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1. 发明授权

US5112644A Horizontal precession tooling and method for tube rotation 失效
标题翻译：水平进动工具和管旋转方法
公开(公告)号：US5112644A
公开(公告)日：1992-05-12
申请号：US491474
申请日：1990-03-08
申请人： Richard I. Seddon , Michael D. Temple
发明人： Richard I. Seddon , Michael D. Temple
IPC分类号： C23C14/50
CPC分类号： C23C14/505 , Y10S414/123
摘要： A simple, double rotary workpiece or cage holder is disclosed for coating articles such as tubes or article-holders. The articles or article holders are supported in oversized support holes or on undersized pegs so that rotation of the cage about a horizontal axis causes gravity-induced precession of the tubes. The center of gravity of the article holders may be displaced so that the article holders are maintained at an acute angle relative to the cage axis, to facilitate coating difficult shapes such as lenses.
摘要翻译：公开了一种简单的双旋转工件或保持架，用于涂覆物品如管或物品保持器。物品或物品保持器支撑在超大的支撑孔或小尺寸的钉中，使得笼围绕水平轴的旋转引起重力引起的管的进动。物品保持器的重心可以移位，使得物品保持器相对于保持架轴线保持锐角，以便于涂覆诸如透镜的困难形状。

2. 发明授权

US4293732A Silicon solar cell and 350 nanometer cut-on filter for use therein 失效
标题翻译：硅太阳能电池和350纳米切割式过滤器用于其中
公开(公告)号：US4293732A
公开(公告)日：1981-10-06
申请号：US51379
申请日：1979-06-25
申请人： James D. Rancourt , Richard I. Seddon
发明人： James D. Rancourt , Richard I. Seddon
IPC分类号： H01L31/0216 , H01L31/06
CPC分类号： C03C17/3417 , H01L31/02168 , Y02E10/50
摘要： Solar cell construction having a body formed essentially of silicon and having a surface with a photovoltaic junction applied thereon. An anti-reflection coating is formed on the surface. A transparent protective cover is provided. A cut-on filter is carried by the cover for reflecting solar energy below approximately 350 nanometers. A layer of substantially transparent cement is used for securing the protective cover to the body so that it overlies the junction and the anti-reflection coating. The cut-on filter includes a stack of high and low index layers for reflecting solar energy in the ultra-violet region of 350 nanometers and below and also may include at least one additional layer of material of absorbing ultraviolet energy below 350 nanometers which passes through the high and low index layers above it.
摘要翻译：太阳能电池结构具有基本上由硅形成并且具有其上施加有光伏结的表面的主体。在表面上形成防反射涂层。提供透明保护罩。封闭式过滤器由盖子承载，用于将太阳能反射到大约350纳米以下。一层基本上透明的水泥用于将保护盖固定到主体上，使其覆盖在接合处和防反射涂层之间。切入式过滤器包括用于在350纳米及以下的紫外区域反射太阳能的高折射率层和低折射率层的堆叠，并且还可以包括至少一个额外的吸收低于350纳米的紫外线能量的材料层，其通过其上方的高和低折射率层。

3. 发明授权

US4276855A Coating apparatus 失效
标题翻译：涂装设备
公开(公告)号：US4276855A
公开(公告)日：1981-07-07
申请号：US35396
申请日：1979-05-02
申请人： Richard I. Seddon
发明人： Richard I. Seddon
IPC分类号： C23C14/24 , C23C14/50 , C23C14/56 , C23C13/08
CPC分类号： C23C14/564 , C23C14/50
摘要： A coating apparatus having a housing and a vacuum pump for establishing a vacuum in the housing. First and second rotors are disposed within the housing for rotation about axes which are offset from the horizontal by less than 45.degree. whereby the upper portions of the rotors are in relatively close proximity to each other and the lower portions of the rotors are spaced apart from each other. A source of coating material is disposed between the rotors generally in line with the axis of rotation of the rotors. The rotors have substrate carrying surfaces having longitudinal dimensions extending generally parallel to the axis of rotation which is such so that an imaginary vertical line extending downwardly from the top portion of the substrate carrying surface from the inner extremity of the same clears the outermost margin of the lower portion of the substrate carrying surfaces of the rotor whereby debris and the like falling by force of gravity from the top portion of the rotor will clear the lower portion of the rotor.
摘要翻译：一种具有壳体和用于在壳体中建立真空的真空泵的涂覆装置。第一转子和第二转子设置在壳体内，用于围绕与水平偏移小于45度的轴旋转，由此转子的上部彼此相对靠近并且转子的下部与彼此。涂层材料的源头设置在转子之间，大体上与转子的旋转轴线一致。转子具有基本承载表面，其具有大体上平行于旋转轴线延伸的纵向尺寸，使得从基板承载表面的顶部向下延伸的从该基板承载表面的顶部向下延伸的假想垂直线将第一边缘的最外边缘清除转子的承载表面的底部的下部，由于来自转子的顶部的力的重力引起的碎屑等将使转子的下部部分清除。

