostatic chucks and methods of manufacturing the same are provided herein. In some embodiments, an electrostatic chuck comprises an electrically conductive body having one or more channels formed in an upper surface thereof; a plate positioned within the one or more channels to define one or more plenums between the body and the plate, wherein the surfaces of the plenum are anodized; one or more fluid passages disposed in the plate and fluidly coupling the one or more plenums to the upper surface of the body, wherein the surfaces of the fluid passages are electrically insulated; and a dielectric layer disposed over the upper surface of the body and the plate, wherein the dielectric layer forms a support surface for a substrate to be disposed thereon.
摘要翻译：本文提供了静电卡盘及其制造方法。在一些实施例中，静电卡盘包括导电体，其具有形成在其上表面中的一个或多个通道; 定位在所述一个或多个通道内的板，以在所述主体和所述板之间限定一个或多个气室，其中所述气室的表面被阳极氧化; 一个或多个流体通道设置在板中并将一个或多个通风室流体地联接到主体的上表面，其中流体通道的表面是电绝缘的; 以及设置在所述主体和所述板的上表面上方的电介质层，其中所述电介质层形成用于要置于其上的衬底的支撑表面。

4. 发明申请

US20080295928A1 Method for Manufacturing High Strength Steel Strips with Superior Formability and Excellent Coatability 有权
标题翻译：制造具有优异成型性和优异涂层性的高强度钢带的方法
公开(公告)号：US20080295928A1
公开(公告)日：2008-12-04
申请号：US12096968
申请日：2006-12-22
申请人： Seong-Ju Kim , Il-Ryoung Sohn , Hyun-Gyu Hwang , Seung-Bok Lee
发明人： Seong-Ju Kim , Il-Ryoung Sohn , Hyun-Gyu Hwang , Seung-Bok Lee
IPC分类号： C21D8/02
CPC分类号： C21D8/0236 , C21D9/46 , C22C38/02 , C22C38/04 , C22C38/06 , C22C38/12 , C22C38/60
摘要： A method for manufacturing a steel sheet used for structural members, elements, etc. of automobiles including a front side member, pillar, and the like, and more particularly, a method for manufacturing a steel sheet having a high strength and formability as well as hot-dip galvanizing properties is disclosed. In the method, after an aluminum killed steel slab, which comprises, by weight %,: C: 0.05% to 0.25%; Si: 0.1% to 1.5%; S: 0.02% or less; N: 0.01% or less; Al: 0.02% to 2.0%; Mn: 1.0% to 2.5%; P: 0.001% to 0.1%; Sb: 0.005% to 0.10%; the balance of Fe and other unavoidable impurities, is subjected to a homogenization treatment at a temperature range of 1050° C. to 1300° C., the aluminum killed steel slab is subjected to a hot rolling under a finishing hot rolling temperature of 850° C. to 950° C. and a coiling temperature of 400° C. to 700° C., followed by a cold rolling under a cold rolling reduction ration of 30% to 80%, and annealing the cold rolled steel sheet.
摘要翻译：一种制造用于包括前侧构件，支柱等的汽车的结构构件，构件等的钢板的制造方法，更具体地说，涉及具有高强度，成形性的钢板的制造方法以及公开了热浸镀锌性能。在该方法中，在铝镇静钢板之后，以重量％计：C：0.05％至0.25％; Si：0.1〜1.5％ S：0.02％以下; N：0.01％以下 Al：0.02〜2.0％ Mn：1.0〜2.5％ P：0.001〜0.1％ Sb：0.005〜0.10％将余量的Fe等不可避免的杂质在1050℃〜1300℃的温度范围内进行均质化处理，在850℃的最终热轧温度下进行热轧，在950℃，卷取温度400℃〜700℃，冷轧压下率为30〜80％的冷轧，冷轧钢板进行退火。

