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    • 4. 发明授权
    • Method of manufacturing a multi-level flash EEPROM cell
    • 制造多级闪存EEPROM单元的方法
    • US06821850B2
    • 2004-11-23
    • US10627917
    • 2003-07-28
    • Sang-Hoan ChangKi-Seog KimKeun-Woo LeeSung-Kee Park
    • Sang-Hoan ChangKi-Seog KimKeun-Woo LeeSung-Kee Park
    • H02L21336
    • G11C11/5621G11C11/5628G11C16/0425G11C2211/5611
    • A multi-level EEPROM cell and a method of manufacture thereof are provided so as to improve a program characteristic of the multi-level cell. For the purpose, the multi-level flash EEPROM cell includes a floating gate formed as being electrically separated from a silicon substrate by an underlying tunnel oxide layer, a first dielectric layer formed over the top of the floating gate, a first control gate formed on the floating gate as being electrically separated from the floating gate by the first dielectric layer, a second dielectric layer formed on the sidewall and top of the first control gate, a second control gate formed on the sidewall and top of the first control gate as being electrically separated from the first control gate by the second dielectric layer, and a source and drain formed in the substrate as being self-aligned with both edges of the second control gate.
    • 提供多级EEPROM单元及其制造方法,以改善多电平单元的程序特性。 为此,多级闪速EEPROM单元包括浮置栅极,其通过下面的隧道氧化物层与硅衬底电隔离,形成在浮置栅极的顶部上的第一电介质层,形成在第一控制栅极上的第一控制栅极 所述浮置栅极通过所述第一介电层与所述浮置栅极电分离,形成在所述第一控制栅极的侧壁和顶部上的第二介电层,形成在所述第一控制栅极的侧壁和顶部上的第二控制栅极为 通过第二电介质层与第一控制栅极电分离,以及在衬底中形成的与第二控制栅极的两个边缘自对准的源极和漏极。
    • 5. 发明授权
    • Method of monitoring a source contact in a flash memory
    • 监视闪存中的源触点的方法
    • US06391665B1
    • 2002-05-21
    • US09722112
    • 2000-11-27
    • Sang Hoan ChangKi Seog KimJin ShinKeun Woo Lee
    • Sang Hoan ChangKi Seog KimJin ShinKeun Woo Lee
    • H01L21336
    • H01L27/11521G11C16/04G11C29/50G11C29/50008G11C2029/5006H01L21/76895H01L27/115
    • There is disclosed a method of monitoring a source contact in a flash memory by which whether a source contact having a narrow contact area contacts or not can be easily monitored using over-erase cell characteristic in a flash cell, in a flash memory device in which a source line is formed by a local interconnection method. In the present invention, in order to monitor a contact state at source contacts, the same voltage to the erase condition of a cell is applied to respective terminals (VG terminal, VD terminal, VS terminal and VSS terminal) wherein all the electrons existing at a floating gate in all the cells connected to the VS terminal and VSS terminal become turned on so that they can be over-erased. On the other hands, as electrons existing at the floating gate in two cells shared by any source contacts having a defect contact are not erased, the cells remain turn-off. In this state, if test voltages (VG=0V, VD
    • 公开了一种监视闪速存储器中的源极触点的方法,通过该闪光存储器中的源极触点可以容易地利用闪存单元中的过擦除单元特性来容易地监视具有窄接触区域的源极触点的触点, 源线由本地互连方式形成。 在本发明中,为了监测源极触点的接触状态,将与电池的擦除状态相同的电压施加到各个端子(VG端子,VD端子,VS端子和VSS端子),其中所有电子存在于 连接到VS端子和VSS端子的所有单元中的浮动栅极变为导通,使得它们可能被过擦除。 另一方面,由于存在于由具有缺陷接触的任何源极触点共享的两个电池中的浮动栅极处的电子不被擦除,所以电池保持关断。 在这种状态下,如果施加了测试电压(VG = 0V,VD <5V,VS =浮动,VSS =接地),则在具有接触缺陷的部分中,从VD端子到VSS端子的电流断开,从而允许 要监控的源触点的接触状态。
    • 10. 发明授权
    • Multi-level flash EEPROM cell and method of manufacture thereof
    • 多级闪存EEPROM单元及其制造方法
    • US06630709B2
    • 2003-10-07
    • US09739401
    • 2000-12-19
    • Sang-Hoan ChangKi-Seog KimKeun-Woo LeeSung-Kee Park
    • Sang-Hoan ChangKi-Seog KimKeun-Woo LeeSung-Kee Park
    • H01L2976
    • G11C11/5621G11C11/5628G11C16/0425G11C2211/5611
    • A multi-level EEPROM cell and a method of manufacture thereof are provided so as to improve a program characteristic of the multi-level cell. For the purpose, the multi-level flash EEPROM cell includes a floating gate formed as being electrically separated from a silicon substrate by an underlying tunnel oxide layer, a first dielectric layer formed over the top of the floating gate, a first control gate formed on the floating gate as being electrically separated from the floating gate by the first dielectric layer, a second dielectric layer formed on the sidewall and top of the first control gate, a second control gate formed on the sidewall and top of the first control gate as being electrically separated from the first control gate by the second dielectric layer, and a source and drain formed in the substrate as being self-aligned with both edges of the second control gate.
    • 提供多级EEPROM单元及其制造方法,以改善多电平单元的程序特性。 为此,多级闪速EEPROM单元包括浮置栅极,其通过下面的隧道氧化物层与硅衬底电隔离,形成在浮置栅极的顶部上的第一电介质层,形成在第一控制栅极上的第一控制栅极 所述浮置栅极通过所述第一介电层与所述浮置栅极电分离,形成在所述第一控制栅极的侧壁和顶部上的第二介电层,形成在所述第一控制栅极的侧壁和顶部上的第二控制栅极为 通过第二电介质层与第一控制栅极电分离,以及在衬底中形成的与第二控制栅极的两个边缘自对准的源极和漏极。