4. 发明授权

US5879519A Geometries and configurations for magnetron sputtering apparatus 失效
标题翻译：磁控溅射装置的几何形状和构造
公开(公告)号：US5879519A
公开(公告)日：1999-03-09
申请号：US699612
申请日：1996-08-16
申请人： James W. Seeser , Thomas H. Allen , Eric R. Dickey , Bryant P. Hichwa , Rolf F. Illsley , Robert F. Klinger , Paul M. Lefebvre , Michael A. Scobey , Richard I. Seddon , David L. Soberanis , Michael D. Temple , Craig C. Van Horn , Patrick R. Wentworth
发明人： James W. Seeser , Thomas H. Allen , Eric R. Dickey , Bryant P. Hichwa , Rolf F. Illsley , Robert F. Klinger , Paul M. Lefebvre , Michael A. Scobey , Richard I. Seddon , David L. Soberanis , Michael D. Temple , Craig C. Van Horn , Patrick R. Wentworth
IPC分类号： C23C8/02 , C23C14/00 , C23C14/08 , C23C14/10 , C23C14/34 , C23C14/35 , C23C14/50 , C23C14/56 , C23C14/58
CPC分类号： C23C14/562 , C23C14/0047 , C23C14/0078 , C23C14/083 , C23C14/10 , C23C14/3407 , C23C14/352 , C23C14/505 , C23C14/56 , C23C14/568 , C23C14/58 , C23C8/02
摘要： A thin film coating system incorporates separate, separately-controlled deposition and reaction zones for depositing materials such as refractory metals and forming oxides and other compounds and alloys of such materials. The associated process involves rotating or translating workpieces past the differentially pumped, atmospherically separated, sequentially or simultaneously operated deposition and reaction zones and is characterized by the ability to form a wide range of materials, by high throughput, and by controlled coating thickness, including both constant and selectively varied thickness profiles.
摘要翻译：薄膜涂覆系统包含分离的，单独控制的沉积和反应区，用于沉积材料，例如难熔金属和形成氧化物以及其它化合物和这些材料的合金。相关联的方法涉及通过差异泵浦，大气分离，顺序或同时操作的沉积和反应区域旋转或平移工件，其特征在于能够通过高通量和受控的涂层厚度形成宽范围的材料，包括两者恒定和选择性变化的厚度剖面。

5. 发明授权

US5218473A Leakage-corrected linear variable filter 失效
标题翻译：泄漏校正线性可变滤波器
公开(公告)号：US5218473A
公开(公告)日：1993-06-08
申请号：US550255
申请日：1990-07-06
申请人： Richard I. Seddon , Basil L. Swaby
发明人： Richard I. Seddon , Basil L. Swaby
IPC分类号： G02B5/20 , G01J3/12 , G01J3/26 , G02B5/28
CPC分类号： G02B5/288 , G01J3/26 , G01J2003/1234
摘要： A leak-corrected linearly variable filter comprises optical filter coatings formed on an assembly of one or more optically transmissive substrates. Leaks due to the longitudinal precession of incident light within the substrates are suppressed by forming the filter such that no two surfaces which are reflected at the same wavelength within the range of interest are parallel. Typically, the constituent substrates of the filter are oriented at a slight angle relative to one another and filter coatings having overlapping reflective wavelengths are deposited on different substrates rather than on the two parallel sides of the same substrate. Alternatively, venetian shade structures can be incorporated within the substrates to block longitudinal precession of light.