5. 发明申请

US20080240969A1 High Strength Hot Rolled Steel Sheet Containing High Mn Content with Excellent Workability and Method for Manufacturing the Same 审中-公开
标题翻译：含有高Mn含量的高强度热轧钢板及其制造方法
公开(公告)号：US20080240969A1
公开(公告)日：2008-10-02
申请号：US12064145
申请日：2006-08-23
申请人： Sung-Kyu Kim , Kwang-Geun Chin , Seong-Ju Kim
发明人： Sung-Kyu Kim , Kwang-Geun Chin , Seong-Ju Kim
IPC分类号： C22C38/04 , C21D8/02
CPC分类号： C22C38/42 , C21D6/005 , C21D8/02 , C21D8/0205 , C21D8/04 , C21D8/0405 , C21D2211/001 , C22C38/06 , C22C38/58
摘要： A hot rolled steel sheet used for a bumper reinforceing material or for an impact absorption material in a door of automobiles, and a method for manufacturing the same are disclosed. The steel sheet comprises, by weight%, C: 0.2%˜1%, Mn: 8˜15%, S: 0.05% or less, P: 0.03% or less, and the balance of Fe and other unavoidable impurities. A product of tensile strength and total elongation (TS×ToLEl) of the steel sheet is 24,000 MPa % or more. The method provides a high strength hot rolled steel sheet, which has a high strength-elongation balance value, ensuring excellent workability.
摘要翻译：公开了一种用于汽车门保险杠加强材料或冲击吸收材料的热轧钢板及其制造方法。钢板以C：0.2％〜1％，Mn：8〜15％，S：0.05％以下，P：0.03％以下，余量由Fe和其他不可避免的杂质构成。钢板的拉伸强度和总伸长率（TSxToLE1）为24000MPa％以上。该方法提供了具有高强度 - 伸长平衡值的高强度热轧钢板，确保了优异的可加工性。

6. 发明授权

US06358666B1 Chemically amplified resist composition containing norbornane type low molecular additive 有权
标题翻译：含有降冰片烷型低分子添加剂的化学扩增抗蚀剂组合物
公开(公告)号：US06358666B1
公开(公告)日：2002-03-19
申请号：US09616859
申请日：2000-07-14
申请人： Dong Chul Seo , Sun Yi Park , Joo Hyeon Park , Seong Ju Kim
发明人： Dong Chul Seo , Sun Yi Park , Joo Hyeon Park , Seong Ju Kim
IPC分类号： G03F7004
CPC分类号： G03F7/004 , C08F232/08 , G03F7/0045 , G03F7/039 , Y10S430/115 , Y10S430/122
摘要： This invention relates to a chemically amplified positive photoresist composition comprising a multi copolymer copolymer whose repeating units is represented by the following formula I, a low molecular additive represented by the following formula 2 or 3, an acid generator and a solvent wherein the repeating units comprising X and Y are independent monomers, respectively, selected from the group consisting of the following formulae (II), (III) and (IV):
摘要翻译：本发明涉及一种化学放大型正性光致抗蚀剂组合物，其包含多重共聚物共聚物，其重复单元由下式I表示，低分子量添加剂由下式2或3表示，酸产生剂和溶剂，其中重复单元包含X 和Y分别为选自下式（II），（III）和（IV）的独立单体：

