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    • 3. 发明授权
    • Backing layer of a donor element for adjusting the focus on an imaging laser
    • 用于调整成像激光器上的焦点的施主元件的背衬层
    • US06890691B2
    • 2005-05-10
    • US10415400
    • 2001-12-14
    • Richard Albert CoveleskieHarry Richard Zwicker
    • Richard Albert CoveleskieHarry Richard Zwicker
    • B41J2/32B23K26/04B41J2/475B41J31/00B41J31/06B41M5/382B41M5/392B41M5/40B41M5/42B41M5/46G02B5/20G02B5/22G02F1/1335G03F9/00B41M5/38
    • B41M5/42B23K26/04B41J2/4753B41M5/38221B41M5/426G02B5/201G02B5/223G02F1/133516
    • A process for adjusting the energy of an imaging laser for imaging of a thermally imageable element and thermally imageable elements suitable for this purpose are described. The process comprises the steps of: (a) providing an imaging unit having a non-imaging laser and an imaging laser, the non-imaging laser having a light detector which is in communication with the imaging laser; (b) contacting a receiver element with the thermally imageable element in the imaging unit, the thermally imageable element comprising a thermally imageable layer on a front side of a base element and a light attenuated layer on a back side of the base element comprising a light attenuating agent; (c) actuating the non-imaging laser to expose the thermally imageable element and the receiver element to an amount of light energy sufficient for the light detector to detect the amount of light reflected from the light attenuated layer of the thermally imageable element; and (d) actuating the imaging laser to focus the imaging laser in order to expose the thermally imageable element to an amount of light energy sufficient for imaging the thermally imageable element. The light attenuation is achieved by use of a light attenuating agent or by physically roughening a support.
    • 描述了用于调整用于成像可热成像元件的成像激光器的能量和适于该目的的可热成像元件的工艺。 该方法包括以下步骤:(a)提供具有非成像激光和成像激光的成像单元,所述非成像激光器具有与成像激光器连通的光检测器; (b)使接收器元件与成像单元中的可热成像元件接触,所述可热成像元件包括在基底元件的前侧上的可热成像层和在所述基底元件的背面上的光衰减层,包括光 衰减剂; (c)致动所述非成像激光器以将所述可热成像元件和所述接收器元件暴露于足以使所述光检测器检测从所述可热成像元件的光衰减层反射的光量的量的光能量; 以及(d)致动成像激光器以聚焦成像激光器,以将可热成像元件暴露于足以对可热成像元件成像的光能量。 光衰减通过使用光衰减剂或通过物理上粗糙化支持物来实现。
    • 5. 发明授权
    • Donor element for adjusting the focus of an imaging laser
    • 用于调整成像激光焦点的供体元件
    • US06958202B2
    • 2005-10-25
    • US10433869
    • 2001-12-14
    • Richard Albert CoveleskieAlan Lee ShobertGregory Charles WeedHarry Richard Zwicker
    • Richard Albert CoveleskieAlan Lee ShobertGregory Charles WeedHarry Richard Zwicker
    • B41M5/382B41M5/392B41M5/42B41M5/46G02B5/20G02B5/22G02F1/1335B41M5/40B41J2/475B41M5/38
    • B41M5/42B41M5/38221G02B5/201G02B5/223G02F1/133516
    • A process for adjusting the energy of an imaging laser for element and thermally imageable elements suitable for this purpose are described. The process comprises the steps of: (a) providing an imaging unit having a non-imaging laser and an imaging laser, the non-imaging laser having a light detector which is in communication with the imaging laser, (b) contacting a receiver element with the thermally imageable element in the imaging unit, wherein the thermally imageable element comprises a light attenuated layer having a front surface and a back surface; (c) actuating the non-imaging laser to expose the thermally imageable element and the receiver element to an amount of light energy sufficient for the light detector to detect the amount of light reflected from the light attenuated layer of the thermally imageable element; and (d) actuating the imaging laser to focus the imaging laser in order to expose the thermally imageable element to an amount of light energy sufficient for imaging the thermally imageable element. The light attenuation is achieved by use of a light attenuating agent or by physically roughening a base element of the thermally imageable element.
    • 描述了用于调整用于适合于此目的的元件和可热成像元件的成像激光器的能量的方法。 该方法包括以下步骤:(a)提供具有非成像激光和成像激光的成像单元,所述非成像激光器具有与成像激光器连通的光检测器,(b)使接收元件 其中可成像单元中的可热成像元件,其中可热成像元件包括具有前表面和后表面的光衰减层; (c)致动所述非成像激光器以将所述可热成像元件和所述接收器元件暴露于足以使所述光检测器检测从所述可热成像元件的光衰减层反射的光量的量的光能量; 以及(d)致动成像激光器以聚焦成像激光器,以将可热成像元件暴露于足以对可热成像元件成像的光能量。 光衰减通过使用光衰减剂或通过物理粗化可热成像元件的基底元件来实现。