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    • 1. 发明授权
    • Haptic actuator using cellulose electro-active paper film
    • 触觉致动器采用纤维素电活性纸膜
    • US08680741B2
    • 2014-03-25
    • US13295520
    • 2011-11-14
    • Sang-Yeon KimJae hwan Kim
    • Sang-Yeon KimJae hwan Kim
    • H01L41/08
    • G06F3/016H01L41/094H01L41/193
    • A haptic actuator using a cellulose electro-active paper film is provided. The haptic actuator includes a cellulose electro-active paper film exhibiting a piezoelectric phenomenon and a metal electrode for applying electricity to the electro-active paper film, so that the haptic actuator can be provided in the form of a thin film, can manifest high transparency, and can produce displacement to the magnitude of sufficiently stimulating the sensor receptors of a user's skin in response to the applied electricity. Also, the haptic actuator is friendly to the environment and humans thanks to the use of cellulose which is an environmentally friendly material.
    • 提供了使用纤维素电活性纸膜的触觉致动器。 触觉致动器包括显示压电现象的纤维素电活性纸膜和用于向电活性纸膜施加电力的金属电极,使得触觉致动器可以以薄膜的形式提供,可以表现出高透明度 并且可以响应于所施加的电力而产生位移到充分刺激使用者皮肤的传感器受体的量级。 此外,由于使用作为环境友好材料的纤维素,触觉致动器对环境和人类是友好的。
    • 3. 发明授权
    • Semiconductor device having multiple gate oxide layers and method of manufacturing thereof
    • 具有多个栅极氧化物层的半导体器件及其制造方法
    • US07208378B2
    • 2007-04-24
    • US11126944
    • 2005-05-10
    • Inki KimSang Yeon KimMin PaekOng Boon TeongOh Choong YoungNg Chun LengJoung Joon Ho
    • Inki KimSang Yeon KimMin PaekOng Boon TeongOh Choong YoungNg Chun LengJoung Joon Ho
    • H01L21/8234
    • H01L21/823462Y10S438/981
    • A method of manufacturing a semiconductor device includes defining a first voltage region, a second voltage region, and a third voltage region on a substrate. The first, second, and third voltage regions are configured to handle first, second, and third voltage levels, respectively, that are different from each other. A nitride layer overlying the first, second, and third voltage regions are formed. An oxide layer overlying the nitride layer is formed. The oxide layer is patterned to expose a portion of the nitride layer overlying the first voltage region. The exposed portion of the nitride layer is removed using a wet etch process. A first gate oxide layer overlying the first voltage region is formed. Portions of the oxide layer and the nitride layer overlying the second and third voltage regions are removed. Impurities are selectively implanted into the third voltage region while preventing the impurities from being provided in the second voltage region. A second gate oxide overlying the second voltage region and a third gate oxide overlying the third voltage region are formed simultaneously. The second gate oxide is thicker than the third gate oxide.
    • 制造半导体器件的方法包括在衬底上限定第一电压区域,第二电压区域和第三电压区域。 第一,第二和第三电压区域被配置为分别处理彼此不同的第一,第二和第三电压电平。 形成覆盖第一,第二和第三电压区域的氮化物层。 形成覆盖氮化物层的氧化物层。 图案化氧化物层以暴露覆盖第一电压区域的氮化物层的一部分。 使用湿蚀刻工艺去除氮化物层的暴露部分。 形成覆盖第一电压区域的第一栅极氧化物层。 除去覆盖第二和第三电压区域的氧化物层和氮化物层的部分。 杂质被选择性地注入到第三电压区域中,同时防止在第二电压区域中提供杂质。 覆盖第二电压区域的第二栅极氧化物和覆盖第三电压区域的第三栅极氧化物同时形成。 第二栅极氧化物比第三栅极氧化物厚。
    • 5. 发明授权
    • Semiconductor device with dual gate oxides
    • 具有双栅极氧化物的半导体器件
    • US06818514B2
    • 2004-11-16
    • US10377167
    • 2003-02-26
    • Inki KimSang Yeon KimMin PaekChiew Sin PingWan Gie LeeChoong Shiau ChienZadig LamHitomi WatanabeNaoto Inoue
    • Inki KimSang Yeon KimMin PaekChiew Sin PingWan Gie LeeChoong Shiau ChienZadig LamHitomi WatanabeNaoto Inoue
    • H01L218234
    • H01L21/823462H01L21/823481Y10S438/981
    • A method for making a semiconductor device having a first active region and a second active region includes providing first and second isolation structures defining the first active region on a substrate. The first active region uses a first operational voltage, and the second active region uses a second operational voltage that is different from the first voltage. A nitride layer overlying the first and second active regions is formed. An oxide layer overlying the nitride layer is formed. A first portion of the oxide layer overlying the first active region is removed to expose a first portion of the nitride layer. The exposed first portion of the nitride layer is removed using a wet etch method while leaving a second portion of the nitride layer that is overlying the second active region intact. Thereafter, a first gate oxide having a first thickness is formed on the first active region, the first gate oxide having a first edge facing the first isolation structure and a second edge facing the second isolation structure. The first edge is separated from the first isolation structure by a first distance. The second edge is separated from the second isolation structure by a second distance. Thereafter, a second gate oxide having a second thickness is formed on the second active region, the second thickness being different than the first thickness.
