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1. 发明授权

US08398779B2 Non destructive selective deposition removal of non-metallic deposits from aluminum containing substrates 有权
标题翻译：从含铝基材中非金属沉积物的非破坏性选择性沉积去除
公开(公告)号：US08398779B2
公开(公告)日：2013-03-19
申请号：US12709369
申请日：2010-02-19
申请人： Liyuan Bao , Anbei Jiang , Sio On Lo , Yukari Nishimura , Joseph F. Sommers , Samantha S. H. Tan
发明人： Liyuan Bao , Anbei Jiang , Sio On Lo , Yukari Nishimura , Joseph F. Sommers , Samantha S. H. Tan
IPC分类号： B08B3/08
CPC分类号： C23C16/4407 , C23G1/125 , Y02P20/582
摘要： Non-metallic deposits are selectively removed from aluminum containing substrates such as aluminum faceplates using a selective deposition removal (SDR) solution. The SDR solution does not substantially etch the faceplate holes, thereby preserving the hole diameter integrity and increasing the number of times the faceplate may be cleaned or refurbished while remaining within processing hole diameter tolerances. In an embodiment, the SDR solution comprises, in wt % of the solution, 15.5%+/−2% HF or buffered HF acid, 3.8%+/−0.5% NH4F pH buffer, 59.7%+/−5% ethylene glycol, and the balance H2O.
摘要翻译：使用选择性沉积去除（SDR）溶液，从含铝底物例如铝面板选择性地除去非金属沉积物。 SDR溶液基本上不蚀刻面板孔，从而保持孔直径的完整性并增加面板在保持在加工孔直径公差范围内可被清洁或翻新的次数。在一个实施方案中，SDR溶液以重量％的比例包含15.5％±2％HF或缓冲HF酸，3.8％±0.5％NH 4 F pH缓冲液，59.7％±5％乙二醇，和余量H 2 O。

2. 发明授权

US08691023B2 Methods and apparatus for cleaning deposition chamber parts using selective spray etch 有权
标题翻译：使用选择性喷涂蚀刻来清洁沉积室部件的方法和设备
公开(公告)号：US08691023B2
公开(公告)日：2014-04-08
申请号：US13585294
申请日：2012-08-14
申请人： Liyuan Bao , Samantha S. H. Tan , Anbei Jiang
发明人： Liyuan Bao , Samantha S. H. Tan , Anbei Jiang
IPC分类号： B08B3/00
CPC分类号： C23G3/00 , B08B3/08 , C23C14/564 , C23C16/4407 , C23F1/00 , C23F1/26 , C23F1/44 , C23G1/00 , C23G1/22
摘要： In one aspect, a method of cleaning an electronic device manufacturing process chamber part is provided, including a) spraying the part with an acid; b) spraying the part with DI water; and c) treating the part with potassium hydroxide. Other aspects are provided.
摘要翻译：一方面，提供一种清洁电子装置制造处理室部件的方法，包括：a）用酸喷涂该部件; b）用DI水喷涂部件; 和c）用氢氧化钾处理该部分。提供其他方面。

3. 发明授权

US07789969B2 Methods and apparatus for cleaning chamber components 有权
标题翻译：清洁腔室部件的方法和设备
公开(公告)号：US07789969B2
公开(公告)日：2010-09-07
申请号：US11931272
申请日：2007-10-31
申请人： Felix Rabinovich , Thomas Echols , Janet Maleski , Ning Chen , Samantha S. H. Tan
发明人： Felix Rabinovich , Thomas Echols , Janet Maleski , Ning Chen , Samantha S. H. Tan
IPC分类号： B08B5/04 , B08B9/00 , B08B3/00
CPC分类号： B08B3/04 , B08B3/08 , B08B5/00 , B08B9/00 , B08B9/02 , C23C16/4407
摘要： In a first aspect, a method for cleaning a semiconductor fabrication chamber component having an orifice is provided. The method includes (A) placing the component into a bath having a cleaning solution; (B) flowing a fluid into the orifice thereby maintaining at least a first portion of the orifice free from cleaning solution while the cleaning solution cleans the component; and (C) withdrawing the fluid from the orifice such that cleaning solution enters into the first portion of the orifice and cleans the first portion of the orifice. Numerous other aspects are also provided.
摘要翻译：在第一方面，提供了一种用于清洁具有孔口的半导体制造室部件的方法。该方法包括（A）将组分置于具有清洁溶液的浴中; （B）使流体流入孔中，从而在清洁溶液清洁组件的同时保持孔的至少第一部分不含清洁溶液; 和（C）从孔口抽出流体，使得清洁溶液进入孔口的第一部分并清洁孔口的第一部分。还提供了许多其他方面。