7. 发明授权

US6111143A Sulfonium salt and its manufacturing method 有权
标题翻译：锍盐及其制造方法
公开(公告)号：US6111143A
公开(公告)日：2000-08-29
申请号：US140955
申请日：1998-08-27
申请人： Joo-Hyeon Park , Dong-Chul Seo , Sun-Yi Park , Seong-Ju Kim
发明人： Joo-Hyeon Park , Dong-Chul Seo , Sun-Yi Park , Seong-Ju Kim
IPC分类号： C07C381/00 , C07C309/06 , C07C381/12 , G03F7/004 , G03F7/029 , C07C315/00
CPC分类号： C07C381/12 , Y02P20/55
摘要： This invention relates to a sulfonium salt, including its manufacturing method, which is effectively used as a photoacid initiator or radical photoinitiator during polymerization and a photoacid generator, leaving the protection groups of organic compounds, especially as an useful photoacid generator of the chemically amplified photoresist employed in semiconductor materials. Since the sulfonium salt of this invention, so prepared via one-step reaction between sulfoxide compound and aromatic compound in the presence of perfluoroalkanesulfonic anhydride, has the advantages in that by overcoming some shortcomings of the prior art to prepare the sulfonium salt via two steps using Grinard reagent, this invention may provide a novel sulfonium salt with higher yield which cannot be achieved in the prior art and also to prepare even any conventional sulfonium salt having better yield.
摘要翻译：本发明涉及一种锍盐，包括其制造方法，其在聚合期间有效地用作光酸引发剂或自由基光引发剂，并且光酸产生剂，留下有机化合物的保护基团，特别是作为化学放大光致抗蚀剂的有用的光致酸产生剂半导体材料。由于在全氟烷基磺酸酐存在下通过亚砜化合物和芳族化合物之间的一步反应制备的本发明的锍盐的优点在于克服现有技术的一些缺点，通过两步使用格林纳特试剂，本发明可以提供一种在现有技术中无法实现的更高产率的新型锍盐，并且甚至制备任何具有较好产率的常规锍盐。

8. 发明授权

US5989775A Copolymer useful for positive photoresist and chemical amplification positive photoresist composition comprising the same 失效
标题翻译：用于正性光致抗蚀剂的共聚物和包含其的化学扩增正性光致抗蚀剂组合物
公开(公告)号：US5989775A
公开(公告)日：1999-11-23
申请号：US998546
申请日：1997-12-26
申请人： Joo-Hyeon Park , Ji-Hong Kim , Ki-Dae Kim , Sun-Yi Park , Seong-Ju Kim
发明人： Joo-Hyeon Park , Ji-Hong Kim , Ki-Dae Kim , Sun-Yi Park , Seong-Ju Kim
IPC分类号： G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106
摘要： A copolymer having a repeating unit represented by the following general formula I and a chemical amplification positive photoresist composition having the copolymer and a photoacid generator. The photoresist can allow for a good pattern shape even though a post-baking is taken in a somewhat delayed time and for a use of any radiation, such as uv light, deep uv light and charged particle beam. Also, it is superior in storage stability and resolution so that it is useful for the high integration of semiconductor devices. The polymer ranges, in polystyrene-reduced average molecular weight, from 1,000 to 1,000,000. The polymer is represented by the following repeating pattern: ##STR1## wherein, R.sub.1, R.sub.2 and R.sub.3 independently represent a hydrogen atom or a methyl; R.sub.4, R.sub.5 and R.sub.6 independently represent a hydrogen atom, an alkyl group, an alkoxy group or a halogen; 1, m, n each is a repeating number satisfying the condition that 0.3
摘要翻译：具有由以下通式I表示的重复单元的共聚物和具有共聚物和光致酸发生剂的化学扩增正性光致抗蚀剂组合物。即使在稍微延迟的时间内进行后烘烤并且使用诸如紫外光，深紫外光和带电粒子束的任何辐射，光致抗蚀剂可以允许良好的图案形状。此外，它在存储稳定性和分辨率方面是优异的，因此它对于半导体器件的高集成是有用的。聚苯乙烯换算的聚合物的平均分子量为1,000至1,000,000。聚合物由以下重复图案表示：其中，R1，R2和R3独立地表示氢原子或甲基; R4，R5和R6独立地表示氢原子，烷基，烷氧基或卤素; 1，m，n分别为满足0.3 <1 /（m + n）<0.9,0.1