6. 发明授权

US4882198A System and method for vacuum deposition of thin films 失效
标题翻译：真空沉积薄膜的系统和方法
公开(公告)号：US4882198A
公开(公告)日：1989-11-21
申请号：US202830
申请日：1988-06-03
申请人： Michael D. Temple , Richard I. Seddon , Kim L. Johnson
发明人： Michael D. Temple , Richard I. Seddon , Kim L. Johnson
IPC分类号： C23C14/32
CPC分类号： C23C14/32
摘要： A substrate holder is mounted within the vacuum chamber for carrying at least one substrate; an electrically conductive crucible is positioned within said vacuum chamber and is electrically insulated therefrom but has a low electrical resistance connection therebetween. The crucible is adapted to contain a preselected material for evaporation onto a substrate on the substrate holder. A high voltage electron beam source is positioned within said vacuum chamber in the vicinity of said crucible and includes a high voltage electron gun and a deflection magnet system arranged for bending electrons from said gun into said crucible for evaporating the preselected material therein, the magnet system forms a magnet field of prearranged characteristics in the region above said crucible. A low voltage, high current plasma source, including a separate plasma generating chamber is positioned relative to said vacuum chamber to produce an intense first plasma of a selected activation gas species in said plasma generating chamber for injection into said vacuum chamber. The plasma source is positioned at any convenient location relative to the crucible and the electron beam source and is electrically interconnected with the crucible for current flow therebetween. The plasma source fills the vacuum chamber with a generally distributed plasma. The distributed plasma coacts with the magnetic field above said crucible and evaporant material leaving the crucible to form an intense second plasma in the region above said crucible, thereby activating the evaporant material passing through the region toward the substrate to produce a vacuum deposited thin film having improved thin film characteristics.
摘要翻译：衬底保持器安装在真空室内以承载至少一个衬底; 导电坩埚定位在所述真空室内并与之电绝缘，但是在它们之间具有低电阻连接。坩埚适于容纳用于蒸发到衬底保持器上的衬底上的预选材料。高电压电子束源位于所述坩埚附近的所述真空室内，并且包括高压电子枪和偏转磁体系统，其布置成用于将电子从所述枪弯曲到所述坩埚中，用于蒸发其中的预选材料，磁体系统在所述坩埚上方的区域中形成预定特性的磁场。包括单独的等离子体产生室的低电压，高电流等离子体源相对于所述真空室定位，以在所述等离子体发生室中产生用于注入所述真空室的所选激活气体种类的强烈的第一等离子体。等离子体源位于相对于坩埚和电子束源的任何方便的位置，并且与坩埚电互连，用于其间的电流。等离子体源以大致分布的等离子体填充真空室。分布式等离子体与坩埚上方的磁场和离开坩埚的蒸发材料共同作用，在坩埚上方的区域中形成强烈的第二等离子体，从而使通过该区域的蒸发材料活动到衬底，以产生真空沉积的薄膜，改善薄膜特性。

7. 发明授权

US4851095A Magnetron sputtering apparatus and process 失效
标题翻译：磁控溅射装置及工艺
公开(公告)号：US4851095A
公开(公告)日：1989-07-25
申请号：US154177
申请日：1988-02-08
申请人： Michael A. Scobey , Richard I. Seddon , James W. Seeser , R. Russel Austin , Paul M. LeFebvre , Barry W. Manley
发明人： Michael A. Scobey , Richard I. Seddon , James W. Seeser , R. Russel Austin , Paul M. LeFebvre , Barry W. Manley
IPC分类号： C23C8/02 , C23C14/00 , C23C14/08 , C23C14/10 , C23C14/34 , C23C14/35 , C23C14/50 , C23C14/56 , C23C14/58
CPC分类号： C23C14/352 , C23C14/0047 , C23C14/0078 , C23C14/083 , C23C14/10 , C23C14/3407 , C23C14/505 , C23C14/56 , C23C14/562 , C23C14/58 , C23C8/02 , H01J2237/022
摘要： A rotary cylindrical sputtering system incorporates separate, separately-controlled linear magnetron sputter cathode and reaction zones for sputter depositing materials such as refractory metals and forming oxides and other compounds and alloys of such materials. The associated process involves rotating or translating workpieces past the differentially pumped, atmospherically separated, sequentially or simultaneously operated cathode and reaction zones and is characterized by the ability to form a wide range of materials, by high throughput, and by controlled coating thickness, including both constant and selectively varied thickness profiles.

8. 发明授权

US4777908A System and method for vacuum deposition of thin films 失效
标题翻译：真空沉积薄膜的系统和方法
公开(公告)号：US4777908A
公开(公告)日：1988-10-18
申请号：US935292
申请日：1986-11-26
申请人： Michael D. Temple , Richard I. Seddon , Kim L. Johnson
发明人： Michael D. Temple , Richard I. Seddon , Kim L. Johnson
IPC分类号： C23C14/30 , C23C14/32 , C23C14/24 , C23C16/50
CPC分类号： C23C14/32
摘要： A substrate holder is mounted within the vacuum chamber for carrying at least one substrate; an electrically conductive crucible is positioned within said vacuum chamber and is electrically insulated therefrom but has a low electrical resistance connection therebetween. The crucible is adapted to contain a preselected material for evaporation onto a substrate on the substrate holder. A high voltage electron beam source is positioned within said vacuum chamber in the vicinity of said crucible and includes a high voltage electron gun and a deflection magnet system arranged for bending electrons from said gun into said crucible for evaporating the preselected material therein, the magnet system forms a magnet field of prearranged characteristics in the region above said crucible. A low voltage, high current plasma source, including a separate plasma generating chamber is positioned relative to said vacuum chamber to produce an intense first plasma of a selected activation gas species in said plasma generating chamber for injection into said vacuum chamber. The plasma source is positioned at any convenient location relative to the crucible and the electron beam source and is electrically interconnected with the crucible for current flow therebetween. The plasma source fills the vacuum chamber with a generally distributed plasma. The distributed plasma coacts with the magnetic field above said crucible and evaporant material leaving the crucible to form an intense second plasma in the region above said crucible, thereby activating the evaporant material passing through the region toward the substrate to produce a vacuum deposited thin film having improved thin film characteristics.
摘要翻译：衬底保持器安装在真空室内以承载至少一个衬底; 导电坩埚定位在所述真空室内并与之电绝缘，但是在它们之间具有低电阻连接。坩埚适于容纳用于蒸发到衬底保持器上的衬底上的预选材料。高电压电子束源位于所述坩埚附近的所述真空室内，并且包括高压电子枪和偏转磁体系统，其布置成用于将电子从所述枪弯曲到所述坩埚中，用于蒸发其中的预选材料，磁体系统在所述坩埚上方的区域中形成预定特性的磁场。包括单独的等离子体产生室的低电压，高电流等离子体源相对于所述真空室定位，以在所述等离子体发生室中产生用于注入所述真空室的所选激活气体种类的强烈的第一等离子体。等离子体源位于相对于坩埚和电子束源的任何方便的位置，并且与坩埚电互连，用于其间的电流。等离子体源以大致分布的等离子体填充真空室。分布式等离子体与坩埚上方的磁场和离开坩埚的蒸发材料共同作用，在坩埚上方的区域中形成强烈的第二等离子体，从而使通过该区域的蒸发材料活动到衬底，以产生真空沉积的薄膜，改善薄膜特性。