4. 发明授权

US4930360A Liquids sampler 失效
标题翻译：液体取样器
公开(公告)号：US4930360A
公开(公告)日：1990-06-05
申请号：US383924
申请日：1989-07-21
申请人： Samantha S. H. Tan
发明人： Samantha S. H. Tan
IPC分类号： G01N1/14 , G01N1/20
CPC分类号： C23F1/36 , G01N1/14 , G01N2001/1427 , G01N2001/2071
摘要： An apparatus and method are set forth for removing a sample of a liquid for chemical analysis from a vessel containing the liquid and for delivering the sample into a sample bottle. The apparatus comprises a hollow member defining an enclosed plenum. A sample bottle attachment structure defines a passage communicating with the plenum and being adapted for attachment to a top portion of the sample bottle. A longitudinally extending sample transport tube extends through the passage and into the bottle. The transport tube passes through the hollow member in substantially air-tight relation to it. The other end of the transport tube is positionable in the liquid being sampled. The method comprises positioning one end of a tube in a sample bottle and the other end in the liquid. A hand operated pump manually creates a partial vacuum in the bottle to draw the sample.
摘要翻译：提出了一种装置和方法，用于从容纳液体的容器中取出用于化学分析的液体的样品，并将样品输送到样品瓶中。该设备包括限定封闭的通风室的中空构件。样品瓶附接结构限定与通气室连通的通道并适于附接到样品瓶的顶部。纵向延伸的样品输送管延伸穿过通道并进入瓶中。输送管以基本上不密封的方式穿过中空构件。输送管的另一端可定位在被采样的液体中。该方法包括将管的一端定位在样品瓶中，另一端位于液体中。手动泵手动在瓶中产生部分真空以抽出样品。

5. 发明申请

US20090197004A1 METHODS FOR CLEANING PROCESS KITS AND CHAMBERS, AND FOR RUTHENIUM RECOVERY 有权
标题翻译：清洁过程工具箱和盖子的方法以及用于回收的方法
公开(公告)号：US20090197004A1
公开(公告)日：2009-08-06
申请号：US12339037
申请日：2008-12-18
申请人： Samantha S. H. Tan , Jianqi Wang
发明人： Samantha S. H. Tan , Jianqi Wang
IPC分类号： B05D1/00 , B08B9/38
CPC分类号： C23C16/4407 , C23C14/564
摘要： A method is provided for recovering a metal from electronic device deposition equipment including: providing deposition equipment wherein the deposition equipment is at least partially coated with a deposited metal; blasting the deposition equipment with a grit to remove at least some of the deposited metal to form a blasted grit and a removed metal; and separating at least some of the removed metal from the blasted grit to form a recovered metal.
摘要翻译：提供一种用于从电子设备沉积设备回收金属的方法，包括：提供沉积设备，其中沉积设备至少部分地涂覆有沉积的金属; 用砂砾喷砂沉积设备以去除至少一些沉积的金属以形成喷砂砂粒和去除的金属; 以及将所移除的金属中的至少一些与喷砂砂粒分离以形成回收的金属。