9. 发明授权

US5962185A Polymer for positive photoresist and chemical amplified positive photoresist composition containing the same 失效
标题翻译：用于正性光致抗蚀剂的聚合物和含有该光致抗蚀剂的化学扩增的正性光致抗蚀剂组合物
公开(公告)号：US5962185A
公开(公告)日：1999-10-05
申请号：US938925
申请日：1997-09-26
申请人： Joo-Hyeon Park , Seong-Ju Kim , Ji-Hong Kim , Ki-Dae Kim
发明人： Joo-Hyeon Park , Seong-Ju Kim , Ji-Hong Kim , Ki-Dae Kim
IPC分类号： C08F212/04 , C07C69/736 , C08F216/10 , C08F220/30 , G03C1/00 , G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0045 , C08F220/30 , G03F7/039 , Y10S430/106 , Y10S430/111
摘要： A positive chemical amplified photoresist composition having as a matrix resin a polymer having the repeating unit of Formula (I) and a photoacid generator. The polymer ranges, in polystyrene-reduced weight average molecular weight, from about 2,000 to 1,000,000. The photoresist composition is possible to develop in alkali and shows excellent sensitivity, resolution and transmissivity to deep uv light in addition to being superior in storage preservativity. The repeating unit of Formula (I) is: ##STR1## wherein, R.sub.2, R.sub.2 and R.sub.3 are independently represented by a hydrogen atom or a methyl group; R.sub.4 is a hydrogen atom, an alkyl group or an alkoxy group; R.sub.5 is functions as an acid-labile protective group and is selected from a t-butyl group, a tetrahydropyranyl group or an alkoxymethylene group; j is an integer of 1-8; k is an integer of 0-8; and 1, m and n each represent a mole ratio, satisfying the condition of l+m+n=1 where 0
摘要翻译：一种正性化学放大光致抗蚀剂组合物，其具有作为基质树脂的具有式（I）的重复单元的聚合物和光酸产生剂。聚苯乙烯换算的重均分子量范围为约2,000至1,000,000。光致抗蚀剂组合物可以在碱中显影，并且除了具有优异的储存保存性之外，对深紫外光具有优异的灵敏度，分辨率和透射率。式（I）的重复单元是：其中R2，R2和R3独立地由氢原子或甲基表示; R4是氢原子，烷基或烷氧基; R5用作酸不稳定保护基，选自叔丁基，四氢吡喃基或烷氧基亚甲基; j为1-8的整数; k是0-8的整数; 和1，m和n各自表示摩尔比，满足条件1 + m + n = 1，其中0 <1 <0.4。

10. 发明授权

US5916995A Acetal-substituted aromatic hydroxy compounds and negative photoresist compositions comprising the same 失效
标题翻译：乙缩醛取代的芳族羟基化合物和包含其的负性光致抗蚀剂组合物
公开(公告)号：US5916995A
公开(公告)日：1999-06-29
申请号：US932358
申请日：1997-09-17
申请人： Joo-Hyeon Park , Seong-Ju Kim , Ji-Hong Kim , Sun-Yi Park
发明人： Joo-Hyeon Park , Seong-Ju Kim , Ji-Hong Kim , Sun-Yi Park
IPC分类号： G03F7/004 , C07C43/303 , C07C69/734 , C07C69/92 , C07C69/94 , C07D317/00 , C07D317/22 , C07D319/00 , C08F8/00 , C08F12/22 , C08L25/00 , C08L25/18 , C08L61/00 , C08L61/06 , G03F7/023 , G03F7/038 , H01L21/027 , C08G59/00
CPC分类号： G03F7/038 , C07D317/22 , C08F8/10 , G03F7/0045
摘要： There are disclosed an aromatic hydroxy compound or polymer substituted with acetal of Formula (I), (II) or (III), and a negative photoresist composition prepared therefrom. The pattern formed of the negative photoresist composition has good cross sections in addition to being superior in transmissivity to deep uv light and excimer laser and in thermal resistance and storage stability after exposure. ##STR1##
摘要翻译：公开了由式（I），（II）或（III）的缩醛取代的芳族羟基化合物或聚合物，以及由其制备的负性光致抗蚀剂组合物。除了对深紫外光和准分子激光器的透射率优异以及曝光后的耐热性和储存稳定性之外，由负性光致抗蚀剂组合物形成的图案也具有良好的横截面。

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