    • 制造具有第一有源区和第二有源区的半导体器件的方法包括提供在衬底上限定第一有源区的第一和第二隔离结构。 第一有源区域使用第一工作电压,而第二有源区域使用不同于第一电压的第二工作电压。 形成覆盖第一和第二有源区的氮化物层。 形成覆盖氮化物层的氧化物层。 去除覆盖在第一有源区上的氧化物层的第一部分以露出氮化物层的第一部分。 使用湿蚀刻方法去除氮化物层的暴露的第一部分,同时留下覆盖第二有源区域的氮化物层的第二部分完好无损。 此后,在第一有源区上形成具有第一厚度的第一栅极氧化物,第一栅极氧化物具有面对第一隔离结构的第一边缘和面向第二隔离结构的第二边缘。 第一边缘与第一隔离结构隔开第一距离。 第二边缘与第二隔离结构隔开第二距离。 此后,在第二有源区上形成具有第二厚度的第二栅极氧化物,第二厚度不同于第一厚度。
    • 7. 发明授权
    • Method of forming CMOS device
    • 形成CMOS器件的方法
    • US06531742B2
    • 2003-03-11
    • US09745555
    • 2000-12-26
    • Sang Yeon Kim
    • Sang Yeon Kim
    • H01L2701
    • H01L27/1203H01L21/86
    • A CMOS device and a method for fabricating the same, is disclosed, the device including an insulating film formed on a substrate, first and second sapphire patterns formed on the insulating film at fixed intervals, first and second epitaxial semiconductor layers formed on the first and second sapphire patterns, isolating structures formed at edges of the first and second semiconductor layers, respectively, first and second trenches formed down to predetermined depths from surfaces of the first and second semiconductor layers, sidewall spacer structures formed at both sides of the first and second trenches, a gate insulating film formed on a surface of each of the first and second semiconductor layers between the sidewall spacer structures, first and second gate electrodes formed in the first and second trenches respectively on the gate insulating film, first conductivity type impurity regions formed in the first semiconductor layer on both sides of the first gate electrodes, and second conductivity type impurity regions formed in the second semiconductor layer on both sides of the second gate electrodes. The CMOS device exhibits reduced latch-up and hot carrier characteristics, improved device reliability, reduced junction and parasitic capacitances, and improved device performance.
    • 公开了一种CMOS器件及其制造方法,该器件包括形成在衬底上的绝缘膜,以固定间隔形成在绝缘膜上的第一和第二蓝宝石图案,形成在第一和第二衬底上的第一和第二外延半导体层, 第二蓝宝石图案,分别形成在第一和第二半导体层的边缘处的隔离结构,分别从第一和第二半导体层的表面形成为预定深度的第一和第二沟槽,形成在第一和第二半导体层的两侧的侧壁间隔结构 沟槽,形成在侧壁间隔物结构之间的第一和第二半导体层中的每一个的表面上的栅极绝缘膜,分别形成在栅极绝缘膜上的第一和第二沟槽中的第一和第二栅极,形成的第一导电型杂质区 在第一栅电极的两侧的第一半导体层中,第二栅极电极 形成在第二栅电极两侧的第二半导体层中的导电型杂质区。 CMOS器件表现出减少的闭锁和热载流子特性,改进的器件可靠性,减少的结和寄生电容以及改进的器件性能。
    • 9. 发明申请
    • HAPTIC ACTUATOR USING CELLULOSE ELECTRO-ACTIVE PAPER FILM
    • 使用纤维素电动活性纸膜的致动器
    • US20120161587A1
    • 2012-06-28
    • US13295520
    • 2011-11-14
    • Sang yeon KIMJae hwan KIM
    • Sang yeon KIMJae hwan KIM
    • H01L41/18
    • G06F3/016H01L41/094H01L41/193
    • A haptic actuator using a cellulose electro-active paper film is provided. The haptic actuator includes a cellulose electro-active paper film exhibiting a piezoelectric phenomenon and a metal electrode for applying electricity to the electro-active paper film, so that the haptic actuator can be provided in the form of a thin film, can manifest high transparency, and can produce displacement to the magnitude of sufficiently stimulating the sensor receptors of a user's skin in response to the applied electricity. Also, the haptic actuator is friendly to the environment and humans thanks to the use of cellulose which is an environmentally friendly material.
    • 提供了使用纤维素电活性纸膜的触觉致动器。 触觉致动器包括显示压电现象的纤维素电活性纸膜和用于向电活性纸膜施加电力的金属电极,使得触觉致动器可以以薄膜的形式提供,可以表现出高透明度 并且可以响应于所施加的电力而产生位移到充分刺激使用者皮肤的传感器受体的量级。 此外,由于使用作为环境友好材料的纤维素,触觉致动器对环境和人类是友好的。
    • 10. 发明授权
    • Device and method for controlling brightness of image signal
    • 用于控制图像信号亮度的装置和方法
    • US06700628B1
    • 2004-03-02
    • US09567103
    • 2000-05-08
    • Sang Yeon Kim
    • Sang Yeon Kim
    • H04N514
    • H04N5/20G06T5/009G06T5/40
    • A device and method for controlling a brightness of an image signal in a moving picture transmission/reception system is disclosed. The present invention includes a control point detecting unit for receiving an image, calculating a Cumulative Density Function from two most significant bits of the image, dividing an axis into a required number of portions, and detecting a required number of control points. The present invention also includes an image signal brightness controlling unit for calculating and dividing six least significant bits of the image and a signal from the control point detecting unit for controlling a next frame of the image.
    • 公开了一种用于控制运动图像发送/接收系统中的图像信号的亮度的装置和方法。 本发明包括用于接收图像的控制点检测单元,从图像的两个最高有效位计算累积密度函数,将轴分成所需数量的部分,并且检测所需数量的控制点。 本发明还包括图像信号亮度控制单元,用于计算和分割图像的六个最低有效位和来自控制点检测单元的信号,用于控制图像的下一帧。