6. 发明授权

US07452475B2 Cleaning process and apparatus for silicate materials 有权
标题翻译：硅酸盐材料清洗工艺和设备
公开(公告)号：US07452475B2
公开(公告)日：2008-11-18
申请号：US11061013
申请日：2005-02-17
申请人： Samantha S. H. Tan , Ning Chen
发明人： Samantha S. H. Tan , Ning Chen
IPC分类号： B44C1/22
CPC分类号： C23C16/4404 , C23C16/4407
摘要： A method for treating a surface of a quartz substrate includes preparing a substrate to provide a working surface having an initial roughness; and then ultrasonically acid-etching the working surface to increase the roughness of the working surface by at least about 10%. In one embodiment, the initial surface roughness is greater than about 10 Ra, and in another embodiment the initial surface roughness is greater than about 200 Ra. In a still further embodiment, the initial surface area, if less than about 200 Ra, is increased to greater than about 200 Ra. In other embodiments of the present invention, the working surface roughness is increased by at least about 25% or at least about 50%. Simultaneous with the increase in surface area (as measured by the roughness), the surface defects are reduced to reduce particulate contamination from the substrate.
摘要翻译：一种用于处理石英基板的表面的方法包括制备基板以提供具有初始粗糙度的工作表面; 然后对工作表面进行超声波酸蚀，使工作表面的粗糙度增加至少约10％。在一个实施方案中，初始表面粗糙度大于约10Ra，在另一个实施方案中，初始表面粗糙度大于约200Ra。在另一个实施方案中，初始表面积（如果小于约200Ra）增加至大于约200Ra。在本发明的其它实施例中，工作表面粗糙度增加至少约25％或至少约50％。与表面积增加同步（通过粗糙度测量），表面缺陷减少，从而降低基材的颗粒污染。

7. 发明授权

US07045072B2 Cleaning process and apparatus for silicate materials 有权
标题翻译：硅酸盐材料清洗工艺和设备
公开(公告)号：US07045072B2
公开(公告)日：2006-05-16
申请号：US10627185
申请日：2003-07-24
申请人： Samantha S. H. Tan , Ning Chen
发明人： Samantha S. H. Tan , Ning Chen
IPC分类号： B44C1/22 , C03C15/00 , C03C25/68 , C23F1/00
CPC分类号： C23C16/4404 , C23C16/4407
摘要： A method for treating a surface of a quartz substrate includes preparing a substrate to provide a working surface having an initial roughness; and then ultrasonically acid-etching the working surface to increase the roughness of the working surface by at least about 10%. In one embodiment, the initial surface roughness is greater than about 10 Ra, and in another embodiment the initial surface roughness is greater than about 200 Ra. In a still further embodiment, the initial surface area, if less than about 200 Ra, is increased to greater than about 200 Ra. In other embodiments of the present invention, the working surface roughness is increased by at least about 25% or at least about 50%. Simultaneous with the increase in surface area (as measured by the roughness), the surface defects are reduced to reduce particulate contamination from the substrate.
摘要翻译：一种用于处理石英基板的表面的方法包括制备基板以提供具有初始粗糙度的工作表面; 然后对工作表面进行超声波酸蚀，使工作表面的粗糙度增加至少约10％。在一个实施方案中，初始表面粗糙度大于约10Ra，在另一个实施方案中，初始表面粗糙度大于约200Ra。在另一个实施方案中，初始表面积（如果小于约200Ra）增加至大于约200Ra。在本发明的其它实施例中，工作表面粗糙度增加至少约25％或至少约50％。与表面积增加同步（通过粗糙度测量），表面缺陷减少，从而降低基材的颗粒污染。