9. 发明授权

US07785456B2 Magnetic latch for a vapour deposition system 有权
标题翻译：用于气相沉积系统的磁性闩锁
公开(公告)号：US07785456B2
公开(公告)日：2010-08-31
申请号：US10968642
申请日：2004-10-19
申请人： Richard I. Seddon , Markus K. Tilsch , Jeremy Hayes
发明人： Richard I. Seddon , Markus K. Tilsch , Jeremy Hayes
IPC分类号： C25B9/00 , C25B11/00 , C25B13/00 , C23C16/00 , C23C14/00
CPC分类号： C23C14/505 , C23C16/4584 , C23C16/4586 , H01J37/32715 , H01J37/34 , H01J37/3417 , H01L21/68764 , H01L21/68771 , H01L21/68785 , H01L21/68792
摘要： The invention relates to a magnetic latch for securing substrates on a planetary rotating platform suspended above a coating source in a vacuum chamber of a vapor deposition system, e.g. a chemical vapor deposition (CVD) system or a physical vapor deposition (PVD) system. The magnetic latch includes a permanent magnetic, which is moveable between a latching position, in which the permanent magnet magnetizes the latch for attracting a substrate holder, and an unlatching position, in which the permanent magnet is connected in a bypass circuit, thereby demagnetizing the latch for releasing the substrate holder.
摘要翻译：本发明涉及一种用于将基板固定在悬浮在气相沉积系统的真空室中的涂覆源上方的行星旋转平台上的磁性闩锁，化学气相沉积（CVD）系统或物理气相沉积（PVD）系统。磁性闩锁包括永久磁铁，该永久磁铁可以在其中永磁体磁化闩锁以吸引衬底保持器的闩锁位置与永久磁铁连接在旁路电路中的解锁位置之间移动，从而使用于释放衬底保持器的闩锁。

10. 发明授权

US5124013A High ratio planetary drive system and method for vacuum chamber 失效
标题翻译：高比率行星驱动系统和真空室方法
公开(公告)号：US5124013A
公开(公告)日：1992-06-23
申请号：US640487
申请日：1991-01-10
申请人： Richard I. Seddon , John D. Sonderman
发明人： Richard I. Seddon , John D. Sonderman
IPC分类号： C23C8/02 , C23C14/00 , C23C14/08 , C23C14/10 , C23C14/34 , C23C14/35 , C23C14/50 , C23C14/56 , C23C14/58
CPC分类号： C23C14/3407 , C23C14/0047 , C23C14/0078 , C23C14/083 , C23C14/10 , C23C14/352 , C23C14/505 , C23C14/56 , C23C14/562 , C23C14/58 , C23C8/02 , H01J2237/022
摘要： A high ratio planetary drive system, a vacuum processing chamber system incorporating the planetary drive system, and a method of operating the system are disclosed. The planetary drive system provides relatively slow planetary workpiece rotation for effecting processing (deposition and reaction) of thin films, in particular, optical thin films, with complete film oxidation, controlled film uniformity, reduced bearing wear and reduced heat dissipation.
摘要翻译：公开了一种高比例的行星驱动系统，包括行星驱动系统的真空处理室系统和操作该系统的方法。行星驱动系统提供相对较慢的行星工件旋转，用于实现薄膜特别是光学薄膜的处理（沉积和反应），具有完整的膜氧化，受控的膜均匀性，降低的轴承磨损和减少的散热。

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