8. 发明授权

US5996424A Apparatus for obtaining, storing and transporting liquid samples and methods for making and using same 失效
标题翻译：用于获取，储存和运输液体样品的设备及其制造和使用方法
公开(公告)号：US5996424A
公开(公告)日：1999-12-07
申请号：US52871
申请日：1998-03-31
申请人： Samantha S. H. Tan , Dianne M. Dougherty
发明人： Samantha S. H. Tan , Dianne M. Dougherty
IPC分类号： G01N1/10 , B01L3/00 , B29C49/00 , B29L22/00 , B65D1/00 , G01N1/14 , G01N1/20 , G01N1/00
CPC分类号： B01L3/505 , G01N1/14 , G01N2001/2071
摘要： A low contamination bottle for sampling, storing, and transporting of chemical samples includes a bottle portion defining an internal volume and having a threaded neck, and a cap portion provided with threads that engage the threaded neck of the bottle to provide a fluid-tight seal between the internal volume of the bottle and the ambient environment. The bottle has a flexible sidewall portion that permits the reduction of the internal volume to allow a liquid sample to be drawn into the bottle portion by a suction or vacuum process. Both the bottle portion and the cap portion are made from a material selected from the chemical resistant group consisting essentially of hydrocarbon polymers and fluorocarbon polymers, where the material generates less then 1 ppb of metal contaminants and 1 ppm of leachable anionic and organic contaminants. The flexible sidewall portion of the bottle portion has a minimum thickness of 0.2 mm such that the low contamination bottle meets all safety requirements for the transport of hazardous chemical samples.
摘要翻译：用于采样，储存和运输化学样品的低污染瓶包括限定内部容积并具有螺纹颈部的瓶部分，以及具有与瓶子的螺纹颈部接合以提供流体密封的螺纹的帽部分在瓶的内部体积和周围环境之间。瓶子具有柔性侧壁部分，其允许减小内部容积以允许液体样品通过抽吸或真空过程被吸入瓶子部分。瓶部分和盖部分均由选自基本上由烃聚合物和碳氟聚合物组成的耐化学性基团的材料制成，其中材料产生少于1ppb的金属污染物和1ppm的可浸出的阴离子和有机污染物。瓶部分的柔性侧壁部分具有0.2mm的最小厚度，使得低污染瓶符合运输危险化学样品的所有安全要求。

9. 发明授权

US5804744A Apparatus for obtaining, storing and transporting liquid samples and methods for making and using same 失效
公开(公告)号：US5804744A
公开(公告)日：1998-09-08
申请号：US723861
申请日：1996-09-30
申请人： Samantha S. H. Tan , Dianne M. Dougherty
发明人： Samantha S. H. Tan , Dianne M. Dougherty
IPC分类号： G01N1/10 , B01L3/00 , B29C49/00 , B29L22/00 , B65D1/00 , G01N1/14 , G01N1/20 , G01N1/00
CPC分类号： B01L3/505 , G01N1/14 , G01N2001/2071
摘要： A low contamination bottle for sampling, storing, and transporting of chemical samples includes a bottle portion defining an internal volume and having a threaded neck, and a cap portion provided with threads that engage the threaded neck of the bottle to provide a fluid-tight seal between the internal volume of the bottle and the ambient environment. The bottle has a flexible sidewall portion that permits the reduction of the internal volume to allow a liquid sample to be drawn into the bottle portion by a suction or vacuum process. Both the bottle portion and the cap portion are made from a material selected from the chemical resistant group consisting essentially of hydrocarbon polymers and fluorocarbon polymers, where the material generates less then 1 ppb of metal contaminants and 1 ppm of leachable anionic and organic contaminants. The flexible sidewall portion of the bottle portion has a minimum thickness of 0.2 mm such that the low contamination bottle meets all safety requirements for the transport of hazardous chemical samples.

10. 发明授权

US08097089B2 Methods for cleaning process kits and chambers, and for ruthenium recovery 有权
标题翻译：清洁工艺包和室的方法，以及钌的回收
公开(公告)号：US08097089B2
公开(公告)日：2012-01-17
申请号：US12339037
申请日：2008-12-18
申请人： Samantha S. H. Tan , Jianqi Wang
发明人： Samantha S. H. Tan , Jianqi Wang
IPC分类号： H01G9/04
CPC分类号： C23C16/4407 , C23C14/564
摘要： A method is provided for recovering a metal from electronic device deposition equipment including: providing deposition equipment wherein the deposition equipment is at least partially coated with a deposited metal; blasting the deposition equipment with a grit to remove at least some of the deposited metal to form a blasted grit and a removed metal; and separating at least some of the removed metal from the blasted grit to form a recovered metal.
摘要翻译：提供一种用于从电子设备沉积设备回收金属的方法，包括：提供沉积设备，其中沉积设备至少部分地涂覆有沉积的金属; 用砂砾喷砂沉积设备以去除至少一些沉积的金属以形成喷砂砂粒和去除的金属; 以及将所移除的金属中的至少一些与喷砂砂粒分离以形成回收的金属。

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